Class information for:
Level 2: BETA FESI2//SILICIDES//SERIES RESISTANCE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
746 12475 22.1 65%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
746 2             BETA FESI2//SILICIDES//SERIES RESISTANCE 12475
2724 1                   SERIES RESISTANCE//IDEALITY FACTOR//SCHOTTKY DIODE 2164
3226 1                   TISI2//TITANIUM SILICIDE//SALICIDE 2033
4634 1                   NICKEL SILICIDE//NISI//NI SILICIDE 1751
4805 1                   BETA FESI2//IRON DISILICIDE//IRON SILICIDE 1722
5736 1                   SURFACE MAGNETO OPTIC KERR EFFECT//VALENCE BAND DENSITY OF STATES//SILICIDES 1581
14980 1                   ERBIUM SILICIDE//YTTRIUM SILICIDE//RARE EARTH SILICIDES 738
19107 1                   LASER MOL BEAM EPITAXY//PTSI//INTERNAL PHOTOEMISSION EFFECT 522
19147 1                   BALLISTIC ELECTRON EMISSION MICROSCOPY//BEEM//BALLISTIC ELECTRON EMISSION MICROSCOPY BEEM 519
20525 1                   SCHOTTKY BARRIER SB//SCHOTTKY BARRIER MOSFET//DOPANT SEGREGATION 456
22649 1                   W TI THIN FILMS//W 10TI ALLOY//W 10WTTI ALLOY 373
26250 1                   SILICIDE NANOWIRES//NICKEL SUICIDE//POINT CONTACT REACTIONS 260
29312 1                   CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL 188
35885 1                   CU2SI//ATOMIC ADSORPTION ON SURFACE//CU011 90
36570 1                   NANOMETER SIZED SCHOTTKY CONTACT//KSRC//BRIDGE METAL ION 78

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 BETA FESI2 authKW 548212 2% 97% 230
2 SILICIDES authKW 468567 4% 38% 499
3 SERIES RESISTANCE authKW 188926 2% 39% 199
4 NICKEL SILICIDE authKW 180115 1% 60% 122
5 SCHOTTKY DIODE authKW 161049 2% 23% 283
6 IRON DISILICIDE authKW 152193 1% 88% 71
7 SCHOTTKY BARRIER authKW 140464 2% 22% 264
8 NISI authKW 139317 1% 69% 82
9 IDEALITY FACTOR authKW 138633 1% 46% 124
10 BARRIER HEIGHT authKW 119646 1% 33% 147

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Physics, Applied 94654 56% 1% 6931
2 Physics, Condensed Matter 48983 34% 1% 4196
3 Materials Science, Coatings & Films 47791 14% 1% 1797
4 Materials Science, Multidisciplinary 15519 27% 0% 3337
5 Engineering, Electrical & Electronic 9384 18% 0% 2257
6 Nanoscience & Nanotechnology 6888 9% 0% 1097
7 Chemistry, Physical 1970 11% 0% 1431
8 Metallurgy & Metallurgical Engineering 1062 4% 0% 507
9 Optics 818 5% 0% 606
10 Physics, Multidisciplinary 693 5% 0% 650

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 VOCAT MED SCI 49300 0% 81% 25
2 OPTICIANRY 41724 0% 74% 23
3 AUTOMAT CONTROL PROC 20693 0% 14% 62
4 LASER MOL BEAM EPITAXY 19566 0% 100% 8
5 SCI ARTS 18417 2% 4% 219
6 NUCL ELECT RUMENTAT 17120 0% 100% 7
7 MICROELECT PL 15826 0% 36% 18
8 VAKGROEP VASTE STOFWETEN PEN 12576 0% 86% 6
9 VAKGRP VASTE STOFWETEN PEN 9981 0% 58% 7
10 CENT SOLAR NEW ENERGY SOURCES 9783 0% 100% 4

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 THIN SOLID FILMS 33306 6% 2% 712
2 JOURNAL OF APPLIED PHYSICS 32042 10% 1% 1204
3 MICROELECTRONIC ENGINEERING 28523 3% 3% 347
4 APPLIED SURFACE SCIENCE 20775 4% 2% 556
5 APPLIED PHYSICS LETTERS 16038 7% 1% 880
6 IEEE ELECTRON DEVICE LETTERS 14118 2% 3% 231
7 IEEE TRANSACTIONS ON ELECTRON DEVICES 13350 2% 2% 293
8 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 12315 2% 2% 295
9 SOLID-STATE ELECTRONICS 11978 2% 2% 223
10 SURFACE SCIENCE 10611 3% 1% 351

