Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
20525 | 456 | 18.7 | 63% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
746 | 2 | BETA FESI2//SILICIDES//SERIES RESISTANCE | 12475 |
20525 | 1 | SCHOTTKY BARRIER SB//SCHOTTKY BARRIER MOSFET//DOPANT SEGREGATION | 456 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | SCHOTTKY BARRIER SB | authKW | 1220375 | 6% | 68% | 27 |
2 | SCHOTTKY BARRIER MOSFET | authKW | 753321 | 3% | 75% | 15 |
3 | DOPANT SEGREGATION | authKW | 718488 | 6% | 41% | 26 |
4 | DOPANT SEGREGATION DS | authKW | 690764 | 3% | 74% | 14 |
5 | SCHOTTKY BARRIER SB MOSFET | authKW | 476176 | 2% | 89% | 8 |
6 | SCHOTTKY MOSFET | authKW | 344377 | 1% | 86% | 6 |
7 | SCHOTTKY BARRIER SB LOWERING | authKW | 334813 | 1% | 100% | 5 |
8 | SCHOTTKY SOURCE DRAIN MOSFET | authKW | 334813 | 1% | 100% | 5 |
9 | SCHOTTKY BARRIER | authKW | 294775 | 16% | 6% | 73 |
10 | METAL SOURCE DRAIN | authKW | 279009 | 1% | 83% | 5 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 4412 | 62% | 0% | 284 |
2 | Engineering, Electrical & Electronic | 4086 | 55% | 0% | 251 |
3 | Nanoscience & Nanotechnology | 552 | 13% | 0% | 57 |
4 | Physics, Condensed Matter | 383 | 17% | 0% | 77 |
5 | Materials Science, Multidisciplinary | 104 | 14% | 0% | 63 |
6 | Optics | 47 | 6% | 0% | 26 |
7 | Materials Science, Coatings & Films | 41 | 3% | 0% | 12 |
8 | Physics, Multidisciplinary | 34 | 6% | 0% | 26 |
9 | Nuclear Science & Technology | 0 | 1% | 0% | 5 |
10 | Physics, Nuclear | 0 | 1% | 0% | 5 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ADV I MEMS TEAM | 214278 | 1% | 80% | 4 |
2 | TECHNOL FDN GRP | 133925 | 0% | 100% | 2 |
3 | BIO NANOSYST IBNI | 89282 | 0% | 67% | 2 |
4 | U TERMINAL TEAM | 89282 | 0% | 67% | 2 |
5 | NANOELECT DEVICE TEAM | 86091 | 1% | 43% | 3 |
6 | SEMICOND BASIC | 76523 | 1% | 29% | 4 |
7 | SILICON NANO DEVICE | 75299 | 4% | 6% | 18 |
8 | BIO NANSYSTIBN I | 66963 | 0% | 100% | 1 |
9 | CENT ANALYT CHEM ZHC | 66963 | 0% | 100% | 1 |
10 | EXPLORATORY TECHNOL DEV | 66963 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE ELECTRON DEVICE LETTERS | 38596 | 16% | 1% | 72 |
2 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 22236 | 16% | 0% | 71 |
3 | SOLID-STATE ELECTRONICS | 4927 | 6% | 0% | 27 |
4 | MICROELECTRONIC ENGINEERING | 4099 | 5% | 0% | 25 |
5 | IEEE TRANSACTIONS ON NANOTECHNOLOGY | 1827 | 2% | 0% | 7 |
6 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 1402 | 3% | 0% | 13 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS | 1346 | 4% | 0% | 18 |
8 | APPLIED PHYSICS LETTERS | 1075 | 9% | 0% | 43 |
9 | SUPERLATTICES AND MICROSTRUCTURES | 661 | 2% | 0% | 8 |
10 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 601 | 4% | 0% | 17 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SCHOTTKY BARRIER SB | 1220375 | 6% | 68% | 27 | Search SCHOTTKY+BARRIER+SB | Search SCHOTTKY+BARRIER+SB |
2 | SCHOTTKY BARRIER MOSFET | 753321 | 3% | 75% | 15 | Search SCHOTTKY+BARRIER+MOSFET | Search SCHOTTKY+BARRIER+MOSFET |
3 | DOPANT SEGREGATION | 718488 | 6% | 41% | 26 | Search DOPANT+SEGREGATION | Search DOPANT+SEGREGATION |
4 | DOPANT SEGREGATION DS | 690764 | 3% | 74% | 14 | Search DOPANT+SEGREGATION+DS | Search DOPANT+SEGREGATION+DS |
