Class information for:
Level 1: STENCIL LITHOGRAPHY//NANOSYST MFG//STRESS INDUCED DEFORMATION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
21913 400 18.5 66%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
21913 1                   STENCIL LITHOGRAPHY//NANOSYST MFG//STRESS INDUCED DEFORMATION 400

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 STENCIL LITHOGRAPHY authKW 954215 4% 83% 15
2 NANOSYST MFG address 458025 2% 100% 6
3 STRESS INDUCED DEFORMATION authKW 318072 1% 83% 5
4 RESIST SPRAY COATING authKW 305350 1% 100% 4
5 NANOSTENCIL authKW 249362 2% 47% 7
6 SHADOW MASK authKW 240100 5% 17% 18
7 THREE DIMENSIONAL PHOTOLITHOGRAPHY authKW 229013 1% 100% 3
8 FEEDTHROUGHS authKW 171758 1% 75% 3
9 AGILE FAB authKW 152675 1% 100% 2
10 ANGLED EXPOSURE authKW 152675 1% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Nanoscience & Nanotechnology 14689 64% 0% 256
2 Physics, Applied 6304 79% 0% 314
3 Engineering, Electrical & Electronic 4925 64% 0% 256
4 Instruments & Instrumentation 1319 19% 0% 74
5 Optics 752 19% 0% 76
6 Materials Science, Multidisciplinary 465 26% 0% 104
7 Mechanics 132 7% 0% 29
8 Engineering, Manufacturing 66 3% 0% 10
9 Physics, Condensed Matter 64 9% 0% 35
10 Chemistry, Multidisciplinary 10 7% 0% 26

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 NANOSYST MFG 458025 2% 100% 6
2 NANOELECT PROC IL 114503 1% 50% 3
3 MICROSYST 78167 9% 3% 34
4 11X MFG 76338 0% 100% 1
5 CEA GRENOBLE INAC UMR5819 76338 0% 100% 1
6 CEA INAC UMR SPRAM 5819 76338 0% 100% 1
7 CYCLOTRON SLOVAK REPUBL 76338 0% 100% 1
8 DIMESEEMCS 76338 0% 100% 1
9 ELECT RUMENTATET 76338 0% 100% 1
10 FAB D1C MFG 76338 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 44198 25% 1% 98
2 MICROELECTRONIC ENGINEERING 35887 17% 1% 69
3 JOURNAL OF MICROMECHANICS AND MICROENGINEERING 11588 7% 1% 29
4 SENSORS AND ACTUATORS A-PHYSICAL 3051 5% 0% 20
5 CONNECTOR SPECIFIER 2061 0% 3% 1
6 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 1212 1% 0% 5
7 JOURNAL OF MICROELECTROMECHANICAL SYSTEMS 1018 2% 0% 6
8 NANOTECHNOLOGY 782 3% 0% 11
9 JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS 732 1% 0% 3
10 IEEE TRANSACTIONS ON NANOTECHNOLOGY 677 1% 0% 4

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 STENCIL LITHOGRAPHY 954215 4% 83% 15 Search STENCIL+LITHOGRAPHY Search STENCIL+LITHOGRAPHY
2 STRESS INDUCED DEFORMATION 318072 1% 83% 5 Search STRESS+INDUCED+DEFORMATION Search STRESS+INDUCED+DEFORMATION
3 RESIST SPRAY COATING 305350 1% 100% 4 Search RESIST+SPRAY+COATING Search RESIST+SPRAY+COATING
4 NANOSTENCIL 249362 2% 47% 7 Search NANOSTENCIL Search NANOSTENCIL
5 SHADOW MASK 240100 5% 17% 18 Search SHADOW+MASK Search SHADOW+MASK
6 THREE DIMENSIONAL PHOTOLITHOGRAPHY 229013 1% 100% 3 Search THREE+DIMENSIONAL+PHOTOLITHOGRAPHY Search THREE+DIMENSIONAL+PHOTOLITHOGRAPHY
7 FEEDTHROUGHS 171758 1% 75% 3 Search FEEDTHROUGHS Search FEEDTHROUGHS
8 AGILE FAB 152675 1% 100% 2 Search AGILE+FAB Search AGILE+FAB
9 ANGLED EXPOSURE 152675 1% 100% 2 Search ANGLED+EXPOSURE Search ANGLED+EXPOSURE
10 ELECTRODEPOSITION OF PHOTORESIST 152675 1% 100% 2 Search ELECTRODEPOSITION+OF+PHOTORESIST Search ELECTRODEPOSITION+OF+PHOTORESIST