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 BETA FESI2 548212 2% 97% 230 Search BETA+FESI2 Search BETA+FESI2
2 SILICIDES 468567 4% 38% 499 Search SILICIDES Search SILICIDES
3 SERIES RESISTANCE 188926 2% 39% 199 Search SERIES+RESISTANCE Search SERIES+RESISTANCE
4 NICKEL SILICIDE 180115 1% 60% 122 Search NICKEL+SILICIDE Search NICKEL+SILICIDE
5 SCHOTTKY DIODE 161049 2% 23% 283 Search SCHOTTKY+DIODE Search SCHOTTKY+DIODE
6 IRON DISILICIDE 152193 1% 88% 71 Search IRON+DISILICIDE Search IRON+DISILICIDE
7 SCHOTTKY BARRIER 140464 2% 22% 264 Search SCHOTTKY+BARRIER Search SCHOTTKY+BARRIER
8 NISI 139317 1% 69% 82 Search NISI Search NISI
9 IDEALITY FACTOR 138633 1% 46% 124 Search IDEALITY+FACTOR Search IDEALITY+FACTOR
10 BARRIER HEIGHT 119646 1% 33% 147 Search BARRIER+HEIGHT Search BARRIER+HEIGHT

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 ZHANG, SL , OSTLING, M , (2003) METAL SILICIDES IN CMOS TECHNOLOGY: PAST, PRESENT, AND FUTURE TRENDS.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 28. ISSUE 1. P. 1 -129 402 85% 212
2 GAMBINO, JP , COLGAN, EG , (1998) SILICIDES AND OHMIC CONTACTS.MATERIALS CHEMISTRY AND PHYSICS. VOL. 52. ISSUE 2. P. 99 -146 205 74% 283
3 DE SCHUTTER, B , DE KEYSER, K , LAVOIE, C , DETAVERNIER, C , (2016) TEXTURE IN THIN FILM SILICIDES AND GERMANIDES: A REVIEW.APPLIED PHYSICS REVIEWS. VOL. 3. ISSUE 3. P. - 126 95% 0
4 CHI, DZ , (2013) SEMICONDUCTING BETA-PHASE FESI2 FOR LIGHT EMITTING DIODE APPLICATIONS: RECENT DEVELOPMENTS, CHALLENGES, AND SOLUTIONS.THIN SOLID FILMS. VOL. 537. ISSUE . P. 1 -22 128 84% 7
5 VONKANEL, H , (1992) GROWTH AND CHARACTERIZATION OF EPITAXIAL NI-SILICADE AND CO-SILICIDE.MATERIALS SCIENCE REPORTS. VOL. 8. ISSUE 5. P. 193-269 170 90% 175
6 MAEX, K , (1993) SILICIDES FOR INTEGRATED-CIRCUITS - TISI2 AND COSI2.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 11. ISSUE 2-3. P. 53 -153 125 83% 278
7 TUNG, RT , (1992) EPITAXIAL COSI2 AND NISI2 THIN-FILMS.MATERIALS CHEMISTRY AND PHYSICS. VOL. 32. ISSUE 2. P. 107-133 139 95% 94
8 PRETORIUS, R , THERON, CC , VANTOMME, A , MAYER, JW , (1999) COMPOUND PHASE FORMATION IN THIN FILM STRUCTURES.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 24. ISSUE 1. P. 1 -62 138 74% 60
9 NARAYANAMURTI, V , KOZHEVNIKOV, M , (2001) BEEM IMAGING AND SPECTROSCOPY OF BURIED STRUCTURES IN SEMICONDUCTORS.PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS. VOL. 349. ISSUE 6. P. 447-514 124 67% 61
10 LANGE, H , (1997) ELECTRONIC PROPERTIES OF SEMICONDUCTING SILICIDES.PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS. VOL. 201. ISSUE 1. P. 3-65 123 85% 0

Classes with closest relation at Level 2


Rank Class id link
1 3223 EMBEDDED RESISTOR//RESISTIVE FILMS//THIN FILM RESISTOR
2 899 SURFACE SCIENCE//SILICON//SCANNING TUNNELING MICROSCOPY
3 1210 GALLIUM ARSENIDE//GAAS//REFLECTANCE ANISOTROPY SPECTROSCOPY
4 2863 MOLYBDENUM SILICIDES//MOSI2//MOLYBDENUM DISILICIDE
5 1826 TRANSIENT ENHANCED DIFFUSION//SHALLOW JUNCTION//NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
6 3422 CAF2//EPITAXIAL AL2O3//METAL INSULATOR HETEROSTRUCTURE
7 1299 SIGE//STRAINED SI//VIRTUAL SUBSTRATE
8 2014 BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION
9 1242 NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS//SWIFT HEAVY IONS//THERMAL SPIKE
10 3264 SOLAR CELLS//SOLID-STATE ELECTRONICS//OPEN CIRCUIT VOLTAGE DECAY OCVD

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