Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
671 | 13252 | 20.3 | 68% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
628 | 3 | SILICON CARBIDE//4H SIC//SIC | 13252 |
671 | 2 | SILICON CARBIDE//4H SIC//SIC | 13252 |
2541 | 1 | MICROPIPE//SUBLIMATION GROWTH//SEMICONDUCTING SILICON COMPOUNDS | 2213 |
2631 | 1 | PHYS MEASUREMENT TECHNOL//MATERIALS SCIENCE FORUM//4H SIC | 2191 |
5206 | 1 | SIC NANOWIRES//SILICON CARBIDE NANOWIRES//CARBOTHERMAL REDUCTION | 1657 |
5987 | 1 | 4H SIC//CHANNEL MOBILITY//SIO2 SIC INTERFACE | 1547 |
7015 | 1 | 3C SIC//MONOMETHYLSILANE//FG NANOTECHNOL | 1415 |
7583 | 1 | SICF SIC COMPOSITES//SIC SIC COMPOSITE//ADV ENERGY | 1351 |
9042 | 1 | OHMIC CONTACT//4H SIC//EDGE TERMINATION | 1193 |
15708 | 1 | SIMA//HEXAGONAL SURFACES//SIC0001 | 697 |
23247 | 1 | METHYLTRICHLOROSILANE//HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION//ADV FIB COMPOSIT | 353 |
24234 | 1 | MESFET//4H SIC MESFET//SIC MESFET | 319 |
26620 | 1 | ELECTRON BEAM ANNEALING//RAFTER//ION BEAM SYNTHESIS | 250 |
37133 | 1 | SICGE//SI 6H SIC HETEROJUNCTION//SI 6H SIC | 66 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | SILICON CARBIDE | authKW | 1344849 | 12% | 36% | 1633 |
2 | 4H SIC | authKW | 899875 | 4% | 82% | 477 |
3 | SIC | authKW | 716678 | 8% | 31% | 1015 |
4 | MATERIALS SCIENCE FORUM | journal | 419964 | 13% | 10% | 1785 |
5 | 3C SIC | authKW | 374440 | 1% | 82% | 198 |
6 | 6H SIC | authKW | 328376 | 1% | 72% | 197 |
7 | MICROPIPE | authKW | 221061 | 1% | 87% | 110 |
8 | PHYS MEASUREMENT TECHNOL | address | 166571 | 3% | 21% | 338 |
9 | SILICON CARBIDE SIC | authKW | 160363 | 1% | 44% | 158 |
10 | SEMICONDUCTING SILICON COMPOUNDS | authKW | 127116 | 1% | 54% | 103 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Multidisciplinary | 42973 | 41% | 0% | 5388 |
2 | Physics, Applied | 42824 | 37% | 0% | 4969 |
3 | Physics, Condensed Matter | 23382 | 23% | 0% | 3096 |
4 | Materials Science, Coatings & Films | 23122 | 10% | 1% | 1310 |
5 | Materials Science, Characterization, Testing | 17483 | 5% | 1% | 620 |
6 | Nuclear Science & Technology | 6595 | 7% | 0% | 959 |
7 | Engineering, Electrical & Electronic | 6387 | 15% | 0% | 1999 |
8 | Materials Science, Ceramics | 4447 | 4% | 0% | 526 |
9 | Crystallography | 3278 | 5% | 0% | 645 |
10 | Nanoscience & Nanotechnology | 1879 | 5% | 0% | 661 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | PHYS MEASUREMENT TECHNOL | 166571 | 3% | 21% | 338 |
2 | ADV POWER DEVICE | 55340 | 0% | 96% | 25 |
3 | ETUD SEMICOND GRP | 52586 | 1% | 21% | 110 |
4 | MAT SCI 6 | 48385 | 0% | 38% | 56 |
5 | FG NANOTECHNOL | 38046 | 0% | 72% | 23 |
6 | ULTRA LOW LOSS POWER DEVICE TECHNOL BODY | 37293 | 0% | 90% | 18 |
7 | RD ASSOC FUTURE ELE ON DEVICES | 36506 | 0% | 55% | 29 |
8 | WIDE BAND G SEMICOND MAT DEVICES | 31337 | 1% | 19% | 71 |
9 | MULTIMAT INTER ES | 28938 | 1% | 14% | 90 |
10 | POWER SEMICOND | 28753 | 0% | 50% | 25 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MATERIALS SCIENCE FORUM | 419964 | 13% | 10% | 1785 |
2 | MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 23243 | 2% | 4% | 275 |
3 | JOURNAL OF NUCLEAR MATERIALS | 16812 | 3% | 2% | 387 |
4 | JOURNAL OF CRYSTAL GROWTH | 16348 | 4% | 2% | 480 |
5 | INSTITUTE OF PHYSICS CONFERENCE SERIES | 13321 | 2% | 2% | 241 |
6 | JOURNAL OF ELECTRONIC MATERIALS | 12375 | 2% | 2% | 232 |
