Class information for:
Level 1: X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
9774 1122 12.8 55%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
9774 1                   X RAY MASK//X RAY LITHOGRAPHY//SR LITHOGRAPHY 1122

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 X RAY MASK authKW 1489208 6% 79% 69
2 X RAY LITHOGRAPHY authKW 1053667 9% 40% 96
3 SR LITHOGRAPHY authKW 400775 2% 82% 18
4 SUPER FINE SR LITHOG address 380989 1% 100% 14
5 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B journal 287097 37% 3% 418
6 MASK CONTRAST authKW 190495 1% 100% 7
7 MICROFABRICAT TECHNOL address 166681 1% 88% 7
8 DOSE MARGIN authKW 163281 1% 100% 6
9 X RAY MASK MEMBRANE authKW 136068 0% 100% 5
10 TELECOMMUN ENERGY S address 131484 3% 17% 29

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Nanoscience & Nanotechnology 21832 47% 0% 526
2 Physics, Applied 16452 76% 0% 851
3 Engineering, Electrical & Electronic 10806 57% 0% 639
4 Optics 1544 16% 0% 185
5 Instruments & Instrumentation 434 7% 0% 78
6 Spectroscopy 372 6% 0% 63
7 Nuclear Science & Technology 116 4% 0% 42
8 Physics, Nuclear 48 3% 0% 31
9 Physics, Particles & Fields 40 3% 0% 33
10 Materials Science, Coatings & Films 27 2% 0% 18

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SUPER FINE SR LITHOG 380989 1% 100% 14
2 MICROFABRICAT TECHNOL 166681 1% 88% 7
3 TELECOMMUN ENERGY S 131484 3% 17% 29
4 XRAY LITHOG 130611 1% 40% 12
5 DEV OPERAT SEMICOND PROD 81641 0% 100% 3
6 SUPERFINE SR LITHOG 81641 0% 100% 3
7 POSTECH ADV LITHOG 72567 0% 67% 4
8 SYST ELECT S 46088 2% 8% 20
9 NANOTECHNOL ADV SYST S 43537 0% 40% 4
10 QUANTUM EQUIPMENT TECHNOL 40013 0% 29% 5

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 287097 37% 3% 418
2 MICROELECTRONIC ENGINEERING 26241 9% 1% 99
3 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 20581 14% 1% 153
4 NTT REVIEW 12951 1% 3% 14
5 SOLID STATE TECHNOLOGY 9145 2% 1% 25
6 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY 5867 1% 1% 16
7 PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS 4817 3% 1% 31
8 BULLETIN OF THE JAPAN SOCIETY OF PRECISION ENGINEERING 2802 0% 2% 5
9 IBM JOURNAL OF RESEARCH AND DEVELOPMENT 1107 1% 0% 9
10 OPTICAL SPECTRA 1006 0% 4% 1

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 X RAY MASK 1489208 6% 79% 69 Search X+RAY+MASK Search X+RAY+MASK
2 X RAY LITHOGRAPHY 1053667 9% 40% 96 Search X+RAY+LITHOGRAPHY Search X+RAY+LITHOGRAPHY
3 SR LITHOGRAPHY 400775 2% 82% 18 Search SR+LITHOGRAPHY Search SR+LITHOGRAPHY
4 MASK CONTRAST 190495 1% 100% 7 Search MASK+CONTRAST Search MASK+CONTRAST
5 DOSE MARGIN 163281 1% 100% 6 Search DOSE+MARGIN Search DOSE+MARGIN
6 X RAY MASK MEMBRANE 136068 0% 100% 5 Search X+RAY+MASK+MEMBRANE Search X+RAY+MASK+MEMBRANE
7 X RAY STEPPER 108854 0% 100% 4 Search X+RAY+STEPPER Search X+RAY+STEPPER
8 EXPOSURE LATITUDE 89057 1% 55% 6 Search EXPOSURE+LATITUDE Search EXPOSURE+LATITUDE
9 LINEWIDTH CONTROL 87082 0% 80% 4 Search LINEWIDTH+CONTROL Search LINEWIDTH+CONTROL
10 PATTERN PLACEMENT ACCURACY 87082 0% 80% 4 Search PATTERN+PLACEMENT+ACCURACY Search PATTERN+PLACEMENT+ACCURACY

