Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
14404 | 771 | 18.4 | 42% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
314 | 3 | ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 39933 |
2587 | 2 | SCANNING//BACKSCATTERED ELECTRONS//MICROSCOPY | 3648 |
14404 | 1 | BACKSCATTERED ELECTRONS//DOPANT CONTRAST//SCANNING | 771 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | BACKSCATTERED ELECTRONS | authKW | 446723 | 5% | 30% | 38 |
2 | DOPANT CONTRAST | authKW | 360030 | 1% | 91% | 10 |
3 | SCANNING | journal | 309517 | 15% | 7% | 115 |
4 | CATHODE LENS | authKW | 232953 | 1% | 59% | 10 |
5 | TOPOGRAPHIC CONTRAST | authKW | 213852 | 1% | 60% | 9 |
6 | SCANNING LOW ENERGY ELECTRON MICROSCOPY | authKW | 203673 | 1% | 86% | 6 |
7 | INTEGRATED CIRCUIT ADV PROC TECHNOL | address | 158414 | 1% | 100% | 4 |
8 | VERY LOW ENERGY STEM | authKW | 158414 | 1% | 100% | 4 |
9 | LOW VOLTAGE SCANNING ELECTRON MICROSCOPY | authKW | 158402 | 1% | 40% | 10 |
10 | MICROSCOPY | WoSSC | 125161 | 44% | 1% | 336 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Microscopy | 125161 | 44% | 1% | 336 |
2 | Instruments & Instrumentation | 4993 | 26% | 0% | 197 |
3 | Physics, Applied | 709 | 22% | 0% | 167 |
4 | Engineering, General | 346 | 6% | 0% | 43 |
5 | Physics, Multidisciplinary | 339 | 11% | 0% | 86 |
6 | Materials Science, Characterization, Testing | 265 | 2% | 0% | 19 |
7 | Nanoscience & Nanotechnology | 251 | 7% | 0% | 54 |
8 | Materials Science, Multidisciplinary | 93 | 11% | 0% | 86 |
9 | Spectroscopy | 75 | 3% | 0% | 26 |
10 | Engineering, Electrical & Electronic | 71 | 8% | 0% | 64 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | INTEGRATED CIRCUIT ADV PROC TECHNOL | 158414 | 1% | 100% | 4 |
2 | SCI RUMENTS | 95691 | 5% | 7% | 36 |
3 | QUAL MANAGEMENT FAILURE ANAL | 79207 | 0% | 100% | 2 |
4 | SECT 5 11 | 79207 | 0% | 100% | 2 |
5 | 4481 | 39603 | 0% | 100% | 1 |
6 | ANALYT HIGH TECHNOL | 39603 | 0% | 100% | 1 |
7 | AREA METROL MAT | 39603 | 0% | 100% | 1 |
8 | ARMINESUMR 7633 | 39603 | 0% | 100% | 1 |
9 | ETUDES MAT MICROSCOPIE AVANCEE | 39603 | 0% | 100% | 1 |
10 | FEI ELECT OPT | 39603 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SCANNING | 309517 | 15% | 7% | 115 |
2 | SCANNING MICROSCOPY | 28365 | 4% | 2% | 30 |
3 | MICROSCOPY AND MICROANALYSIS | 12884 | 3% | 1% | 24 |
4 | SCANNING ELECTRON MICROSCOPY | 10982 | 2% | 2% | 17 |
5 | ULTRAMICROSCOPY | 10749 | 5% | 1% | 39 |
6 | JOURNAL OF ELECTRON MICROSCOPY | 9389 | 3% | 1% | 21 |
7 | MEASUREMENT TECHNIQUES USSR | 9322 | 2% | 2% | 13 |
8 | IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA | 9316 | 4% | 1% | 28 |
9 | MEASUREMENT TECHNIQUES | 7374 | 2% | 1% | 19 |
10 | JOURNAL OF MICROSCOPY-OXFORD | 6829 | 3% | 1% | 21 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | BACKSCATTERED ELECTRONS | 446723 | 5% | 30% | 38 | Search BACKSCATTERED+ELECTRONS | Search BACKSCATTERED+ELECTRONS |
2 | DOPANT CONTRAST | 360030 | 1% | 91% | 10 | Search DOPANT+CONTRAST | Search DOPANT+CONTRAST |
3 | CATHODE LENS | 232953 | 1% | 59% | 10 | Search CATHODE+LENS | Search CATHODE+LENS |
4 | TOPOGRAPHIC CONTRAST | 213852 | 1% | 60% | 9 | Search TOPOGRAPHIC+CONTRAST | Search TOPOGRAPHIC+CONTRAST |
