Class information for:
Level 1: NICKEL SILICIDE//NISI//NI SILICIDE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
4634 1751 20.8 64%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
746 2             BETA FESI2//SILICIDES//SERIES RESISTANCE 12475
4634 1                   NICKEL SILICIDE//NISI//NI SILICIDE 1751

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 NICKEL SILICIDE authKW 863121 6% 50% 100
2 NISI authKW 643636 4% 56% 66
3 NI SILICIDE authKW 479143 3% 60% 46
4 SILICIDES authKW 274453 8% 11% 143
5 COSI2 authKW 263700 2% 46% 33
6 COBALT SILICIDE authKW 210026 2% 38% 32
7 SALICIDE authKW 132555 1% 36% 21
8 FULL SILICIDATION authKW 122060 0% 100% 7
9 GERMANOSILICIDE authKW 117696 1% 75% 9
10 SILICIDATION authKW 117678 1% 38% 18

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Physics, Applied 18371 65% 0% 1133
2 Materials Science, Coatings & Films 9798 17% 0% 303
3 Physics, Condensed Matter 2776 22% 0% 390
4 Nanoscience & Nanotechnology 2497 13% 0% 236
5 Materials Science, Multidisciplinary 2399 28% 0% 488
6 Engineering, Electrical & Electronic 2124 22% 0% 388
7 Optics 460 8% 0% 142
8 Metallurgy & Metallurgical Engineering 357 6% 0% 100
9 Electrochemistry 207 4% 0% 62
10 Microscopy 141 1% 0% 19

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 VAKGROEP VASTE STOFWETEN PEN 89675 0% 86% 6
2 VAKGRP VASTE STOFWETEN PEN 71196 0% 58% 7
3 MIKROELEKT ZENTRUM A 69748 0% 100% 4
4 IM2NP 52176 3% 6% 47
5 KRISTALLOG STUDIE VASTE STOF 48432 0% 56% 5
6 VAKGRP VASTE STOF WETEN PEN 39232 0% 75% 3
7 NAKA TORY 34874 0% 100% 2
8 TEXAS RUMENTS 31131 0% 36% 5
9 TSMC 30995 0% 44% 4
10 CNRS UPR 5001 23248 0% 67% 2

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 MICROELECTRONIC ENGINEERING 32169 8% 1% 137
2 THIN SOLID FILMS 7617 7% 0% 127
3 JOURNAL OF APPLIED PHYSICS 7535 12% 0% 217
4 IEEE ELECTRON DEVICE LETTERS 6657 3% 1% 59
5 APPLIED PHYSICS LETTERS 4175 9% 0% 166
6 ELECTROCHEMICAL AND SOLID STATE LETTERS 3870 2% 1% 31
7 APPLIED SURFACE SCIENCE 2688 4% 0% 75
8 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 1999 3% 0% 60
9 JOURNAL OF THE KOREAN INSTITUTE OF METALS AND MATERIALS 1962 0% 2% 6
10 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 1694 2% 0% 41

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 NICKEL SILICIDE 863121 6% 50% 100 Search NICKEL+SILICIDE Search NICKEL+SILICIDE
2 NISI 643636 4% 56% 66 Search NISI Search NISI
3 NI SILICIDE 479143 3% 60% 46 Search NI+SILICIDE Search NI+SILICIDE
4 SILICIDES 274453 8% 11% 143 Search SILICIDES Search SILICIDES
5 COSI2 263700 2% 46% 33 Search COSI2 Search COSI2
6 COBALT SILICIDE 210026 2% 38% 32 Search COBALT+SILICIDE Search COBALT+SILICIDE
7 SALICIDE 132555 1% 36% 21 Search SALICIDE Search SALICIDE
8 FULL SILICIDATION 122060 0% 100% 7 Search FULL+SILICIDATION Search FULL+SILICIDATION
9 GERMANOSILICIDE 117696 1% 75% 9 Search GERMANOSILICIDE Search GERMANOSILICIDE
10 SILICIDATION 117678 1% 38% 18 Search SILICIDATION Search SILICIDATION

