Class information for:
Level 1: ELECTRON BEAM LITHOGRAPHY//HSQ//HYDROGEN SILSESQUIOXANE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
18745 537 16.3 77%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
18745 1                   ELECTRON BEAM LITHOGRAPHY//HSQ//HYDROGEN SILSESQUIOXANE 537

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ELECTRON BEAM LITHOGRAPHY authKW 485756 18% 9% 97
2 HSQ authKW 469968 4% 36% 23
3 HYDROGEN SILSESQUIOXANE authKW 310034 3% 32% 17
4 HYDROGEN SILSESQUIOXANE HSQ authKW 272922 2% 40% 12
5 ELECTRON RESISTS authKW 200241 2% 39% 9
6 CVD A C authKW 170585 1% 100% 3
7 HSQ RESIST authKW 151629 1% 67% 4
8 TECHNOL MFG GRP J AN address 127937 1% 75% 3
9 MICROELECTRONIC ENGINEERING journal 124832 28% 1% 149
10 HYBRID LITHOGRAPHY authKW 118456 1% 42% 5

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Nanoscience & Nanotechnology 24838 72% 0% 385
2 Physics, Applied 9883 85% 0% 454
3 Engineering, Electrical & Electronic 6911 65% 0% 351
4 Optics 2651 30% 0% 160
5 Materials Science, Multidisciplinary 296 19% 0% 103
6 Materials Science, Coatings & Films 137 4% 0% 22
7 Physics, Condensed Matter 119 10% 0% 53
8 Chemistry, Multidisciplinary 6 6% 0% 30
9 Polymer Science 3 2% 0% 12
10 Chemistry, Physical 1 5% 0% 25

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 TECHNOL MFG GRP J AN 127937 1% 75% 3
2 KAVLI NANOSCI NANO IL 113723 0% 100% 2
3 MIRCROENGN IMT 113723 0% 100% 2
4 PHOTO IST GRP 113723 0% 100% 2
5 JAMES WATT NANOFABRICAT 101083 1% 44% 4
6 AMICA 59269 1% 15% 7
7 CHARGED PARTICLE OPT GRP 59223 1% 21% 5
8 AETS DEV 1 56862 0% 100% 1
9 AETS DEV 2 56862 0% 100% 1
10 CB390 56862 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 MICROELECTRONIC ENGINEERING 124832 28% 1% 149
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 94548 31% 1% 166
3 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 2187 1% 1% 6
4 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 1867 1% 0% 8
5 NANOTECHNOLOGY 1235 3% 0% 16
6 MICRO 321 0% 1% 1
7 RECENT PATENTS ON NANOTECHNOLOGY 297 0% 1% 1
8 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 290 2% 0% 13
9 JAPANESE JOURNAL OF APPLIED PHYSICS 276 2% 0% 9
10 POLYMER REVIEWS 262 0% 0% 1

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 ELECTRON BEAM LITHOGRAPHY 485756 18% 9% 97 Search ELECTRON+BEAM+LITHOGRAPHY Search ELECTRON+BEAM+LITHOGRAPHY
2 HSQ 469968 4% 36% 23 Search HSQ Search HSQ
3 HYDROGEN SILSESQUIOXANE 310034 3% 32% 17 Search HYDROGEN+SILSESQUIOXANE Search HYDROGEN+SILSESQUIOXANE
4 HYDROGEN SILSESQUIOXANE HSQ 272922 2% 40% 12 Search HYDROGEN+SILSESQUIOXANE+HSQ Search HYDROGEN+SILSESQUIOXANE+HSQ
5 ELECTRON RESISTS 200241 2% 39% 9 Search ELECTRON+RESISTS Search ELECTRON+RESISTS
6 CVD A C 170585 1% 100% 3 Search CVD+A+C Search CVD+A+C
7 HSQ RESIST 151629 1% 67% 4 Search HSQ+RESIST Search HSQ+RESIST
8 HYBRID LITHOGRAPHY 118456 1% 42% 5 Search HYBRID+LITHOGRAPHY Search HYBRID+LITHOGRAPHY
9 AZNLOF 2020 113723 0% 100% 2 Search AZNLOF+2020 Search AZNLOF+2020
10 EVAPORATED RESIST 113723 0% 100% 2 Search EVAPORATED+RESIST Search EVAPORATED+RESIST

