Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
23247 | 353 | 20.5 | 49% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
628 | 3 | SILICON CARBIDE//4H SIC//SIC | 13252 |
671 | 2 | SILICON CARBIDE//4H SIC//SIC | 13252 |
23247 | 1 | METHYLTRICHLOROSILANE//HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION//ADV FIB COMPOSIT | 353 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | METHYLTRICHLOROSILANE | authKW | 288326 | 3% | 33% | 10 |
2 | HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION | authKW | 115334 | 1% | 67% | 2 |
3 | ADV FIB COMPOSIT | address | 86502 | 0% | 100% | 1 |
4 | ANALYSIS OF GASEOUS SPECIES | authKW | 86502 | 0% | 100% | 1 |
5 | AR DILUENT GAS | authKW | 86502 | 0% | 100% | 1 |
6 | CNRS INPT ESA5071 | address | 86502 | 0% | 100% | 1 |
7 | CO DEPOSITED SI | authKW | 86502 | 0% | 100% | 1 |
8 | COMPETITIVE ADSORPTION MODEL | authKW | 86502 | 0% | 100% | 1 |
9 | CVD MECHANISM | authKW | 86502 | 0% | 100% | 1 |
10 | CVD MONITORING | authKW | 86502 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 3797 | 24% | 0% | 84 |
2 | Materials Science, Ceramics | 1750 | 14% | 0% | 50 |
3 | Materials Science, Multidisciplinary | 1066 | 39% | 0% | 139 |
4 | Physics, Applied | 608 | 28% | 0% | 100 |
5 | Electrochemistry | 269 | 8% | 0% | 28 |
6 | Physics, Condensed Matter | 195 | 14% | 0% | 50 |
7 | Crystallography | 187 | 7% | 0% | 24 |
8 | Metallurgy & Metallurgical Engineering | 80 | 6% | 0% | 21 |
9 | METALLURGY & MINING | 78 | 1% | 0% | 2 |
10 | Physics, Multidisciplinary | 60 | 8% | 0% | 27 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ADV FIB COMPOSIT | 86502 | 0% | 100% | 1 |
2 | CNRS INPT ESA5071 | 86502 | 0% | 100% | 1 |
3 | E ORAT MAT ETUD STRUCT OPT ELE | 86502 | 0% | 100% | 1 |
4 | LCTSCNRS | 86502 | 0% | 100% | 1 |
5 | NAT DEF TECHNOL | 86502 | 0% | 100% | 1 |
6 | SPSCEAUB1 | 86502 | 0% | 100% | 1 |
7 | STN C5 | 86502 | 0% | 100% | 1 |
8 | UMRCNRSUJF 5614 | 86502 | 0% | 100% | 1 |
9 | LOE CNRS | 69199 | 1% | 40% | 2 |
10 | CEASAFRAN | 43250 | 0% | 50% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | CHEMICAL VAPOR DEPOSITION | 14681 | 4% | 1% | 13 |
2 | JOURNAL DE PHYSIQUE IV | 3012 | 5% | 0% | 19 |
3 | REVUE INTERNATIONALE DES HAUTES TEMPERATURES ET DES REFRACTAIRES | 1676 | 1% | 1% | 2 |
4 | JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1640 | 5% | 0% | 19 |
5 | SURFACE & COATINGS TECHNOLOGY | 1587 | 5% | 0% | 19 |
6 | HIGH TEMPERATURE AND MATERIALS SCIENCE | 1252 | 0% | 1% | 1 |
7 | THIN SOLID FILMS | 1235 | 7% | 0% | 23 |
8 | JOURNAL OF CRYSTAL GROWTH | 1201 | 6% | 0% | 21 |
9 | JOURNAL OF MATERIALS SCIENCE LETTERS | 1117 | 3% | 0% | 12 |
10 | JOURNAL OF INORGANIC MATERIALS | 971 | 2% | 0% | 7 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | METHYLTRICHLOROSILANE | 288326 | 3% | 33% | 10 | Search METHYLTRICHLOROSILANE | Search METHYLTRICHLOROSILANE |
2 | HIGH TEMPERATURE CHEMICAL VAPOR DEPOSITION | 115334 | 1% | 67% | 2 | Search HIGH+TEMPERATURE+CHEMICAL+VAPOR+DEPOSITION | Search HIGH+TEMPERATURE+CHEMICAL+VAPOR+DEPOSITION |
3 | ANALYSIS OF GASEOUS SPECIES | 86502 | 0% | 100% | 1 | Search ANALYSIS+OF+GASEOUS+SPECIES | Search ANALYSIS+OF+GASEOUS+SPECIES |
