Class information for: |
Basic class information |
| Class id | #P | Avg. number of references |
Database coverage of references |
|---|---|---|---|
| 720 | 12751 | 17.9 | 59% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|---|
| 1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | journal | 1120750 | 22% | 17% | 2787 |
| 2 | CHEMICALLY AMPLIFIED RESIST | authKW | 358009 | 1% | 85% | 176 |
| 3 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | journal | 332672 | 4% | 27% | 519 |
| 4 | MICROELECTRONIC ENGINEERING | journal | 260593 | 8% | 10% | 1052 |
| 5 | RESIST | authKW | 235931 | 1% | 52% | 189 |
| 6 | ELECTRON BEAM LITHOGRAPHY | authKW | 234777 | 3% | 30% | 329 |
| 7 | LITHOGRAPHY | authKW | 231360 | 3% | 24% | 398 |
| 8 | LINE EDGE ROUGHNESS | authKW | 197778 | 1% | 68% | 122 |
| 9 | PHOTORESIST | authKW | 182774 | 2% | 32% | 241 |
| 10 | ELECTRON BEAM INDUCED DEPOSITION | authKW | 163348 | 1% | 77% | 89 |
Web of Science journal categories |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | Nanoscience & Nanotechnology | 157795 | 38% | 1% | 4795 |
| 2 | Physics, Applied | 110441 | 59% | 1% | 7538 |
| 3 | Engineering, Electrical & Electronic | 59058 | 40% | 1% | 5154 |
| 4 | Optics | 16213 | 16% | 0% | 2029 |
| 5 | Microscopy | 7038 | 3% | 1% | 338 |
| 6 | Polymer Science | 6741 | 10% | 0% | 1240 |
| 7 | Materials Science, Coatings & Films | 2884 | 4% | 0% | 495 |
| 8 | Materials Science, Multidisciplinary | 2576 | 13% | 0% | 1688 |
| 9 | Instruments & Instrumentation | 1787 | 5% | 0% | 581 |
| 10 | Physics, Condensed Matter | 705 | 6% | 0% | 787 |
Address terms |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | EUV LITHOG | 38759 | 0% | 90% | 18 |
| 2 | XRAY LITHOG | 38592 | 0% | 73% | 22 |
| 3 | ADV MAT DEV 1 | 38416 | 0% | 94% | 17 |
| 4 | SUPER FINE SR LITHOG | 33499 | 0% | 100% | 14 |
| 5 | HIGH VOLTAGE ELE ON MICROSCOPY STN | 32892 | 0% | 39% | 35 |
| 6 | LASTI | 31967 | 0% | 28% | 47 |
| 7 | EUV PROC TECHNOL | 28329 | 0% | 79% | 15 |
| 8 | ADV SCI TECHNOL IND | 26357 | 1% | 17% | 65 |
| 9 | XRAY OPT | 25087 | 1% | 15% | 69 |
| 10 | PHOTOMASK | 23928 | 0% | 100% | 10 |
Journals |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1120750 | 22% | 17% | 2787 |
| 2 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 332672 | 4% | 27% | 519 |
| 3 | MICROELECTRONIC ENGINEERING | 260593 | 8% | 10% | 1052 |
| 4 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 155172 | 2% | 26% | 246 |
| 5 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 66102 | 1% | 34% | 82 |
| 6 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 61388 | 7% | 3% | 897 |
| 7 | SOLID STATE TECHNOLOGY | 50865 | 2% | 11% | 199 |
| 8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 22146 | 1% | 9% | 105 |
| 9 | MICROLITHOGRAPHY WORLD | 20268 | 0% | 40% | 21 |
| 10 | PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 17648 | 2% | 4% | 201 |
Author Key Words |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | CHEMICALLY AMPLIFIED RESIST | 358009 | 1% | 85% | 176 | Search CHEMICALLY+AMPLIFIED+RESIST | Search CHEMICALLY+AMPLIFIED+RESIST |
