Class information for:
Level 1: CEO2 FILM//CEO2 THIN FILM//CEO2

Basic class information

Class id #P Avg. number of
references
Database coverage
of references
11770 955 18.2 76%



Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes

The table includes all classes above and classes immediately below the current class.



Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
589 3       ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 15224
664 2             ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 13339
11770 1                   CEO2 FILM//CEO2 THIN FILM//CEO2 955

Terms with highest relevance score



rank Term termType Chi square Shr. of publ. in
class containing
term
Class's shr. of
term's tot. occurrences
#P with
term in
class
1 CEO2 FILM authKW 188066 1% 59% 10
2 CEO2 THIN FILM authKW 152240 1% 48% 10
3 CEO2 authKW 133375 8% 6% 75
4 KANAGAWA IND TECHNOL address 111897 1% 50% 7
5 MGO THIN FILMS authKW 99595 1% 35% 9
6 DELIBERATELY MISCUT SAPPHIRE authKW 95918 0% 100% 3
7 MICROCRACK FREE authKW 95918 0% 100% 3
8 CEO2 BUFFER LAYER authKW 64731 1% 23% 9
9 100 PREFERENTIAL ORIENTATION authKW 63945 0% 100% 2
10 BETA MGO authKW 63945 0% 100% 2

Web of Science journal categories



Rank Term Chi square Shr. of publ. in
class containing
term
Class's shr. of
term's tot. occurrences
#P with
term in
class
1 Physics, Applied 11006 68% 0% 646
2 Materials Science, Coatings & Films 6299 19% 0% 179
3 Physics, Condensed Matter 2228 26% 0% 253
4 Materials Science, Multidisciplinary 1637 31% 0% 293
5 Materials Science, Ceramics 513 5% 0% 47
6 Crystallography 320 6% 0% 53
7 Engineering, Electrical & Electronic 87 8% 0% 79
8 Materials Science, Composites 84 2% 0% 15
9 Chemistry, Physical 75 9% 0% 88
10 Electrochemistry 63 3% 0% 27

Address terms



Rank Term Chi square Shr. of publ. in
class containing
term
Class's shr. of
term's tot. occurrences
#P with
term in
class
1 KANAGAWA IND TECHNOL 111897 1% 50% 7
2 SUPERCONDUCTOR TECHNOL GRP 57548 0% 60% 3
3 ADV MAT ANAL 46320 1% 14% 10
4 ART CRAFTS EDUC SUPPORT 31973 0% 100% 1
5 CRISMAT LAMIPS 31973 0% 100% 1
6 DTNM LTS 31973 0% 100% 1
7 ENVIRONM MOL SCO 31973 0% 100% 1
8 FAK PHYS GEWISSEN AFTEN 31973 0% 100% 1
9 FERROELECT THIN FILM 31973 0% 100% 1
10 FLUENS TECHNOL GRP 31973 0% 100% 1

Journals



Rank Term Chi square Shr. of publ. in
class containing
term
Class's shr. of
term's tot. occurrences
#P with
term in
class
1 THIN SOLID FILMS 6145 9% 0% 84
2 PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS 5254 7% 0% 64
3 CHEMICAL VAPOR DEPOSITION 4608 1% 1% 12
4 APPLIED PHYSICS LETTERS 1760 8% 0% 80
5 JOURNAL OF CRYSTAL GROWTH 1670 4% 0% 41
6 SUPERCONDUCTOR SCIENCE & TECHNOLOGY 1609 2% 0% 19
7 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 1517 4% 0% 39
8 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 1497 3% 0% 24
9 IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY 1496 3% 0% 27
10 APPLIED SURFACE SCIENCE 1002 4% 0% 34

Author Key Words



Rank Term Chi square Shr. of publ. in
class containing
term
Class's shr. of
term's tot. occurrences
#P with
term in
class
LCSH search Wikipedia search
1 CEO2 FILM 188066 1% 59% 10 Search CEO2+FILM Search CEO2+FILM
2 CEO2 THIN FILM 152240 1% 48% 10 Search CEO2+THIN+FILM Search CEO2+THIN+FILM
3 CEO2 133375 8% 6% 75 Search CEO2 Search CEO2
4 MGO THIN FILMS 99595 1% 35% 9 Search MGO+THIN+FILMS Search MGO+THIN+FILMS
5 DELIBERATELY MISCUT SAPPHIRE 95918 0% 100% 3 Search DELIBERATELY+MISCUT+SAPPHIRE Search DELIBERATELY+MISCUT+SAPPHIRE
6 MICROCRACK FREE 95918 0% 100% 3 Search MICROCRACK+FREE Search MICROCRACK+FREE
7 CEO2 BUFFER LAYER 64731 1% 23% 9 Search CEO2+BUFFER+LAYER Search CEO2+BUFFER+LAYER
8 100 PREFERENTIAL ORIENTATION 63945 0% 100% 2 Search 100+PREFERENTIAL+ORIENTATION Search 100+PREFERENTIAL+ORIENTATION
9 BETA MGO 63945 0% 100% 2 Search BETA+MGO Search BETA+MGO
10 DC CURRENT MEASUREMENTS 63945 0% 100% 2 Search DC+CURRENT+MEASUREMENTS Search DC+CURRENT+MEASUREMENTS

Core articles

The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.



