Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
29312 | 188 | 13.5 | 51% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
746 | 2 | BETA FESI2//SILICIDES//SERIES RESISTANCE | 12475 |
29312 | 1 | CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL | 188 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | CROSS KELVIN RESISTOR CKR | authKW | 649690 | 2% | 100% | 4 |
2 | CROSS BRIDGE KELVIN RESISTOR CBKR | authKW | 519751 | 2% | 80% | 4 |
3 | POLYMETAL | authKW | 487268 | 2% | 100% | 3 |
4 | POLYMETAL GATE | authKW | 365449 | 2% | 75% | 3 |
5 | CROSS BRIDGE KELVIN RESISTORS | authKW | 324845 | 1% | 100% | 2 |
6 | DIFFUSION BARRIER METAL | authKW | 324845 | 1% | 100% | 2 |
7 | DUAL POLYMETAL GATE | authKW | 324845 | 1% | 100% | 2 |
8 | LOW RESISTIVITY TUNGSTEN | authKW | 324845 | 1% | 100% | 2 |
9 | W WNX POLY SI | authKW | 324845 | 1% | 100% | 2 |
10 | 50 NM NMOSFET | authKW | 162423 | 1% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 2144 | 62% | 0% | 116 |
2 | Physics, Applied | 1916 | 64% | 0% | 120 |
3 | Materials Science, Coatings & Films | 662 | 14% | 0% | 26 |
4 | Electrochemistry | 216 | 10% | 0% | 18 |
5 | Nanoscience & Nanotechnology | 142 | 10% | 0% | 19 |
6 | Physics, Condensed Matter | 89 | 13% | 0% | 25 |
7 | Instruments & Instrumentation | 39 | 5% | 0% | 10 |
8 | Materials Science, Multidisciplinary | 26 | 12% | 0% | 22 |
9 | Engineering, Manufacturing | 11 | 2% | 0% | 3 |
10 | Nuclear Science & Technology | 1 | 2% | 0% | 3 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | CHAIR SEMICOND CPDS | 162423 | 1% | 100% | 1 |
2 | DEVICE CHARACTERIZAT | 162423 | 1% | 100% | 1 |
3 | OVENS | 162423 | 1% | 100% | 1 |
4 | SEMICOND PROC PROGRAM | 162423 | 1% | 100% | 1 |
5 | PROC MODULE DEV | 162421 | 1% | 50% | 2 |
6 | PHYS ENERGY HARVEST | 81210 | 1% | 50% | 1 |
7 | TAIWAN SEMICOND MFG CO | 81210 | 1% | 50% | 1 |
8 | MEMORY RD | 44202 | 4% | 4% | 7 |
9 | ELECT COMP ENGN MICROELE | 40604 | 1% | 25% | 1 |
10 | NXP TSMC | 40604 | 1% | 25% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 19823 | 23% | 0% | 43 |
2 | IEEE ELECTRON DEVICE LETTERS | 8729 | 12% | 0% | 22 |
3 | SHARP TECHNICAL JOURNAL | 4059 | 1% | 3% | 1 |
4 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1549 | 9% | 0% | 17 |
5 | SOLID-STATE ELECTRONICS | 1324 | 5% | 0% | 9 |
6 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 930 | 2% | 0% | 3 |
7 | ALTA FREQUENZA | 895 | 1% | 1% | 1 |
8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 614 | 4% | 0% | 8 |
9 | ELECTRON DEVICE LETTERS | 538 | 1% | 0% | 1 |
10 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 414 | 5% | 0% | 9 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | CROSS KELVIN RESISTOR CKR | 649690 | 2% | 100% | 4 | Search CROSS+KELVIN+RESISTOR+CKR | Search CROSS+KELVIN+RESISTOR+CKR |
2 | CROSS BRIDGE KELVIN RESISTOR CBKR | 519751 | 2% | 80% | 4 | Search CROSS+BRIDGE+KELVIN+RESISTOR+CBKR | Search CROSS+BRIDGE+KELVIN+RESISTOR+CBKR |
3 | POLYMETAL | 487268 | 2% | 100% | 3 | Search POLYMETAL | Search POLYMETAL |
4 | POLYMETAL GATE | 365449 | 2% | 75% | 3 | Search POLYMETAL+GATE | Search POLYMETAL+GATE |
5 | CROSS BRIDGE KELVIN RESISTORS | 324845 | 1% | 100% | 2 | Search CROSS+BRIDGE+KELVIN+RESISTORS | Search CROSS+BRIDGE+KELVIN+RESISTORS |
