Class information for:
Level 1: ATOMIC LAYER DEPOSITION//ALD//MOLECULAR LAYER DEPOSITION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
2435 2244 35.4 79%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
589 3       ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 15224
664 2             ATOMIC LAYER DEPOSITION//HFO2//HIGH K DIELECTRICS 13339
2435 1                   ATOMIC LAYER DEPOSITION//ALD//MOLECULAR LAYER DEPOSITION 2244

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ATOMIC LAYER DEPOSITION authKW 1928137 25% 26% 553
2 ALD authKW 288893 5% 20% 108
3 MOLECULAR LAYER DEPOSITION authKW 238361 1% 60% 29
4 ATOMIC LAYER DEPOSITION ALD authKW 205534 3% 22% 69
5 MOLECULAR LAYER DEPOSITION MLD authKW 149663 0% 100% 11
6 EXPT PHYS TECHNOL address 94448 1% 28% 25
7 PLASMA ENHANCED ALD authKW 69971 0% 86% 6
8 CHEMICAL VAPOR DEPOSITION journal 65040 3% 7% 69
9 GROWTH PER CYCLE authKW 54423 0% 100% 4
10 PLASMA ENHANCED ATOMIC LAYER DEPOSITION authKW 53314 1% 28% 14

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Materials Science, Coatings & Films 36154 29% 0% 651
2 Physics, Applied 10702 45% 0% 1005
3 Materials Science, Multidisciplinary 8565 44% 0% 982
4 Nanoscience & Nanotechnology 5745 18% 0% 397
5 Physics, Condensed Matter 3308 22% 0% 484
6 Chemistry, Physical 3234 27% 0% 607
7 Electrochemistry 1546 8% 0% 170
8 Chemistry, Multidisciplinary 414 12% 0% 262
9 Materials Science, Ceramics 58 1% 0% 31
10 Chemistry, Applied 54 2% 0% 51

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 EXPT PHYS TECHNOL 94448 1% 28% 25
2 ANGSTROM MICROSTRUCT 50379 0% 37% 10
3 COCOON 48579 0% 36% 10
4 PL PHYS SENSORS 48579 0% 36% 10
5 NANOTECHNOL PLASMAS PROC 43537 0% 80% 4
6 INTERUNIV SEMICOND 40420 2% 6% 52
7 ADV SUR E TECHNOL 30917 0% 45% 5
8 ANGTROM SOLAR 30611 0% 75% 3
9 MAT SUR E ENGN NANOFABRICAT 30611 0% 75% 3
10 ARMY AVIAT MISSILE DEV ENGN 27212 0% 100% 2

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CHEMICAL VAPOR DEPOSITION 65040 3% 7% 69
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 36800 9% 1% 196
3 CHEMISTRY OF MATERIALS 11182 5% 1% 121
4 THIN SOLID FILMS 8157 7% 0% 149
5 ELECTROCHEMICAL AND SOLID STATE LETTERS 6959 2% 1% 47
6 APPLIED SURFACE SCIENCE 4542 5% 0% 110
7 ACTA POLYTECHNICA SCANDINAVICA-CHEMICAL TECHNOLOGY SERIES 4261 0% 8% 4
8 ACTA POLYTECHNICA SCANDINAVICA-ELECTRICAL ENGINEERING SERIES 3884 0% 14% 2
9 ACS APPLIED MATERIALS & INTERFACES 3579 3% 0% 64
10 JOURNAL OF PHYSICAL CHEMISTRY C 3575 4% 0% 93

