Class information for:
Level 3: ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
589 15224 23.9 68%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
589 3       ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 15224
664 2             ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 13339
3561 2             DIELECTRIC PHENOMENA//CBH MECHANISM//EUROPIUM INDIUM OXIDE 1325
4119 2             ANAL STRUCT MAT//UNITE RECH PHYS SOLIDE//PHYS MATIERE CONDENSEE NANOSCI LR ES 40 11 560

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 ATOMIC LAYER DEPOSITION authKW 568539 5% 36% 783
2 HFO2 authKW 375771 2% 53% 357
3 HIGH K DIELECTRICS authKW 356701 2% 52% 345
4 HIGH K authKW 329693 2% 47% 347
5 HIGH K GATE DIELECTRICS authKW 208299 1% 67% 155
6 HAFNIUM OXIDE authKW 159785 1% 51% 155
7 METAL GATE authKW 153493 1% 46% 165
8 ALD authKW 141395 1% 36% 197
9 PHYSICS, APPLIED WoSSC 126339 58% 1% 8821
10 MFIS authKW 101033 0% 75% 67

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Physics, Applied 126339 58% 1% 8821
2 Materials Science, Coatings & Films 73472 16% 2% 2452
3 Physics, Condensed Matter 29513 24% 0% 3710
4 Materials Science, Multidisciplinary 21395 28% 0% 4289
5 Engineering, Electrical & Electronic 13455 19% 0% 2947
6 Nanoscience & Nanotechnology 12719 11% 0% 1609
7 Electrochemistry 3058 4% 0% 671
8 Chemistry, Physical 1831 10% 0% 1597
9 Materials Science, Ceramics 1438 2% 0% 348
10 Optics 780 4% 0% 682

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SILICON NANO DEVICE 75120 1% 36% 104
2 EXPT PHYS TECHNOL 74855 0% 64% 58
3 INTERUNIV SEMICOND 54830 1% 17% 158
4 MBE 47060 0% 44% 54
5 RADIAT DETECT MAT DEVICES 34715 0% 67% 26
6 MDM 28188 0% 20% 72
7 ANGSTROM MICROSTRUCT 26780 0% 70% 19
8 ADV PROC DEV TEAM 26315 0% 77% 17
9 ANHUI NANOMAT NANOSTRUCT 25395 0% 21% 60
10 CHAIR NANOELECT MAT 23634 0% 54% 22

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 MICROELECTRONIC ENGINEERING 46374 3% 5% 488
2 APPLIED PHYSICS LETTERS 45764 11% 2% 1614
3 CHEMICAL VAPOR DEPOSITION 42722 1% 15% 146
4 THIN SOLID FILMS 36380 5% 2% 823
5 INTEGRATED FERROELECTRICS 36217 2% 7% 268
6 IEEE ELECTRON DEVICE LETTERS 36088 3% 5% 406
7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 24339 3% 3% 420
8 ELECTROCHEMICAL AND SOLID STATE LETTERS 18801 1% 5% 202
9 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 13769 3% 2% 466
10 JOURNAL OF APPLIED PHYSICS 12748 6% 1% 861

