Class information for: |
Basic class information |
| Class id | #P | Avg. number of references |
Database coverage of references |
|---|---|---|---|
| 25108 | 291 | 15.1 | 50% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
| rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|---|
| 1 | IMMERSION LITHOGRAPHY | authKW | 2861641 | 18% | 51% | 53 |
| 2 | DOUBLE PATTERNING | authKW | 440347 | 5% | 26% | 16 |
| 3 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | journal | 429818 | 31% | 5% | 89 |
| 4 | WAFER RINSING | authKW | 335781 | 1% | 80% | 4 |
| 5 | SECOND GENERATION FLUID | authKW | 314796 | 1% | 100% | 3 |
| 6 | DEFECTIVITY | authKW | 265596 | 3% | 28% | 9 |
| 7 | 193NM IMMERSION LITHOGRAPHY | authKW | 236096 | 1% | 75% | 3 |
| 8 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | journal | 228391 | 8% | 9% | 23 |
| 9 | ACTIVE RECYCLE | authKW | 209864 | 1% | 100% | 2 |
| 10 | FREEZING FREE | authKW | 209864 | 1% | 100% | 2 |
Web of Science journal categories |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | Polymer Science | 2003 | 32% | 0% | 92 |
| 2 | Nanoscience & Nanotechnology | 1425 | 24% | 0% | 70 |
| 3 | Optics | 883 | 24% | 0% | 69 |
| 4 | Physics, Applied | 864 | 36% | 0% | 105 |
| 5 | Engineering, Electrical & Electronic | 826 | 32% | 0% | 94 |
| 6 | Materials Science, Multidisciplinary | 19 | 9% | 0% | 27 |
| 7 | Instruments & Instrumentation | 14 | 3% | 0% | 9 |
| 8 | Physics, Condensed Matter | 11 | 5% | 0% | 16 |
| 9 | Engineering, Manufacturing | 5 | 1% | 0% | 3 |
| 10 | Materials Science, Coatings & Films | 4 | 1% | 0% | 4 |
Address terms |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | ADV LITHPG DEV ALBANY | 104932 | 0% | 100% | 1 |
| 2 | AVD MAT DEV 1 | 104932 | 0% | 100% | 1 |
| 3 | CHEM ULTR URE WATER TECHNOL GRP | 104932 | 0% | 100% | 1 |
| 4 | CLEAN TRACK BUSINESS UNIT | 104932 | 0% | 100% | 1 |
| 5 | DEP C T | 104932 | 0% | 100% | 1 |
| 6 | DEV TECHNOL OPERAT | 104932 | 0% | 100% | 1 |
| 7 | DUPONT KK | 104932 | 0% | 100% | 1 |
| 8 | ENVIRONM BENIGN SEMICOND MFG | 104932 | 0% | 100% | 1 |
| 9 | FREESCALE SEMICOND ASSIGNEE | 104932 | 0% | 100% | 1 |
| 10 | INSULAT POLYMER TECHNOL | 104932 | 0% | 100% | 1 |
Journals |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
|---|---|---|---|---|---|
| 1 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 429818 | 31% | 5% | 89 |
| 2 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 228391 | 8% | 9% | 23 |
| 3 | MICROLITHOGRAPHY WORLD | 32279 | 1% | 8% | 4 |
| 4 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 22063 | 5% | 2% | 14 |
| 5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 6443 | 11% | 0% | 32 |
| 6 | MICRO | 5360 | 1% | 2% | 3 |
| 7 | JOURNAL OF THE INSTITUTE OF ENVIRONMENTAL SCIENCES | 3277 | 0% | 3% | 1 |
| 8 | MICROELECTRONIC ENGINEERING | 2972 | 6% | 0% | 17 |
| 9 | SOLID STATE TECHNOLOGY | 2765 | 2% | 0% | 7 |
| 10 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 647 | 5% | 0% | 14 |
Author Key Words |
| Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
|---|---|---|---|---|---|---|---|
| 1 | IMMERSION LITHOGRAPHY | 2861641 | 18% | 51% | 53 | Search IMMERSION+LITHOGRAPHY | Search IMMERSION+LITHOGRAPHY |
| 2 | DOUBLE PATTERNING | 440347 | 5% | 26% | 16 | Search DOUBLE+PATTERNING | Search DOUBLE+PATTERNING |
