Class information for:
Level 1: PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
19724 492 21.5 68%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
314 3       ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 39933
720 2             JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B//CHEMICALLY AMPLIFIED RESIST//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 12751
19724 1                   PHOTOBASE GENERATOR//BASE AMPLIFIER//BASE PROLIFERATION REACTION 492

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PHOTOBASE GENERATOR authKW 2681971 11% 79% 55
2 BASE AMPLIFIER authKW 682690 2% 100% 11
3 BASE PROLIFERATION REACTION authKW 558564 2% 100% 9
4 PHOTOACID GENERATOR authKW 457161 7% 23% 32
5 BASE PROLIFERATION authKW 434439 1% 100% 7
6 IMINO SULFONATE authKW 310313 1% 100% 5
7 ACYLOXYIMINO GROUP authKW 248251 1% 100% 4
8 BASE PROLIFERATING REACTION authKW 248251 1% 100% 4
9 MOLECULAR DISASSEMBLY authKW 248251 1% 100% 4
10 REWORKABLE RESINS authKW 248251 1% 100% 4

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Polymer Science 9342 52% 0% 254
2 Chemistry, Multidisciplinary 406 21% 0% 102
3 Materials Science, Multidisciplinary 117 14% 0% 69
4 Chemistry, Physical 112 13% 0% 64
5 Materials Science, Coatings & Films 63 3% 0% 15
6 Chemistry, Applied 53 4% 0% 19
7 Engineering, Chemical 18 4% 0% 20
8 Imaging Science & Photographic Technology 17 1% 0% 5
9 Nanoscience & Nanotechnology 11 3% 0% 13
10 Materials Science, Textiles 4 0% 0% 2

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 GUNMA TORY 186188 1% 100% 3
2 ADV PHOTOPOLYMERS 119345 1% 38% 5
3 FUNCT POLYMER 82396 2% 15% 9
4 BRIDGEWATER PL GRP 62063 0% 100% 1
5 CHEM PUNE 62063 0% 100% 1
6 DRUG DISCOVETY 62063 0% 100% 1
7 EQUIPE POROSITE CONTROLEEIS2M 62063 0% 100% 1
8 FUNCTIONAL POLYMER 62063 0% 100% 1
9 J AN SCI TECHNOL AGCY JST C T 62063 0% 100% 1
10 PL CHEM POLYMER SCI 62063 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 226386 17% 4% 84
2 JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY 3454 6% 0% 30
3 CHEMISTRY OF MATERIALS 3143 6% 0% 30
4 JOURNAL OF IMAGING SCIENCE 1682 1% 1% 3
5 CHEMISTRY LETTERS 1672 5% 0% 25
6 MACROMOLECULAR RESEARCH 1452 1% 0% 7
7 MACROMOLECULAR RAPID COMMUNICATIONS 1215 2% 0% 10
8 JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY 1085 2% 0% 12
9 ADHESIVES AGE 1013 0% 1% 2
10 EUROPEAN POLYMER JOURNAL 984 3% 0% 13

