Class information for:
Level 1: HYDROGEN TERMINATION//NATIVE OXIDE//HYDRIDE SPECIES

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
8494 1248 22.8 64%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
3149 2             CLEANROOM//PHOTORESIST REMOVAL//MINIENVIRONMENT 2235
8494 1                   HYDROGEN TERMINATION//NATIVE OXIDE//HYDRIDE SPECIES 1248

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 HYDROGEN TERMINATION authKW 159205 2% 24% 27
2 NATIVE OXIDE authKW 105198 2% 22% 20
3 HYDRIDE SPECIES authKW 97863 0% 100% 4
4 NATIVE OXIDATION authKW 87375 0% 71% 5
5 H TERMINATION authKW 87365 1% 36% 10
6 ECR PLASMA SPUTTERING authKW 79914 1% 47% 7
7 NINAMI KU address 78289 0% 80% 4
8 HF TREATED SILICON authKW 73397 0% 100% 3
9 HFON GATE INSULATOR authKW 73397 0% 100% 3
10 MULTIREFLECTION ATR authKW 73397 0% 100% 3

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 15337 25% 0% 317
2 Physics, Applied 6619 47% 0% 587
3 Electrochemistry 5200 18% 0% 220
4 Physics, Condensed Matter 2634 25% 0% 316
5 Chemistry, Physical 706 18% 0% 229
6 Materials Science, Multidisciplinary 534 17% 0% 217
7 Nanoscience & Nanotechnology 413 7% 0% 88
8 Engineering, Electrical & Electronic 335 12% 0% 150
9 Engineering, Manufacturing 29 1% 0% 14
10 Microscopy 14 0% 0% 6

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 NINAMI KU 78289 0% 80% 4
2 ABT SILIZIUMPHOTOVOLTAIK 55047 0% 75% 3
3 KDG 48932 0% 100% 2
4 ABT PHOTOVOLTAIK 34241 1% 20% 7
5 NEW IND CREAT HATCHERY CENTER 32620 0% 67% 2
6 POST SILICON TECHNOL 31453 0% 43% 3
7 NEW IND CREAT HATCHERY 27526 3% 3% 36
8 PRECIS SCI TECHNOL 26994 2% 5% 22
9 ABT POTOVOLTAIK 24466 0% 100% 1
10 BILKENT UNIV 24466 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 24917 14% 1% 175
2 SOLID STATE PHENOMENA 22452 4% 2% 45
3 MICRO 11243 1% 5% 9
4 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 5361 7% 0% 83
5 SOLID STATE TECHNOLOGY 4737 2% 1% 19
6 MICROCONTAMINATION 3911 0% 8% 2
7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 3436 4% 0% 45
8 IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING 3042 1% 1% 14
9 APPLIED SURFACE SCIENCE 2860 5% 0% 65
10 SURFACE SCIENCE 2471 4% 0% 53

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 HYDROGEN TERMINATION 159205 2% 24% 27 Search HYDROGEN+TERMINATION Search HYDROGEN+TERMINATION
2 NATIVE OXIDE 105198 2% 22% 20 Search NATIVE+OXIDE Search NATIVE+OXIDE
3 HYDRIDE SPECIES 97863 0% 100% 4 Search HYDRIDE+SPECIES Search HYDRIDE+SPECIES
4 NATIVE OXIDATION 87375 0% 71% 5 Search NATIVE+OXIDATION Search NATIVE+OXIDATION
5 H TERMINATION 87365 1% 36% 10 Search H+TERMINATION Search H+TERMINATION
6 ECR PLASMA SPUTTERING 79914 1% 47% 7 Search ECR+PLASMA+SPUTTERING Search ECR+PLASMA+SPUTTERING
7 HF TREATED SILICON 73397 0% 100% 3 Search HF+TREATED+SILICON Search HF+TREATED+SILICON
8 HFON GATE INSULATOR 73397 0% 100% 3 Search HFON+GATE+INSULATOR Search HFON+GATE+INSULATOR
9 MULTIREFLECTION ATR 73397 0% 100% 3 Search MULTIREFLECTION+ATR Search MULTIREFLECTION+ATR
10 RCA ETCHANT 73397 0% 100% 3 Search RCA+ETCHANT Search RCA+ETCHANT