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 ZHANG, SL , OSTLING, M , (2003) METAL SILICIDES IN CMOS TECHNOLOGY: PAST, PRESENT, AND FUTURE TRENDS.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 28. ISSUE 1. P. 1 -129 161 34% 212
2 LAVOIE, C , DETAVERNIER, C , CABRAL, C , D'HEURLE, FM , KELLOCK, AJ , JORDAN-SWEET, J , HARPER, JME , (2006) EFFECTS OF ADDITIVE ELEMENTS ON THE PHASE FORMATION AND MORPHOLOGICAL STABILITY OF NICKEL MONOSILICIDE FILMS.MICROELECTRONIC ENGINEERING. VOL. 83. ISSUE 11-12. P. 2042-2054 57 79% 70
3 DE SCHUTTER, B , DE KEYSER, K , LAVOIE, C , DETAVERNIER, C , (2016) TEXTURE IN THIN FILM SILICIDES AND GERMANIDES: A REVIEW.APPLIED PHYSICS REVIEWS. VOL. 3. ISSUE 3. P. - 71 53% 0
4 LAVOIE, C , D'HEURLE, FM , DETAVERNIER, C , CABRAL, C , (2003) TOWARDS IMPLEMENTATION OF A NICKEL SILICIDE PROCESS FOR CMOS TECHNOLOGIES.MICROELECTRONIC ENGINEERING. VOL. 70. ISSUE 2-4. P. 144 -157 41 72% 260
5 MANGELINCK, D , HOUMMADA, K , PANCIERA, F , EL KOUSSEIFI, M , BLUM, I , DESCOINS, M , BERTOGLIO, M , PORTAVOCE, A , PERRIN, C , PUTERO, M , (2014) PROGRESS IN THE UNDERSTANDING OF NI SILICIDE FORMATION FOR ADVANCED MOS STRUCTURES.PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. VOL. 211. ISSUE 1. P. 152-165 38 75% 4
6 VANTOMME, A , TEMST, K , DETAVERNIER, C , KNAEPEN, W , VAN BOCKSTAEL, C , COMRIE, CM , SMEETS, D , DEMEULEMEESTER, J , (2010) THE INFLUENCE OF PT REDISTRIBUTION ON NI1-XPTXSI GROWTH PROPERTIES.JOURNAL OF APPLIED PHYSICS. VOL. 108. ISSUE 4. P. - 30 88% 12
7 PIAO, YH , ZHU, ZW , GAO, XD , KARABKO, A , HU, C , QIU, ZJ , LUO, J , ZHANG, ZB , ZHANG, SL , WU, DP , (2012) EXTENSIVE RAMAN SPECTROSCOPIC INVESTIGATION OF ULTRATHIN CO1-XNIXSI2 FILMS GROWN ON SI(100).JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 30. ISSUE 4. P. - 27 96% 1
8 SMEETS, D , DEMEULEMEESTER, J , DE KEYSER, K , DEDUYTSCHE, D , DETAVERNIER, C , COMRIE, CM , THERON, CC , LAVOIE, C , VANTOMME, A , (2008) NUCLEATION AND DIFFUSION DURING GROWTH OF TERNARY CO1-XNIXSI2 THIN FILMS STUDIED BY COMPLEMENTARY TECHNIQUES IN REAL TIME.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 9. P. - 29 94% 5
9 LIU, QB , WANG, GL , GUO, YL , KE, XX , LIU, H , ZHAO, C , LUO, J , (2015) OPTIMIZATION OF A TWO-STEP NI(5% PT) GERMANOSILICIDATION PROCESS AND THE REDISTRIBUTION OF PT IN NI(PT)SI1-XGEX GERMANOSILICIDE.VACUUM. VOL. 111. ISSUE . P. 114 -118 23 96% 2
10 DEMEULEMEESTER, J , SMEETS, D , COMRIE, CM , BARRADAS, NP , VIEIRA, A , VAN BOCKSTAEL, C , DETAVERNIER, C , TEMST, K , VANTOMME, A , (2013) ON THE GROWTH KINETICS OF NI(PT) SILICIDE THIN FILMS.JOURNAL OF APPLIED PHYSICS. VOL. 113. ISSUE 16. P. - 27 87% 1

Classes with closest relation at Level 1


Rank Class id link
1 3226 TISI2//TITANIUM SILICIDE//SALICIDE
2 26250 SILICIDE NANOWIRES//NICKEL SUICIDE//POINT CONTACT REACTIONS
3 5736 SURFACE MAGNETO OPTIC KERR EFFECT//VALENCE BAND DENSITY OF STATES//SILICIDES
4 20525 SCHOTTKY BARRIER SB//SCHOTTKY BARRIER MOSFET//DOPANT SEGREGATION
5 22649 W TI THIN FILMS//W 10TI ALLOY//W 10WTTI ALLOY
6 19107 LASER MOL BEAM EPITAXY//PTSI//INTERNAL PHOTOEMISSION EFFECT
7 29312 CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL
8 37369 BOUNDARY CONDITIONS FOR DIFFUSION//RATE OF FREE ENERGY CHANGE//MO NB ALLOY SINGLE CRYSTAL
9 25901 KIRKENDALL EFFECT//BIOMAGNETIC SENSOR//CHIM INTERACT PLASMA SUR E CHIPS CIRM
10 14980 ERBIUM SILICIDE//YTTRIUM SILICIDE//RARE EARTH SILICIDES

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