5 | SCANNING LOW ENERGY ELECTRON MICROSCOPY | 203673 | 1% | 86% | 6 | Search SCANNING+LOW+ENERGY+ELECTRON+MICROSCOPY | Search SCANNING+LOW+ENERGY+ELECTRON+MICROSCOPY |
6 | VERY LOW ENERGY STEM | 158414 | 1% | 100% | 4 | Search VERY+LOW+ENERGY+STEM | Search VERY+LOW+ENERGY+STEM |
7 | LOW VOLTAGE SCANNING ELECTRON MICROSCOPY | 158402 | 1% | 40% | 10 | Search LOW+VOLTAGE+SCANNING+ELECTRON+MICROSCOPY | Search LOW+VOLTAGE+SCANNING+ELECTRON+MICROSCOPY |
8 | GRAIN CONTRAST | 118810 | 0% | 100% | 3 | Search GRAIN+CONTRAST | Search GRAIN+CONTRAST |
9 | SLEEM | 118810 | 0% | 100% | 3 | Search SLEEM | Search SLEEM |
10 | CHANNELING CONTRAST | 105607 | 1% | 67% | 4 | Search CHANNELING+CONTRAST | Search CHANNELING+CONTRAST |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | CHEE, AKW , (2016) QUANTITATIVE DOPANT PROFILING BY ENERGY FILTERING IN THE SCANNING ELECTRON MICROSCOPE.IEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITY. VOL. 16. ISSUE 2. P. 138 -148 | 21 | 84% | 0 |
2 | FRANK, L , HOVORKA, M , MIKMEKOVA, S , MIKMEKOVA, E , MULLEROVA, I , POKORNA, Z , (2012) SCANNING ELECTRON MICROSCOPY WITH SAMPLES IN AN ELECTRIC FIELD.MATERIALS. VOL. 5. ISSUE 12. P. 2731-2756 | 26 | 63% | 1 |
3 | HEJNA, J , (1994) DETECTION OF TOPOGRAPHIC CONTRAST IN THE SCANNING ELECTRON-MICROSCOPE AT LOW AND MEDIUM RESOLUTION BY DIFFERENT DETECTORS AND DETECTOR SYSTEMS.SCANNING MICROSCOPY. VOL. 8. ISSUE 2. P. 143-164 | 30 | 79% | 5 |
4 | TSURUMI, D , HAMADA, K , KAWASAKI, Y , (2013) OBSERVATION OF TWO-DIMENSIONAL P-TYPE DOPANT DIFFUSION ACROSS A P(+)-INP/N(-)-INGAAS INTERFACE USING SCANNING ELECTRON MICROSCOPY.JOURNAL OF APPLIED PHYSICS. VOL. 113. ISSUE 14. P. - | 13 | 100% | 1 |
5 | KACZMAREK, D , DOMARADZKI, J , (2002) THE METHOD FOR THE RECONSTRUCTION OF COMPLEX IMAGES OF SPECIMENS USING BACKSCATTERED ELECTRONS.SCANNING. VOL. 24. ISSUE 2. P. 65-69 | 17 | 94% | 1 |
6 | TSURUMI, D , HAMADA, K , KAWASAKI, Y , (2012) HIGHLY REPRODUCIBLE SECONDARY ELECTRON IMAGING UNDER ELECTRON IRRADIATION USING HIGH-PASS ENERGY FILTERING IN LOW-VOLTAGE SCANNING ELECTRON MICROSCOPY.MICROSCOPY AND MICROANALYSIS. VOL. 18. ISSUE 2. P. 385-389 | 13 | 93% | 0 |
7 | FRANK, L , MULLEROVA, I , (2005) THE INJECTED-CHARGE CONTRAST MECHANISM IN SCANNED IMAGING OF DOPED SEMICONDUCTORS BY VERY SLOW ELECTRONS.ULTRAMICROSCOPY. VOL. 106. ISSUE 1. P. 28-36 | 15 | 94% | 12 |
8 | TSURUMI, D , HAMADA, K , KAWASAKI, Y , (2012) ENERGY-FILTERED SECONDARY-ELECTRON IMAGING FOR NANOSCALE DOPANT MAPPING BY APPLYING A REVERSE BIAS VOLTAGE.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 51. ISSUE 10. P. - | 13 | 87% | 6 |
9 | KLEIN, T , BUHR, E , FRASE, CG , (2012) TSEM: A REVIEW OF SCANNING ELECTRON MICROSCOPY IN TRANSMISSION MODE AND ITS APPLICATIONS.ADVANCES IN IMAGING AND ELECTRON PHYSICS, VOL 171. VOL. 171. ISSUE . P. 297 -356 | 28 | 38% | 15 |
10 | WALKER, CGH , ZAGGOUT, F , EL-GOMATI, MM , (2008) THE ROLE OF OXYGEN IN SECONDARY ELECTRON CONTRAST IN DOPED SEMICONDUCTORS USING LOW VOLTAGE SCANNING ELECTRON MICROSCOPY.JOURNAL OF APPLIED PHYSICS. VOL. 104. ISSUE 12. P. - | 17 | 71% | 8 |
Classes with closest relation at Level 1 |