Class information for:
Level 1: SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
3298 2017 21.2 60%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
474 2             FLASH MEMORY//SONOS//NEGATIVE BIAS TEMPERATURE INSTABILITY NBTI 15884
3298 1                   SILICON OXYNITRIDE//SILICON NITRIDE//SILICON NITRIDE FILM 2017

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 SILICON OXYNITRIDE authKW 299026 3% 29% 68
2 SILICON NITRIDE authKW 260723 10% 8% 211
3 SILICON NITRIDE FILM authKW 203303 1% 45% 30
4 PECVD authKW 61534 4% 6% 73
5 ION ENERGY DIAGNOSTICS authKW 60549 0% 100% 4
6 AMORPHOUS SILICON NITRIDE authKW 52184 0% 34% 10
7 EFFECTIVE TRAPPED CARRIER DENSITY authKW 45412 0% 100% 3
8 ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION authKW 45412 0% 100% 3
9 SIH4 N 2 authKW 45412 0% 100% 3
10 SIH4 NH3 authKW 45412 0% 100% 3

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with term
in class
1 Materials Science, Coatings & Films 26460 26% 0% 529
2 Physics, Applied 17520 59% 0% 1194
3 Physics, Condensed Matter 4008 25% 0% 497
4 Materials Science, Multidisciplinary 3816 32% 0% 646
5 Materials Science, Ceramics 3620 9% 0% 175
6 Nanoscience & Nanotechnology 699 7% 0% 145
7 Electrochemistry 693 6% 0% 112
8 Engineering, Electrical & Electronic 651 13% 0% 260
9 Physics, Multidisciplinary 75 5% 0% 93
10 Instruments & Instrumentation 73 3% 0% 56

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 EPUSP 35826 1% 16% 15
2 ABT SF 4 30274 0% 100% 2
3 DEV MIDORI KU 30274 0% 100% 2
4 ELECT TECNOL COMPUTADO PROYECTOS 27245 0% 60% 3
5 FIS LICADA 3 21221 1% 6% 24
6 OPT RADIAT SECT 20182 0% 67% 2
7 SIMULAC DISPOSIT SEMICOND 20182 0% 67% 2
8 2121 HISAKATA 15137 0% 100% 1
9 ABT SILIZIUM PHOTOVOLTAIK IONENSTRAHL OR 15137 0% 100% 1
10 ADV TECH CORP 15137 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL OF NON-CRYSTALLINE SOLIDS 14782 7% 1% 150
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 14262 6% 1% 116
3 THIN SOLID FILMS 13668 9% 1% 182
4 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 5420 5% 0% 105
5 JOURNAL OF APPLIED PHYSICS 4506 9% 0% 182
6 SOVIET MICROELECTRONICS 4083 0% 3% 9
7 PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES 3151 1% 1% 26
8 SOLID STATE TECHNOLOGY 2616 1% 1% 18
9 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2283 3% 0% 51
10 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2227 3% 0% 69

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 SILICON OXYNITRIDE 299026 3% 29% 68 Search SILICON+OXYNITRIDE Search SILICON+OXYNITRIDE
2 SILICON NITRIDE 260723 10% 8% 211 Search SILICON+NITRIDE Search SILICON+NITRIDE
3 SILICON NITRIDE FILM 203303 1% 45% 30 Search SILICON+NITRIDE+FILM Search SILICON+NITRIDE+FILM
4 PECVD 61534 4% 6% 73 Search PECVD Search PECVD
5 ION ENERGY DIAGNOSTICS 60549 0% 100% 4 Search ION+ENERGY+DIAGNOSTICS Search ION+ENERGY+DIAGNOSTICS
6 AMORPHOUS SILICON NITRIDE 52184 0% 34% 10 Search AMORPHOUS+SILICON+NITRIDE Search AMORPHOUS+SILICON+NITRIDE
7 EFFECTIVE TRAPPED CARRIER DENSITY 45412 0% 100% 3 Search EFFECTIVE+TRAPPED+CARRIER+DENSITY Search EFFECTIVE+TRAPPED+CARRIER+DENSITY
8 ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION 45412 0% 100% 3 Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+DEPOSITION Search ELECTRON+CYCLOTRON+RESONANCE+PLASMA+DEPOSITION
9 SIH4 N 2 45412 0% 100% 3 Search SIH4+N+2 Search SIH4+N+2
10 SIH4 NH3 45412 0% 100% 3 Search SIH4+NH3 Search SIH4+NH3

