Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
11770 | 955 | 18.2 | 76% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
589 | 3 | ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS | 15224 |
664 | 2 | ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS | 13339 |
11770 | 1 | CEO2 FILM//CEO2 THIN FILM//CEO2 | 955 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | CEO2 FILM | authKW | 188066 | 1% | 59% | 10 |
2 | CEO2 THIN FILM | authKW | 152240 | 1% | 48% | 10 |
3 | CEO2 | authKW | 133375 | 8% | 6% | 75 |
4 | KANAGAWA IND TECHNOL | address | 111897 | 1% | 50% | 7 |
5 | MGO THIN FILMS | authKW | 99595 | 1% | 35% | 9 |
6 | DELIBERATELY MISCUT SAPPHIRE | authKW | 95918 | 0% | 100% | 3 |
7 | MICROCRACK FREE | authKW | 95918 | 0% | 100% | 3 |
8 | CEO2 BUFFER LAYER | authKW | 64731 | 1% | 23% | 9 |
9 | 100 PREFERENTIAL ORIENTATION | authKW | 63945 | 0% | 100% | 2 |
10 | BETA MGO | authKW | 63945 | 0% | 100% | 2 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 11006 | 68% | 0% | 646 |
2 | Materials Science, Coatings & Films | 6299 | 19% | 0% | 179 |
3 | Physics, Condensed Matter | 2228 | 26% | 0% | 253 |
4 | Materials Science, Multidisciplinary | 1637 | 31% | 0% | 293 |
5 | Materials Science, Ceramics | 513 | 5% | 0% | 47 |
6 | Crystallography | 320 | 6% | 0% | 53 |
7 | Engineering, Electrical & Electronic | 87 | 8% | 0% | 79 |
8 | Materials Science, Composites | 84 | 2% | 0% | 15 |
9 | Chemistry, Physical | 75 | 9% | 0% | 88 |
10 | Electrochemistry | 63 | 3% | 0% | 27 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | KANAGAWA IND TECHNOL | 111897 | 1% | 50% | 7 |
2 | SUPERCONDUCTOR TECHNOL GRP | 57548 | 0% | 60% | 3 |
3 | ADV MAT ANAL | 46320 | 1% | 14% | 10 |
4 | ART CRAFTS EDUC SUPPORT | 31973 | 0% | 100% | 1 |
5 | CRISMAT LAMIPS | 31973 | 0% | 100% | 1 |
6 | DTNM LTS | 31973 | 0% | 100% | 1 |
7 | ENVIRONM MOL SCO | 31973 | 0% | 100% | 1 |
8 | FAK PHYS GEWISSEN AFTEN | 31973 | 0% | 100% | 1 |
9 | FERROELECT THIN FILM | 31973 | 0% | 100% | 1 |
10 | FLUENS TECHNOL GRP | 31973 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | THIN SOLID FILMS | 6145 | 9% | 0% | 84 |
2 | PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 5254 | 7% | 0% | 64 |
3 | CHEMICAL VAPOR DEPOSITION | 4608 | 1% | 1% | 12 |
4 | APPLIED PHYSICS LETTERS | 1760 | 8% | 0% | 80 |
5 | JOURNAL OF CRYSTAL GROWTH | 1670 | 4% | 0% | 41 |
6 | SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 1609 | 2% | 0% | 19 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1517 | 4% | 0% | 39 |
8 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1497 | 3% | 0% | 24 |
9 | IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY | 1496 | 3% | 0% | 27 |
10 | APPLIED SURFACE SCIENCE | 1002 | 4% | 0% | 34 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | CEO2 FILM | 188066 | 1% | 59% | 10 | Search CEO2+FILM | Search CEO2+FILM |
2 | CEO2 THIN FILM | 152240 | 1% | 48% | 10 | Search CEO2+THIN+FILM | Search CEO2+THIN+FILM |
3 | CEO2 | 133375 | 8% | 6% | 75 | Search CEO2 | Search CEO2 |
4 | MGO THIN FILMS | 99595 | 1% | 35% | 9 | Search MGO+THIN+FILMS | Search MGO+THIN+FILMS |
5 | DELIBERATELY MISCUT SAPPHIRE | 95918 | 0% | 100% | 3 | Search DELIBERATELY+MISCUT+SAPPHIRE | Search DELIBERATELY+MISCUT+SAPPHIRE |
