Class information for:
Level 1: BORON PENETRATION//NITRIDED OXIDE//OXYNITRIDATION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
6002 1545 18.2 62%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
474 2             FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI 15884
6002 1                   BORON PENETRATION//NITRIDED OXIDE//OXYNITRIDATION 1545

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 BORON PENETRATION authKW 502173 2% 71% 36
2 NITRIDED OXIDE authKW 133581 1% 52% 13
3 OXYNITRIDATION authKW 106709 1% 60% 9
4 SI OXYNITRIDE authKW 88927 0% 75% 6
5 OXYNITRIDE authKW 84754 3% 10% 44
6 REMOTE PLASMA NITRIDATION RPN authKW 82341 0% 83% 5
7 HOT ELECTRON HARDNESS authKW 59287 0% 100% 3
8 POST NITRIDATION ANNEALING authKW 59287 0% 100% 3
9 REOXIDIZED NITRIDED OXIDE authKW 59287 0% 100% 3
10 STORAGE DIELECTRIC authKW 59287 0% 100% 3

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 15844 64% 0% 989
2 Materials Science, Coatings & Films 8823 17% 0% 270
3 Engineering, Electrical & Electronic 5803 37% 0% 567
4 Physics, Condensed Matter 1394 17% 0% 269
5 Electrochemistry 1063 8% 0% 117
6 Nanoscience & Nanotechnology 705 8% 0% 125
7 Materials Science, Multidisciplinary 235 12% 0% 186
8 Materials Science, Ceramics 124 2% 0% 33
9 Nuclear Science & Technology 63 3% 0% 41
10 Chemistry, Physical 20 6% 0% 92

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 DIFFUS 54720 0% 46% 6
2 SOFTWARE ADV MAT PROC 39525 0% 100% 2
3 LEMEAMED 25405 0% 43% 3
4 PHYS CHEM SUR E INTER E 25405 0% 43% 3
5 ADV ULSI PROC ENGN 4 19762 0% 100% 1
6 AKIRUNI TECHNOL 19762 0% 100% 1
7 AUSTIN LOG TECHNOL DEV 19762 0% 100% 1
8 BEREICH SONDERFOR FESTKORPERELEKTR 56 19762 0% 100% 1
9 CNRS LP 7251 19762 0% 100% 1
10 DFAE LCMM 19762 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 IEEE ELECTRON DEVICE LETTERS 42950 9% 2% 140
2 IEEE TRANSACTIONS ON ELECTRON DEVICES 16800 7% 1% 114
3 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 8737 8% 0% 116
4 SOLID-STATE ELECTRONICS 7878 4% 1% 63
5 APPLIED PHYSICS LETTERS 5325 11% 0% 175
6 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 4956 6% 0% 89
7 JOURNAL OF APPLIED PHYSICS 3533 9% 0% 141
8 MICROELECTRONICS RELIABILITY 3055 2% 0% 33
9 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2893 3% 0% 50
10 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2635 3% 0% 44

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 BORON PENETRATION 502173 2% 71% 36 Search BORON+PENETRATION Search BORON+PENETRATION
2 NITRIDED OXIDE 133581 1% 52% 13 Search NITRIDED+OXIDE Search NITRIDED+OXIDE
3 OXYNITRIDATION 106709 1% 60% 9 Search OXYNITRIDATION Search OXYNITRIDATION
4 SI OXYNITRIDE 88927 0% 75% 6 Search SI+OXYNITRIDE Search SI+OXYNITRIDE
5 OXYNITRIDE 84754 3% 10% 44 Search OXYNITRIDE Search OXYNITRIDE
6 REMOTE PLASMA NITRIDATION RPN 82341 0% 83% 5 Search REMOTE+PLASMA+NITRIDATION+RPN Search REMOTE+PLASMA+NITRIDATION+RPN
7 HOT ELECTRON HARDNESS 59287 0% 100% 3 Search HOT+ELECTRON+HARDNESS Search HOT+ELECTRON+HARDNESS
8 POST NITRIDATION ANNEALING 59287 0% 100% 3 Search POST+NITRIDATION+ANNEALING Search POST+NITRIDATION+ANNEALING
9 REOXIDIZED NITRIDED OXIDE 59287 0% 100% 3 Search REOXIDIZED+NITRIDED+OXIDE Search REOXIDIZED+NITRIDED+OXIDE
10 STORAGE DIELECTRIC 59287 0% 100% 3 Search STORAGE+DIELECTRIC Search STORAGE+DIELECTRIC