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 VAZQUEZ-MENA, O , GROSS, L , XIE, S , VILLANUEVA, LG , BRUGGER, J , (2015) RESISTLESS NANOFABRICATION BY STENCIL LITHOGRAPHY: A REVIEW.MICROELECTRONIC ENGINEERING. VOL. 132. ISSUE . P. 236 -254 67 54% 5
2 STEURER, W , GROSS, L , SCHLITTLER, RR , MEYER, G , (2014) A VARIABLE-TEMPERATURE NANOSTENCIL COMPATIBLE WITH A LOW-TEMPERATURE SCANNING TUNNELING MICROSCOPE/ATOMIC FORCE MICROSCOPE.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 85. ISSUE 2. P. - 26 93% 2
3 SIDLER, K , VILLANUEVA, LG , VAZQUEZ-MENA, O , SAVU, V , BRUGGER, J , (2012) COMPLIANT MEMBRANES IMPROVE RESOLUTION IN FULL-WAFER MICRO/NANOSTENCIL LITHOGRAPHY.NANOSCALE. VOL. 4. ISSUE 3. P. 773 -778 19 100% 4
4 VILLANUEVA, LG , MARTIN-OLMOS, C , VAZQUEZ-MENA, O , MONTSERRAT, J , LANGLET, P , BAUSELLS, J , BRUGGER, J , (2011) LOCALIZED ION IMPLANTATION THROUGH MICRO/NANOSTENCIL MASKS.IEEE TRANSACTIONS ON NANOTECHNOLOGY. VOL. 10. ISSUE 5. P. 940-946 20 87% 6
5 VILLANUEVA, LG , VAZQUEZ-MENA, O , MARTIN-OLMOS, C , SAVU, V , SIDLER, K , BRUGGER, J , (2013) RESISTLESS FABRICATION OF NANOIMPRINT LITHOGRAPHY (NIL) STAMPS USING NANO-STENCIL LITHOGRAPHY.MICROMACHINES. VOL. 4. ISSUE 4. P. 370-377 18 90% 1
6 SAVU, V , VAN DEN BOOGAART, MAF , BRUGGER, J , ARCAMONE, J , SANSA, M , PEREZ-MURANO, F , (2008) DYNAMIC STENCIL LITHOGRAPHY ON FULL WAFER SCALE.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 6. P. 2054 -2058 19 90% 5
7 GREVIN, B , FAKIR, M , HAYTON, J , BRUN, M , DEMADRILLE, R , FAURE-VINCENT, J , (2011) QPLUS AFM DRIVEN NANOSTENCIL.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 82. ISSUE 6. P. - 20 77% 5
8 WANG, H , LUO, C , (2011) GENERATION OF AU MICROPATTERNS ON TWO SIDEWALLS OF A SI CHANNEL THROUGH A PDMS SHADOW MASK.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 21. ISSUE 6. P. - 17 81% 0
9 VILLANUEVA, LG , VAZQUEZ-MENA, O , MARTIN-OLMOS, C , SAVU, V , SIDLER, K , MONTSERRAT, J , LANGLET, P , HIBERT, C , VETTIGER, P , BAUSELLS, J , ET AL (2012) ALL-STENCIL TRANSISTOR FABRICATION ON 3D SILICON SUBSTRATES.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 22. ISSUE 9. P. - 17 77% 2
10 VAZQUEZ-MENA, O , VILLANUEVA, LG , SAVU, V , SIDLER, K , LANGLET, P , BRUGGER, J , (2009) ANALYSIS OF THE BLURRING IN STENCIL LITHOGRAPHY.NANOTECHNOLOGY. VOL. 20. ISSUE 41. P. - 18 67% 25

Classes with closest relation at Level 1


Rank Class id link
1 5528 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY
2 8222 LIQUID METAL ION SOURCE//ION BEAMS MAT//ALLOY LIQUID METAL ION SOURCES
3 9774 X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY
4 18745 ELECTRON BEAM LITHOGRAPHY//HSQ//HYDROGEN SILSESQUIOXANE
5 11311 SU 8//MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS//JOURNAL OF MICROMECHANICS AND MICROENGINEERING
6 33525 IONCONDUCTIVE MEMBRANE//PROTON TRANSPORT NUMBER//ALCOHOL PLASMA POLYMERIZATION
7 21960 NANOCHANNEL MEMBRANES//DOUBLET MECHANICS//FLOAT CASTING
8 25993 PROBE CARD//COMPLIANT INTERCONNECTS//MEMS PROBE CARD
9 37582 SECONDARY SPUTTERING LITHOGRAPHY//TEMPLATE INDUCED GROWTH//COVERSLIP MICROCOVER GLASS
10 21812 PT CR CO MULTILAYER//COCRPT TERNARY ALLOY//UPR 6412

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