Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
21494 | 416 | 14.8 | 34% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
314 | 3 | ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 39933 |
2587 | 2 | SCANNING//BACKSCATTERED ELECTRONS//MICROSCOPY | 3648 |
21494 | 1 | VOLTAGE CONTRAST//E BEAM INSPECTION//ELECTRON BEAM TESTING | 416 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | VOLTAGE CONTRAST | authKW | 320282 | 3% | 36% | 12 |
2 | E BEAM INSPECTION | authKW | 293606 | 1% | 100% | 4 |
3 | ELECTRON BEAM TESTING | authKW | 239771 | 2% | 47% | 7 |
4 | ELECTRON BEAM INSPECTION | authKW | 165152 | 1% | 75% | 3 |
5 | NONVISUAL DEFECTS | authKW | 146803 | 0% | 100% | 2 |
6 | ELECTRON BEAM TESTER | authKW | 97867 | 0% | 67% | 2 |
7 | SOREP | address | 97867 | 0% | 67% | 2 |
8 | 64MDRAM | authKW | 73401 | 0% | 100% | 1 |
9 | ADV PROC DEVICE DEV GRP | address | 73401 | 0% | 100% | 1 |
10 | ANALYZER GEOMETRY | authKW | 73401 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Microscopy | 12094 | 19% | 0% | 77 |
2 | Engineering, Electrical & Electronic | 1898 | 40% | 0% | 167 |
3 | Physics, Applied | 1709 | 42% | 0% | 174 |
4 | Nanoscience & Nanotechnology | 1555 | 21% | 0% | 88 |
5 | Instruments & Instrumentation | 898 | 15% | 0% | 63 |
6 | Optics | 580 | 17% | 0% | 69 |
7 | Computer Science, Hardware & Architecture | 301 | 5% | 0% | 21 |
8 | Engineering, Manufacturing | 63 | 2% | 0% | 10 |
9 | Physics, Multidisciplinary | 50 | 7% | 0% | 28 |
10 | Engineering, General | 49 | 3% | 0% | 13 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SOREP | 97867 | 0% | 67% | 2 |
2 | ADV PROC DEVICE DEV GRP | 73401 | 0% | 100% | 1 |
3 | ATSUGI ELECT COMMUN INTEGRATED ELE | 73401 | 0% | 100% | 1 |
4 | E BEAM INSPECT | 73401 | 0% | 100% | 1 |
5 | ETUD SEPARAT ISOTOP CHEM PHYS | 73401 | 0% | 100% | 1 |
6 | INTEGRATED CIRCUIT ADV PROC ENGN | 36700 | 0% | 50% | 1 |
7 | PLICAT SYST | 36700 | 0% | 50% | 1 |
8 | CC SYST S | 7338 | 0% | 10% | 1 |
9 | ELE COMMUN ENGN | 7338 | 0% | 10% | 1 |
10 | ELEKTROTECH GRUNDLAGEN INFORMAT | 4586 | 0% | 6% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SCANNING ELECTRON MICROSCOPY | 51449 | 6% | 3% | 27 |
2 | SCANNING | 24955 | 6% | 1% | 24 |
3 | SCANNING MICROSCOPY | 11445 | 3% | 1% | 14 |
4 | MICROELECTRONIC ENGINEERING | 9886 | 9% | 0% | 37 |
5 | SIEMENS FORSCHUNGS-UND ENTWICKLUNGSBERICHTE-SIEMENS RESEARCH AND DEVELOPMENT REPORTS | 9562 | 1% | 2% | 6 |
6 | JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 6263 | 3% | 1% | 14 |
7 | IEEE DESIGN & TEST OF COMPUTERS | 6018 | 2% | 1% | 9 |
8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 5688 | 9% | 0% | 36 |
9 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 2992 | 2% | 1% | 8 |
10 | ELECTRONICSWEEK | 2620 | 0% | 4% | 1 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | VOLTAGE CONTRAST | 320282 | 3% | 36% | 12 | Search VOLTAGE+CONTRAST | Search VOLTAGE+CONTRAST |
2 | E BEAM INSPECTION | 293606 | 1% | 100% | 4 | Search E+BEAM+INSPECTION | Search E+BEAM+INSPECTION |