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 PHOTOBASE GENERATOR 2681971 11% 79% 55 Search PHOTOBASE+GENERATOR Search PHOTOBASE+GENERATOR
2 BASE AMPLIFIER 682690 2% 100% 11 Search BASE+AMPLIFIER Search BASE+AMPLIFIER
3 BASE PROLIFERATION REACTION 558564 2% 100% 9 Search BASE+PROLIFERATION+REACTION Search BASE+PROLIFERATION+REACTION
4 PHOTOACID GENERATOR 457161 7% 23% 32 Search PHOTOACID+GENERATOR Search PHOTOACID+GENERATOR
5 BASE PROLIFERATION 434439 1% 100% 7 Search BASE+PROLIFERATION Search BASE+PROLIFERATION
6 IMINO SULFONATE 310313 1% 100% 5 Search IMINO+SULFONATE Search IMINO+SULFONATE
7 ACYLOXYIMINO GROUP 248251 1% 100% 4 Search ACYLOXYIMINO+GROUP Search ACYLOXYIMINO+GROUP
8 BASE PROLIFERATING REACTION 248251 1% 100% 4 Search BASE+PROLIFERATING+REACTION Search BASE+PROLIFERATING+REACTION
9 MOLECULAR DISASSEMBLY 248251 1% 100% 4 Search MOLECULAR+DISASSEMBLY Search MOLECULAR+DISASSEMBLY
10 REWORKABLE RESINS 248251 1% 100% 4 Search REWORKABLE+RESINS Search REWORKABLE+RESINS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 SUYAMA, K , SHIRAI, M , (2009) PHOTOBASE GENERATORS: RECENT PROGRESS AND APPLICATION TREND IN POLYMER SYSTEMS.PROGRESS IN POLYMER SCIENCE. VOL. 34. ISSUE 2. P. 194 -209 65 70% 50
2 ICHIMURA, K , AOKI, K , (2009) BRANCHED BASE-AMPLIFYING OLIGOMERS ENHANCING UV-CURING OF EPOXY RESINS.MACROMOLECULAR CHEMISTRY AND PHYSICS. VOL. 210. ISSUE 16. P. 1303 -1309 30 100% 2
3 FURUTANI, M , KOBAYASHI, H , GUNJI, T , ABE, Y , ARIMITSU, K , (2015) BASE-AMPLIFYING SILICONE RESINS WITH PHOTOBASE-GENERATING SIDE CHAINS AND THEIR APPLICATION TO NEGATIVE-WORKING PHOTORESISTS.JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY. VOL. 53. ISSUE 10. P. 1205 -1212 27 77% 1
4 ARIMITSU, K , KOBAYASHI, H , FURUTANI, M , GUNJI, T , ABE, Y , (2014) BASE-AMPLIFYING SILICONE RESINS GENERATING ALIPHATIC SECONDARY AMINES AUTOCATALYTICALLY: SYNTHESIS, CHARACTERIZATION AND APPLICATION TO POSITIVE-WORKING PHOTORESISTS.POLYMER CHEMISTRY. VOL. 5. ISSUE 23. P. 6671 -6677 27 79% 1
5 IGARASHI, A , ARIMITSU, K , SEKI, T , ICHIMURA, K , (2008) NOVEL BASE-SENSITIVE POLYMERS GENERATING AMINO GROUPS FROM THEIR SIDE CHAINS IN A NONLINEAR MANNER AND THEIR APPLICATION TO PHOTOIMAGING MATERIALS.JOURNAL OF MATERIALS CHEMISTRY. VOL. 18. ISSUE 5. P. 560 -566 28 82% 6
6 TSUNOOKA, M , SUYAMA, K , OKAMURA, H , SHIRAI, M , (2006) DEVELOPMENT OF PHOTOACID AND PHOTOBASE GENERATORS AS THE KEY MATERIALS FOR DESIGN OF NOVEL PHOTOPOLYMERS.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 19. ISSUE 1. P. 65 -71 27 82% 9
7 SHIRAI, M , (2014) PHOTOCROSSLINKABLE POLYMERS WITH DEGRADABLE PROPERTIES.POLYMER JOURNAL. VOL. 46. ISSUE 12. P. 859 -865 27 61% 7
8 OHBA, T , SUYAMA, K , SHIRAI, M , (2006) VISIBLE LIGHT-INDUCED FORMATION OF PENDANT BASIC GROUPS BY USING TRIPLET SENSITIZERS.REACTIVE & FUNCTIONAL POLYMERS. VOL. 66. ISSUE 10. P. 1189 -1197 23 92% 3
9 SHIRAI, M , (2007) REWORKABLE UV CURING MATERIALS.PROGRESS IN ORGANIC COATINGS. VOL. 58. ISSUE 2-3. P. 158 -165 21 84% 19
10 SHIRAI, M , SUYAMA, K , OKAMURA, H , TSUNOOKA, M , (2002) DEVELOPMENT OF NOVEL PHOTOSENSITIVE POLYMER SYSTEMS USING PHOTOACID AND PHOTOBASE GENERATORS.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 15. ISSUE 5. P. 715-730 24 86% 9

Classes with closest relation at Level 1


Rank Class id link
1 3013 CHEMICALLY AMPLIFIED RESIST//LINE EDGE ROUGHNESS//JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY
2 23619 PHOTOSENSITIVE POLYIMIDE//REACTION DEVELOPMENT PATTERNING RDP//POLYISOIMIDE
3 26525 POLYPEROXIDE//POLYSTYRENE PEROXIDE//COPOLYPEROXIDES
4 736 PHOTOPOLYMERIZATION//PHOTOINITIATOR//CATIONIC PHOTOPOLYMERIZATION
5 34469 BASE CATALYZED POLYMERIZATION//DEUTERATED ACRYLIC//EQUIACTIVE
6 37582 SECONDARY SPUTTERING LITHOGRAPHY//TEMPLATE INDUCED GROWTH//COVERSLIP MICROCOVER GLASS
7 15066 THIOL ENE//POLYMER CHEM GRP//THIOL ENE REACTION
8 14466 CYCLIC KETENE ACETAL//RADICAL RING OPENING POLYMERIZATION//SPIRO ORTHOCARBONATE
9 24555 SELF IMMOLATIVE//POLYMETHYL GLYOXYLATE//POLYOLEFIN SULFONES
10 7685 CAGED COMPOUNDS//PHOTOLABILE PROTECTING GROUPS//PHOTOCLEAVABLE PROTECTING GROUPS

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