Class information for:
Level 2: ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
664 13339 24.7 72%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
589 3       ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 15224
664 2             ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 13339
89 1                   HFO2//HIGH K DIELECTRICS//HIGH K 4457
2435 1                   ATOMIC LAYER DEPOSITION//ALD//MOLECULAR LAYER DEPOSITION 2244
9326 1                   GERMANIUM//MBE//GE MOS 1166
9796 1                   TANTALUM OXIDE//TA2O5//TANTALUM PENTOXIDE 1119
11062 1                   MFIS//MEMORY WINDOW//MFIS STRUCTURE 1010
11770 1                   CEO2 FILM//CEO2 THIN FILM//CEO2 955
14564 1                   RU//RUO2//RUTHENIUM DIOXIDE 762
19257 1                   METAL INSULATOR METAL MIM CAPACITOR//METAL INSULATOR METAL MIM//VOLTAGE COEFFICIENT OF CAPACITANCE VCC 514
20013 1                   Y2O3 FILM//GADOLINIUM OXIDE GD2O3//Y2O3 THIN FILMS 480
21402 1                   SI001 SUBSTRATES//S UNICAT//INLUMR5270 420
28210 1                   NEGATIVE CAPACITANCE//CHAIR NANOELECT MAT//NAM GGMBH 212

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 ATOMIC LAYER DEPOSITION authKW 642480 6% 36% 779
2 HFO2 authKW 428974 3% 53% 357
3 HIGH K DIELECTRICS authKW 407205 3% 52% 345
4 HIGH K authKW 374213 3% 47% 346
5 HIGH K GATE DIELECTRICS authKW 234718 1% 67% 154
6 HAFNIUM OXIDE authKW 182409 1% 51% 155
7 METAL GATE authKW 175230 1% 46% 165
8 ALD authKW 158166 1% 36% 195
9 PHYSICS, APPLIED WoSSC 124054 61% 1% 8154
10 MFIS authKW 115330 1% 75% 67

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Physics, Applied 124054 61% 1% 8154
2 Materials Science, Coatings & Films 73367 17% 1% 2289
3 Physics, Condensed Matter 22461 23% 0% 3052
4 Materials Science, Multidisciplinary 17359 27% 0% 3637
5 Nanoscience & Nanotechnology 14343 12% 0% 1580
6 Engineering, Electrical & Electronic 13559 21% 0% 2740
7 Electrochemistry 3404 5% 0% 651
8 Chemistry, Physical 1825 11% 0% 1459
9 Materials Science, Ceramics 1342 2% 0% 313
10 Optics 777 5% 0% 623

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SILICON NANO DEVICE 85765 1% 36% 104
2 EXPT PHYS TECHNOL 85450 0% 64% 58
3 INTERUNIV SEMICOND 62623 1% 17% 158
4 MBE 53726 0% 44% 54
5 RADIAT DETECT MAT DEVICES 39628 0% 67% 26
6 MDM 32192 1% 20% 72
7 ANGSTROM MICROSTRUCT 30570 0% 70% 19
8 ADV PROC DEV TEAM 30038 0% 77% 17
9 ANHUI NANOMAT NANOSTRUCT 29001 0% 21% 60
10 CHAIR NANOELECT MAT 26980 0% 54% 22

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 MICROELECTRONIC ENGINEERING 51972 4% 5% 483
2 APPLIED PHYSICS LETTERS 50347 12% 1% 1579
3 CHEMICAL VAPOR DEPOSITION 47468 1% 14% 144
4 INTEGRATED FERROELECTRICS 41410 2% 7% 268
5 IEEE ELECTRON DEVICE LETTERS 41096 3% 5% 405
6 THIN SOLID FILMS 29561 5% 2% 695
7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 27225 3% 3% 415
8 ELECTROCHEMICAL AND SOLID STATE LETTERS 21300 2% 5% 201
9 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 15426 3% 2% 460
10 JOURNAL OF APPLIED PHYSICS 13366 6% 1% 821

