Class information for:
Level 1: NEGATIVE CAPACITANCE//CHAIR NANOELECT MAT//NAM GGMBH

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
28210 212 27.1 74%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
589 3       ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 15224
664 2             ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 13339
28210 1                   NEGATIVE CAPACITANCE//CHAIR NANOELECT MAT//NAM GGMBH 212

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 NEGATIVE CAPACITANCE authKW 1470307 17% 29% 35
2 CHAIR NANOELECT MAT address 1138207 8% 44% 18
3 NAM GGMBH address 838017 4% 73% 8
4 FERROELECTRIC HFO2 authKW 576140 2% 100% 4
5 NEGATIVE CAPACITANCE FET NCFET authKW 576140 2% 100% 4
6 SUB 60 MV DECADE authKW 432105 1% 100% 3
7 TWO WELL ENERGY LANDSCAPE authKW 432105 1% 100% 3
8 FIELD EFFECT ACTION authKW 288070 1% 100% 2
9 PARTIALLY DEPLETED SILICON ON INSULATOR DEVICE authKW 288070 1% 100% 2
10 ZRHFO authKW 288070 1% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 2917 74% 0% 156
2 Nanoscience & Nanotechnology 836 22% 0% 46
3 Engineering, Electrical & Electronic 384 26% 0% 56
4 Materials Science, Multidisciplinary 376 31% 0% 66
5 Physics, Condensed Matter 317 22% 0% 46
6 Chemistry, Physical 36 12% 0% 25
7 Chemistry, Multidisciplinary 36 11% 0% 24
8 Materials Science, Ceramics 13 2% 0% 4
9 Acoustics 2 1% 0% 2
10 Materials Science, Characterization, Testing 1 0% 0% 1

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CHAIR NANOELECT MAT 1138207 8% 44% 18
2 NAM GGMBH 838017 4% 73% 8
3 BEST GRP 144035 0% 100% 1
4 BUSINESS UNIT NANOELECT TECHNOL CNT 144035 0% 100% 1
5 FUER HALBLEITER MIKROSYST TECH 144035 0% 100% 1
6 MIDRORI KU 144035 0% 100% 1
7 NAM GMBH 144035 0% 100% 1
8 NSF COMPUTAT NANOTECHNOL 144035 0% 100% 1
9 SEMICOND MICROSYT 144035 0% 100% 1
10 ASIC RD 121286 2% 21% 4

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 IEEE TRANSACTIONS ON ELECTRON DEVICES 4169 10% 0% 21
2 APPLIED PHYSICS LETTERS 2763 22% 0% 46
3 IEEE ELECTRON DEVICE LETTERS 2291 6% 0% 12
4 ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY 1769 2% 0% 4
5 ADVANCED ELECTRONIC MATERIALS 1532 1% 1% 2
6 APPLIED PHYSICS REVIEWS 1514 0% 1% 1
7 NANO LETTERS 1418 5% 0% 11
8 PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS 959 1% 0% 3
9 IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY 794 0% 1% 1
10 SOLID-STATE ELECTRONICS 517 3% 0% 6

