Class information for:
Level 1: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
5528 1611 13.2 54%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
5528 1                   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY 1611

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B journal 526233 42% 4% 678
2 PROXIMITY EFFECT CORRECTION authKW 516883 2% 91% 30
3 ELECTRON BEAM LITHOGRAPHY authKW 251814 8% 11% 121
4 PHOTOMASK address 189526 1% 100% 10
5 CHARACTER PROJECTION authKW 181940 1% 80% 12
6 VARIABLE SHAPED BEAM authKW 172294 1% 91% 10
7 MICROCOLUMN authKW 172254 2% 30% 30
8 ELECTRON BEAM DIRECT WRITING authKW 135370 1% 71% 10
9 IC EQUIPMENT address 127925 1% 75% 9
10 CELL PROJECTION authKW 118084 1% 69% 9

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Nanoscience & Nanotechnology 48798 58% 0% 938
2 Physics, Applied 26596 80% 0% 1293
3 Engineering, Electrical & Electronic 20037 64% 0% 1036
4 Optics 3048 19% 0% 307
5 Microscopy 551 2% 0% 34
6 Computer Science, Hardware & Architecture 192 2% 0% 36
7 Instruments & Instrumentation 134 4% 0% 60
8 Materials Science, Coatings & Films 64 2% 0% 31
9 Spectroscopy 15 2% 0% 25
10 Computer Science, Information Systems 13 1% 0% 22

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PHOTOMASK 189526 1% 100% 10
2 IC EQUIPMENT 127925 1% 75% 9
3 MASK DRAWING EQUIPMENT DEV 94763 0% 100% 5
4 NEXT GENERAT SEMICOND TECHNOL 80857 0% 53% 8
5 EB MASK EQUIPMENT ENGN 78967 0% 83% 5
6 OHI PLANT 78967 0% 83% 5
7 MASK DEV TEAM 66327 0% 50% 7
8 PL MAT CO 60647 0% 80% 4
9 ETEC SYST 56858 0% 100% 3
10 IC LCD EQUIPMENT BUSINESS HEADQUARTERS 56858 0% 100% 3

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 526233 42% 4% 678
2 MICROELECTRONIC ENGINEERING 87223 13% 2% 216
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY 32411 3% 4% 45
4 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 13135 9% 0% 147
5 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 4551 1% 2% 15
6 MICROLITHOGRAPHY WORLD 3275 0% 6% 3
7 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 2796 0% 2% 6
8 SOLID STATE TECHNOLOGY 2275 1% 1% 15
9 IBM JOURNAL OF RESEARCH AND DEVELOPMENT 2146 1% 1% 15
10 HEWLETT-PACKARD JOURNAL 2037 0% 2% 6

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 PROXIMITY EFFECT CORRECTION 516883 2% 91% 30 Search PROXIMITY+EFFECT+CORRECTION Search PROXIMITY+EFFECT+CORRECTION
2 ELECTRON BEAM LITHOGRAPHY 251814 8% 11% 121 Search ELECTRON+BEAM+LITHOGRAPHY Search ELECTRON+BEAM+LITHOGRAPHY
3 CHARACTER PROJECTION 181940 1% 80% 12 Search CHARACTER+PROJECTION Search CHARACTER+PROJECTION
4 VARIABLE SHAPED BEAM 172294 1% 91% 10 Search VARIABLE+SHAPED+BEAM Search VARIABLE+SHAPED+BEAM
5 MICROCOLUMN 172254 2% 30% 30 Search MICROCOLUMN Search MICROCOLUMN
6 ELECTRON BEAM DIRECT WRITING 135370 1% 71% 10 Search ELECTRON+BEAM+DIRECT+WRITING Search ELECTRON+BEAM+DIRECT+WRITING
7 CELL PROJECTION 118084 1% 69% 9 Search CELL+PROJECTION Search CELL+PROJECTION
8 ELECTRON BEAM PROJECTION LITHOGRAPHY 113715 0% 100% 6 Search ELECTRON+BEAM+PROJECTION+LITHOGRAPHY Search ELECTRON+BEAM+PROJECTION+LITHOGRAPHY
9 ELECTRON PROJECTION LITHOGRAPHY EPL 113715 0% 100% 6 Search ELECTRON+PROJECTION+LITHOGRAPHY+EPL Search ELECTRON+PROJECTION+LITHOGRAPHY+EPL
10 ELECTRON PROJECTION LITHOGRAPHY 110265 0% 73% 8 Search ELECTRON+PROJECTION+LITHOGRAPHY Search ELECTRON+PROJECTION+LITHOGRAPHY