4 | AR DILUENT GAS | 86502 | 0% | 100% | 1 | Search AR+DILUENT+GAS | Search AR+DILUENT+GAS |
5 | CO DEPOSITED SI | 86502 | 0% | 100% | 1 | Search CO+DEPOSITED+SI | Search CO+DEPOSITED+SI |
6 | COMPETITIVE ADSORPTION MODEL | 86502 | 0% | 100% | 1 | Search COMPETITIVE+ADSORPTION+MODEL | Search COMPETITIVE+ADSORPTION+MODEL |
7 | CVD MECHANISM | 86502 | 0% | 100% | 1 | Search CVD+MECHANISM | Search CVD+MECHANISM |
8 | CVD MONITORING | 86502 | 0% | 100% | 1 | Search CVD+MONITORING | Search CVD+MONITORING |
9 | CVD MTS | 86502 | 0% | 100% | 1 | Search CVD+MTS | Search CVD+MTS |
10 | DEPOSITION RATE MEASUREMENTS | 86502 | 0% | 100% | 1 | Search DEPOSITION+RATE+MEASUREMENTS | Search DEPOSITION+RATE+MEASUREMENTS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | CHOLLON, G , LANGLAIS, F , PLACIDE, M , WEISBECKER, P , (2012) TRANSIENT STAGES DURING THE CHEMICAL VAPOUR DEPOSITION OF SILICON CARBIDE FROM CH3SICL3/H-2: IMPACT ON THE PHYSICOCHEMICAL AND INTERFACIAL PROPERTIES OF THE COATINGS.THIN SOLID FILMS. VOL. 520. ISSUE 19. P. 6075 -6087 | 38 | 67% | 2 |
2 | DENG, JL , SU, KH , ZENG, QF , WANG, X , CHENG, LF , XU, YD , ZHANG, LT , (2009) THERMODYNAMICS OF THE PRODUCTION OF CONDENSED PHASES IN THE CVD OF METHYLTRICHLOROSILANE PYROLYSIS.CHEMICAL VAPOR DEPOSITION. VOL. 15. ISSUE 10-12. P. 281-290 | 39 | 57% | 2 |
3 | FUKUSHIMA, Y , SATO, N , FUNATO, Y , SUGIURA, H , HOTOZUKA, K , MOMOSE, T , SHIMOGAKI, Y , (2013) MULTI-SCALE ANALYSIS AND ELEMENTARY REACTION SIMULATION OF SIC-CVD USING CH3SICL3/H-2.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 2. ISSUE 11. P. P492-P497 | 26 | 70% | 0 |
4 | GE, YB , GORDON, MS , BATTAGLIA, F , FOX, RO , (2007) THEORETICAL STUDY OF THE PYROLYSIS OF METHYLTRICHLOROSILANE IN THE GAS PHASE. 1. THERMODYNAMICS.JOURNAL OF PHYSICAL CHEMISTRY A. VOL. 111. ISSUE 8. P. 1462-1474 | 25 | 57% | 17 |
5 | YANG, Y , ZHANG, WG , (2009) KINETIC AND MICROSTRUCTURE OF SIC DEPOSITED FROM SICL4-CH4-H-2.CHINESE JOURNAL OF CHEMICAL ENGINEERING. VOL. 17. ISSUE 3. P. 419-426 | 16 | 84% | 5 |
6 | LU, CY , CHENG, LF , ZHAO, CN , ZHANG, LT , YE, F , (2012) EFFECTS OF RESIDENCE TIME AND REACTION CONDITIONS ON THE DEPOSITION OF SIC FROM METHYLTRICHLOROSILANE AND HYDROGEN.INTERNATIONAL JOURNAL OF APPLIED CERAMIC TECHNOLOGY. VOL. 9. ISSUE 3. P. 642-649 | 13 | 93% | 1 |
7 | ZHANG, WGG , HUTTINGER, KJ , (2001) CVD OF SIC FROM METHYLTRICHLOROSILANE. PART I: DEPOSITION RATES.CHEMICAL VAPOR DEPOSITION. VOL. 7. ISSUE 4. P. 167 -172 | 25 | 63% | 22 |
8 | DRIEUX, P , CHOLLON, G , JACQUES, S , ALLEMAND, A , CAVAGNAT, D , BUFFETEAU, T , (2013) EXPERIMENTAL STUDY OF THE CHEMICAL VAPOR DEPOSITION FROM CH3SIHCL2/H-2: APPLICATION TO THE SYNTHESIS OF MONOLITHIC SIC TUBES.SURFACE & COATINGS TECHNOLOGY. VOL. 230. ISSUE . P. 137-144 | 18 | 56% | 2 |
9 | YANG, Y , ZHANG, WG , (2009) CHEMICAL VAPOR DEPOSITION OF SIC AT DIFFERENT MOLAR RATIOS OF HYDROGEN TO METHYLTRICHLOROSILANE.JOURNAL OF CENTRAL SOUTH UNIVERSITY OF TECHNOLOGY. VOL. 16. ISSUE 5. P. 730 -737 | 14 | 74% | 2 |
10 | LU, CY , CHENG, LF , ZHAO, CN , ZHANG, LT , XU, YD , (2009) KINETICS OF CHEMICAL VAPOR DEPOSITION OF SIC FROM METHYLTRICHLOROSILANE AND HYDROGEN.APPLIED SURFACE SCIENCE. VOL. 255. ISSUE 17. P. 7495 -7499 | 14 | 70% | 10 |
Classes with closest relation at Level 1 |