Class information for:
Level 2: CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
3149 2235 20.0 56%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
3149 2             CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT 2235
8494 1                   HYDROGEN TERMINATION//NATIVE OXIDE//HYDRIDE SPECIES 1248
19085 1                   PHOTORESIST REMOVAL//RESIST REMOVAL//ORGANIC CONTAMINATION 523
27888 1                   ETCHING FACTOR//SPRAY ETCHING//42 ALLOY 219
31370 1                   CLEANROOM//MINIENVIRONMENT//FAN FILTER UNIT 154
35841 1                   QAS//2 CHLORO 1 1 2 TRIFLUOROETHYL METHYL ETHER//ANHYDROUS FLUORINE GAS 91

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CLEANROOM authKW 280456 2% 38% 54
2 PHOTORESIST REMOVAL authKW 157493 1% 82% 14
3 MINIENVIRONMENT authKW 124185 0% 91% 10
4 RESIST REMOVAL authKW 113835 0% 83% 10
5 ORGANIC CONTAMINATION authKW 106298 1% 32% 24
6 AIRBORNE MOLECULAR CONTAMINATION authKW 100588 0% 82% 9
7 WET OZONE authKW 95624 0% 100% 7
8 HYDROGEN TERMINATION authKW 88875 1% 24% 27
9 SHIZUOKA TORY address 81963 0% 100% 6
10 NATIVE OXIDE authKW 77669 1% 25% 23

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 20929 22% 0% 497
2 Physics, Applied 10293 44% 0% 985
3 Electrochemistry 7716 16% 0% 360
4 Physics, Condensed Matter 3741 23% 0% 510
5 Engineering, Electrical & Electronic 1182 16% 0% 350
6 Nanoscience & Nanotechnology 996 8% 0% 179
7 Materials Science, Multidisciplinary 991 18% 0% 394
8 Engineering, Manufacturing 890 4% 0% 83
9 Chemistry, Physical 443 12% 0% 277
10 Construction & Building Technology 307 2% 0% 50

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SHIZUOKA TORY 81963 0% 100% 6
2 NINAMI KU 43712 0% 80% 4
3 INTEGRATED TECHNOL SYST 41170 1% 22% 14
4 ABT SILIZIUMPHOTOVOLTAIK 30735 0% 75% 3
5 KDG 27321 0% 100% 2
6 QAS 27321 0% 100% 2
7 SUR E CONDITIONING 27321 0% 100% 2
8 UCT S 27321 0% 100% 2
9 NEW IND CREAT HATCHERY 23989 2% 4% 45
10 AIR CONDITIONING REFRIGERAT ENGN 20803 0% 19% 8

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SOLID STATE PHENOMENA 54736 4% 4% 94
2 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 41967 14% 1% 304
3 SOLID STATE TECHNOLOGY 36047 3% 4% 70
4 MICRO 31011 1% 11% 20
5 JOURNAL OF THE IEST 19114 0% 20% 7
6 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 16846 2% 3% 44
7 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 9088 2% 2% 36
8 MICROCONTAMINATION 8736 0% 16% 4
9 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 7895 6% 0% 135
10 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 3613 3% 0% 62

