Class information for:
Level 1: OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//OPTICAL PROXIMITY CORRECTION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
10360 1070 16.5 55%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
10360 1                   OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//OPTICAL PROXIMITY CORRECTION 1070

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 OPTICAL LITHOGRAPHY authKW 1183334 8% 47% 89
2 PHASE SHIFTING MASK authKW 573634 3% 72% 28
3 OPTICAL PROXIMITY CORRECTION authKW 551315 3% 60% 32
4 RESOLUTION ENHANCEMENT TECHNIQUES authKW 475596 2% 83% 20
5 ATTENUATED PHASE SHIFTING MASK authKW 316091 1% 92% 12
6 LAYOUT DECOMPOSITION authKW 316091 1% 92% 12
7 ANNULAR ILLUMINATION authKW 267916 1% 72% 13
8 PHASE SHIFT MASK authKW 257519 2% 48% 19
9 OFF AXIS ILLUMINATION authKW 256819 1% 75% 12
10 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS journal 253657 9% 10% 91

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Nanoscience & Nanotechnology 11578 35% 0% 377
2 Engineering, Electrical & Electronic 8390 52% 0% 553
3 Optics 8159 37% 0% 392
4 Physics, Applied 7198 53% 0% 562
5 Computer Science, Hardware & Architecture 1378 7% 0% 71
6 Computer Science, Interdisciplinary Applications 265 5% 0% 52
7 Engineering, Manufacturing 166 2% 0% 26
8 Materials Science, Multidisciplinary 131 11% 0% 120
9 Physics, Condensed Matter 82 7% 0% 73
10 Computer Science, Software Engineering 13 1% 0% 14

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 OPT TECHNOL HEADQUARTERS 114145 0% 100% 4
2 ULSI PROC DEV 1 114145 0% 100% 4
3 PROC MFG ENGN 87770 2% 15% 20
4 INFORMAT OPT OPTOELECT TECHNOL 70776 1% 18% 14
5 PHOTOELECT IMAGING TECHNOL SYST 65582 2% 12% 19
6 MASK TECHNOL 64205 0% 75% 3
7 LITHOG GRP 57072 0% 100% 2
8 SEMICOND ADV PROC ENGN 2 57072 0% 100% 2
9 IMAGING SYST 56270 1% 16% 12
10 ADV MODULE TECHNOL DEV 51363 0% 60% 3

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 253657 9% 10% 91
2 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 112799 3% 13% 31
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 56250 17% 1% 181
4 MICROLITHOGRAPHY WORLD 44436 1% 17% 9
5 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 29288 17% 1% 178
6 MICROELECTRONIC ENGINEERING 21729 8% 1% 88
7 IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS 14056 5% 1% 49
8 SOLID STATE TECHNOLOGY 12038 3% 2% 28
9 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 9619 2% 1% 23
10 APPLIED OPTICS 2309 5% 0% 54

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 OPTICAL LITHOGRAPHY 1183334 8% 47% 89 Search OPTICAL+LITHOGRAPHY Search OPTICAL+LITHOGRAPHY
2 PHASE SHIFTING MASK 573634 3% 72% 28 Search PHASE+SHIFTING+MASK Search PHASE+SHIFTING+MASK
3 OPTICAL PROXIMITY CORRECTION 551315 3% 60% 32 Search OPTICAL+PROXIMITY+CORRECTION Search OPTICAL+PROXIMITY+CORRECTION
4 RESOLUTION ENHANCEMENT TECHNIQUES 475596 2% 83% 20 Search RESOLUTION+ENHANCEMENT+TECHNIQUES Search RESOLUTION+ENHANCEMENT+TECHNIQUES
5 ATTENUATED PHASE SHIFTING MASK 316091 1% 92% 12 Search ATTENUATED+PHASE+SHIFTING+MASK Search ATTENUATED+PHASE+SHIFTING+MASK
6 LAYOUT DECOMPOSITION 316091 1% 92% 12 Search LAYOUT+DECOMPOSITION Search LAYOUT+DECOMPOSITION
7 ANNULAR ILLUMINATION 267916 1% 72% 13 Search ANNULAR+ILLUMINATION Search ANNULAR+ILLUMINATION
8 PHASE SHIFT MASK 257519 2% 48% 19 Search PHASE+SHIFT+MASK Search PHASE+SHIFT+MASK
9 OFF AXIS ILLUMINATION 256819 1% 75% 12 Search OFF+AXIS+ILLUMINATION Search OFF+AXIS+ILLUMINATION
10 OPTICAL PROXIMITY CORRECTION OPC 237788 1% 56% 15 Search OPTICAL+PROXIMITY+CORRECTION+OPC Search OPTICAL+PROXIMITY+CORRECTION+OPC

