Class information for:
Level 1: TISI2//TITANIUM SILICIDE//SALICIDE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
3226 2033 18.4 56%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
746 2             BETA FESI2//SILICIDES//SERIES RESISTANCE 12475
3226 1                   TISI2//TITANIUM SILICIDE//SALICIDE 2033

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 TISI2 authKW 522140 3% 63% 55
2 TITANIUM SILICIDE authKW 220207 2% 33% 44
3 SALICIDE authKW 103547 1% 34% 20
4 C54 authKW 81762 0% 78% 7
5 SELF ALIGNED SILICIDE authKW 80091 0% 67% 8
6 SILICIDES authKW 61520 4% 6% 73
7 ELE NANO DEVICE address 60072 0% 100% 4
8 INTERFACIAL SOLID PHASE REACTION authKW 60072 0% 100% 4
9 ZR SILICIDE authKW 45054 0% 100% 3
10 TITANIUM DISILICIDE authKW 38435 0% 32% 8

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Materials Science, Coatings & Films 23105 24% 0% 497
2 Physics, Applied 23099 67% 0% 1366
3 Physics, Condensed Matter 3470 23% 0% 468
4 Engineering, Electrical & Electronic 2447 22% 0% 449
5 Materials Science, Multidisciplinary 1629 22% 0% 453
6 Electrochemistry 1502 8% 0% 159
7 Nanoscience & Nanotechnology 908 8% 0% 163
8 Nuclear Science & Technology 70 3% 0% 51
9 Instruments & Instrumentation 68 3% 0% 55
10 Chemistry, Physical 54 7% 0% 141

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ELE NANO DEVICE 60072 0% 100% 4
2 LSI PROD 22524 0% 50% 3
3 IMETEM 18437 1% 8% 15
4 CHEM TECHNOL ELE 15018 0% 100% 1
5 CIENCIAS FIS LICADA CXII 15018 0% 100% 1
6 CLEANING PROC DEV 15018 0% 100% 1
7 COMMUN CNET STMICROELECT 15018 0% 100% 1
8 CRYSTAL MICROSTRUCT GRP 15018 0% 100% 1
9 CSIC CIENCIA MAT B 15018 0% 100% 1
10 DELCO ELE 15018 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF APPLIED PHYSICS 14373 16% 0% 321
2 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 11551 8% 1% 153
3 THIN SOLID FILMS 10573 8% 0% 161
4 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 9630 5% 1% 104
5 IEEE TRANSACTIONS ON ELECTRON DEVICES 5903 4% 1% 78
6 APPLIED SURFACE SCIENCE 4402 5% 0% 103
7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 3855 3% 0% 61
8 IEEE ELECTRON DEVICE LETTERS 3455 2% 1% 46
9 APPLIED PHYSICS LETTERS 2872 7% 0% 150
10 VIDE-SCIENCE TECHNIQUE ET APPLICATIONS 2511 0% 2% 9

