Class information for:
Level 1: GRAZING X RAY REFLECTOMETRY//ANOMALOUS DISPERSION EFFECT//BI POLAR DESIGN

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
37271 62 27.5 49%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
474 2             FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI 15884
37271 1                   GRAZING X RAY REFLECTOMETRY//ANOMALOUS DISPERSION EFFECT//BI POLAR DESIGN 62

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 GRAZING X RAY REFLECTOMETRY authKW 656680 3% 67% 2
2 ANOMALOUS DISPERSION EFFECT authKW 492511 2% 100% 1
3 BI POLAR DESIGN authKW 492511 2% 100% 1
4 DIRECT STRUCTURE DEPTH PROFILING authKW 492511 2% 100% 1
5 DRN DEC address 492511 2% 100% 1
6 ENERGY DIFFERENTIAL ANOMALOUS SMALL ANGLE SCATTERING METHOD authKW 492511 2% 100% 1
7 NI PD THIN FILM authKW 492511 2% 100% 1
8 OXIDATION HUMIDITY authKW 492511 2% 100% 1
9 PD AG BILAYER authKW 492511 2% 100% 1
10 SAMPLE CURRENT authKW 492511 2% 100% 1

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 375 50% 0% 31
2 Materials Science, Coatings & Films 365 18% 0% 11
3 Materials Science, Multidisciplinary 82 27% 0% 17
4 Engineering, Electrical & Electronic 55 19% 0% 12
5 Crystallography 48 8% 0% 5
6 Metallurgy & Metallurgical Engineering 43 10% 0% 6
7 Nuclear Science & Technology 39 8% 0% 5
8 Instruments & Instrumentation 20 6% 0% 4
9 Nanoscience & Nanotechnology 17 6% 0% 4
10 Materials Science, Ceramics 13 3% 0% 2

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 DRN DEC 492511 2% 100% 1
2 CERAM NUCL 246255 2% 50% 1
3 MICROSYST INTEGRAT S 130359 10% 4% 6
4 PL MATH OPERAT GRP 123124 3% 13% 2
5 TELECOMMUN ENERGY S 70753 8% 3% 5
6 URA 2090 28969 2% 6% 1
7 RMCS 24622 3% 3% 2
8 FUNCT MAT S 8639 2% 2% 1
9 ADV MAT PROC 3172 5% 0% 3
10 LETAM 2158 2% 0% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SPRINGER TRACTS IN MODERN PHYSICS 4066 3% 0% 2
2 MATERIALS TRANSACTIONS JIM 3471 6% 0% 4
3 TEXTURES AND MICROSTRUCTURES 1557 2% 0% 1
4 NEC RESEARCH & DEVELOPMENT 1130 2% 0% 1
5 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 866 8% 0% 5
6 JOURNAL OF APPLIED CRYSTALLOGRAPHY 783 5% 0% 3
7 JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY-ARTICLES 563 3% 0% 2
8 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 469 6% 0% 4
9 JOURNAL OF ELECTRONIC MATERIALS 453 5% 0% 3
10 POWDER DIFFRACTION 424 2% 0% 1

