Class information for: |
Basic class information |
| Class id | #P | Avg. number of references |
Database coverage of references |
|---|---|---|---|
| 314 | 39933 | 22.7 | 54% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|---|
| 1 | ULTRAMICROSCOPY | journal | 907535 | 6% | 46% | 2577 |
| 2 | MICROSCOPY | WoSSC | 902369 | 16% | 18% | 6522 |
| 3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | journal | 449971 | 8% | 19% | 3139 |
| 4 | CHEMICALLY AMPLIFIED RESIST | authKW | 115378 | 0% | 86% | 177 |
| 5 | JOURNAL OF ELECTRON MICROSCOPY | journal | 108905 | 1% | 28% | 516 |
| 6 | MICROSCOPY AND MICROANALYSIS | journal | 108240 | 1% | 28% | 502 |
| 7 | SURFACE AND INTERFACE ANALYSIS | journal | 106041 | 2% | 15% | 969 |
| 8 | ELECTRON HOLOGRAPHY | authKW | 105962 | 1% | 63% | 221 |
| 9 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | journal | 105521 | 1% | 27% | 519 |
| 10 | ELECTRON TOMOGRAPHY | authKW | 100255 | 1% | 45% | 293 |
Web of Science journal categories |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | Microscopy | 902369 | 16% | 18% | 6522 |
| 2 | Physics, Applied | 99993 | 33% | 1% | 13351 |
| 3 | Nanoscience & Nanotechnology | 69866 | 15% | 2% | 5915 |
| 4 | Engineering, Electrical & Electronic | 22863 | 16% | 1% | 6457 |
| 5 | Physics, Condensed Matter | 19705 | 14% | 1% | 5399 |
| 6 | Instruments & Instrumentation | 9953 | 6% | 1% | 2302 |
| 7 | Materials Science, Coatings & Films | 9712 | 4% | 1% | 1600 |
| 8 | Spectroscopy | 7931 | 5% | 1% | 1800 |
| 9 | Optics | 7332 | 7% | 1% | 2813 |
| 10 | Materials Science, Multidisciplinary | 7042 | 13% | 0% | 5047 |
Address terms |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | TRIEBENBERG | 22569 | 0% | 60% | 49 |
| 2 | MACROMOL IMAGING | 19935 | 0% | 37% | 71 |
| 3 | SUR E MICROANAL SCI | 17034 | 0% | 30% | 76 |
| 4 | HIGH VOLTAGE ELE ON MICROSCOPY STN | 14361 | 0% | 46% | 41 |
| 5 | UMR 6634 | 12682 | 0% | 20% | 86 |
| 6 | EUV LITHOG | 12352 | 0% | 90% | 18 |
| 7 | XRAY LITHOG | 12293 | 0% | 73% | 22 |
| 8 | ADV MAT DEV 1 | 12243 | 0% | 94% | 17 |
| 9 | LAMACOP | 11852 | 0% | 68% | 23 |
| 10 | SUPER FINE SR LITHOG | 10677 | 0% | 100% | 14 |
Journals |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | ULTRAMICROSCOPY | 907535 | 6% | 46% | 2577 |
| 2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 449971 | 8% | 19% | 3139 |
| 3 | JOURNAL OF ELECTRON MICROSCOPY | 108905 | 1% | 28% | 516 |
| 4 | MICROSCOPY AND MICROANALYSIS | 108240 | 1% | 28% | 502 |
| 5 | SURFACE AND INTERFACE ANALYSIS | 106041 | 2% | 15% | 969 |
| 6 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 105521 | 1% | 27% | 519 |
| 7 | SCANNING | 98531 | 1% | 28% | 469 |
| 8 | MICROELECTRONIC ENGINEERING | 96234 | 3% | 11% | 1140 |
| 9 | JOURNAL OF STRUCTURAL BIOLOGY | 91671 | 2% | 19% | 648 |
| 10 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 60976 | 2% | 12% | 696 |
Author Key Words |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | CHEMICALLY AMPLIFIED RESIST | 115378 | 0% | 86% | 177 | Search CHEMICALLY+AMPLIFIED+RESIST | Search CHEMICALLY+AMPLIFIED+RESIST |