6 | MICROCRACK FREE | 95918 | 0% | 100% | 3 | Search MICROCRACK+FREE | Search MICROCRACK+FREE |
7 | CEO2 BUFFER LAYER | 64731 | 1% | 23% | 9 | Search CEO2+BUFFER+LAYER | Search CEO2+BUFFER+LAYER |
8 | 100 PREFERENTIAL ORIENTATION | 63945 | 0% | 100% | 2 | Search 100+PREFERENTIAL+ORIENTATION | Search 100+PREFERENTIAL+ORIENTATION |
9 | BETA MGO | 63945 | 0% | 100% | 2 | Search BETA+MGO | Search BETA+MGO |
10 | DC CURRENT MEASUREMENTS | 63945 | 0% | 100% | 2 | Search DC+CURRENT+MEASUREMENTS | Search DC+CURRENT+MEASUREMENTS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | SARTORI, A , EL HABRA, N , BOLZAN, M , ROSSETTO, G , SITRAN, S , BARRECA, D , GASPAROTTO, A , CASARIN, M , (2011) STABILITY STUDY OF A MAGNESIUM BETA-DIKETONATE AS PRECURSOR FOR CHEMICAL VAPOR DEPOSITION OF MGO.CHEMISTRY OF MATERIALS. VOL. 23. ISSUE 5. P. 1113 -1119 | 33 | 67% | 5 |
2 | GUHEL, Y , TOLOSHNIAK, T , BERNARD, J , BESQ, A , GERMANICUS, RC , EL FALLAH, J , PESANT, JC , DESCAMPS, P , BOUDART, B , (2015) RAPID THERMAL ANNEALING OF CERIUM DIOXIDE THIN FILMS SPUTTERED ONTO SILICON (111) SUBSTRATES: INFLUENCE OF HEATING RATE ON MICROSTRUCTURE AND ELECTRICAL PROPERTIES.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. VOL. 30. ISSUE . P. 352 -360 | 28 | 52% | 3 |
3 | GUHEL, Y , BERNARD, J , BOUDART, B , (2014) IN SITU RAMAN CHARACTERIZATION OF CEO2 THIN FILMS SPUTTERED ON (111) SI IN ORDER TO OPTIMIZE THE POST GROWTH ANNEALING PARAMETERS.MICROELECTRONIC ENGINEERING. VOL. 118. ISSUE . P. 29 -34 | 24 | 62% | 2 |
4 | GUHEL, Y , TA, MT , BERNARD, J , BOUDART, B , PESANT, JC , (2009) RAMAN CHARACTERIZATION BEFORE AND AFTER RAPID THERMAL ANNEALING OF CEO2 THIN FILMS GROWN BY RF SPUTTERING ON (111) SI.JOURNAL OF RAMAN SPECTROSCOPY. VOL. 40. ISSUE 4. P. 401-404 | 20 | 77% | 9 |
5 | LUO, LZ , CHEN, J , WANG, XL , (2014) THERMAL STABILITY AND SURFACE BEHAVIORS OF CEO2/SI FILMS DURING IN-SITU VACUUM ANNEALING.APPLIED SURFACE SCIENCE. VOL. 322. ISSUE . P. 111 -115 | 17 | 77% | 6 |
6 | INOUE, T , SHIDA, S , (2014) HIGHLY SEPARATED HYBRID ORIENTATION STRUCTURE OF CEO2(100) AND (110) ON SI(100) SUBSTRATES BY ELECTRON BEAM-INDUCED ORIENTATION-SELECTIVE EPITAXY.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 32. ISSUE 3. P. - | 20 | 69% | 0 |
7 | TOLOSHNIAK, T , GUHEL, Y , BERNARD, J , BESQ, A , MARINEL, S , BOUDART, B , (2015) IMPACT OF MICROWAVE ANNEALING ON CEO2 THIN FILMS SPUTTERED ON (111) SI.MATERIALS RESEARCH BULLETIN. VOL. 70. ISSUE . P. 712 -718 | 29 | 46% | 0 |
8 | WAKIYA, N , YOSHIDA, M , KIGUCHI, T , SHINOZAKI, K , MIZUTANI, N , (2002) RF-MAGNETRON-SPUTTERED HETEROEPITAXIAL YSZ AND CEO2/YSZ/SI(001) THIN FILMS WITH IMPROVED CAPACITANCE-VOLTAGE CHARACTERISTICS.THIN SOLID FILMS. VOL. 411. ISSUE 2. P. 268-273 | 20 | 91% | 15 |
9 | ZHAO, P , ITO, A , TU, R , GOTO, T , (2010) PREPARATION OF HIGHLY (100)-ORIENTED CEO2 FILMS ON POLYCRYSTALLINE AL2O3 SUBSTRATES BY LASER CHEMICAL VAPOR DEPOSITION.SURFACE & COATINGS TECHNOLOGY. VOL. 204. ISSUE 21-22. P. 3619 -3622 | 17 | 81% | 7 |
10 | PUTKONEN, M , JOHANSSON, LS , RAUHALA, E , NIINISTO, L , (1999) SURFACE-CONTROLLED GROWTH OF MAGNESIUM OXIDE THIN FILMS BY ATOMIC LAYER EPITAXY.JOURNAL OF MATERIALS CHEMISTRY. VOL. 9. ISSUE 10. P. 2449 -2452 | 26 | 70% | 26 |
Classes with closest relation at Level 1 |