Class information for:
Level 1: PHOTORESIST REMOVAL//RESIST REMOVAL//ORGANIC CONTAMINATION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
19085 523 15.7 48%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
3149 2             CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT 2235
19085 1                   PHOTORESIST REMOVAL//RESIST REMOVAL//ORGANIC CONTAMINATION 523

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PHOTORESIST REMOVAL authKW 580399 2% 76% 13
2 RESIST REMOVAL authKW 486529 2% 83% 10
3 ORGANIC CONTAMINATION authKW 417334 4% 31% 23
4 WET OZONE authKW 408687 1% 100% 7
5 AIRBORNE MOLECULAR CONTAMINATION authKW 339684 2% 73% 8
6 AIRBORNE MOLECULAR CONTAMINANTS AMCS authKW 291920 1% 100% 5
7 SHIZUOKA TORY address 243265 1% 83% 5
8 ION IMPLANTED RESIST authKW 233536 1% 100% 4
9 AIRBORNE MOLECULAR CONTAMINATION AMC authKW 186827 1% 80% 4
10 RESIST STRIPPING authKW 182446 1% 63% 5

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 4129 20% 0% 107
2 Physics, Applied 3310 51% 0% 267
3 Electrochemistry 1455 15% 0% 76
4 Physics, Condensed Matter 1431 28% 0% 149
5 Engineering, Electrical & Electronic 840 25% 0% 131
6 Engineering, Manufacturing 604 6% 0% 32
7 Nanoscience & Nanotechnology 450 11% 0% 56
8 Materials Science, Multidisciplinary 372 21% 0% 111
9 Polymer Science 105 7% 0% 34
10 Engineering, Environmental 77 4% 0% 19

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SHIZUOKA TORY 243265 1% 83% 5
2 INTEGRATED TECHNOL SYST 176028 3% 22% 14
3 UCT S 116768 0% 100% 2
4 ADV CHEM LTD 58384 0% 100% 1
5 ADV CLEANING METROL DEFECT GRP 58384 0% 100% 1
6 ADVANCE SCI MATTER 58384 0% 100% 1
7 ARIZONA FAB SORT MFG AZFSM 58384 0% 100% 1
8 C ACT GRP 58384 0% 100% 1
9 CHAIR COMP AIDED ARCHITECTURAL DESIGN CAAD 58384 0% 100% 1
10 CHARLES COULOMBUM2 58384 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF THE IEST 81726 1% 20% 7
2 SOLID STATE PHENOMENA 56116 9% 2% 46
3 SOLID STATE TECHNOLOGY 45497 7% 2% 38
4 MICRO 40118 2% 6% 11
5 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 25216 5% 2% 26
6 JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY 18828 5% 1% 25
7 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 10924 14% 0% 75
8 ASHRAE JOURNAL-AMERICAN SOCIETY OF HEATING REFRIGERATING AND AIR-CONDITIONING ENGINEERS 3148 1% 1% 4
9 MICROCONTAMINATION 2333 0% 4% 1
10 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2275 7% 0% 35

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 PHOTORESIST REMOVAL 580399 2% 76% 13 Search PHOTORESIST+REMOVAL Search PHOTORESIST+REMOVAL
2 RESIST REMOVAL 486529 2% 83% 10 Search RESIST+REMOVAL Search RESIST+REMOVAL
3 ORGANIC CONTAMINATION 417334 4% 31% 23 Search ORGANIC+CONTAMINATION Search ORGANIC+CONTAMINATION
4 WET OZONE 408687 1% 100% 7 Search WET+OZONE Search WET+OZONE
5 AIRBORNE MOLECULAR CONTAMINATION 339684 2% 73% 8 Search AIRBORNE+MOLECULAR+CONTAMINATION Search AIRBORNE+MOLECULAR+CONTAMINATION
6 AIRBORNE MOLECULAR CONTAMINANTS AMCS 291920 1% 100% 5 Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS Search AIRBORNE+MOLECULAR+CONTAMINANTS+AMCS
7 ION IMPLANTED RESIST 233536 1% 100% 4 Search ION+IMPLANTED+RESIST Search ION+IMPLANTED+RESIST
8 AIRBORNE MOLECULAR CONTAMINATION AMC 186827 1% 80% 4 Search AIRBORNE+MOLECULAR+CONTAMINATION+AMC Search AIRBORNE+MOLECULAR+CONTAMINATION+AMC
9 RESIST STRIPPING 182446 1% 63% 5 Search RESIST+STRIPPING Search RESIST+STRIPPING
10 AIRBORNE MOLECULAR CONTAMINANT AMC 175152 1% 100% 3 Search AIRBORNE+MOLECULAR+CONTAMINANT+AMC Search AIRBORNE+MOLECULAR+CONTAMINANT+AMC