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 MA, X , LI, YQ , DONG, LS , (2012) MASK OPTIMIZATION APPROACHES IN OPTICAL LITHOGRAPHY BASED ON A VECTOR IMAGING MODEL.JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION. VOL. 29. ISSUE 7. P. 1300 -1312 26 100% 9
2 WU, XF , LIU, SY , LV, W , LAM, EY , (2014) ROBUST AND EFFICIENT INVERSE MASK SYNTHESIS WITH BASIS FUNCTION REPRESENTATION.JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION. VOL. 31. ISSUE 12. P. B1 -B9 25 96% 3
3 LV, W , LAM, EY , WEI, HQ , LIU, SY , (2014) CASCADIC MULTIGRID ALGORITHM FOR ROBUST INVERSE MASK SYNTHESIS IN OPTICAL LITHOGRAPHY.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 13. ISSUE 2. P. - 26 90% 2
4 LV, W , LIU, SY , XIA, Q , WU, XF , SHEN, YJ , LAM, EY , (2013) LEVEL-SET-BASED INVERSE LITHOGRAPHY FOR MASK SYNTHESIS USING THE CONJUGATE GRADIENT AND AN OPTIMAL TIME STEP.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 31. ISSUE 4. P. - 25 89% 1
5 MA, X , JIANG, SL , WANG, J , WU, BL , SONG, ZY , LI, YQ , (2017) A FAST AND MANUFACTURE-FRIENDLY OPTICAL PROXIMITY CORRECTION BASED ON MACHINE LEARNING.MICROELECTRONIC ENGINEERING. VOL. 168. ISSUE . P. 15 -26 20 100% 0
6 MA, X , WU, BL , SONG, ZY , JIANG, SL , LI, YQ , (2014) FAST PIXEL-BASED OPTICAL PROXIMITY CORRECTION BASED ON NONPARAMETRIC KERNEL REGRESSION.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 13. ISSUE 4. P. - 21 100% 0
7 MA, X , DONG, LS , HAN, CY , GAO, J , LI, YQ , ARCE, GR , (2015) GRADIENT-BASED JOINT SOURCE POLARIZATION MASK OPTIMIZATION FOR OPTICAL LITHOGRAPHY.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 14. ISSUE 2. P. - 19 100% 2
8 MA, X , LI, YQ , GUO, XJ , DONG, LS , ARCE, GR , (2012) VECTORIAL MASK OPTIMIZATION METHODS FOR ROBUST OPTICAL LITHOGRAPHY.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 11. ISSUE 4. P. - 22 92% 3
9 MA, X , HAN, CY , LI, YQ , DONG, LS , ARCE, GR , (2013) PIXELATED SOURCE AND MASK OPTIMIZATION FOR IMMERSION LITHOGRAPHY.JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION. VOL. 30. ISSUE 1. P. 112 -123 19 100% 8
10 LV, W , LIU, SY , WU, XF , LAM, EY , (2014) ILLUMINATION SOURCE OPTIMIZATION IN OPTICAL LITHOGRAPHY VIA DERIVATIVE-FREE OPTIMIZATION.JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION. VOL. 31. ISSUE 12. P. B19 -B26 19 100% 1

Classes with closest relation at Level 1


Rank Class id link
1 22144 EUV LITHOG//EXTREME ULTRAVIOLET LITHOGRAPHY//EUVL
2 33481 LITHOGRAPHY SIMULATION//VUV LITHOG//RESIST REFLOW PROCESS
3 25108 IMMERSION LITHOGRAPHY//DOUBLE PATTERNING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
4 8140 SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//WT ADDITIVITY
5 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
6 34813 ELECTROSTATIC CHUCK//PIN CHUCK//WAFER FLATNESS
7 23603 ELECT ELECT MAT TECHNOL//CELL ADVANCING METHOD//LC ANALOGUE
8 12907 HOLOGRAPHIC LITHOGRAPHY//INTERFERENCE LITHOGRAPHY//PHOTONIC QUASICRYSTAL
9 9774 X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY
10 5528 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY

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