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 YAMASHITA, H , NOZUE, H , NOMURA, E , ITOH, K , EMA, T , HIRASAWA, S , KOJIMA, K , TAMURA, T , NAKAJIMA, K , (1996) RECENT PROGRESS IN ELECTRON-BEAM CELL PROJECTION TECHNOLOGY.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 35. ISSUE 12B. P. 6404-6414 44 94% 6
2 LIU, CH , NG, PCW , SHEN, YT , CHIEN, SW , TSAI, KY , (2013) IMPACTS OF POINT SPREAD FUNCTION ACCURACY ON PATTERNING PREDICTION AND PROXIMITY EFFECT CORRECTION IN LOW-VOLTAGE ELECTRON-BEAM-DIRECT-WRITE LITHOGRAPHY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 31. ISSUE 2. P. - 32 65% 1
3 ABE, T , MATSUMOTO, H , SHIBATA, H , MOTOSUGI, T , KATO, Y , OHNISHI, T , YASHIMA, J , IIJIMA, T , ANZE, H , (2009) PROXIMITY EFFECT CORRECTION FOR MASK WRITING TAKING RESIST DEVELOPMENT PROCESSES INTO ACCOUNT.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 48. ISSUE 9. P. - 25 93% 0
4 LIU, CH , NG, HT , TSAI, KY , (2012) NEW PARAMETRIC POINT SPREAD FUNCTION CALIBRATION METHODOLOGY FOR IMPROVING THE ACCURACY OF PATTERNING PREDICTION IN ELECTRON-BEAM LITHOGRAPHY.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 11. ISSUE 1. P. - 24 86% 0
5 CHANG, THP , MANKOS, M , LEE, KY , MURAY, LP , (2001) MULTIPLE ELECTRON-BEAM LITHOGRAPHY.MICROELECTRONIC ENGINEERING. VOL. 57-8. ISSUE . P. 117-135 25 89% 69
6 DHALIWAL, RS , ENICHEN, WA , GOLLADAY, SD , GORDON, MS , KENDALL, RA , LIEBERMAN, JE , PFEIFFER, HC , PINCKNEY, DJ , ROBINSON, CF , ROCKROHR, JD , ET AL (2001) PREVAIL - ELECTRON PROJECTION TECHNOLOGY APPROACH FOR NEXT-GENERATION LITHOGRAPHY.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 45. ISSUE 5. P. 615 -638 23 100% 38
7 WEN, Y , DU, ZD , PAN, L , (2015) DESIGN OF ELECTROSTATIC MICROCOLUMN FOR NANOSCALE PHOTOEMISSION SOURCE IN MASSIVELY PARALLEL ELECTRON-BEAM LITHOGRAPHY.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 14. ISSUE 4. P. - 20 80% 0
8 LEE, SY , CHOI, J , LEE, SH , SHIN, IK , JEON, CU , JEON, SC , (2014) EXPERIMENTAL VERIFICATION OF ACHIEVING VERTICAL SIDEWALLS FOR NANOSCALE FEATURES IN ELECTRON-BEAM LITHOGRAPHY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 32. ISSUE 6. P. - 17 94% 1
9 OH, TS , KIM, HS , AHN, S , KIM, DW , (2014) DESIGN OF AN ULTRA-MINIATURIZED ELECTRON OPTICAL MICROCOLUMN WITH SUB-5 NM VERY HIGH RESOLUTION.ULTRAMICROSCOPY. VOL. 136. ISSUE . P. 171-175 19 83% 2
10 DAI, Q , LEE, SY , LEE, SH , KIM, BG , CHO, HK , (2012) NEW TYPES OF DOSE DISTRIBUTIONS FOR VERTICAL SIDEWALL MINIMIZING TOTAL DOSE IN 3-D ELECTRON-BEAM PROXIMITY EFFECT CORRECTION OF NANOSCALE FEATURES.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 30. ISSUE 6. P. - 14 100% 3

Classes with closest relation at Level 1


Rank Class id link
1 18745 ELECTRON BEAM LITHOGRAPHY//HSQ//HYDROGEN SILSESQUIOXANE
2 16154 PROD DESIGN TECHNOL//CORE LENS//THIN LENS APPROXIMATION
3 21913 STENCIL LITHOGRAPHY//NANOSYST MFG//STRESS INDUCED DEFORMATION
4 9774 X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY
5 21494 VOLTAGE CONTRAST//E BEAM INSPECTION//ELECTRON BEAM TESTING
6 26307 SURFACE NANOHOLES//LEHRSTUHL ADHAS INTERPHASEN POLYMEREN//UNITE MICROELECT OPTOELECT POLYMERE
7 14404 BACKSCATTERED ELECTRONS//DOPANT CONTRAST//SCANNING
8 8140 SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//WT ADDITIVITY
9 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
10 8222 LIQUID METAL ION SOURCE//ION BEAMS MAT//ALLOY LIQUID METAL ION SOURCES

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