| 2 | ELECTRON HOLOGRAPHY | 105962 | 1% | 63% | 221 | Search ELECTRON+HOLOGRAPHY | Search ELECTRON+HOLOGRAPHY |
| 3 | ELECTRON TOMOGRAPHY | 100255 | 1% | 45% | 293 | Search ELECTRON+TOMOGRAPHY | Search ELECTRON+TOMOGRAPHY |
| 4 | ELECTRON BEAM LITHOGRAPHY | 82456 | 1% | 31% | 346 | Search ELECTRON+BEAM+LITHOGRAPHY | Search ELECTRON+BEAM+LITHOGRAPHY |
| 5 | LITHOGRAPHY | 76708 | 1% | 25% | 407 | Search LITHOGRAPHY | Search LITHOGRAPHY |
| 6 | RESIST | 75078 | 0% | 52% | 189 | Search RESIST | Search RESIST |
| 7 | FOCUSED ION BEAM | 68781 | 1% | 28% | 321 | Search FOCUSED+ION+BEAM | Search FOCUSED+ION+BEAM |
| 8 | LINE EDGE ROUGHNESS | 66128 | 0% | 69% | 125 | Search LINE+EDGE+ROUGHNESS | Search LINE+EDGE+ROUGHNESS |
| 9 | ABERRATION CORRECTION | 64997 | 0% | 57% | 149 | Search ABERRATION+CORRECTION | Search ABERRATION+CORRECTION |
| 10 | ELECTRON BEAM INDUCED DEPOSITION | 59303 | 0% | 82% | 95 | Search ELECTRON+BEAM+INDUCED+DEPOSITION | Search ELECTRON+BEAM+INDUCED+DEPOSITION |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
| Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
|---|---|---|---|---|
| 1 | UTKE, I , HOFFMANN, P , MELNGAILIS, J , (2008) GAS-ASSISTED FOCUSED ELECTRON BEAM AND ION BEAM PROCESSING AND FABRICATION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 4. P. 1197 -1276 | 322 | 73% | 417 |
| 2 | OXLEY, MP , LUPINI, AR , PENNYCOOK, SJ , (2017) ULTRA-HIGH RESOLUTION ELECTRON MICROSCOPY.REPORTS ON PROGRESS IN PHYSICS. VOL. 80. ISSUE 2. P. - | 187 | 81% | 0 |
| 3 | FERNANDEZ, JJ , (2012) COMPUTATIONAL METHODS FOR ELECTRON TOMOGRAPHY.MICRON. VOL. 43. ISSUE 10. P. 1010 -1030 | 165 | 85% | 38 |
| 4 | VAN DORP, WF , HAGEN, CW , (2008) A CRITICAL LITERATURE REVIEW OF FOCUSED ELECTRON BEAM INDUCED DEPOSITION.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 8. P. - | 139 | 89% | 202 |
| 5 | REN, G , RAMES, MJ , ALAIDI, O , ERCIUS, P , (2015) ELECTRON TOMOGRAPHY: A THREE-DIMENSIONAL ANALYTIC TOOL FOR HARD AND SOFT MATERIALS RESEARCH.ADVANCED MATERIALS. VOL. 27. ISSUE 38. P. 5638 -5663 | 150 | 77% | 7 |
| 6 | ITO, H , (2005) CHEMICAL AMPLIFICATION RESISTS FOR MICROLITHOGRAPHY.MICROLITHOGRAPHY - MOLECULAR IMPRINTING. VOL. 172. ISSUE . P. 37 -245 | 156 | 70% | 333 |
| 7 | BOTMAN, A , MULDERS, JJL , HAGEN, CW , (2009) CREATING PURE NANOSTRUCTURES FROM ELECTRON-BEAM-INDUCED DEPOSITION USING PURIFICATION TECHNIQUES: A TECHNOLOGY PERSPECTIVE.NANOTECHNOLOGY. VOL. 20. ISSUE 37. P. - | 122 | 88% | 122 |
| 8 | LYUMKIS, D , MOELLER, A , CHENG, AC , HEROLD, A , HOU, E , IRVING, C , JACOVETTY, EL , LAU, PW , MULDER, AM , PULOKAS, J , ET AL (2010) AUTOMATION IN SINGLE-PARTICLE ELECTRON MICROSCOPY: CONNECTING THE PIECES.METHODS IN ENZYMOLOGY, VOL 483: CRYO-EM, PART C: ANALYSES, INTERPRETATION, AND CASE STUDIES. VOL. 483. ISSUE . P. 291 -338 | 139 | 89% | 10 |
| 9 | ORLOVA, EV , SAIBIL, HR , (2011) STRUCTURAL ANALYSIS OF MACROMOLECULAR ASSEMBLIES BY ELECTRON MICROSCOPY.CHEMICAL REVIEWS. VOL. 111. ISSUE 12. P. 7710 -7748 | 137 | 76% | 51 |
| 10 | KIRKLAND, EJ , (2016) COMPUTATION IN ELECTRON MICROSCOPY.ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES. VOL. 72. ISSUE . P. 1 -27 | 134 | 81% | 0 |
Classes with closest relation at Level 3 |