Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
4332 | 1803 | 23.8 | 72% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | ELECTRON BEAM INDUCED DEPOSITION | authKW | 1104908 | 5% | 75% | 87 |
2 | FOCUSED ION BEAM | authKW | 578702 | 11% | 17% | 197 |
3 | FOCUSED ELECTRON BEAM INDUCED DEPOSITION | authKW | 512252 | 2% | 92% | 33 |
4 | HIGH VOLTAGE ELE ON MICROSCOPY STN | address | 219911 | 2% | 38% | 34 |
5 | FIB | authKW | 202467 | 5% | 15% | 82 |
6 | FIB CVD | authKW | 186275 | 1% | 100% | 11 |
7 | HELIUM ION MICROSCOPE | authKW | 158746 | 1% | 63% | 15 |
8 | FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION FIB CVD | authKW | 157614 | 1% | 85% | 11 |
9 | FOCUSED ION BEAM CHEMICAL VAPOR DEPOSITION | authKW | 152407 | 0% | 100% | 9 |
10 | HELIUM ION MICROSCOPY | authKW | 130990 | 1% | 37% | 21 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Nanoscience & Nanotechnology | 27306 | 41% | 0% | 748 |
2 | Microscopy | 23681 | 12% | 1% | 225 |
3 | Physics, Applied | 16763 | 61% | 0% | 1102 |
4 | Engineering, Electrical & Electronic | 3404 | 27% | 0% | 485 |
5 | Materials Science, Multidisciplinary | 3049 | 31% | 0% | 550 |
6 | Materials Science, Coatings & Films | 774 | 5% | 0% | 93 |
7 | Instruments & Instrumentation | 719 | 7% | 0% | 127 |
8 | Physics, Condensed Matter | 331 | 9% | 0% | 166 |
9 | Optics | 273 | 7% | 0% | 118 |
10 | Engineering, Manufacturing | 135 | 2% | 0% | 32 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | HIGH VOLTAGE ELE ON MICROSCOPY STN | 219911 | 2% | 38% | 34 |
2 | LASTI | 86265 | 2% | 18% | 29 |
3 | NANOMECH NANOPATTERNING GRP | 67736 | 0% | 100% | 4 |
4 | ALIS BUSINESS UNIT | 60476 | 0% | 71% | 5 |
5 | ELE ON MICROSCOPY NANOANAL | 51487 | 1% | 18% | 17 |
6 | ION MICROSCOPY INNOVAT | 45155 | 0% | 67% | 4 |
7 | CARL ZEISS MICROSCOPY | 38100 | 0% | 75% | 3 |
8 | HIGH VOLTAGE ELECT MICROSCOPY STN | 34564 | 0% | 29% | 7 |
9 | CHEM 56 | 33868 | 0% | 100% | 2 |
10 | CRANN ADV MICROSCOPY | 33864 | 0% | 50% | 4 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 85074 | 16% | 2% | 289 |
2 | MICROSCOPY AND MICROANALYSIS | 18500 | 2% | 2% | 44 |
3 | NANOTECHNOLOGY | 16656 | 6% | 1% | 107 |
4 | MICROELECTRONIC ENGINEERING | 16255 | 5% | 1% | 99 |
5 | PRAKTISCHE METALLOGRAPHIE-PRACTICAL METALLOGRAPHY | 15511 | 1% | 4% | 24 |
6 | BEILSTEIN JOURNAL OF NANOTECHNOLOGY | 9252 | 1% | 2% | 24 |
7 | SCANNING | 6210 | 1% | 1% | 25 |
8 | JOURNAL OF ELECTRON MICROSCOPY | 6130 | 1% | 1% | 26 |
9 | MICRON | 5240 | 2% | 1% | 28 |
10 | ULTRAMICROSCOPY | 4093 | 2% | 1% | 37 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | UTKE, I , HOFFMANN, P , MELNGAILIS, J , (2008) GAS-ASSISTED FOCUSED ELECTRON BEAM AND ION BEAM PROCESSING AND FABRICATION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 4. P. 1197 -1276 | 283 | 64% | 417 |
2 | VAN DORP, WF , HAGEN, CW , (2008) A CRITICAL LITERATURE REVIEW OF FOCUSED ELECTRON BEAM INDUCED DEPOSITION.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 8. P. - | 136 | 87% | 202 |
3 | BOTMAN, A , MULDERS, JJL , HAGEN, CW , (2009) CREATING PURE NANOSTRUCTURES FROM ELECTRON-BEAM-INDUCED DEPOSITION USING PURIFICATION TECHNIQUES: A TECHNOLOGY PERSPECTIVE.NANOTECHNOLOGY. VOL. 20. ISSUE 37. P. - | 119 | 86% | 122 |
4 | DE TERESA, JM , FERNANDEZ-PACHECO, A , CORDOBA, R , SERRANO-RAMON, L , SANGIAO, S , IBARRA, MR , (2016) REVIEW OF MAGNETIC NANOSTRUCTURES GROWN BY FOCUSED ELECTRON BEAM INDUCED DEPOSITION (FEBID).JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 49. ISSUE 24. P. - | 110 | 64% | 4 |
5 | KIM, CS , AHN, SH , JANG, DY , (2012) REVIEW: DEVELOPMENTS IN MICRO/NANOSCALE FABRICATION BY FOCUSED ION BEAMS.VACUUM. VOL. 86. ISSUE 8. P. 1014 -1035 | 110 | 60% | 32 |
6 | RANDOLPH, SJ , FOWLKES, JD , RACK, PD , (2006) FOCUSED, NANOSCALE ELECTRON-BEAM-INDUCED DEPOSITION AND ETCHING.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 31. ISSUE 3. P. 55 -89 | 79 | 65% | 233 |
7 | BELIC, D , SHAWRAV, MM , GAVAGNIN, M , STOGER-POLLACH, M , WANZENBOECK, HD , BERTAGNOLLI, E , (2015) DIRECT-WRITE DEPOSITION AND FOCUSED-ELECTRON-BEAM-INDUCED PURIFICATION OF GOLD NANOSTRUCTURES.ACS APPLIED MATERIALS & INTERFACES. VOL. 7. ISSUE 4. P. 2467 -2479 | 53 | 91% | 8 |
8 | SILVIS-CIVIDJIAN, N , HAGEN, CW , (2006) ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 143.ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 143. VOL. 143. ISSUE . P. 1 -235 | 126 | 51% | 14 |
9 | MURAKAMI, K , TAKAI, M , (2015) NANO ELECTRON SOURCE FABRICATED BY BEAM-INDUCED DEPOSITION AND ITS UNIQUE FEATURE.MICROELECTRONIC ENGINEERING. VOL. 132. ISSUE . P. 74 -82 | 69 | 70% | 0 |
10 | ROBERTS, NA , FOWLKES, JD , MAGEL, GA , RACK, PD , (2013) ENHANCED MATERIAL PURITY AND RESOLUTION VIA SYNCHRONIZED LASER ASSISTED ELECTRON BEAM INDUCED DEPOSITION OF PLATINUM.NANOSCALE. VOL. 5. ISSUE 1. P. 408 -415 | 48 | 92% | 19 |
Classes with closest relation at Level 1 |