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 ATOMIC LAYER DEPOSITION 568539 5% 36% 783 Search ATOMIC+LAYER+DEPOSITION Search ATOMIC+LAYER+DEPOSITION
2 HFO2 375771 2% 53% 357 Search HFO2 Search HFO2
3 HIGH K DIELECTRICS 356701 2% 52% 345 Search HIGH+K+DIELECTRICS Search HIGH+K+DIELECTRICS
4 HIGH K 329693 2% 47% 347 Search HIGH+K Search HIGH+K
5 HIGH K GATE DIELECTRICS 208299 1% 67% 155 Search HIGH+K+GATE+DIELECTRICS Search HIGH+K+GATE+DIELECTRICS
6 HAFNIUM OXIDE 159785 1% 51% 155 Search HAFNIUM+OXIDE Search HAFNIUM+OXIDE
7 METAL GATE 153493 1% 46% 165 Search METAL+GATE Search METAL+GATE
8 ALD 141395 1% 36% 197 Search ALD Search ALD
9 MFIS 101033 0% 75% 67 Search MFIS Search MFIS
10 HAFNIUM COMPOUNDS 94725 1% 43% 109 Search HAFNIUM+COMPOUNDS Search HAFNIUM+COMPOUNDS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 MIIKKULAINEN, V , LESKELA, M , RITALA, M , PUURUNEN, RL , (2013) CRYSTALLINITY OF INORGANIC FILMS GROWN BY ATOMIC LAYER DEPOSITION: OVERVIEW AND GENERAL TRENDS.JOURNAL OF APPLIED PHYSICS. VOL. 113. ISSUE 2. P. - 1134 49% 301
2 PUURUNEN, RL , (2005) SURFACE CHEMISTRY OF ATOMIC LAYER DEPOSITION: A CASE STUDY FOR THE TRIMETHYLALUMINUM/WATER PROCESS.JOURNAL OF APPLIED PHYSICS. VOL. 97. ISSUE 12. P. - 476 44% 1060
3 ROBERTSON, J , WALLACE, RM , (2015) HIGH-K MATERIALS AND METAL GATES FOR CMOS APPLICATIONS.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 88. ISSUE . P. 1 -41 228 81% 53
4 ROBERTSON, J , (2006) HIGH DIELECTRIC CONSTANT GATE OXIDES FOR METAL OXIDE SI TRANSISTORS.REPORTS ON PROGRESS IN PHYSICS. VOL. 69. ISSUE 2. P. 327 -396 178 85% 959
5 GEORGE, SM , (2010) ATOMIC LAYER DEPOSITION: AN OVERVIEW.CHEMICAL REVIEWS. VOL. 110. ISSUE 1. P. 111 -131 134 64% 1462
6 HE, G , ZHU, LQ , SUN, ZQ , WAN, Q , ZHANG, LD , (2011) INTEGRATIONS AND CHALLENGES OF NOVEL HIGH-K GATE STACKS IN ADVANCED CMOS TECHNOLOGY.PROGRESS IN MATERIALS SCIENCE. VOL. 56. ISSUE 5. P. 475 -572 247 70% 61
7 CHOI, JH , MAO, Y , CHANG, JP , (2011) DEVELOPMENT OF HAFNIUM BASED HIGH-K MATERIALS-A REVIEW.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 72. ISSUE 6. P. 97 -136 180 67% 155
8 O'NEILL, BJ , JACKSON, DHK , LEE, J , CANLAS, C , STAIR, PC , MARSHALL, CL , ELAM, JW , KUECH, TF , DUMESIC, JA , HUBER, GW , (2015) CATALYST DESIGN WITH ATOMIC LAYER DEPOSITION.ACS CATALYSIS. VOL. 5. ISSUE 3. P. 1804 -1825 130 58% 51
9 ROBERTSON, J , (2004) HIGH DIELECTRIC CONSTANT OXIDES.EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS. VOL. 28. ISSUE 3. P. 265-291 104 81% 663
10 VAN BUI, H , GRILLO, F , VAN OMMEN, JR , (2017) ATOMIC AND MOLECULAR LAYER DEPOSITION: OFF THE BEATEN TRACK.CHEMICAL COMMUNICATIONS. VOL. 53. ISSUE 1. P. 45 -71 146 44% 1

Classes with closest relation at Level 3


Rank Class id link
1 715 BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION
2 685 RESISTIVE SWITCHING//MEMRISTOR//RRAM
3 6 PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON
4 61 FERROELECTRICS//INTEGRATED FERROELECTRICS//MANGANITES
5 637 SCULPTURED THIN FILMS//MUELLER MATRIX//GLANCING ANGLE DEPOSITION
6 378 SURFACE & COATINGS TECHNOLOGY//HIGH ENTROPY ALLOY//MATERIALS SCIENCE, COATINGS & FILMS
7 215 ZNO//ZINC OXIDE//GAS SENSOR
8 226 SOLID OXIDE FUEL CELL//SOFC//SOLID OXIDE FUEL CELLS
9 505 ZHURNAL NAUCHNOI I PRIKLADNOI FOTOGRAFII//SOLID STATE IONICS//SOLID ELECTROLYTE
10 91 LITHIUM ION BATTERY//JOURNAL OF POWER SOURCES//ELECTROCHEMISTRY

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