Rank Reference # ref.
in cl.
Shr. of ref. in
cl.
Citations
1 SARTORI, A , EL HABRA, N , BOLZAN, M , ROSSETTO, G , SITRAN, S , BARRECA, D , GASPAROTTO, A , CASARIN, M , (2011) STABILITY STUDY OF A MAGNESIUM BETA-DIKETONATE AS PRECURSOR FOR CHEMICAL VAPOR DEPOSITION OF MGO.CHEMISTRY OF MATERIALS. VOL. 23. ISSUE 5. P. 1113 -1119 33 67% 5
2 GUHEL, Y , TOLOSHNIAK, T , BERNARD, J , BESQ, A , GERMANICUS, RC , EL FALLAH, J , PESANT, JC , DESCAMPS, P , BOUDART, B , (2015) RAPID THERMAL ANNEALING OF CERIUM DIOXIDE THIN FILMS SPUTTERED ONTO SILICON (111) SUBSTRATES: INFLUENCE OF HEATING RATE ON MICROSTRUCTURE AND ELECTRICAL PROPERTIES.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. VOL. 30. ISSUE . P. 352 -360 28 52% 3
3 GUHEL, Y , BERNARD, J , BOUDART, B , (2014) IN SITU RAMAN CHARACTERIZATION OF CEO2 THIN FILMS SPUTTERED ON (111) SI IN ORDER TO OPTIMIZE THE POST GROWTH ANNEALING PARAMETERS.MICROELECTRONIC ENGINEERING. VOL. 118. ISSUE . P. 29 -34 24 62% 2
4 GUHEL, Y , TA, MT , BERNARD, J , BOUDART, B , PESANT, JC , (2009) RAMAN CHARACTERIZATION BEFORE AND AFTER RAPID THERMAL ANNEALING OF CEO2 THIN FILMS GROWN BY RF SPUTTERING ON (111) SI.JOURNAL OF RAMAN SPECTROSCOPY. VOL. 40. ISSUE 4. P. 401-404 20 77% 9
5 LUO, LZ , CHEN, J , WANG, XL , (2014) THERMAL STABILITY AND SURFACE BEHAVIORS OF CEO2/SI FILMS DURING IN-SITU VACUUM ANNEALING.APPLIED SURFACE SCIENCE. VOL. 322. ISSUE . P. 111 -115 17 77% 6
6 INOUE, T , SHIDA, S , (2014) HIGHLY SEPARATED HYBRID ORIENTATION STRUCTURE OF CEO2(100) AND (110) ON SI(100) SUBSTRATES BY ELECTRON BEAM-INDUCED ORIENTATION-SELECTIVE EPITAXY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 32. ISSUE 3. P. - 20 69% 0
7 TOLOSHNIAK, T , GUHEL, Y , BERNARD, J , BESQ, A , MARINEL, S , BOUDART, B , (2015) IMPACT OF MICROWAVE ANNEALING ON CEO2 THIN FILMS SPUTTERED ON (111) SI.MATERIALS RESEARCH BULLETIN. VOL. 70. ISSUE . P. 712 -718 29 46% 0
8 WAKIYA, N , YOSHIDA, M , KIGUCHI, T , SHINOZAKI, K , MIZUTANI, N , (2002) RF-MAGNETRON-SPUTTERED HETEROEPITAXIAL YSZ AND CEO2/YSZ/SI(001) THIN FILMS WITH IMPROVED CAPACITANCE-VOLTAGE CHARACTERISTICS.THIN SOLID FILMS. VOL. 411. ISSUE 2. P. 268-273 20 91% 15
9 ZHAO, P , ITO, A , TU, R , GOTO, T , (2010) PREPARATION OF HIGHLY (100)-ORIENTED CEO2 FILMS ON POLYCRYSTALLINE AL2O3 SUBSTRATES BY LASER CHEMICAL VAPOR DEPOSITION.SURFACE & COATINGS TECHNOLOGY. VOL. 204. ISSUE 21-22. P. 3619 -3622 17 81% 7
10 PUTKONEN, M , JOHANSSON, LS , RAUHALA, E , NIINISTO, L , (1999) SURFACE-CONTROLLED GROWTH OF MAGNESIUM OXIDE THIN FILMS BY ATOMIC LAYER EPITAXY.JOURNAL OF MATERIALS CHEMISTRY. VOL. 9. ISSUE 10. P. 2449 -2452 26 70% 26

Classes with closest relation at Level 1



Rank Class id link
1 5302 TRANSPORT MACHINE ENGN//LATERAL CRYSTAL GROWTH//OZONE CONDENSATION
2 20013 Y2O3 FILM//GADOLINIUM OXIDE GD2O3//Y2O3 THIN FILMS
3 25427 PASSIVE COUNTER ELECTRODE//ION STORAGE CAPACITY//V CE OXIDE
4 21402 SI001 SUBSTRATES//S UNICAT//INLUMR5270
5 8548 PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS//ATOMIC GRAPHOEPITAXY//HTSC ULTRATHIN FILM
6 8977 SRDPM2//BETA DIKETONATE//TIT BUO2DPM2
7 13449 SUR E PLASMA SCI//ERLANGEN CATALYSIS OURCE//CERIA
8 11062 MFIS//MEMORY WINDOW//MFIS STRUCTURE
9 18296 ADV COATINGS EXPT//ZRO2 FILMS//TETRAGONAL AND MONOCLINIC PHASES
10 30461 SR AL TA O//HIGH T C DEVICES//REBA2NBO6

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