| 2 | RESIST | 235931 | 1% | 52% | 189 | Search RESIST | Search RESIST |
| 3 | ELECTRON BEAM LITHOGRAPHY | 234777 | 3% | 30% | 329 | Search ELECTRON+BEAM+LITHOGRAPHY | Search ELECTRON+BEAM+LITHOGRAPHY |
| 4 | LITHOGRAPHY | 231360 | 3% | 24% | 398 | Search LITHOGRAPHY | Search LITHOGRAPHY |
| 5 | LINE EDGE ROUGHNESS | 197778 | 1% | 68% | 122 | Search LINE+EDGE+ROUGHNESS | Search LINE+EDGE+ROUGHNESS |
| 6 | PHOTORESIST | 182774 | 2% | 32% | 241 | Search PHOTORESIST | Search PHOTORESIST |
| 7 | ELECTRON BEAM INDUCED DEPOSITION | 163348 | 1% | 77% | 89 | Search ELECTRON+BEAM+INDUCED+DEPOSITION | Search ELECTRON+BEAM+INDUCED+DEPOSITION |
| 8 | X RAY MASK | 150585 | 1% | 85% | 74 | Search X+RAY+MASK | Search X+RAY+MASK |
| 9 | FOCUSED ION BEAM | 145417 | 2% | 23% | 263 | Search FOCUSED+ION+BEAM | Search FOCUSED+ION+BEAM |
| 10 | IMMERSION LITHOGRAPHY | 141299 | 1% | 76% | 78 | Search IMMERSION+LITHOGRAPHY | Search IMMERSION+LITHOGRAPHY |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
| Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
|---|---|---|---|---|
| 1 | UTKE, I , HOFFMANN, P , MELNGAILIS, J , (2008) GAS-ASSISTED FOCUSED ELECTRON BEAM AND ION BEAM PROCESSING AND FABRICATION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 4. P. 1197 -1276 | 304 | 69% | 417 |
| 2 | VAN DORP, WF , HAGEN, CW , (2008) A CRITICAL LITERATURE REVIEW OF FOCUSED ELECTRON BEAM INDUCED DEPOSITION.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 8. P. - | 136 | 87% | 202 |
| 3 | ITO, H , (2005) CHEMICAL AMPLIFICATION RESISTS FOR MICROLITHOGRAPHY.MICROLITHOGRAPHY - MOLECULAR IMPRINTING. VOL. 172. ISSUE . P. 37 -245 | 156 | 70% | 333 |
| 4 | BOTMAN, A , MULDERS, JJL , HAGEN, CW , (2009) CREATING PURE NANOSTRUCTURES FROM ELECTRON-BEAM-INDUCED DEPOSITION USING PURIFICATION TECHNIQUES: A TECHNOLOGY PERSPECTIVE.NANOTECHNOLOGY. VOL. 20. ISSUE 37. P. - | 121 | 88% | 122 |
| 5 | SANDERS, DP , (2010) ADVANCES IN PATTERNING MATERIALS FOR 193 NM IMMERSION LITHOGRAPHY.CHEMICAL REVIEWS. VOL. 110. ISSUE 1. P. 321 -360 | 129 | 76% | 65 |
| 6 | KIM, CS , AHN, SH , JANG, DY , (2012) REVIEW: DEVELOPMENTS IN MICRO/NANOSCALE FABRICATION BY FOCUSED ION BEAMS.VACUUM. VOL. 86. ISSUE 8. P. 1014 -1035 | 129 | 71% | 32 |
| 7 | DE TERESA, JM , FERNANDEZ-PACHECO, A , CORDOBA, R , SERRANO-RAMON, L , SANGIAO, S , IBARRA, MR , (2016) REVIEW OF MAGNETIC NANOSTRUCTURES GROWN BY FOCUSED ELECTRON BEAM INDUCED DEPOSITION (FEBID).JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 24. P. - | 110 | 64% | 4 |
| 8 | KOZAWA, T , TAGAWA, S , (2010) RADIATION CHEMISTRY IN CHEMICALLY AMPLIFIED RESISTS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 3. P. - | 117 | 70% | 49 |
| 9 | BISCHOFF, L , MAZAROV, P , BRUCHHAUS, L , GIERAK, J , (2016) LIQUID METAL ALLOY ION SOURCES-AN ALTERNATIVE FOR FOCUSSED ION BEAM TECHNOLOGY.APPLIED PHYSICS REVIEWS. VOL. 3. ISSUE 2. P. - | 93 | 67% | 1 |
| 10 | RANDOLPH, SJ , FOWLKES, JD , RACK, PD , (2006) FOCUSED, NANOSCALE ELECTRON-BEAM-INDUCED DEPOSITION AND ETCHING.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 31. ISSUE 3. P. 55 -89 | 85 | 70% | 233 |
Classes with closest relation at Level 2 |