Class information for:
Level 1: EUV LITHOG//EXTREME ULTRAVIOLET LITHOGRAPHY//EUVL

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
22144 392 15.8 68%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
22144 1                   EUV LITHOG//EXTREME ULTRAVIOLET LITHOGRAPHY//EUVL 392

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 EUV LITHOG address 997056 4% 80% 16
2 EXTREME ULTRAVIOLET LITHOGRAPHY authKW 852311 10% 28% 39
3 EUVL authKW 730229 8% 31% 30
4 DEFECT MITIGATION authKW 701060 2% 100% 9
5 SCHWARZSCHILD OPTICS authKW 415437 2% 67% 8
6 EUV PROC TECHNOL address 409967 3% 53% 10
7 EUV MICROSCOPE authKW 389478 1% 100% 5
8 REFLECTIVE MASK authKW 389478 1% 100% 5
9 PHASE DEFECT authKW 350521 2% 50% 9
10 EUV MASK authKW 272627 2% 50% 7

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Nanoscience & Nanotechnology 9729 53% 0% 207
2 Physics, Applied 4878 70% 0% 275
3 Engineering, Electrical & Electronic 3087 52% 0% 203
4 Optics 1873 29% 0% 115
5 Materials Science, Multidisciplinary 180 18% 0% 70
6 Physics, Multidisciplinary 14 5% 0% 18
7 Physics, Condensed Matter 13 5% 0% 21
8 Materials Science, Coatings & Films 13 2% 0% 7
9 Metallurgy & Metallurgical Engineering 0 1% 0% 5
10 Education, Scientific Disciplines 0 0% 0% 1

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 EUV LITHOG 997056 4% 80% 16
2 EUV PROC TECHNOL 409967 3% 53% 10
3 XRAY OPT 248782 10% 8% 38
4 ASSOC SUPER ADV ELECT TECHNOL 168292 3% 20% 11
5 PHOTOMASK TEAM 164947 2% 35% 6
6 MASK DEV TEAM 89018 1% 29% 4
7 ADV SCI TECHNOL IND 81528 5% 5% 20
8 BAN WOL 77896 0% 100% 1
9 DEV EUV LITHOGISOGO KU 77896 0% 100% 1
10 ELECT MAT 3 77896 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 154621 11% 5% 43
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 62150 29% 1% 115
3 JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS 15694 2% 3% 7
4 MICROELECTRONIC ENGINEERING 8342 8% 0% 33
5 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 4856 11% 0% 44
6 JAPANESE JOURNAL OF APPLIED PHYSICS 4704 8% 0% 31
7 APPLIED PHYSICS EXPRESS 1352 2% 0% 8
8 KOREAN JOURNAL OF METALS AND MATERIALS 1310 1% 0% 4
9 JOURNAL OF THE KOREAN PHYSICAL SOCIETY 1269 4% 0% 16
10 APPLIED PHYSICS REVIEWS 818 0% 1% 1

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 EXTREME ULTRAVIOLET LITHOGRAPHY 852311 10% 28% 39 Search EXTREME+ULTRAVIOLET+LITHOGRAPHY Search EXTREME+ULTRAVIOLET+LITHOGRAPHY
2 EUVL 730229 8% 31% 30 Search EUVL Search EUVL
3 DEFECT MITIGATION 701060 2% 100% 9 Search DEFECT+MITIGATION Search DEFECT+MITIGATION
4 SCHWARZSCHILD OPTICS 415437 2% 67% 8 Search SCHWARZSCHILD+OPTICS Search SCHWARZSCHILD+OPTICS
5 EUV MICROSCOPE 389478 1% 100% 5 Search EUV+MICROSCOPE Search EUV+MICROSCOPE
6 REFLECTIVE MASK 389478 1% 100% 5 Search REFLECTIVE+MASK Search REFLECTIVE+MASK
7 PHASE DEFECT 350521 2% 50% 9 Search PHASE+DEFECT Search PHASE+DEFECT
8 EUV MASK 272627 2% 50% 7 Search EUV+MASK Search EUV+MASK
9 AERIAL IMAGE CHARACTERISTICS 233687 1% 100% 3 Search AERIAL+IMAGE+CHARACTERISTICS Search AERIAL+IMAGE+CHARACTERISTICS
10 SXPL 233687 1% 100% 3 Search SXPL Search SXPL