7 | JOURNAL OF APPLIED PHYSICS | 10894 | 6% | 1% | 743 |
8 | IEEE ELECTRON DEVICE LETTERS | 10713 | 2% | 2% | 208 |
9 | APPLIED PHYSICS LETTERS | 9736 | 5% | 1% | 718 |
10 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 9505 | 2% | 2% | 256 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SILICON CARBIDE | 1344849 | 12% | 36% | 1633 | Search SILICON+CARBIDE | Search SILICON+CARBIDE |
2 | 4H SIC | 899875 | 4% | 82% | 477 | Search 4H+SIC | Search 4H+SIC |
3 | SIC | 716678 | 8% | 31% | 1015 | Search SIC | Search SIC |
4 | 3C SIC | 374440 | 1% | 82% | 198 | Search 3C+SIC | Search 3C+SIC |
5 | 6H SIC | 328376 | 1% | 72% | 197 | Search 6H+SIC | Search 6H+SIC |
6 | MICROPIPE | 221061 | 1% | 87% | 110 | Search MICROPIPE | Search MICROPIPE |
7 | SILICON CARBIDE SIC | 160363 | 1% | 44% | 158 | Search SILICON+CARBIDE+SIC | Search SILICON+CARBIDE+SIC |
8 | SEMICONDUCTING SILICON COMPOUNDS | 127116 | 1% | 54% | 103 | Search SEMICONDUCTING+SILICON+COMPOUNDS | Search SEMICONDUCTING+SILICON+COMPOUNDS |
9 | SUBLIMATION GROWTH | 121756 | 1% | 77% | 69 | Search SUBLIMATION+GROWTH | Search SUBLIMATION+GROWTH |
10 | SIC NANOWIRES | 82347 | 0% | 62% | 58 | Search SIC+NANOWIRES | Search SIC+NANOWIRES |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | KIMOTO, T , (2015) MATERIAL SCIENCE AND DEVICE PHYSICS IN SIC TECHNOLOGY FOR HIGH-VOLTAGE POWER DEVICES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 54. ISSUE 4. P. - | 213 | 96% | 34 |
2 | WU, RB , ZHOU, K , YUE, CY , WEI, J , PAN, Y , (2015) RECENT PROGRESS IN SYNTHESIS, PROPERTIES AND POTENTIAL APPLICATIONS OF SIC NANOMATERIALS.PROGRESS IN MATERIALS SCIENCE. VOL. 72. ISSUE . P. 1 -60 | 228 | 66% | 38 |
3 | KIMOTO, T , (2016) BULK AND EPITAXIAL GROWTH OF SILICON CARBIDE.PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS. VOL. 62. ISSUE 2. P. 329 -351 | 160 | 99% | 1 |
4 | WANG, ZT , LIU, W , WANG, CQ , (2016) RECENT PROGRESS IN OHMIC CONTACTS TO SILICON CARBIDE FOR HIGH-TEMPERATURE APPLICATIONS.JOURNAL OF ELECTRONIC MATERIALS. VOL. 45. ISSUE 1. P. 267 -284 | 144 | 92% | 3 |
5 | PRESSER, V , NICKEL, KG , (2008) SILICA ON SILICON CARBIDE.CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES. VOL. 33. ISSUE 1. P. 1 -99 | 243 | 59% | 61 |
6 | PEDERSEN, H , LEONE, S , KORDINA, O , HENRY, A , NISHIZAWA, S , KOSHKA, Y , JANZEN, E , (2012) CHLORIDE-BASED CVD GROWTH OF SILICON CARBIDE FOR ELECTRONIC APPLICATIONS.CHEMICAL REVIEWS. VOL. 112. ISSUE 4. P. 2434 -2453 | 129 | 97% | 28 |
7 | LA VIA, F , CAMARDA, M , LA MAGNA, A , (2014) MECHANISMS OF GROWTH AND DEFECT PROPERTIES OF EPITAXIAL SIC.APPLIED PHYSICS REVIEWS. VOL. 1. ISSUE 3. P. - | 129 | 91% | 6 |
8 | KALININA, EV , (2007) THE EFFECT OF IRRADIATION ON THE PROPERTIES OF SIC AND DEVICES BASED ON THIS COMPOUND.SEMICONDUCTORS. VOL. 41. ISSUE 7. P. 745 -783 | 153 | 93% | 13 |
9 | FISSEL, A , (2003) ARTIFICIALLY LAYERED HETEROPOLYTYPIC STRUCTURES BASED ON SIC POLYTYPES: MOLECULAR BEAM EPITAXY, CHARACTERIZATION AND PROPERTIES.PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS. VOL. 379. ISSUE 3-4. P. 149 -255 | 182 | 68% | 120 |
10 | CASADY, JB , JOHNSON, RW , (1996) STATUS OF SILICON CARBIDE (SIC) AS A WIDE-BANDGAP SEMICONDUCTOR FOR HIGH-TEMPERATURE APPLICATIONS: A REVIEW.SOLID-STATE ELECTRONICS. VOL. 39. ISSUE 10. P. 1409-1422 | 117 | 82% | 628 |
Classes with closest relation at Level 2 |