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 NEGATIVE CAPACITANCE 1470307 17% 29% 35 Search NEGATIVE+CAPACITANCE Search NEGATIVE+CAPACITANCE
2 FERROELECTRIC HFO2 576140 2% 100% 4 Search FERROELECTRIC+HFO2 Search FERROELECTRIC+HFO2
3 NEGATIVE CAPACITANCE FET NCFET 576140 2% 100% 4 Search NEGATIVE+CAPACITANCE+FET+NCFET Search NEGATIVE+CAPACITANCE+FET+NCFET
4 SUB 60 MV DECADE 432105 1% 100% 3 Search SUB+60+MV+DECADE Search SUB+60+MV+DECADE
5 TWO WELL ENERGY LANDSCAPE 432105 1% 100% 3 Search TWO+WELL+ENERGY+LANDSCAPE Search TWO+WELL+ENERGY+LANDSCAPE
6 FIELD EFFECT ACTION 288070 1% 100% 2 Search FIELD+EFFECT+ACTION Search FIELD+EFFECT+ACTION
7 PARTIALLY DEPLETED SILICON ON INSULATOR DEVICE 288070 1% 100% 2 Search PARTIALLY+DEPLETED+SILICON+ON+INSULATOR+DEVICE Search PARTIALLY+DEPLETED+SILICON+ON+INSULATOR+DEVICE
8 ZRHFO 288070 1% 100% 2 Search ZRHFO Search ZRHFO
9 NEGATIVE CAPACITANCE NC 209500 2% 36% 4 Search NEGATIVE+CAPACITANCE+NC Search NEGATIVE+CAPACITANCE+NC
10 28 NM TECHNOLOGY NODE 144035 0% 100% 1 Search 28+NM+TECHNOLOGY+NODE Search 28+NM+TECHNOLOGY+NODE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 PARK, MH , KIM, HJ , KIM, YJ , LEE, YH , MOON, T , DO KIM, K , HYUN, SD , FENGLER, F , SCHROEDER, U , HWANG, CS , (2016) EFFECT OF ZR CONTENT ON THE WAKE-UP EFFECT IN HF1-XZRXO2 FILMS.ACS APPLIED MATERIALS & INTERFACES. VOL. 8. ISSUE 24. P. 15466 -15475 35 97% 1
2 HOFFMANN, M , SCHROEDER, U , SCHENK, T , SHIMIZU, T , FUNAKUBO, H , SAKATA, O , POHL, D , DRESCHER, M , ADELMANN, C , MATERLIK, R , ET AL (2015) STABILIZING THE FERROELECTRIC PHASE IN DOPED HAFNIUM OXIDE.JOURNAL OF APPLIED PHYSICS. VOL. 118. ISSUE 7. P. - 25 68% 15
3 STARSCHICH, S , BOETTGER, U , (2017) AN EXTENSIVE STUDY OF THE INFLUENCE OF DOPANTS ON THE FERROELECTRIC PROPERTIES OF HFO2.JOURNAL OF MATERIALS CHEMISTRY C. VOL. 5. ISSUE 2. P. 333 -338 27 75% 0
4 KIM, KD , PARK, MH , KIM, HJ , KIM, YJ , MOON, T , LEE, YH , HYUN, SD , GWON, T , HWANG, CS , (2016) FERROELECTRICITY IN UNDOPED-HFO2 THIN FILMS INDUCED BY DEPOSITION TEMPERATURE CONTROL DURING ATOMIC LAYER DEPOSITION.JOURNAL OF MATERIALS CHEMISTRY C. VOL. 4. ISSUE 28. P. 6864 -6872 28 68% 1
5 SHIRAISHI, T , KATAYAMA, K , YOKOUCHI, T , SHIMIZU, T , OIKAWA, T , SAKATA, O , UCHIDA, H , IMAI, Y , KIGUCHI, T , KONNO, TJ , ET AL (2016) IMPACT OF MECHANICAL STRESS ON FERROELECTRICITY IN (HF0.5ZR0.5)O-2 THIN FILMS.APPLIED PHYSICS LETTERS. VOL. 108. ISSUE 26. P. - 26 74% 0
6 FAN, Z , DENG, JY , WANG, JX , LIU, ZY , YANG, P , XIAO, JX , YAN, XB , DONG, ZL , WANG, J , CHEN, JS , (2016) FERROELECTRICITY EMERGING IN STRAINED (111)-TEXTURED ZRO2 THIN FILMS.APPLIED PHYSICS LETTERS. VOL. 108. ISSUE 1. P. - 24 77% 0
7 GRIMLEY, ED , SCHENK, T , SANG, XH , PESIC, M , SCHROEDER, U , MIKOLAJICK, T , LEBEAU, JM , (2016) STRUCTURAL CHANGES UNDERLYING FIELD-CYCLING PHENOMENA IN FERROELECTRIC HFO2 THIN FILMS.ADVANCED ELECTRONIC MATERIALS. VOL. 2. ISSUE 9. P. - 28 61% 1
8 PARK, MH , LEE, YH , KIM, HJ , KIM, YJ , MOON, T , DO KIM, K , MULLER, J , KERSCH, A , SCHROEDER, U , MIKOLAJICK, T , ET AL (2015) FERROELECTRICITY AND ANTIFERROELECTRICITY OF DOPED THIN HFO2-BASED FILMS.ADVANCED MATERIALS. VOL. 27. ISSUE 11. P. 1811 -1831 35 38% 26
9 LOMENZO, PD , TAKMEEL, Q , ZHOU, CZ , FANCHER, CM , LAMBERS, E , RUDAWSKI, NG , JONES, JL , MOGHADDAM, S , NISHIDA, T , (2015) TAN INTERFACE PROPERTIES AND ELECTRIC FIELD CYCLING EFFECTS ON FERROELECTRIC SI-DOPED HFO2 THIN FILMS.JOURNAL OF APPLIED PHYSICS. VOL. 117. ISSUE 13. P. - 23 62% 14
10 PAHWA, G , DUTTA, T , AGARWAL, A , KHANDELWAL, S , SALAHUDDIN, S , HU, CM , CHAUHAN, YS , (2016) ANALYSIS AND COMPACT MODELING OF NEGATIVE CAPACITANCE TRANSISTOR WITH HIGH ON-CURRENT AND NEGATIVE OUTPUT DIFFERENTIAL RESISTANCE-PART I: MODEL DESCRIPTION.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 63. ISSUE 12. P. 4981 -4985 19 90% 0

Classes with closest relation at Level 1


Rank Class id link
1 10635 TUNNEL FIELD EFFECT TRANSISTOR TFET//TUNNELING FIELD EFFECT TRANSISTOR TFET//BAND TO BAND TUNNELING BTBT
2 19589 CUBIC HFO2//CUBIC YSZ//NANOCRYSTALLINE SAMPLE
3 11062 MFIS//MEMORY WINDOW//MFIS STRUCTURE
4 25979 NANOELECTROMECHANICAL SYSTEMS NEMS//NANOELECTROMECHANICAL NEM MEMORY//NANOELECTROMECHANICAL SWITCH
5 4215 INTEGRATED FERROELECTRICS//PZT//FERAM
6 1797 FERROELECTRIC SUPERLATTICE//MICRO NANO PHYS MECH//FERROELECTRIC TUNNEL JUNCTION
7 16181 ELECTROCALORIC EFFECT//ELECTROCALORIC//ELASTOCALORIC EFFECT
8 89 HFO2//HIGH K DIELECTRICS//HIGH K
9 21402 SI001 SUBSTRATES//S UNICAT//INLUMR5270
10 19257 METAL INSULATOR METAL MIM CAPACITOR//METAL INSULATOR METAL MIM//VOLTAGE COEFFICIENT OF CAPACITANCE VCC

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