Class information for:
Level 1: SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//WT ADDITIVITY

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
8140 1287 16.4 37%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
8140 1                   SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//WT ADDITIVITY 1287

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SOLID STATE TECHNOLOGY journal 94682 7% 5% 86
2 DRY DEVELOPMENT authKW 89307 1% 47% 8
3 WT ADDITIVITY authKW 71173 0% 100% 3
4 PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS journal 66711 10% 2% 123
5 BILEVEL STRUCTURE authKW 53378 0% 75% 3
6 HALFTONE MASK authKW 53378 0% 75% 3
7 PLASMA BLANKING authKW 53378 0% 75% 3
8 PRIME PROCESS authKW 53378 0% 75% 3
9 01 MU M LITHOGRAPHY authKW 47449 0% 100% 2
10 BENZOYL GROUP REMOVAL authKW 47449 0% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 4244 38% 0% 487
2 Materials Science, Coatings & Films 4119 13% 0% 170
3 Engineering, Electrical & Electronic 3430 31% 0% 404
4 Nanoscience & Nanotechnology 2829 16% 0% 212
5 Electrochemistry 2612 13% 0% 161
6 Polymer Science 1824 15% 0% 194
7 Spectroscopy 1392 10% 0% 123
8 Optics 1368 15% 0% 189
9 Imaging Science & Photographic Technology 645 3% 0% 43
10 Physics, Condensed Matter 178 8% 0% 107

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ABSRD ECB RT 23724 0% 100% 1
2 BEREICH MAKROMOL VERBINDUNGEN 23724 0% 100% 1
3 CENT S MICROELE LITHOG GRP 23724 0% 100% 1
4 CHEM PL CHEM YAMADAOKA 23724 0% 100% 1
5 CIENCIES QUIM QUIM FIS 23724 0% 100% 1
6 COLORADO INTEGRATED CIRCUITS 23724 0% 100% 1
7 DEV S TECHNOL GRP 23724 0% 100% 1
8 DRAM DEV ALLIANCE SEMICOND DEV 23724 0% 100% 1
9 DRY ETCH 23724 0% 100% 1
10 ENGN IMAGE SCI TECHNOL INAGE KU 23724 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SOLID STATE TECHNOLOGY 94682 7% 5% 86
2 PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS 66711 10% 2% 123
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39257 13% 1% 166
4 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 18911 12% 1% 155
5 JOURNAL OF INFORMATION RECORDING MATERIALS 8302 1% 4% 9
6 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY 7996 2% 2% 20
7 RCA REVIEW 7893 1% 4% 8
8 POLYMER ENGINEERING AND SCIENCE 7842 4% 1% 53
9 JOURNAL OF IMAGING SCIENCE 7148 1% 3% 10
10 ACS SYMPOSIUM SERIES 6576 6% 0% 72

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 DRY DEVELOPMENT 89307 1% 47% 8 Search DRY+DEVELOPMENT Search DRY+DEVELOPMENT
2 WT ADDITIVITY 71173 0% 100% 3 Search WT+ADDITIVITY Search WT+ADDITIVITY
3 BILEVEL STRUCTURE 53378 0% 75% 3 Search BILEVEL+STRUCTURE Search BILEVEL+STRUCTURE
4 HALFTONE MASK 53378 0% 75% 3 Search HALFTONE+MASK Search HALFTONE+MASK
5 PLASMA BLANKING 53378 0% 75% 3 Search PLASMA+BLANKING Search PLASMA+BLANKING
6 PRIME PROCESS 53378 0% 75% 3 Search PRIME+PROCESS Search PRIME+PROCESS
7 01 MU M LITHOGRAPHY 47449 0% 100% 2 Search 01+MU+M+LITHOGRAPHY Search 01+MU+M+LITHOGRAPHY
8 BENZOYL GROUP REMOVAL 47449 0% 100% 2 Search BENZOYL+GROUP+REMOVAL Search BENZOYL+GROUP+REMOVAL
9 BETA SCISSION OF MAIN CHAIN 47449 0% 100% 2 Search BETA+SCISSION+OF+MAIN+CHAIN Search BETA+SCISSION+OF+MAIN+CHAIN
10 BRUSHING OFF 47449 0% 100% 2 Search BRUSHING+OFF Search BRUSHING+OFF