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 GUSEV, EP , LU, HC , GARFUNKEL, EL , GUSTAFSSON, T , GREEN, ML , (1999) GROWTH AND CHARACTERIZATION OF ULTRATHIN NITRIDED SILICON OXIDE FILMS.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 43. ISSUE 3. P. 265 -286 73 58% 137
2 DOUGLAS, MA , HATTANGADY, S , EASON, K , (2000) DEPTH PROFILE ANALYSIS OF ULTRATHIN SILICON OXYNITRIDE FILMS BY TOF-SIMS.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 147. ISSUE 5. P. 1893 -1902 39 87% 13
3 DANG, SS , TAKOUDIS, CG , (2000) RATE-LIMITING STEPS DURING NITROGEN INCORPORATION IN FURNACE-GROWN SILICON OXYNITRIDES: EFFECTS ON WAFER-TO-WAFER UNIFORMITY.THIN SOLID FILMS. VOL. 366. ISSUE 1-2. P. 225-231 37 86% 0
4 KRZEMINSKI, CD , (2013) MODELLING OF SILICON OXYNITRIDATION BY NITROUS OXIDE USING THE REACTION RATE APPROACH.JOURNAL OF APPLIED PHYSICS. VOL. 114. ISSUE 22. P. - 29 76% 0
5 BAUMVOL, IJR , (1999) ATOMIC TRANSPORT DURING GROWTH OF ULTRATHIN DIELECTRICS ON SILICON.SURFACE SCIENCE REPORTS. VOL. 36. ISSUE 1-8. P. 1 -166 65 43% 95
6 ELLIS, KA , BUHRMAN, RA , (1999) NITROUS OXIDE (N2O) PROCESSING FOR SILICON OXYNITRIDE GATE DIELECTRICS.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 43. ISSUE 3. P. 287 -300 29 97% 33
7 GUSEV, EP , LU, HC , GARFUNKEL, E , GUSTAFSSON, T , GREEN, ML , BRASEN, D , LENNARD, WN , (1998) NITROGEN ENGINEERING OF ULTRATHIN OXYNITRIDES BY A THERMAL NO/O-2/NO PROCESS.JOURNAL OF APPLIED PHYSICS. VOL. 84. ISSUE 5. P. 2980 -2982 29 91% 37
8 CHENG, HC , HER, JK , WU, CY , (1990) INFLUENCES OF ATMOSPHERIC-PRESSURE REOXIDATION ON THE ULTRATHIN OXIDE-FILMS NITRIDED IN ATMOSPHERIC NH3 AMBIENT.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 137. ISSUE 9. P. 2816-2819 38 100% 3
9 TEMPLE-BOYER, P , OLIVIE, F , KASSMI, K , SCHEID, E , SARRABAYROUSE, G , MARTINEZ, A , (1997) ELECTRICAL CHARACTERISTICS OF THIN SILICA LAYERS NITRIDED BY LPCVD NITROGEN DOPED SILICON.SOLID-STATE ELECTRONICS. VOL. 41. ISSUE 7. P. 951 -955 29 97% 0
10 ADAM, LS , BOWEN, C , LAW, ME , (2003) ON IMPLANT-BASED MULTIPLE GATE OXIDE SCHEMES FOR SYSTEM-ON-CHIP INTEGRATION.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 50. ISSUE 3. P. 589 -600 39 58% 6

Classes with closest relation at Level 1


Rank Class id link
1 21911 POLYOXIDE//INTER POLY DIELECTRIC IPD//INTERPOLY OXIDE
2 37271 GRAZING X RAY REFLECTOMETRY//ANOMALOUS DISPERSION EFFECT//BI POLAR DESIGN
3 24686 LOW TEMPERATURE SILICON OXIDATION//DIRECTIONAL OXIDATION//HIGH RATE SILICON OXIDATION
4 3298 SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM
5 2603 STRESS INDUCED LEAKAGE CURRENT//OXIDE RELIABILITY//SOFT BREAKDOWN
6 3635 SI OXIDATION//SILICON OXIDATION//SIO2 SI INTERFACE
7 33212 J AN SCI TECHNOL ORG//CYANIDE TREATMENT//DISPLAY TECHNOL DEV GRP
8 29312 CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL
9 19608 SI SIO2//GE INSULATOR STRUCTURE//MICROWAVE TRANSIENT PHOTOCONDUCTIVITY
10 14061 NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI//NEGATIVE BIAS TEMPERATURE INSTABILITY//NBTI

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