Class information for:
Level 1: RU//RUO2//RUTHENIUM DIOXIDE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
14564 762 23.3 69%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
589 3       ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 15224
664 2             ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 13339
14564 1                   RU//RUO2//RUTHENIUM DIOXIDE 762

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 RU authKW 279688 6% 15% 48
2 RUO2 authKW 245118 5% 16% 38
3 RUTHENIUM DIOXIDE authKW 225694 3% 22% 26
4 RUTHENIUM FILMS authKW 200356 1% 100% 5
5 RUOD3 authKW 160285 1% 100% 4
6 RUTHENIUM OXIDE authKW 156766 5% 11% 35
7 RUO2 THIN FILM authKW 90159 0% 75% 3
8 RUOX authKW 90159 0% 75% 3
9 CONDUCTIVE RUO2 authKW 80143 0% 100% 2
10 ECR ION GUN authKW 80143 0% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 7983 23% 0% 179
2 Physics, Applied 4849 51% 0% 390
3 Physics, Condensed Matter 1980 28% 0% 212
4 Materials Science, Multidisciplinary 1710 35% 0% 263
5 Electrochemistry 775 9% 0% 69
6 Nanoscience & Nanotechnology 450 9% 0% 69
7 Engineering, Electrical & Electronic 264 13% 0% 101
8 Chemistry, Physical 75 10% 0% 75
9 Materials Science, Ceramics 42 2% 0% 14
10 Physics, Multidisciplinary 25 4% 0% 34

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PASMANT GRP 80143 0% 100% 2
2 ADV PROC C ACITOR 66779 1% 33% 5
3 BEREICH INGENIEURWISSEN 40071 0% 100% 1
4 CENIDEIVG 40071 0% 100% 1
5 CHEM N ANO SCI 40071 0% 100% 1
6 CHIM PHYS ANALYT PL 40071 0% 100% 1
7 HEATING LIGHTING 40071 0% 100% 1
8 MAT AVIAT ENGN 40071 0% 100% 1
9 QUANTUM PHYS MATH MODELING MAT 40071 0% 100% 1
10 SEMICOND DEV 2 40071 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 INTEGRATED FERROELECTRICS 16277 5% 1% 40
2 CHEMICAL VAPOR DEPOSITION 11617 2% 2% 17
3 ELECTROCHEMICAL AND SOLID STATE LETTERS 4105 3% 0% 21
4 THIN SOLID FILMS 3656 8% 0% 58
5 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 3623 5% 0% 36
6 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2689 6% 0% 46
7 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 2529 6% 0% 44
8 MICROELECTRONIC ENGINEERING 1114 2% 0% 17
9 JOURNAL OF THE KOREAN PHYSICAL SOCIETY 1006 3% 0% 20
10 JOURNAL OF MATERIALS RESEARCH 844 2% 0% 16

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 RU 279688 6% 15% 48 Search RU Search RU
2 RUO2 245118 5% 16% 38 Search RUO2 Search RUO2
3 RUTHENIUM DIOXIDE 225694 3% 22% 26 Search RUTHENIUM+DIOXIDE Search RUTHENIUM+DIOXIDE
4 RUTHENIUM FILMS 200356 1% 100% 5 Search RUTHENIUM+FILMS Search RUTHENIUM+FILMS
5 RUOD3 160285 1% 100% 4 Search RUOD3 Search RUOD3
6 RUTHENIUM OXIDE 156766 5% 11% 35 Search RUTHENIUM+OXIDE Search RUTHENIUM+OXIDE
7 RUO2 THIN FILM 90159 0% 75% 3 Search RUO2+THIN+FILM Search RUO2+THIN+FILM
8 RUOX 90159 0% 75% 3 Search RUOX Search RUOX
9 CONDUCTIVE RUO2 80143 0% 100% 2 Search CONDUCTIVE+RUO2 Search CONDUCTIVE+RUO2
10 ECR ION GUN 80143 0% 100% 2 Search ECR+ION+GUN Search ECR+ION+GUN