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 ATOMIC LAYER DEPOSITION 642480 6% 36% 779 Search ATOMIC+LAYER+DEPOSITION Search ATOMIC+LAYER+DEPOSITION
2 HFO2 428974 3% 53% 357 Search HFO2 Search HFO2
3 HIGH K DIELECTRICS 407205 3% 52% 345 Search HIGH+K+DIELECTRICS Search HIGH+K+DIELECTRICS
4 HIGH K 374213 3% 47% 346 Search HIGH+K Search HIGH+K
5 HIGH K GATE DIELECTRICS 234718 1% 67% 154 Search HIGH+K+GATE+DIELECTRICS Search HIGH+K+GATE+DIELECTRICS
6 HAFNIUM OXIDE 182409 1% 51% 155 Search HAFNIUM+OXIDE Search HAFNIUM+OXIDE
7 METAL GATE 175230 1% 46% 165 Search METAL+GATE Search METAL+GATE
8 ALD 158166 1% 36% 195 Search ALD Search ALD
9 MFIS 115330 1% 75% 67 Search MFIS Search MFIS
10 HAFNIUM COMPOUNDS 108141 1% 43% 109 Search HAFNIUM+COMPOUNDS Search HAFNIUM+COMPOUNDS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 MIIKKULAINEN, V , LESKELA, M , RITALA, M , PUURUNEN, RL , (2013) CRYSTALLINITY OF INORGANIC FILMS GROWN BY ATOMIC LAYER DEPOSITION: OVERVIEW AND GENERAL TRENDS.JOURNAL OF APPLIED PHYSICS. VOL. 113. ISSUE 2. P. - 1131 49% 301
2 PUURUNEN, RL , (2005) SURFACE CHEMISTRY OF ATOMIC LAYER DEPOSITION: A CASE STUDY FOR THE TRIMETHYLALUMINUM/WATER PROCESS.JOURNAL OF APPLIED PHYSICS. VOL. 97. ISSUE 12. P. - 475 44% 1060
3 ROBERTSON, J , WALLACE, RM , (2015) HIGH-K MATERIALS AND METAL GATES FOR CMOS APPLICATIONS.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 88. ISSUE . P. 1 -41 228 81% 53
4 ROBERTSON, J , (2006) HIGH DIELECTRIC CONSTANT GATE OXIDES FOR METAL OXIDE SI TRANSISTORS.REPORTS ON PROGRESS IN PHYSICS. VOL. 69. ISSUE 2. P. 327 -396 178 85% 959
5 GEORGE, SM , (2010) ATOMIC LAYER DEPOSITION: AN OVERVIEW.CHEMICAL REVIEWS. VOL. 110. ISSUE 1. P. 111 -131 134 64% 1462
6 HE, G , ZHU, LQ , SUN, ZQ , WAN, Q , ZHANG, LD , (2011) INTEGRATIONS AND CHALLENGES OF NOVEL HIGH-K GATE STACKS IN ADVANCED CMOS TECHNOLOGY.PROGRESS IN MATERIALS SCIENCE. VOL. 56. ISSUE 5. P. 475 -572 247 70% 61
7 CHOI, JH , MAO, Y , CHANG, JP , (2011) DEVELOPMENT OF HAFNIUM BASED HIGH-K MATERIALS-A REVIEW.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 72. ISSUE 6. P. 97 -136 179 66% 155
8 O'NEILL, BJ , JACKSON, DHK , LEE, J , CANLAS, C , STAIR, PC , MARSHALL, CL , ELAM, JW , KUECH, TF , DUMESIC, JA , HUBER, GW , (2015) CATALYST DESIGN WITH ATOMIC LAYER DEPOSITION.ACS CATALYSIS. VOL. 5. ISSUE 3. P. 1804 -1825 130 58% 51
9 ROBERTSON, J , (2004) HIGH DIELECTRIC CONSTANT OXIDES.EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. VOL. 28. ISSUE 3. P. 265-291 104 81% 663
10 VAN BUI, H , GRILLO, F , VAN OMMEN, JR , (2017) ATOMIC AND MOLECULAR LAYER DEPOSITION: OFF THE BEATEN TRACK.CHEMICAL COMMUNICATIONS. VOL. 53. ISSUE 1. P. 45 -71 146 44% 1

Classes with closest relation at Level 2


Rank Class id link
1 474 FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI
2 3561 DIELECTRIC PHENOMENA//CBH MECHANISM//EUROPIUM INDIUM OXIDE
3 2000 ZIRCONIA//ZRO2//ZIRCONIUM TITANATE
4 1210 GALLIUM ARSENIDE//GAAS//REFLECTANCE ANISOTROPY SPECTROSCOPY
5 2516 THIN FILM TRANSISTORS//THIN FILM TRANSISTORS TFTS//IGZO
6 2014 BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION
7 1754 RESISTIVE SWITCHING//MEMRISTOR//RRAM
8 532 IEEE TRANSACTIONS ON ELECTRON DEVICES//MOSFET//FINFET
9 1919 BISMUTH TITANATE//BI4TI3O12//BISMUTH OXIDE
10 3422 CAF2//EPITAXIAL AL2O3//METAL INSULATOR HETEROSTRUCTURE

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