Class information for:
Level 1: LOW TEMPERATURE SILICON OXIDATION//DIRECTIONAL OXIDATION//HIGH RATE SILICON OXIDATION

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
24686 304 18.0 47%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
474 2             FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI 15884
24686 1                   LOW TEMPERATURE SILICON OXIDATION//DIRECTIONAL OXIDATION//HIGH RATE SILICON OXIDATION 304

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 LOW TEMPERATURE SILICON OXIDATION authKW 301334 1% 100% 3
2 DIRECTIONAL OXIDATION authKW 200890 1% 100% 2
3 HIGH RATE SILICON OXIDATION authKW 200890 1% 100% 2
4 JORGENSEN MOTT MODEL authKW 200890 1% 100% 2
5 OXYGEN NEGATIVE ION authKW 150664 1% 50% 3
6 PLASMA OXIDATION authKW 105412 4% 8% 13
7 AL2O3 CENTER DOT SIO2 COMPOSITE THIN FILM authKW 100445 0% 100% 1
8 COPLANAR DBD authKW 100445 0% 100% 1
9 CR ETCHING authKW 100445 0% 100% 1
10 DIRECTIONAL SILICON OXIDATION authKW 100445 0% 100% 1

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 4016 26% 0% 80
2 Physics, Applied 3553 68% 0% 207
3 Physics, Condensed Matter 798 28% 0% 85
4 Materials Science, Multidisciplinary 196 20% 0% 62
5 Engineering, Electrical & Electronic 190 17% 0% 51
6 Electrochemistry 137 6% 0% 19
7 Nanoscience & Nanotechnology 75 6% 0% 19
8 COMPUTER APPLICATIONS & CYBERNETICS 36 0% 0% 1
9 Chemistry, Physical 14 8% 0% 24
10 Materials Science, Ceramics 3 1% 0% 3

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 MAT SCI MINERAL ENGN XRAY OPT 100445 0% 100% 1
2 MITERCNR 100445 0% 100% 1
3 SDPM ENGN 100445 0% 100% 1
4 SOALR TERR ENVIRONM 100445 0% 100% 1
5 CHEVREUL 66961 1% 33% 2
6 CHAIRE UNESCO SUR GEST EAU 50221 0% 50% 1
7 ADV MARKING S 33480 0% 33% 1
8 LASIRUMR 8516 33480 0% 33% 1
9 OPTOMECHATORON 25110 0% 25% 1
10 YAMANASHI 25110 0% 25% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 THIN SOLID FILMS 2470 10% 0% 30
2 APPLICATIONS OF SURFACE SCIENCE 1743 1% 1% 3
3 JOURNAL OF APPLIED PHYSICS 1556 13% 0% 41
4 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY 1353 1% 0% 4
5 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 1062 6% 0% 18
6 APPLIED SURFACE SCIENCE 805 6% 0% 17
7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 695 3% 0% 10
8 OPEN CHEMISTRY 618 0% 1% 1
9 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 588 3% 0% 10
10 JAPAN ANNUAL REVIEWS IN ELECTRONICS COMPUTERS & TELECOMMUNICATIONS 569 0% 1% 1

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 LOW TEMPERATURE SILICON OXIDATION 301334 1% 100% 3 Search LOW+TEMPERATURE+SILICON+OXIDATION Search LOW+TEMPERATURE+SILICON+OXIDATION
2 DIRECTIONAL OXIDATION 200890 1% 100% 2 Search DIRECTIONAL+OXIDATION Search DIRECTIONAL+OXIDATION
3 HIGH RATE SILICON OXIDATION 200890 1% 100% 2 Search HIGH+RATE+SILICON+OXIDATION Search HIGH+RATE+SILICON+OXIDATION
4 JORGENSEN MOTT MODEL 200890 1% 100% 2 Search JORGENSEN+MOTT+MODEL Search JORGENSEN+MOTT+MODEL
5 OXYGEN NEGATIVE ION 150664 1% 50% 3 Search OXYGEN+NEGATIVE+ION Search OXYGEN+NEGATIVE+ION
6 PLASMA OXIDATION 105412 4% 8% 13 Search PLASMA+OXIDATION Search PLASMA+OXIDATION
7 AL2O3 CENTER DOT SIO2 COMPOSITE THIN FILM 100445 0% 100% 1 Search AL2O3+CENTER+DOT+SIO2+COMPOSITE+THIN+FILM Search AL2O3+CENTER+DOT+SIO2+COMPOSITE+THIN+FILM
8 COPLANAR DBD 100445 0% 100% 1 Search COPLANAR+DBD Search COPLANAR+DBD
9 CR ETCHING 100445 0% 100% 1 Search CR+ETCHING Search CR+ETCHING
10 DIRECTIONAL SILICON OXIDATION 100445 0% 100% 1 Search DIRECTIONAL+SILICON+OXIDATION Search DIRECTIONAL+SILICON+OXIDATION