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 TISI2 522140 3% 63% 55 Search TISI2 Search TISI2
2 TITANIUM SILICIDE 220207 2% 33% 44 Search TITANIUM+SILICIDE Search TITANIUM+SILICIDE
3 SALICIDE 103547 1% 34% 20 Search SALICIDE Search SALICIDE
4 C54 81762 0% 78% 7 Search C54 Search C54
5 SELF ALIGNED SILICIDE 80091 0% 67% 8 Search SELF+ALIGNED+SILICIDE Search SELF+ALIGNED+SILICIDE
6 SILICIDES 61520 4% 6% 73 Search SILICIDES Search SILICIDES
7 INTERFACIAL SOLID PHASE REACTION 60072 0% 100% 4 Search INTERFACIAL+SOLID+PHASE+REACTION Search INTERFACIAL+SOLID+PHASE+REACTION
8 ZR SILICIDE 45054 0% 100% 3 Search ZR+SILICIDE Search ZR+SILICIDE
9 TITANIUM DISILICIDE 38435 0% 32% 8 Search TITANIUM+DISILICIDE Search TITANIUM+DISILICIDE
10 TI SILICIDE 37540 0% 50% 5 Search TI+SILICIDE Search TI+SILICIDE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 MAEX, K , (1993) SILICIDES FOR INTEGRATED-CIRCUITS - TISI2 AND COSI2.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 11. ISSUE 2-3. P. 53 -153 95 63% 278
2 SAITO, T , OSHIMA, K , SHIMOGAKI, Y , EGASHIRA, Y , SUGAWARA, K , TAKAHIRO, K , NAGATA, S , YAMAGUCHI, S , KOMIYAMA, H , (2012) LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION OF SILICON-RICH TUNGSTEN SILICIDE FILMS FROM TUNGSTEN HEXAFLUORIDE - DISILANE PRE-ACTIVATED MIXTURES.INTERNATIONAL JOURNAL OF CHEMICAL REACTOR ENGINEERING. VOL. 10. ISSUE . P. - 29 76% 0
3 OZCAN, AS , LUDWIG, KF , LAVOIE, C , BASU, SN , COIA, C , CABRAL, C , RODBELL, KP , HARPER, JME , (2004) EVOLUTION OF MICROSTRUCTURE IN TI-TA BILAYER THIN FILMS ON POLYCRYSTALLINE-SI AND SI(001).THIN SOLID FILMS. VOL. 466. ISSUE 1-2. P. 238 -249 25 96% 0
4 ENGQVIST, J , JANSSON, U , LU, J , CARLSSON, JO , (1994) C49/C54 PHASE-TRANSFORMATION DURING CHEMICAL-VAPOR-DEPOSITION OF TISI2.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 12. ISSUE 1. P. 161 -168 35 95% 13
5 IRELAND, PJ , (1997) HIGH ASPECT RATIO CONTACTS: A REVIEW OF THE CURRENT TUNGSTEN PLUG PROCESS.THIN SOLID FILMS. VOL. 304. ISSUE 1-2. P. 1-12 60 47% 39
6 HARPER, JME , CABRAL, C , LAVOIE, C , (2000) MECHANISMS FOR ENHANCED FORMATION OF THE C54 PHASE OF TITANIUM SILICIDE ULTRA-LARGE-SCALE INTEGRATION CONTACTS.ANNUAL REVIEW OF MATERIALS SCIENCE. VOL. 30. ISSUE . P. 523 -543 28 88% 20
7 CHOW, TP , STECKL, AJ , (1983) REFRACTORY-METAL SILICIDES - THIN-FILM PROPERTIES AND PROCESSING TECHNOLOGY.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 30. ISSUE 11. P. 1480 -1497 57 84% 112
8 KU, YH , LEE, SK , KWONG, DL , (1990) THE APPLICATION OF ION-BEAM MIXING, DOPED SILICIDE, AND RAPID THERMAL-PROCESSING TO SELF-ALIGNED SILICIDE TECHNOLOGY.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 137. ISSUE 2. P. 728-740 46 79% 11
9 CHAIX-PLUCHERY, O , CHENEVIER, B , MATKO, I , SENATEUR, JP , LA VIA, F , (2004) INVESTIGATIONS OF TRANSIENT PHASE FORMATION IN TI/SI THIN FILM REACTION.JOURNAL OF APPLIED PHYSICS. VOL. 96. ISSUE 1. P. 361-368 24 89% 8
10 MILOSAVLJEVIC, M , BIBIC, N , PERUSKO, D , JEYNES, C , BANGERT, U , (2000) THE EFFECTS OF IMPLANTED ARSENIC ON TI-SILICIDE FORMATION.SOLID STATE PHENOMENA. VOL. 71. ISSUE . P. 147 -171 33 73% 1

Classes with closest relation at Level 1


Rank Class id link
1 4634 NICKEL SILICIDE//NISI//NI SILICIDE
2 22649 W TI THIN FILMS//W 10TI ALLOY//W 10WTTI ALLOY
3 29312 CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL
4 5736 SURFACE MAGNETO OPTIC KERR EFFECT//VALENCE BAND DENSITY OF STATES//SILICIDES
5 16292 CVD W//TUNGSTEN THIN FILMS//CVD IRON
6 19107 LASER MOL BEAM EPITAXY//PTSI//INTERNAL PHOTOEMISSION EFFECT
7 26250 SILICIDE NANOWIRES//NICKEL SUICIDE//POINT CONTACT REACTIONS
8 14980 ERBIUM SILICIDE//YTTRIUM SILICIDE//RARE EARTH SILICIDES
9 29679 MEMS POST PROCESSING//AE STZI SENSORTECHNOL ZENTRUM//ALUMINIUM INTERCONNECTS
10 20135 EMBEDDED RESISTOR//RESISTIVE FILMS//THIN FILM RESISTOR

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