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 GRAZING X RAY REFLECTOMETRY 656680 3% 67% 2 Search GRAZING+X+RAY+REFLECTOMETRY Search GRAZING+X+RAY+REFLECTOMETRY
2 ANOMALOUS DISPERSION EFFECT 492511 2% 100% 1 Search ANOMALOUS+DISPERSION+EFFECT Search ANOMALOUS+DISPERSION+EFFECT
3 BI POLAR DESIGN 492511 2% 100% 1 Search BI+POLAR+DESIGN Search BI+POLAR+DESIGN
4 DIRECT STRUCTURE DEPTH PROFILING 492511 2% 100% 1 Search DIRECT+STRUCTURE+DEPTH+PROFILING Search DIRECT+STRUCTURE+DEPTH+PROFILING
5 ENERGY DIFFERENTIAL ANOMALOUS SMALL ANGLE SCATTERING METHOD 492511 2% 100% 1 Search ENERGY+DIFFERENTIAL+ANOMALOUS+SMALL+ANGLE+SCATTERING+METHOD Search ENERGY+DIFFERENTIAL+ANOMALOUS+SMALL+ANGLE+SCATTERING+METHOD
6 NI PD THIN FILM 492511 2% 100% 1 Search NI+PD+THIN+FILM Search NI+PD+THIN+FILM
7 OXIDATION HUMIDITY 492511 2% 100% 1 Search OXIDATION+HUMIDITY Search OXIDATION+HUMIDITY
8 PD AG BILAYER 492511 2% 100% 1 Search PD+AG+BILAYER Search PD+AG+BILAYER
9 SAMPLE CURRENT 492511 2% 100% 1 Search SAMPLE+CURRENT Search SAMPLE+CURRENT
10 SILICON OXIDE SILICON INTERFACE 492511 2% 100% 1 Search SILICON+OXIDE+SILICON+INTERFACE Search SILICON+OXIDE+SILICON+INTERFACE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 YAMADA, H , (2008) EFFECTS OF N AND F PASSIVATION ON THE RELIABILITY AND INTERFACE STRUCTURE OF 700 DEGREES C GROWN ULTRATHIN SILICON OXIDE/SI(100) GATE FILMS.JOURNAL OF APPLIED PHYSICS. VOL. 103. ISSUE 1. P. - 30 54% 0
2 YAMADA, H , (2006) EXCESS SI AND PASSIVATING N AND F ATOMS NEAR THE PYROLYTIC-GAS-PASSIVATED ULTRATHIN SILICON OXIDE FILM/SI(100) INTERFACE.JOURNAL OF APPLIED PHYSICS. VOL. 100. ISSUE 12. P. - 27 47% 1
3 YAMADA, H , (2006) ADDITIONAL FLUORINE PASSIVATION TO PYROLYTIC-N2O PASSIVATED ULTRATHIN SILICON OXIDE/SI(100) FILMS.JOURNAL OF APPLIED PHYSICS. VOL. 100. ISSUE 3. P. - 25 50% 3
4 YAMADA, H , (2005) INHIBITION OF EXCESS INTERFACE SI ATOM GENERATION IN 700 DEGREES C-GROWN PYROLYTIC-GAS PASSIVATED ULTRATHIN SILICON OXIDE FILMS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 23. ISSUE 4. P. 599 -604 22 48% 5
5 YAMADA, H , (2008) FUNDAMENTAL RELIABILITY OF 1.5-NM-THICK SILICON OXIDE GATE FILMS GROWN AT 150 DEGREES C BY MODIFIED REACTIVE ION BEAM DEPOSITION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 26. ISSUE 1. P. 36 -43 23 42% 0
6 YAMADA, H , (2004) CORRELATION BETWEEN DENSITY AND OXIDATION TEMPERATURE FOR PYROLYTIC-GAS PASSIVATED ULTRATHIN SILICON OXIDE FILMS.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 22. ISSUE 1. P. 82-87 20 49% 8
7 YAMADA, H , (2003) DENSITY AND NITROGEN CONTENT OF ULTRATHIN SILICON OXIDE GATE FILMS GROWN USING IN SITU PYROLYTIC-GAS PASSIVATION.JOURNAL OF APPLIED PHYSICS. VOL. 93. ISSUE 8. P. 4902 -4908 19 49% 6
8 YAMADA, H , (2002) CHANGES IN THE DENSITY OF ULTRATHIN SILICON OXIDE FILMS RELATED TO EXCESS SI ATOMS NEAR THE OXIDE-SI(100) INTERFACE.JOURNAL OF APPLIED PHYSICS. VOL. 91. ISSUE 3. P. 1108 -1112 16 59% 9
9 YAMADA, H , (2007) 1.5-NM-THICK SILICON OXIDE GATE FILMS GROWN AT 150 DEGREES C USING MODIFIED REACTIVE ION BEAM DEPOSITION WITH PYROLYTIC-GAS PASSIVATION.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 25. ISSUE 2. P. 340 -346 22 34% 2
10 YAMADA, H , (2001) CORRELATION BETWEEN EXCESS SI ATOMS NEAR THE ULTRATHIN SILICON OXIDE-SI(100) INTERFACE AND OXIDATION TEMPERATURE.JOURNAL OF ELECTRONIC MATERIALS. VOL. 30. ISSUE 8. P. 1021 -1027 15 58% 5

Classes with closest relation at Level 1


Rank Class id link
1 6002 BORON PENETRATION//NITRIDED OXIDE//OXYNITRIDATION
2 3635 SI OXIDATION//SILICON OXIDATION//SIO2 SI INTERFACE
3 26450 VORONOI DIAGRAM//VORONOI DIAGRAM OF SPHERES//QUASI TRIANGULATION
4 2603 STRESS INDUCED LEAKAGE CURRENT//OXIDE RELIABILITY//SOFT BREAKDOWN
5 12305 TOTAL EXTERNAL REFLECTION//X RAY STANDING WAVES//BACKSCATTERING DIFFRACTION
6 33847 DILATIONAL FRICTION//DIFFRACTED SH WAVES//LAME PARAMETER
7 30368 DIELECTRIC CONSTANTS FROM DC TO MICROWAVE FREQUENCIES//ANCHORING LIQUID CRYSTAL//AU SI111 SYSTEM
8 26012 THERMO REACTIVE DEPOSITION//NIOBIUM CARBIDE COATING//VC COATING
9 8993 JOURNAL OF RADIOANALYTICAL CHEMISTRY//JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY-ARTICLES//LOSS FREE COUNTING
10 4469 HOT CARRIERS//HOT CARRIER DEGRADATION//CHARGE PUMPING

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