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 TAYLOR, S , ZHANG, JF , ECCLESTON, W , (1993) A REVIEW OF THE PLASMA OXIDATION OF SILICON AND ITS APPLICATIONS.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 8. ISSUE 7. P. 1426-1433 27 79% 30
2 TAKAHASHI, S , SHINDO, H , (2011) SILICON TRENCH OXIDATION IN DOWNSTREAM OF MICROWAVE OXYGEN PLASMA.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 50. ISSUE 6. P. - 17 68% 0
3 HESS, DW , (1999) PLASMA ASSISTED OXIDATION, ANODIZATION, AND NITRIDATION OF SILICON.IBM JOURNAL OF RESEARCH AND DEVELOPMENT. VOL. 43. ISSUE 1-2. P. 127-145 34 45% 33
4 MATSUO, S , YAMAMOTO, M , SADOH, T , TSURUSHIMA, T , GAO, DW , FURUKAWA, K , NAKASHIMA, H , (2000) EFFECTS OF ION IRRADIATION ON SILICON OXIDATION IN ELECTRON CYCLOTRON RESONANCE ARGON AND OXYGEN MIXED PLASMA.JOURNAL OF APPLIED PHYSICS. VOL. 88. ISSUE 3. P. 1664 -1669 19 63% 11
5 CHOKSI, AJ , LAL, R , CHANDORKAR, AN , (1992) GROWTH-KINETICS OF SILICON DIOXIDE ON SILICON IN AN INDUCTIVELY COUPLED RF PLASMA AT CONSTANT ANODIZATION CURRENTS.JOURNAL OF APPLIED PHYSICS. VOL. 72. ISSUE 4. P. 1550-1557 18 90% 10
6 HASEGAWA, I , YAMAUCHI, T , SUGAI, H , (2007) MECHANISM OF OXIDATION OF SI SURFACES EXPOSED TO O-2/AR MICROWAVE-EXCITED PLASMA.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 46. ISSUE 1. P. 98 -104 11 73% 9
7 CHOKSI, AJ , LAL, R , CHANDORKAR, AN , (1991) ELECTRICAL-PROPERTIES OF SILICON DIOXIDE FILMS GROWN BY INDUCTIVELY COUPLED RF PLASMA ANODIZATION.SOLID-STATE ELECTRONICS. VOL. 34. ISSUE 7. P. 765-770 15 88% 3
8 ELJABALY, K , REISMAN, A , (1991) SPECIES CHARGE AND OXIDATION MECHANISM IN THE CATHODIC PLASMA OXIDATION OF SILICON.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 138. ISSUE 4. P. 1071 -1076 13 100% 5
9 BUIU, O , KENNEDY, GP , GARTNER, M , TAYLOR, S , (1998) STRUCTURAL ANALYSIS OF SILICON DIOXIDE AND SILICON OXYNITRIDE FILMS PRODUCED USING AN OXYGEN PLASMA.IEEE TRANSACTIONS ON PLASMA SCIENCE. VOL. 26. ISSUE 6. P. 1700 -1712 16 57% 5
10 JAJU, V , DALAL, V , (2008) GROWTH AND PROPERTIES OF FLUORINATED PLASMA OXIDE FOR SI MOSFET DEVICES.JOURNAL OF NON-CRYSTALLINE SOLIDS. VOL. 354. ISSUE 19-25. P. 2839-2842 7 88% 1

Classes with closest relation at Level 1


Rank Class id link
1 33212 J AN SCI TECHNOL ORG//CYANIDE TREATMENT//DISPLAY TECHNOL DEV GRP
2 3635 SI OXIDATION//SILICON OXIDATION//SIO2 SI INTERFACE
3 6002 BORON PENETRATION//NITRIDED OXIDE//OXYNITRIDATION
4 10794 CONDUCTANCE TRANSIENTS//INDIUM PHOSPHIDE100//INSULATOR DAMAGE
5 12287 ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE
6 17770 VOLTCOULOMETRY//DLTS RESOLUTION//SEMI INSULATING MATERIALS
7 28032 MIS TUNNEL DIODE//ANODIC OXIDE ANO//COMPOSED CAPACITOR
8 3298 SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM
9 31370 CLEANROOM//MINIENVIRONMENT//FAN FILTER UNIT
10 19470 PLANE PLASMA DISCHARGE//ENERGY INFLUX//DRY DEVELOPMENT

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