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 GRIGORESCU, AE , HAGEN, CW , (2009) RESISTS FOR SUB-20-NM ELECTRON BEAM LITHOGRAPHY WITH A FOCUS ON HSQ: STATE OF THE ART.NANOTECHNOLOGY. VOL. 20. ISSUE 29. P. - 33 42% 164
2 MOHAMMAD, MA , KOSHELEV, K , FITO, T , ZHENG, DAZ , STEPANOVA, M , DEW, S , (2012) STUDY OF DEVELOPMENT PROCESSES FOR ZEP-520 AS A HIGH-RESOLUTION POSITIVE AND NEGATIVE TONE ELECTRON BEAM LITHOGRAPHY RESIST.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 51. ISSUE 6. P. - 21 72% 18
3 ROMMEL, M , WEIS, J , (2013) HYDROGEN SILSESQUIOXANE BILAYER RESISTS-COMBINING HIGH RESOLUTION ELECTRON BEAM LITHOGRAPHY AND GENTLE RESIST REMOVAL.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 31. ISSUE 6. P. - 21 68% 2
4 TOBING, LYM , TJAHJANA, L , ZHANG, DH , (2012) LARGE CONTRAST ENHANCEMENT BY SONICATION ASSISTED COLD DEVELOPMENT PROCESS FOR LOW DOSE AND ULTRAHIGH RESOLUTION PATTERNING ON ZEP520A POSITIVE TONE RESIST.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 30. ISSUE 5. P. - 14 88% 7
5 MACINTYRE, DS , THOMS, S , (2011) COMPARISON OF HYDROGEN SILSESQUIOXANE DEVELOPMENT METHODS FOR SUB-10 NM ELECTRON BEAM LITHOGRAPHY USING ACCURATE LINEWIDTH INSPECTION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 29. ISSUE 6. P. - 12 100% 1
6 DEY, RK , CUI, B , (2014) LIFT-OFF WITH SOLVENT FOR NEGATIVE RESIST USING LOW ENERGY ELECTRON BEAM EXPOSURE.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 32. ISSUE 6. P. - 13 81% 1
7 YAN, M , CHOI, S , SUBRAMANIAN, KRV , ADESIDA, I , (2008) THE EFFECTS OF MOLECULAR WEIGHT ON THE EXPOSURE CHARACTERISTICS OF POLY(METHYLMETHACRYLATE) DEVELOPED AT LOW TEMPERATURES.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 6. P. 2306 -2310 17 68% 21
8 WESTLY, DA , TENNANT, DM , AIDA, Y , OHKI, H , OHKUBO, T , (2011) IMPROVED TIME DEPENDENT PERFORMANCE OF HYDROGEN SILSESQUIOXANE RESIST USING A SPIN ON TOP COAT.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 29. ISSUE 6. P. - 18 62% 0
9 MA, SQ , CON, C , YAVUZ, M , CUI, B , (2011) POLYSTYRENE NEGATIVE RESIST FOR HIGH-RESOLUTION ELECTRON BEAM LITHOGRAPHY.NANOSCALE RESEARCH LETTERS. VOL. 6. ISSUE . P. - 15 71% 10
10 CHEN, YF , (2015) NANOFABRICATION BY ELECTRON BEAM LITHOGRAPHY AND ITS APPLICATIONS: A REVIEW.MICROELECTRONIC ENGINEERING. VOL. 135. ISSUE . P. 57 -72 27 27% 24

Classes with closest relation at Level 1


Rank Class id link
1 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
2 5528 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY
3 26307 SURFACE NANOHOLES//LEHRSTUHL ADHAS INTERPHASEN POLYMEREN//UNITE MICROELECT OPTOELECT POLYMERE
4 2012 NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//IMPRINT LITHOGRAPHY
5 21913 STENCIL LITHOGRAPHY//NANOSYST MFG//STRESS INDUCED DEFORMATION
6 19410 NANOGAP ELECTRODES//NANOGAP//SURFACE CONDUCTION ELECTRON EMITTER
7 33424 CARBON MEMS//PYROLYZED POLYMER//C MEMS
8 11311 SU 8//MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS//JOURNAL OF MICROMECHANICS AND MICROENGINEERING
9 26726 MSB ARGE D//5 NORBORNENE 2 2 DIMETHANOL//ARTIFICIAL BREAST IMPLANT PACK
10 12907 HOLOGRAPHIC LITHOGRAPHY//INTERFERENCE LITHOGRAPHY//PHOTONIC QUASICRYSTAL

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