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 IWAYANAGI, T , UENO, T , NONOGAKI, S , ITO, H , WILLSON, CG , (1988) MATERIALS AND PROCESSES FOR DEEP-UV LITHOGRAPHY.ADVANCES IN CHEMISTRY SERIES. VOL. . ISSUE 218. P. 109 -224 101 73% 0
2 REICHMANIS, E , THOMPSON, LF , (1987) POLYMER MATERIALS FOR MICROLITHOGRAPHY.ANNUAL REVIEW OF MATERIALS SCIENCE. VOL. 17. ISSUE . P. 235-271 72 83% 14
3 REICHMANIS, E , THOMPSON, LF , (1989) POLYMER MATERIALS FOR MICROLITHOGRAPHY.CHEMICAL REVIEWS. VOL. 89. ISSUE 6. P. 1273-1289 56 78% 129
4 SUGITA, K , UENO, N , (1992) RESISTS FOR MICROLITHOGRAPHY - PRESENT STATUS AND RECENT RESEARCH TRENDS.PROGRESS IN POLYMER SCIENCE. VOL. 17. ISSUE 3. P. 319-360 58 75% 15
5 OBRIEN, MJ , SOANE, DS , (1989) RESISTS IN MICROLITHOGRAPHY.ADVANCES IN CHEMISTRY SERIES. VOL. . ISSUE 221. P. 326 -376 54 64% 0
6 GOGOLIDES, E , TZEVELEKIS, D , GRIGOROPOULOS, S , TEGOU, E , HATZAKIS, M , (1996) WET SILYLATION AND OXYGEN PLASMA DEVELOPMENT OF PHOTORESISTS: A MATURE AND VERSATILE LITHOGRAPHIC PROCESS FOR MICROELECTRONICS AND MICROFABRICATION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 14. ISSUE 5. P. 3332-3338 31 78% 3
7 WHITE, LK , (1986) POSITIVE-RESIST PROCESSING FOR STEP-AND-REPEAT OPTICAL LITHOGRAPHY.RCA REVIEW. VOL. 47. ISSUE 3. P. 345-379 49 78% 2
8 REICHMANIS, E , NOVEMBRE, AE , (1993) LITHOGRAPHIC RESIST MATERIALS CHEMISTRY.ANNUAL REVIEW OF MATERIALS SCIENCE. VOL. 23. ISSUE . P. 11 -43 47 50% 9
9 SHEATS, JR , (1989) PHOTORESISTS FOR DEEP UV LITHOGRAPHY.SOLID STATE TECHNOLOGY. VOL. 32. ISSUE 6. P. 79 -86 40 69% 12
10 WILLSON, CG , BOWDEN, MJ , (1988) ORGANIC RESIST MATERIALS.ADVANCES IN CHEMISTRY SERIES. VOL. . ISSUE 218. P. 75-108 26 93% 0

Classes with closest relation at Level 1


Rank Class id link
1 26726 MSB ARGE D//5 NORBORNENE 2 2 DIMETHANOL//ARTIFICIAL BREAST IMPLANT PACK
2 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
3 19470 PLANE PLASMA DISCHARGE//ENERGY INFLUX//DRY DEVELOPMENT
4 33525 IONCONDUCTIVE MEMBRANE//PROTON TRANSPORT NUMBER//ALCOHOL PLASMA POLYMERIZATION
5 10360 OPTICAL LITHOGRAPHY//PHASE SHIFTING MASK//OPTICAL PROXIMITY CORRECTION
6 5528 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY
7 36287 PUDDLE DEVELOPMENT//DEDUCTIVE AND OBJECT ORIENTED DATABASES//DEDUCTIVE ER MODEL
8 9774 X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY
9 34813 ELECTROSTATIC CHUCK//PIN CHUCK//WAFER FLATNESS
10 25108 IMMERSION LITHOGRAPHY//DOUBLE PATTERNING//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY

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