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 SMITH, HI , SCHATTENBURG, ML , HECTOR, SD , FERRERA, J , MOON, EE , YANG, IY , BURKHARDT, M , (1996) X-RAY NANOLITHOGRAPHY: EXTENSION TO THE LIMITS OF THE LITHOGRAPHIC PROCESS.MICROELECTRONIC ENGINEERING. VOL. 32. ISSUE 1-4. P. 143-158 39 83% 25
2 DEGUCHI, K , MIYOSHI, K , BAN, H , MATSUDA, T , OHNO, T , KADO, Y , (1995) FABRICATION OF 0.2 MU M LARGE SCALE INTEGRATED CIRCUITS USING SYNCHROTRON RADIATION X-RAY LITHOGRAPHY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 13. ISSUE 6. P. 3040 -3045 31 94% 19
3 TSUBOI, S , TANAKA, Y , IWAMOTO, T , SUMITANI, H , NAKAYAMA, Y , (2001) RECENT PROGRESS IN 1X X-RAY MASK TECHNOLOGY: FEASIBILITY STUDY USING ASET-NIST FORMAT TAXN X-RAY MASKS WITH 100 NM RULE 4 GBIT DYNAMIC RANDOM ACCESS MEMORY TEST PATTERNS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 19. ISSUE 6. P. 2416-2422 25 93% 7
4 GOTO, S , SUGISHIMA, K , BAN, Y , (1995) LITHOGRAPHY FOR MICROELECTRONICS.RADIATION PHYSICS AND CHEMISTRY. VOL. 45. ISSUE 3. P. 333-348 31 89% 1
5 CERRINA, F , (1997) APPLICATION OF X RAYS TO NANOLITHOGRAPHY.PROCEEDINGS OF THE IEEE. VOL. 85. ISSUE 4. P. 644-651 21 95% 6
6 MARUMOTO, K , YABE, H , AYA, S , KISE, K , AMI, S , SASAKI, K , WATANABE, H , ITOGA, K , SUMITANI, H , (2003) FABRICATION OF HIGH RESOLUTION X-RAY MASKS USING DIAMOND MEMBRANE FOR SECOND GENERATION X-RAY LITHOGRAPHY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 21. ISSUE 1. P. 207 -213 16 100% 6
7 CERRINA, F , (2000) X-RAY IMAGING: APPLICATIONS TO PATTERNING AND LITHOGRAPHY.JOURNAL OF PHYSICS D-APPLIED PHYSICS. VOL. 33. ISSUE 12. P. R103 -R116 23 72% 30
8 HECTOR, SD , SMITH, HI , SCHATTENBURG, ML , (1993) SIMULTANEOUS-OPTIMIZATION OF SPECTRUM, SPATIAL COHERENCE, GAP, FEATURE BIAS, AND ABSORBER THICKNESS IN SYNCHROTRON-BASED X-RAY-LITHOGRAPHY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 11. ISSUE 6. P. 2981-2985 20 100% 13
9 WILSON, AD , (1993) X-RAY-LITHOGRAPHY IN IBM, 1980-1992, THE DEVELOPMENT YEARS.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 37. ISSUE 3. P. 299-318 22 85% 9
10 IBA, Y , KUMASAKA, F , AOYAMA, H , TAGUCHI, T , YAMABE, M , (1996) PRECISE STRESS CONTROL OF TA ABSORBER USING LOW STRESS ALUMINA ETCHING MASK FOR X-RAY MASK FABRICATION.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 35. ISSUE 12B. P. 6463-6468 17 94% 11

Classes with closest relation at Level 1


Rank Class id link
1 5528 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//PROXIMITY EFFECT CORRECTION//ELECTRON BEAM LITHOGRAPHY
2 22144 EUV LITHOG//EXTREME ULTRAVIOLET LITHOGRAPHY//EUVL
3 21913 STENCIL LITHOGRAPHY//NANOSYST MFG//STRESS INDUCED DEFORMATION
4 8140 SOLID STATE TECHNOLOGY//DRY DEVELOPMENT//WT ADDITIVITY
5 34813 ELECTROSTATIC CHUCK//PIN CHUCK//WAFER FLATNESS
6 11311 SU 8//MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS//JOURNAL OF MICROMECHANICS AND MICROENGINEERING
7 27641 3D OPTICAL INSPECTION//3 D MODELS FOR STRUCTURES AND FAULTS//3D DIFFRACTION
8 30199 TRANSMISSION GRATING//FREESTANDING TRANSMISSION GRATING//HIGH TEMP HIGH DENS PLASMA PHYS
9 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
10 24424 BETATRON TUNE SHIFT//COMPACT ELECTRON STORAGE RING//RACETRACK MICROTRON

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