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 DEN, W , BAI, HL , KANG, YH , (2006) ORGANIC AIRBORNE MOLECULAR CONTAMINATION IN SEMICONDUCTOR FABRICATION CLEAN ROOMS - A REVIEW.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 153. ISSUE 2. P. G149 -G159 35 76% 23
2 KANG, YH , DEN, W , BAI, HL , (2006) SHORT TIME DEPOSITION KINETICS OF DIETHYL PHTHALATE AND DIBUTYL PHTHALATE ON A SILICON WAFER SURFACE.INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH. VOL. 45. ISSUE 4. P. 1331 -1336 20 100% 17
3 TLILI, S , HAYECK, N , GLIGOROVSKI, S , WORTHAM, H , (2012) ADSORPTION FEATURES OF PHTHALATES AND ORGANOPHOSPHORUS COMPOUNDS ON SILICON WAFERS.INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH. VOL. 51. ISSUE 45. P. 14665 -14672 19 90% 1
4 MASHIKO, T , SANADA, T , NISHIYAMA, I , HORIBE, H , (2012) PARAMETRIC STUDY ON THE PHYSICAL ACTION OF STEAM-WATER MIXTURE JET: REMOVAL OF PHOTORESIST FILM FROM SILICON WAFER SURFACES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 51. ISSUE 6. P. - 21 75% 0
5 KAMIMURA, T , MURAOKA, H , YAMANA, Y , MATSURA, Y , HORIBE, H , (2012) STRIPPING OF THE POSITIVE-TONE DIAZONAPHTHOQUINONE/NOVOLAK RESIST USING LASER IRRADIATION FROM VISIBLE TO NEAR INFRARED WAVELENGTH.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 25. ISSUE 6. P. 741 -746 17 89% 0
6 TLILI, S , GOMEZ ALVAREZ, E , GLIGOROVSKI, S , WORTHAM, H , (2012) ADSORPTION BEHAVIOR OF TWO MODEL AIRBORNE ORGANIC CONTAMINANTS ON WAFER SURFACES.CHEMICAL ENGINEERING JOURNAL. VOL. 187. ISSUE . P. 239 -247 21 68% 7
7 ANGATA, Y , GOTO, Y , TAKAHASHI, S , KONO, A , KOIKE, K , NISHIYAMA, I , KAMOTO, R , HORIBE, H , (2013) STUDY OF CHEMICAL STRUCTURE AND REMOVAL OF POSITIVE-TONE NOVOLAK RESIST HAVING VARIOUS PREBAKE TEMPERATURE USING WET OZONE.KAGAKU KOGAKU RONBUNSHU. VOL. 39. ISSUE 2. P. 144 -149 16 89% 0
8 MATSUURA, K , NISHIYAMA, T , SATO, E , YAMAMOTO, M , KAMIMURA, T , TAKAHASHI, M , KOIKE, K , HORIBE, H , (2016) EFFECT OF TEMPERATURE ON DEGRADATION OF POLYMERS FOR PHOTORESIST USING OZONE MICROBUBBLES.JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY. VOL. 29. ISSUE 4. P. 623 -627 15 83% 0
9 CHOI, J , HABUKA, H , (2015) IN SITU METHOD FOR DETERMINING COMBINATION OF ORGANIC COMPOUNDS INTERACTING WITH EACH OTHER ON SILICON OXIDE SURFACE.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 4. ISSUE 12. P. P408 -P414 13 93% 0
10 HABUKA, H , NAKAGOMI, K , (2015) EVALUATION OF MOLECULAR INTERACTION BETWEEN ORGANIC MOLECULES PHYSISORBED ON SILICON NATIVE OXIDE SURFACE IN DRY AND HUMID ATMOSPHERE.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 4. ISSUE 3. P. P86 -P90 12 100% 0

Classes with closest relation at Level 1


Rank Class id link
1 8494 HYDROGEN TERMINATION//NATIVE OXIDE//HYDRIDE SPECIES
2 31370 CLEANROOM//MINIENVIRONMENT//FAN FILTER UNIT
3 20767 CAT CVD//CATALYTIC CHEMICAL VAPOR DEPOSITION//HOT WIRE CHEMICAL VAPOR DEPOSITION
4 35841 QAS//2 CHLORO 1 1 2 TRIFLUOROETHYL METHYL ETHER//ANHYDROUS FLUORINE GAS
5 19470 PLANE PLASMA DISCHARGE//ENERGY INFLUX//DRY DEVELOPMENT
6 37132 MICRO WETTABILITY//TISSUE MONOLAYER//LIPOPHILIC PROPERTY
7 37353 OPTICAL ANALOG SIGNAL TRANSMISSION//COOLED LEDS//GALVANICALLY ISOLATED AMPLIFIER
8 23381 COLLOIDAL GAS APHRONS//APHRONS//COLLOIDAL LIQUID APHRON
9 24369 NITROGEN TRIFLUORIDE//DIFLUOROALKYLAMINES//CHEMICAL DRY ETCHING
10 30968 TETRAMINE//RUVETTUS PRETIOSUS//LEPIDOCYBIUM FLAVOBRUNNEUM

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