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 ATOMIC LAYER DEPOSITION 1928137 25% 26% 553 Search ATOMIC+LAYER+DEPOSITION Search ATOMIC+LAYER+DEPOSITION
2 ALD 288893 5% 20% 108 Search ALD Search ALD
3 MOLECULAR LAYER DEPOSITION 238361 1% 60% 29 Search MOLECULAR+LAYER+DEPOSITION Search MOLECULAR+LAYER+DEPOSITION
4 ATOMIC LAYER DEPOSITION ALD 205534 3% 22% 69 Search ATOMIC+LAYER+DEPOSITION+ALD Search ATOMIC+LAYER+DEPOSITION+ALD
5 MOLECULAR LAYER DEPOSITION MLD 149663 0% 100% 11 Search MOLECULAR+LAYER+DEPOSITION+MLD Search MOLECULAR+LAYER+DEPOSITION+MLD
6 PLASMA ENHANCED ALD 69971 0% 86% 6 Search PLASMA+ENHANCED+ALD Search PLASMA+ENHANCED+ALD
7 GROWTH PER CYCLE 54423 0% 100% 4 Search GROWTH+PER+CYCLE Search GROWTH+PER+CYCLE
8 PLASMA ENHANCED ATOMIC LAYER DEPOSITION 53314 1% 28% 14 Search PLASMA+ENHANCED+ATOMIC+LAYER+DEPOSITION Search PLASMA+ENHANCED+ATOMIC+LAYER+DEPOSITION
9 AREA SELECTIVE ALD 40817 0% 100% 3 Search AREA+SELECTIVE+ALD Search AREA+SELECTIVE+ALD
10 ALUMINUM OXIDE 38737 3% 4% 66 Search ALUMINUM+OXIDE Search ALUMINUM+OXIDE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 MIIKKULAINEN, V , LESKELA, M , RITALA, M , PUURUNEN, RL , (2013) CRYSTALLINITY OF INORGANIC FILMS GROWN BY ATOMIC LAYER DEPOSITION: OVERVIEW AND GENERAL TRENDS.JOURNAL OF APPLIED PHYSICS. VOL. 113. ISSUE 2. P. - 723 31% 301
2 GEORGE, SM , (2010) ATOMIC LAYER DEPOSITION: AN OVERVIEW.CHEMICAL REVIEWS. VOL. 110. ISSUE 1. P. 111 -131 126 60% 1462
3 PUURUNEN, RL , (2005) SURFACE CHEMISTRY OF ATOMIC LAYER DEPOSITION: A CASE STUDY FOR THE TRIMETHYLALUMINUM/WATER PROCESS.JOURNAL OF APPLIED PHYSICS. VOL. 97. ISSUE 12. P. - 347 32% 1060
4 O'NEILL, BJ , JACKSON, DHK , LEE, J , CANLAS, C , STAIR, PC , MARSHALL, CL , ELAM, JW , KUECH, TF , DUMESIC, JA , HUBER, GW , (2015) CATALYST DESIGN WITH ATOMIC LAYER DEPOSITION.ACS CATALYSIS. VOL. 5. ISSUE 3. P. 1804 -1825 127 56% 51
5 GREGORCZYK, K , KNEZ, M , (2016) HYBRID NANOMATERIALS THROUGH MOLECULAR AND ATOMIC LAYER DEPOSITION: TOP DOWN, BOTTOM UP, AND IN-BETWEEN APPROACHES TO NEW MATERIALS.PROGRESS IN MATERIALS SCIENCE. VOL. 75. ISSUE . P. 1 -37 94 61% 12
6 VAN BUI, H , GRILLO, F , VAN OMMEN, JR , (2017) ATOMIC AND MOLECULAR LAYER DEPOSITION: OFF THE BEATEN TRACK.CHEMICAL COMMUNICATIONS. VOL. 53. ISSUE 1. P. 45 -71 132 40% 1
7 SUNDBERG, P , KARPPINEN, M , (2014) ORGANIC AND INORGANIC-ORGANIC THIN FILM STRUCTURES BY MOLECULAR LAYER DEPOSITION: A REVIEW.BEILSTEIN JOURNAL OF NANOTECHNOLOGY. VOL. 5. ISSUE . P. 1104 -1136 80 78% 31
8 KNAPAS, K , RITALA, M , (2013) IN SITU STUDIES ON REACTION MECHANISMS IN ATOMIC LAYER DEPOSITION.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 38. ISSUE 3. P. 167 -202 110 56% 29
9 POTTS, SE , KESSELS, WMM , (2013) ENERGY-ENHANCED ATOMIC LAYER DEPOSITION FOR MORE PROCESS AND PRECURSOR VERSATILITY.COORDINATION CHEMISTRY REVIEWS. VOL. 257. ISSUE 23-24. P. 3254-3270 99 63% 19
10 LONGRIE, D , DEDUYTSCHE, D , DETAVERNIER, C , (2014) REACTOR CONCEPTS FOR ATOMIC LAYER DEPOSITION ON AGITATED PARTICLES: A REVIEW.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 32. ISSUE 1. P. - 75 67% 14

Classes with closest relation at Level 1


Rank Class id link
1 33555 MICROSYST IMICRO//NAT SCI SCI//AD SAKHAROV INT STATE ECOL
2 14564 RU//RUO2//RUTHENIUM DIOXIDE
3 25583 CHEM TECHNOL MAT DEVICES ELECT IND//MOLECULAR LAYERING METHOD//METALLIC EUROPIUM
4 10702 THIN FILM ENCAPSULATION//PERMEATION BARRIER//WATER VAPOR TRANSMISSION RATE
5 89 HFO2//HIGH K DIELECTRICS//HIGH K
6 11277 PERFLUORINATED CARBOXYLATES//ZENTRUM MIKROTECHNOL//COPPER FILMS
7 13873 TDEAT//TITANIUM NITRIDE//CVD TIN
8 19257 METAL INSULATOR METAL MIM CAPACITOR//METAL INSULATOR METAL MIM//VOLTAGE COEFFICIENT OF CAPACITANCE VCC
9 30808 POLYTHIOURETHANES//DESIGNED DISPERSIONS//SILVERI ACETYLACETONATE
10 13129 KAPPA AL2O3//AL CR2O 3//ALUMINUM OXIDE

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