6 | DIFFUSION BARRIER METAL | 324845 | 1% | 100% | 2 | Search DIFFUSION+BARRIER+METAL | Search DIFFUSION+BARRIER+METAL |
7 | DUAL POLYMETAL GATE | 324845 | 1% | 100% | 2 | Search DUAL+POLYMETAL+GATE | Search DUAL+POLYMETAL+GATE |
8 | LOW RESISTIVITY TUNGSTEN | 324845 | 1% | 100% | 2 | Search LOW+RESISTIVITY+TUNGSTEN | Search LOW+RESISTIVITY+TUNGSTEN |
9 | W WNX POLY SI | 324845 | 1% | 100% | 2 | Search W+WNX+POLY+SI | Search W+WNX+POLY+SI |
10 | 50 NM NMOSFET | 162423 | 1% | 100% | 1 | Search 50+NM+NMOSFET | Search 50+NM+NMOSFET |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | GUDMUNDSSON, V , HELLSTROM, PE , OSTLING, M , (2012) ERROR PROPAGATION IN CONTACT RESISTIVITY EXTRACTION USING CROSS-BRIDGE KELVIN RESISTORS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 59. ISSUE 6. P. 1585-1591 | 15 | 94% | 4 |
2 | SRIRAM, S , BHASKARAN, M , REEVES, GK , HOLLAND, AS , (2009) ANALYTICAL AND FINITE-ELEMENT MODELING OF A CROSS KELVIN RESISTOR TEST STRUCTURE FOR LOW SPECIFIC CONTACT RESISTIVITY.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 56. ISSUE 10. P. 2250 -2254 | 9 | 90% | 5 |
3 | SUNG, MG , KIM, YS , KIM, SJ , JEONG, IK , CHOI, HS , KIM, MS , KIM, H , PARK, SK , (2012) LOW RESISTIVE TUNGSTEN DUAL POLY-METAL GATES WITH MULTI-DIFFUSION BARRIER METALS IN HIGH PERFORMANCE MEMORY DEVICES.SOLID-STATE ELECTRONICS. VOL. 69. ISSUE . P. 22 -26 | 9 | 82% | 1 |
4 | SUNG, MG , PARK, SK , ALI, AI , KIM, YS , (2013) OPTIMIZATION OF TUNGSTEN DUAL POLY-METAL GATES IN MEMORY DEVICES WITH TI/WN/WSIN BARRIER METAL.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY. VOL. 13. ISSUE 9. P. 6455-6458 | 10 | 71% | 0 |
5 | BHASKARAN, M , SRIRAM, S , HOLLAND, AS , (2010) INTERFACIAL RESISTIVE PROPERTIES OF NICKEL SILICIDE THIN FILMS TO DOPED SILICON.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 157. ISSUE 8. P. H842 -H846 | 9 | 69% | 3 |
6 | STAVITSKI, N , KLOOTWIJK, JH , VAN ZEIJL, HW , KOVALGIN, AY , WOLTERS, RAM , (2009) CROSS-BRIDGE KELVIN RESISTOR STRUCTURES FOR RELIABLE MEASUREMENT OF LOW CONTACT RESISTANCES AND CONTACT INTERFACE CHARACTERIZATION.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING. VOL. 22. ISSUE 1. P. 146-152 | 7 | 88% | 15 |
7 | OUSSALAH, S , DJEZZAR, B , JERISIAN, R , (2005) A COMPARATIVE STUDY OF DIFFERENT CONTACT RESISTANCE TEST STRUCTURES DEDICATED TO THE POWER PROCESS TECHNOLOGY.SOLID-STATE ELECTRONICS. VOL. 49. ISSUE 10. P. 1617 -1622 | 7 | 100% | 6 |
8 | SANTANDER, J , LOZANO, M , COLLADO, A , ULLAN, M , CABRUJA, E , (2000) ACCURATE CONTACT RESISTIVITY EXTRACTION ON KELVIN STRUCTURES WITH UPPER AND LOWER RESISTIVE LAYERS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 47. ISSUE 7. P. 1431 -1439 | 8 | 100% | 13 |
9 | KOVALGIN, AY , TIGGELMAN, N , WOLTERS, RAM , (2012) AN AREA-CORRECTION MODEL FOR ACCURATE EXTRACTION OF LOW SPECIFIC CONTACT RESISTANCE.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 59. ISSUE 2. P. 426-432 | 11 | 50% | 2 |
10 | HOLLAND, AS , REEVES, GK , LEECH, PW , (2004) UNIVERSAL ERROR CORRECTIONS FOR FINITE SEMICONDUCTOR RESISTIVITY IN CROSS-KELVIN RESISTOR TEST STRUCTURES.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 51. ISSUE 6. P. 914-919 | 7 | 88% | 14 |
Classes with closest relation at Level 1 |