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 NG, PCW , CHIEN, SW , CHANG, BS , TSAI, KY , LU, YC , LI, JH , CHEN, AC , (2011) IMPACT OF PROCESS-EFFECT CORRECTION STRATEGIES ON VARIABILITY OF CRITICAL DIMENSION AND ELECTRICAL CHARACTERISTICS IN EXTREME ULTRAVIOLET LITHOGRAPHY.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 50. ISSUE 6. P. - 17 89% 0
2 NG, PCW , TSAI, KY , LEE, YM , WANG, FM , LI, JH , CHEN, AC , (2011) FULLY MODEL-BASED METHODOLOGY FOR SIMULTANEOUS CORRECTION OF EXTREME ULTRAVIOLET MASK SHADOWING AND PROXIMITY EFFECTS.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 10. ISSUE 1. P. - 14 100% 10
3 TANAKA, Y , HARADA, T , AMANO, T , USUI, Y , WATANABE, T , KINOSHITA, H , (2014) CHARACTERIZATION OF SMALL PHASE DEFECTS USING A MICRO-COHERENT EXTREME ULTRAVIOLET SCATTEROMETRY MICROSCOPE.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 53. ISSUE 6. P. - 12 100% 0
4 GOLDBERG, KA , MOCHI, I , (2010) WAVELENGTH-SPECIFIC REFLECTIONS: A DECADE OF EXTREME ULTRAVIOLET ACTINIC MASK INSPECTION RESEARCH.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 28. ISSUE 6. P. C6E1 -C6E10 18 72% 4
5 LEE, JU , HONG, S , AHN, J , DOH, J , JEONG, S , (2014) ACTINIC CRITICAL DIMENSION MEASUREMENT OF CONTAMINATED EXTREME ULTRAVIOLET MASK USING COHERENT SCATTERING MICROSCOPY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 32. ISSUE 3. P. - 17 61% 0
6 TAKASE, K , KAMAJI, Y , SAKAGAMI, N , IGUCHI, T , TADA, M , YAMAGUCHI, Y , FUKUSHIMA, Y , HARADA, T , WATANABE, T , KINOSHITA, H , (2010) IMAGING PERFORMANCE IMPROVEMENT OF AN EXTREME ULTRAVIOLET MICROSCOPE.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 6. P. - 12 86% 3
7 TERASAWA, T , YAMANE, T , TANAKA, T , SUGA, O , TOMIE, T , (2010) ACTINIC PHASE DEFECT DETECTION FOR EXTREME ULTRAVIOLET LITHOGRAPHY MASK WITH ABSORBER PATTERNS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 6. P. - 10 100% 9
8 KAMAJI, Y , UNO, T , TAKASE, K , WATANABE, T , KINOSHITA, H , (2010) STUDY ON CRITICAL DIMENSION OF PRINTABLE PHASE DEFECTS USING AN EXTREME ULTRAVIOLET MICROSCOPE: II. DEFINITION OF PRINTABLE THRESHOLD REGION FOR HOLE-PIT PROGRAMMED DEFECTS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 12. P. - 11 92% 2
9 HARADA, T , HASHIMOTO, H , AMANO, T , KINOSHITA, H , WATANABE, T , (2016) ACTUAL DEFECT OBSERVATION RESULTS OF AN EXTREME-ULTRAVIOLET BLANK MASK BY COHERENT DIFFRACTION IMAGING.APPLIED PHYSICS EXPRESS. VOL. 9. ISSUE 3. P. - 11 79% 0
10 PARK, S , LIM, JD , PERANANTHAM, P , KANG, HY , HWANGBO, CK , LEE, S , KIM, SS , (2014) BINARY MASK DESIGNS WITH SINGLE- AND DOUBLE-LAYER ABSORBER STACKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND ACTINIC INSPECTION.APPLIED OPTICS. VOL. 53. ISSUE 4. P. A42 -A47 10 83% 0

Classes with closest relation at Level 1


Rank Class id link
1 10360 OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//OPTICAL PROXIMITY CORRECTION
2 2805 MULTILAYER MIRROR//PRECIS OPT ENGN//MULTILAYERS
3 12923 GAS PUFF TARGET//EUV SOURCE//LASER PRODUCED PLASMA
4 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
5 9774 X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY
6 33481 LITHOGRAPHY SIMULATION//VUV LITHOG//RESIST REFLOW PROCESS
7 34813 ELECTROSTATIC CHUCK//PIN CHUCK//WAFER FLATNESS
8 14505 ABSOLUTE TEST//SUBAPERTURE STITCHING//OPTICAL TESTING
9 2964 PHASE RETRIEVAL//PTYCHOGRAPHY//COHERENT DIFFRACTIVE IMAGING
10 31370 CLEANROOM//MINIENVIRONMENT//FAN FILTER UNIT

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