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 WATANABE, S , (1998) CHEMICAL STRUCTURE AND SURFACE PHONONS ASSOCIATED WITH H ON SI.JOURNAL OF CHEMICAL PHYSICS. VOL. 108. ISSUE 14. P. 5965-5974 31 94% 23
2 CAUDANO, Y , THIRY, PA , CHABAL, YJ , (2002) INVESTIGATION OF THE BENDING VIBRATIONS OF VICINAL H/SI(111) SURFACES BY INFRARED SPECTROSCOPY.SURFACE SCIENCE. VOL. 502. ISSUE . P. 91-95 25 100% 5
3 BERTAGNA, V , ROUELLE, F , ERRE, R , CHEMLA, M , (2000) ELECTROCHEMICAL TEST FOR SILICON SURFACE CONTAMINATION BY COPPER TRACES IN HF, HF PLUS HCL AND HF+NH4F DILUTE SOLUTIONS.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 15. ISSUE 2. P. 121 -125 26 93% 4
4 ANGERMANN, H , HENRION, W , REBIEN, M , ROSELER, A , (2004) WET-CHEMICAL PREPARATION AND SPECTROSCOPIC CHARACTERIZATION OF SI INTERFACES.APPLIED SURFACE SCIENCE. VOL. 235. ISSUE 3. P. 322-339 30 67% 40
5 ANGERMANN, H , (2008) PASSIVATION OF STRUCTURED P-TYPE SILICON INTERFACES: EFFECT OF SURFACE MORPHOLOGY AND WET-CHEMICAL PRE-TREATMENT.APPLIED SURFACE SCIENCE. VOL. 254. ISSUE 24. P. 8067 -8074 23 77% 24
6 KOLIBAL, M , CECHAL, J , BARTOSIK, M , MACH, J , SIKOLA, T , (2010) STABILITY OF HYDROGEN-TERMINATED VICINAL SI(111) SURFACE UNDER AMBIENT ATMOSPHERE.APPLIED SURFACE SCIENCE. VOL. 256. ISSUE 11. P. 3423 -3426 21 81% 8
7 TOMITA, N , ADACHI, S , (2002) CHARACTERIZATION OF SI(111) SURFACES TREATED IN NH4F AND NH4HF2 SOLUTIONS.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 149. ISSUE 4. P. G245-G250 28 76% 13
8 PIETSCH, GJ , (1995) HYDROGEN ON SI - UBIQUITOUS SURFACE TERMINATION AFTER WET-CHEMICAL PROCESSING.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. VOL. 60. ISSUE 4. P. 347-363 44 56% 67
9 WATANABE, S , (1998) STEP STRUCTURE OF SILICON SURFACE HYDROGENATED IN SOLUTION AS REVEALED WITH ANGLE-RESOLVED POLARIZED INFRARED SPECTROSCOPY.SURFACE SCIENCE. VOL. 415. ISSUE 3. P. 385-391 26 93% 11
10 KATO, H , TAOKA, T , NISHIKATA, S , SAZAKI, G , YAMADA, T , CZAJKA, R , WAWRO, A , NAKAJIMA, K , KASUYA, A , SUTO, S , (2007) PREPARATION OF AN ULTRACLEAN AND ATOMICALLY CONTROLLED HYDROGEN-TERMINATED SI(111)-(1X1) SURFACE REVEALED BY HIGH RESOLUTION ELECTRON ENERGY LOSS SPECTROSCOPY, ATOMIC FORCE MICROSCOPY, AND SCANNING TUNNELING MICROSCOPY: AQUEOUS NH4F ETCHING PROCESS OF SI(111).JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 46. ISSUE 9A. P. 5701-5705 22 81% 7

Classes with closest relation at Level 1


Rank Class id link
1 35841 QAS//2 CHLORO 1 1 2 TRIFLUOROETHYL METHYL ETHER//ANHYDROUS FLUORINE GAS
2 33212 J AN SCI TECHNOL ORG//CYANIDE TREATMENT//DISPLAY TECHNOL DEV GRP
3 19085 PHOTORESIST REMOVAL//RESIST REMOVAL//ORGANIC CONTAMINATION
4 13493 CHAIR GEN MAT SCI//MACROPOROUS SILICON//ELECTROCHEMICAL ETCHING
5 3635 SI OXIDATION//SILICON OXIDATION//SIO2 SI INTERFACE
6 9538 ORGANIC MONOLAYER//NOYES 210//HYDROGEN TERMINATED SILICON
7 6615 HYDROGEN SURFACTANT//MANA SATELLITE//DISILANE
8 11950 ANISOTROPIC ETCHING//MICRONANOSYST ENGN//MEMS MICRO NANO SYST
9 27888 ETCHING FACTOR//SPRAY ETCHING//42 ALLOY
10 31370 CLEANROOM//MINIENVIRONMENT//FAN FILTER UNIT

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