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 CLEANROOM 280456 2% 38% 54 Search CLEANROOM Search CLEANROOM
2 PHOTORESIST REMOVAL 157493 1% 82% 14 Search PHOTORESIST+REMOVAL Search PHOTORESIST+REMOVAL
3 MINIENVIRONMENT 124185 0% 91% 10 Search MINIENVIRONMENT Search MINIENVIRONMENT
4 RESIST REMOVAL 113835 0% 83% 10 Search RESIST+REMOVAL Search RESIST+REMOVAL
5 ORGANIC CONTAMINATION 106298 1% 32% 24 Search ORGANIC+CONTAMINATION Search ORGANIC+CONTAMINATION
6 AIRBORNE MOLECULAR CONTAMINATION 100588 0% 82% 9 Search AIRBORNE+MOLECULAR+CONTAMINATION Search AIRBORNE+MOLECULAR+CONTAMINATION
7 WET OZONE 95624 0% 100% 7 Search WET+OZONE Search WET+OZONE
8 HYDROGEN TERMINATION 88875 1% 24% 27 Search HYDROGEN+TERMINATION Search HYDROGEN+TERMINATION
9 NATIVE OXIDE 77669 1% 25% 23 Search NATIVE+OXIDE Search NATIVE+OXIDE
10 AIRBORNE MOLECULAR CONTAMINANTS AMCS 68303 0% 100% 5 Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 DEN, W , BAI, HL , KANG, YH , (2006) ORGANIC AIRBORNE MOLECULAR CONTAMINATION IN SEMICONDUCTOR FABRICATION CLEAN ROOMS - A REVIEW.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 153. ISSUE 2. P. G149 -G159 37 80% 23
2 SATO, N , YAMAZAKI, O , SHIMOGAKI, Y , (2012) IMPACTS OF CHEMICAL SUPPLY FLOW ON PARTICLE REMOVABILITY IN WET CLEAN BATH.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 159. ISSUE 4. P. H367 -H372 25 83% 0
3 WATANABE, S , (1998) CHEMICAL STRUCTURE AND SURFACE PHONONS ASSOCIATED WITH H ON SI.JOURNAL OF CHEMICAL PHYSICS. VOL. 108. ISSUE 14. P. 5965-5974 31 94% 23
4 CAUDANO, Y , THIRY, PA , CHABAL, YJ , (2002) INVESTIGATION OF THE BENDING VIBRATIONS OF VICINAL H/SI(111) SURFACES BY INFRARED SPECTROSCOPY.SURFACE SCIENCE. VOL. 502. ISSUE . P. 91-95 25 100% 5
5 TLILI, S , HAYECK, N , GLIGOROVSKI, S , WORTHAM, H , (2012) ADSORPTION FEATURES OF PHTHALATES AND ORGANOPHOSPHORUS COMPOUNDS ON SILICON WAFERS.INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH. VOL. 51. ISSUE 45. P. 14665 -14672 20 95% 1
6 BERTAGNA, V , ROUELLE, F , ERRE, R , CHEMLA, M , (2000) ELECTROCHEMICAL TEST FOR SILICON SURFACE CONTAMINATION BY COPPER TRACES IN HF, HF PLUS HCL AND HF+NH4F DILUTE SOLUTIONS.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 15. ISSUE 2. P. 121 -125 27 96% 4
7 KANG, YH , DEN, W , BAI, HL , (2006) SHORT TIME DEPOSITION KINETICS OF DIETHYL PHTHALATE AND DIBUTYL PHTHALATE ON A SILICON WAFER SURFACE.INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH. VOL. 45. ISSUE 4. P. 1331 -1336 20 100% 17
8 SATO, N , SHIMOGAKI, Y , (2014) COMPARATIVE SURFACE STUDY ON HYDROGEN TERMINATED SI SURFACE COVERED WITH ALCOHOLS.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 3. ISSUE 3. P. N46-N51 22 76% 1
9 TLILI, S , GOMEZ ALVAREZ, E , GLIGOROVSKI, S , WORTHAM, H , (2012) ADSORPTION BEHAVIOR OF TWO MODEL AIRBORNE ORGANIC CONTAMINANTS ON WAFER SURFACES.CHEMICAL ENGINEERING JOURNAL. VOL. 187. ISSUE . P. 239 -247 23 74% 7
10 MASHIKO, T , SANADA, T , NISHIYAMA, I , HORIBE, H , (2012) PARAMETRIC STUDY ON THE PHYSICAL ACTION OF STEAM-WATER MIXTURE JET: REMOVAL OF PHOTORESIST FILM FROM SILICON WAFER SURFACES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 51. ISSUE 6. P. - 22 79% 0

Classes with closest relation at Level 2


Rank Class id link
1 3874 AC SURFACE PHOTOVOLTAGE//TECH M PUPIN//SCANNING PHOTON MICROSCOPE
2 899 SURFACE SCIENCE//SILICON//SCANNING TUNNELING MICROSCOPY
3 474 FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI
4 1125 POROUS SILICON//ELECTROCHEMICAL ETCHING//POROUS SI
5 2642 THROUGH SILICON VIA TSV//WAFER BONDING//THROUGH SILICON VIA
6 1358 SELF ASSEMBLED MONOLAYER//LANGMUIR//ALKANETHIOL
7 1077 PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
8 1299 SIGE//STRAINED SI//VIRTUAL SUBSTRATE
9 1998 MULTICRYSTALLINE SILICON//IEEE JOURNAL OF PHOTOVOLTAICS//SOLAR CELLS
10 648 OXYGEN PRECIPITATION//OXYGEN PRECIPITATES//GETTERING

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