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 VASILYEV, VY , MOROZOVA, NB , IGUMENOV, IK , (2014) CHEMICAL VAPOUR-PHASE DEPOSITION OF RUTHENIUM-CONTAINING THIN FILMS.RUSSIAN CHEMICAL REVIEWS. VOL. 83. ISSUE 8. P. 758 -782 52 71% 1
2 GAUR, R , MISHRA, L , SIDDIQI, MA , ATAKAN, B , (2014) RUTHENIUM COMPLEXES AS PRECURSORS FOR CHEMICAL VAPOR-DEPOSITION (CVD).RSC ADVANCES. VOL. 4. ISSUE 64. P. 33785 -33805 51 44% 0
3 LAI, YH , CHEN, YL , CHI, Y , LIU, CS , CARTY, AJ , PENG, SM , LEE, GH , (2003) DEPOSITION OF RU AND RUO2 THIN FILMS EMPLOYING DICARBONYL BIS-DIKETONATE RUTHENIUM COMPLEXES AS CVD SOURCE REAGENTS.JOURNAL OF MATERIALS CHEMISTRY. VOL. 13. ISSUE 8. P. 1999-2006 35 78% 28
4 TUCHSCHERER, A , GEORGI, C , ROTH, N , SCHAARSCHMIDT, D , RUFFER, T , WAECHTLER, T , SCHULZ, SE , OSWALD, S , GESSNER, T , LANG, H , (2012) RUTHENOCENES AND HALF-OPEN RUTHENOCENES: SYNTHESIS, CHARACTERIZATION, AND THEIR USE AS CVD PRECURSORS FOR RUTHENIUM THIN FILM DEPOSITION.EUROPEAN JOURNAL OF INORGANIC CHEMISTRY. VOL. . ISSUE 30. P. 4867 -4876 30 67% 6
5 ANDO, T , NAKATA, N , SUZUKI, K , MATSUMOTO, T , OGO, S , (2012) RU CYCLOOCTATETRAENE PRECURSORS FOR MOCVD.DALTON TRANSACTIONS. VOL. 41. ISSUE 6. P. 1678 -1682 22 85% 7
6 SONG, YH , CHEN, YL , CHI, Y , LITT, CS , CHING, WL , KAI, JJ , CHEN, RS , HUANG, YS , CARTY, AJ , (2003) DEPOSITION OF CONDUCTIVE RU AND RUO2 THIN FILMS EMPLOYING A PYRAZOLATE COMPLEX [RU(CO)(3)(3,5-(CF3)(2)-PZ)](2) AS THE CVD SOURCE REAGENT.CHEMICAL VAPOR DEPOSITION. VOL. 9. ISSUE 3. P. 162-169 33 72% 10
7 YEO, S , PARK, JY , LEE, SJ , LEE, DJ , SEO, JH , KIM, SH , (2015) RUTHENIUM AND RUTHENIUM DIOXIDE THIN FILMS DEPOSITED BY ATOMIC LAYER DEPOSITION USING A NOVEL ZERO-VALENT METALORGANIC PRECURSOR, (ETHYLBENZENE)(1,3-BUTADIENE)RU(0), AND MOLECULAR OXYGEN.MICROELECTRONIC ENGINEERING. VOL. 137. ISSUE . P. 16 -22 22 76% 2
8 FUNAKUBO, H , SHIRAISHI, T , OIKAWA, T , HIRANO, M , CHIBA, H , KAWANO, K , (2015) EFFECT OF INCUBATION TIME ON PREPARATION OF CONTINUOUS AND FLAT RU FILMS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 33. ISSUE 1. P. - 20 80% 0
9 NOUGARET, L , COMBETTE, P , ARINERO, R , PODLECKI, J , PASCAL-DELANNOY, F , (2007) DEVELOPMENT OF RUTHENIUM DIOXIDE ELECTRODES FOR PYROELECTRIC DEVICES BASED ON LITHIUM TANTALATE THIN FILMS.THIN SOLID FILMS. VOL. 515. ISSUE 7-8. P. 3971-3977 23 79% 12
10 YANG, ZJ , GUO, YD , LI, J , LIU, JC , DAI, W , CHENG, XL , YANG, XD , (2010) ELECTRONIC STRUCTURE AND OPTICAL PROPERTIES OF RUTILE RUO2 FROM FIRST PRINCIPLES.CHINESE PHYSICS B. VOL. 19. ISSUE 7. P. - 23 72% 11

Classes with closest relation at Level 1


Rank Class id link
1 2435 ATOMIC LAYER DEPOSITION//ALD//MOLECULAR LAYER DEPOSITION
2 4387 IRIDIUM OXIDE//WATER ELECTROLYSIS//UNITIZED REGENERATIVE FUEL CELL
3 9566 FIRST PRINCIPLES KINETIC MONTE CARLO//FRITZ HABER//HIGH PRESSURE X RAY PHOTOELECTRON SPECTROSCOPY
4 4215 INTEGRATED FERROELECTRICS//PZT//FERAM
5 3427 DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE
6 26085 INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING//TI HARD MASK//MAGNETIC TUNNEL JUNCTION MATERIALS
7 12445 IRIDIUM COATING//RUAL//IR COATING
8 693 PZT//PZT THIN FILMS//LEAD ZIRCONATE TITANATE
9 35913 RUO3//UNITE CHIM INORGAN ANALYT NUCL//RUTHENIUM OXYCHLORIDE
10 433 BST//BARIUM STRONTIUM TITANATE//TUNABILITY

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