| 3 | WAFER RINSING | 335781 | 1% | 80% | 4 | Search WAFER+RINSING | Search WAFER+RINSING |
| 4 | SECOND GENERATION FLUID | 314796 | 1% | 100% | 3 | Search SECOND+GENERATION+FLUID | Search SECOND+GENERATION+FLUID |
| 5 | DEFECTIVITY | 265596 | 3% | 28% | 9 | Search DEFECTIVITY | Search DEFECTIVITY |
| 6 | 193NM IMMERSION LITHOGRAPHY | 236096 | 1% | 75% | 3 | Search 193NM+IMMERSION+LITHOGRAPHY | Search 193NM+IMMERSION+LITHOGRAPHY |
| 7 | ACTIVE RECYCLE | 209864 | 1% | 100% | 2 | Search ACTIVE+RECYCLE | Search ACTIVE+RECYCLE |
| 8 | FREEZING FREE | 209864 | 1% | 100% | 2 | Search FREEZING+FREE | Search FREEZING+FREE |
| 9 | HIGH N IMMERSION FLUIDS | 209864 | 1% | 100% | 2 | Search HIGH+N+IMMERSION+FLUIDS | Search HIGH+N+IMMERSION+FLUIDS |
| 10 | IMMERSION DEFECTS | 209864 | 1% | 100% | 2 | Search IMMERSION+DEFECTS | Search IMMERSION+DEFECTS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
| Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
|---|---|---|---|---|
| 1 | SANDERS, DP , (2010) ADVANCES IN PATTERNING MATERIALS FOR 193 NM IMMERSION LITHOGRAPHY.CHEMICAL REVIEWS. VOL. 110. ISSUE 1. P. 321 -360 | 88 | 52% | 65 |
| 2 | FRENCH, RH , TRAN, HV , (2009) IMMERSION LITHOGRAPHY: PHOTOMASK AND WAFER-LEVEL MATERIALS.ANNUAL REVIEW OF MATERIALS RESEARCH. VOL. 39. ISSUE . P. 93 -126 | 33 | 48% | 38 |
| 3 | BASSETT, DW , BONNECAZE, RT , (2006) IMMERSION LITHOGRAPHY FOR LASER MASK WRITING.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 24. ISSUE 6. P. 2659-2667 | 11 | 85% | 0 |
| 4 | CHEN, WY , CHEN, Y , ZOU, J , FU, X , YANG, HY , RUAN, XD , GONG, GF , (2009) EFFECT OF LIQUID DISPENSING ON FLOW FIELD FOR IMMERSION LITHOGRAPHY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 27. ISSUE 5. P. 2192 -2199 | 9 | 90% | 1 |
| 5 | TAYLOR, JC , COSTNER, EA , GOH, S , WOJTCZAK, W , DEWULF, D , WILLSON, CG , (2008) THE EFFECT OF ADDED SALTS ON THE OPTICAL PROPERTIES OF WATER FOR HIGH INDEX IMMERSION LITHOGRAPHY FLUIDS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 2. P. 506 -513 | 9 | 75% | 2 |
| 6 | TRAN, HV , HENDRICKX, E , VAN ROEY, F , VANDENBERGHE, G , FRENCH, RH , (2009) FLUID-PHOTORESIST INTERACTIONS AND IMAGING IN HIGH-INDEX IMMERSION LITHOGRAPHY.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 8. ISSUE 3. P. - | 8 | 80% | 3 |
| 7 | CHEN, H , CHEN, WY , ZOU, J , FU, X , (2011) LENS DISTORTION FOR LIQUID RENOVATION IN IMMERSION LITHOGRAPHY.MICROELECTRONIC ENGINEERING. VOL. 88. ISSUE 8. P. 2200-2204 | 6 | 100% | 0 |
| 8 | CHEN, H , FU, X , ZOU, J , YANG, HY , RUAN, XD , GONG, GF , (2010) MODELING FLUID VELOCITY RESPONSE FOR WAFER SCANNING IN IMMERSION LITHOGRAPHY.MICROELECTRONIC ENGINEERING. VOL. 87. ISSUE 5-8. P. 1082-1085 | 6 | 100% | 0 |
| 9 | BEKAERT, J , VAN LOOK, L , TRUFFERT, V , LAZZARINO, F , VANDENBERGHE, G , REYBROUCK, M , TARUTANI, S , (2010) COMPARING POSITIVE AND NEGATIVE TONE DEVELOPMENT PROCESS FOR PRINTING THE METAL AND CONTACT LAYERS OF THE 32-AND 22-NM NODES.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 9. ISSUE 4. P. - | 4 | 100% | 14 |
| 10 | CHEN, WY , FU, X , ZOU, J , YANG, HY , RUAN, XD , GONG, GF , (2010) INVESTIGATION ON THE CRITICAL VELOCITY FOR LIQUID LOSS IN IMMERSION LITHOGRAPHY.MICROELECTRONIC ENGINEERING. VOL. 87. ISSUE 5-8. P. 1070-1073 | 4 | 100% | 1 |
Classes with closest relation at Level 1 |