5 | SCHOTTKY BARRIER SB MOSFET | 476176 | 2% | 89% | 8 | Search SCHOTTKY+BARRIER+SB+MOSFET | Search SCHOTTKY+BARRIER+SB+MOSFET |
6 | SCHOTTKY MOSFET | 344377 | 1% | 86% | 6 | Search SCHOTTKY+MOSFET | Search SCHOTTKY+MOSFET |
7 | SCHOTTKY BARRIER SB LOWERING | 334813 | 1% | 100% | 5 | Search SCHOTTKY+BARRIER+SB+LOWERING | Search SCHOTTKY+BARRIER+SB+LOWERING |
8 | SCHOTTKY SOURCE DRAIN MOSFET | 334813 | 1% | 100% | 5 | Search SCHOTTKY+SOURCE+DRAIN+MOSFET | Search SCHOTTKY+SOURCE+DRAIN+MOSFET |
9 | SCHOTTKY BARRIER | 294775 | 16% | 6% | 73 | Search SCHOTTKY+BARRIER | Search SCHOTTKY+BARRIER |
10 | METAL SOURCE DRAIN | 279009 | 1% | 83% | 5 | Search METAL+SOURCE+DRAIN | Search METAL+SOURCE+DRAIN |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | LARSON, JM , SNYDER, JP , (2006) OVERVIEW AND STATUS OF METAL S/D SCHOTTKY-BARRIER MOSFET TECHNOLOGY.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 53. ISSUE 5. P. 1048-1058 | 33 | 92% | 251 |
2 | MARTIN, MJ , PASCUAL, E , RENGEL, R , (2012) RF DYNAMIC AND NOISE PERFORMANCE OF METALLIC SOURCE/DRAIN SOI N-MOSFETS.SOLID-STATE ELECTRONICS. VOL. 73. ISSUE . P. 64 -73 | 35 | 64% | 3 |
3 | MARTIN-MARTINEZ, MJ , COUSO, C , PASCUAL, E , RENGEL, R , (2014) MONTE CARLO STUDY OF DOPANT-SEGREGATED SCHOTTKY BARRIER SOI MOSFETS: ENHANCEMENT OF THE RF PERFORMANCE.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 61. ISSUE 12. P. 3955 -3961 | 25 | 78% | 3 |
4 | SHIH, CH , YEH, SP , (2008) DEVICE CONSIDERATIONS AND DESIGN OPTIMIZATIONS FOR DOPANT SEGREGATED SCHOTTKY BARRIER MOSFETS.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 23. ISSUE 12. P. - | 22 | 92% | 5 |
5 | ZHU, GJ , ZHOU, X , CHIN, YK , PEY, KL , ZHANG, JB , SEE, GH , LIN, SH , YAN, YF , CHEN, ZH , (2010) SUBCIRCUIT COMPACT MODEL FOR DOPANT-SEGREGATED SCHOTTKY GATE-ALL-AROUND SI-NANOWIRE MOSFETS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 57. ISSUE 4. P. 772-781 | 23 | 79% | 13 |
6 | CHANG, W , SHIH, CH , LUO, YX , WU, WF , LIEN, C , (2014) DRAIN-INDUCED SCHOTTKY BARRIER SOURCE-SIDE HOT CARRIERS AND ITS APPLICATION TO PROGRAM LOCAL BITS OF NANOWIRE CHARGE-TRAPPING MEMORIES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 53. ISSUE 9. P. - | 20 | 83% | 1 |
7 | LUO, J , QIU, ZJ , ZHANG, Z , OSTLING, M , ZHANG, SL , (2010) INTERACTION OF NISI WITH DOPANTS FOR METALLIC SOURCE/DRAIN APPLICATIONS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 28. ISSUE 1. P. C1I1 -C1I11 | 31 | 53% | 0 |
8 | LIM, PSY , CHI, DZ , LIM, PC , YEO, YC , (2012) MODULATION OF EFFECTIVE SCHOTTKY BARRIER HEIGHT OF NICKEL SILICIDE ON SILICON USING PRE-SILICIDE AMMONIUM SULFIDE TREATMENT.JOURNAL OF APPLIED PHYSICS. VOL. 111. ISSUE 7. P. - | 19 | 76% | 3 |
9 | TONG, Y , HAN, GQ , LIU, B , YANG, Y , WANG, LX , WANG, W , YEO, YC , (2013) NI(GE1-XSNX) OHMIC CONTACT FORMATION ON N-TYPE GE1-XSNX USING SELENIUM OR SULFUR IMPLANT AND SEGREGATION.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 60. ISSUE 2. P. 746 -752 | 19 | 70% | 10 |
10 | JHAVERI, R , NAGAVARAPU, V , WOO, JCS , (2009) ASYMMETRIC SCHOTTKY TUNNELING SOURCE SOI MOSFET DESIGN FOR MIXED-MODE APPLICATIONS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 56. ISSUE 1. P. 93-99 | 18 | 78% | 27 |
Classes with closest relation at Level 1 |