3 | ELECTRON BEAM TESTING | 239771 | 2% | 47% | 7 | Search ELECTRON+BEAM+TESTING | Search ELECTRON+BEAM+TESTING |
4 | ELECTRON BEAM INSPECTION | 165152 | 1% | 75% | 3 | Search ELECTRON+BEAM+INSPECTION | Search ELECTRON+BEAM+INSPECTION |
5 | NONVISUAL DEFECTS | 146803 | 0% | 100% | 2 | Search NONVISUAL+DEFECTS | Search NONVISUAL+DEFECTS |
6 | ELECTRON BEAM TESTER | 97867 | 0% | 67% | 2 | Search ELECTRON+BEAM+TESTER | Search ELECTRON+BEAM+TESTER |
7 | 64MDRAM | 73401 | 0% | 100% | 1 | Search 64MDRAM | Search 64MDRAM |
8 | ANALYZER GEOMETRY | 73401 | 0% | 100% | 1 | Search ANALYZER+GEOMETRY | Search ANALYZER+GEOMETRY |
9 | CAD BASED TESTING | 73401 | 0% | 100% | 1 | Search CAD+BASED+TESTING | Search CAD+BASED+TESTING |
10 | COMPUTER AIDED DESIGN CAD DATABASE | 73401 | 0% | 100% | 1 | Search COMPUTER+AIDED+DESIGN+CAD+DATABASE | Search COMPUTER+AIDED+DESIGN+CAD+DATABASE |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | PLIES, E , (1990) SECONDARY-ELECTRON ENERGY ANALYZERS FOR ELECTRON-BEAM TESTING.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT. VOL. 298. ISSUE 1-3. P. 142 -155 | 30 | 55% | 8 |
2 | THONG, JTL , (1992) TRANSIT-TIME EFFECT IN ELECTRON-BEAM TESTING VOLTAGE MEASUREMENTS.MEASUREMENT SCIENCE AND TECHNOLOGY. VOL. 3. ISSUE 9. P. 827 -837 | 15 | 100% | 2 |
3 | THONG, JTL , NIXON, WC , (1990) AN ELECTRON-OPTICAL PHASE-SHIFT ELEMENT FOR HIGH-SPEED ELECTRON-BEAM TESTING.MEASUREMENT SCIENCE AND TECHNOLOGY. VOL. 1. ISSUE 4. P. 337 -344 | 14 | 100% | 0 |
4 | GIRARD, P , (1991) VOLTAGE CONTRAST.JOURNAL DE PHYSIQUE IV. VOL. 1. ISSUE C6. P. 259-270 | 17 | 74% | 1 |
5 | CLAUBERG, R , BEHA, H , BLACHA, A , SEITZ, HK , (1990) PICOSECOND PHOTOEMISSION PROBING OF INTEGRATED-CIRCUITS - CAPABILITIES, LIMITATIONS, AND APPLICATIONS.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 34. ISSUE 2-3. P. 173-188 | 14 | 88% | 2 |
6 | WINKLER, D , SCHMITT, R , BRUNNER, M , LISCHKE, B , (1990) FLEXIBLE PICOSECOND PROBING OF INTEGRATED-CIRCUITS WITH CHOPPED ELECTRON-BEAMS.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 34. ISSUE 2-3. P. 189-203 | 13 | 93% | 3 |
7 | CLAUBERG, R , BLACHA, A , SEITZ, HK , (1990) VOLTAGE DETECTOR AND SUBMICROMETER FOCUSING UNIT FOR PHOTOEMISSION PROBING.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 61. ISSUE 3. P. 1044-1054 | 12 | 100% | 0 |
8 | WINKLER, D , SCHMITT, R , BRUNNER, M , LISCHKE, B , (1988) BLANKING SYSTEM FOR ELECTRON-BEAM TESTING WITH PICOSECOND TIME RESOLUTION.OPTIK. VOL. 78. ISSUE 4. P. 165-172 | 14 | 93% | 3 |
9 | GOPINATH, A , (1987) VOLTAGE MEASUREMENT IN THE SCANNING ELECTRON-MICROSCOPE.ADVANCES IN ELECTRONICS AND ELECTRON PHYSICS. VOL. 69. ISSUE . P. 1-53 | 14 | 93% | 3 |
10 | NAKAMAE, K , FUJIOKA, H , URA, K , (1990) ANALYSIS OF WAVE-FORM DISTORTION DUE TO THE TRANSIT-TIME EFFECT IN STROBOSCOPIC SCANNING ELECTRON-MICROSCOPY.MEASUREMENT SCIENCE AND TECHNOLOGY. VOL. 1. ISSUE 9. P. 894 -902 | 11 | 100% | 3 |
Classes with closest relation at Level 1 |