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 HABRAKEN, FHPM , KUIPER, AET , (1994) SILICON-NITRIDE AND OXYNITRIDE FILMS.MATERIALS SCIENCE & ENGINEERING R-REPORTS. VOL. 12. ISSUE 3. P. 123 -175 116 56% 129
2 JIANG, WL , XU, DH , YAO, SK , XIONG, B , WANG, YL , (2016) EFFECT OF HYPERTHERMAL ANNEALING ON LPCVD SILICON NITRIDE.MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING. VOL. 43. ISSUE . P. 222 -229 30 70% 0
3 KOBAYASHI, K , SUZUKI, A , (2014) THERMAL STABILITY OF PARAMAGNETIC DEFECT CENTERS IN AMORPHOUS SILICON NITRIDE FILMS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 53. ISSUE 5. P. - 27 77% 0
4 GUPTA, M , RATHI, VK , THANGARAJ, R , AGNIHOTRI, OP , CHARI, KS , (1991) THE PREPARATION, PROPERTIES AND APPLICATIONS OF SILICON-NITRIDE THIN-FILMS DEPOSITED BY PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION.THIN SOLID FILMS. VOL. 204. ISSUE 1. P. 77-106 53 74% 63
5 GARCIA, S , MARTIN, JM , FERNANDEZ, M , MARTIL, I , GONZALEZDIAZ, G , (1996) PROPERTIES OF A-SINX:H FILMS DEPOSITED AT ROOM TEMPERATURE BY THE ELECTRON CYCLOTRON RESONANCE PLASMA METHOD.PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES. VOL. 73. ISSUE 3. P. 487 -502 33 94% 5
6 WANG, L , REEHAL, HS , MARTINEZ, FL , ANDRES, ES , DEL PRADO, A , (2003) CHARACTERIZATION OF NITROGEN-RICH SILICON NITRIDE FILMS GROWN BY THE ELECTRON CYCLOTRON RESONANCE PLASMA TECHNIQUE.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 18. ISSUE 7. P. 633-641 33 72% 11
7 DERGEZ, D , SCHNEIDER, M , BITTNER, A , PAWLAK, N , SCHMID, U , (2016) MECHANICAL AND ELECTRICAL PROPERTIES OF RF MAGNETRON SPUTTER DEPOSITED AMORPHOUS SILICON-RICH SILICON NITRIDE THIN FILMS.THIN SOLID FILMS. VOL. 606. ISSUE . P. 7 -12 22 79% 0
8 PATIL, LS , PANDEY, RK , BANG, JP , GAIKWAD, SA , GAUTAM, DK , (2005) EFFECT OF DEPOSITION TEMPERATURE ON THE CHEMICAL PROPERTIES OF THERMALLY DEPOSITED SILICON NITRIDE FILMS.OPTICAL MATERIALS. VOL. 27. ISSUE 4. P. 663-670 26 81% 23
9 DERGEZ, D , SCHALKO, J , BITTNER, A , SCHMID, U , (2013) FUNDAMENTAL PROPERTIES OF A-SINX: H THIN FILMS DEPOSITED BY ICP-PECVD FOR MEMS APPLICATIONS.APPLIED SURFACE SCIENCE. VOL. 284. ISSUE . P. 348-353 24 71% 6
10 ROBERTSON, J , (1991) ELECTRONIC-STRUCTURE OF SILICON-NITRIDE.PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES. VOL. 63. ISSUE 1. P. 47-77 44 59% 244

Classes with closest relation at Level 1


Rank Class id link
1 6002 BORON PENETRATION//NITRIDED OXIDE//OXYNITRIDATION
2 25406 MSOS O P STRUCTURE//SI2H6 GAS//SEMI INSULATING POLYCRYSTALLINE SILICON
3 11111 TEOS PECVD//TEOS//FEATURE SCALE
4 37496 NONHERMETIC//OPTICAL TRANSCEIVER MODULES//PLASTIC OPTICAL TRANSCEIVER MODULES
5 20305 SILICON CARBONITRIDE//SICN//SILICON CARBON NITRIDE
6 21462 GAMMA SI3N4//TIN NITRIDE//CONCURRENT COMP MAT SIMULAT
7 20767 CAT CVD//CATALYTIC CHEMICAL VAPOR DEPOSITION//HOT WIRE CHEMICAL VAPOR DEPOSITION
8 14239 SILANE PLASMA//SIH2//SIH3
9 24686 LOW TEMPERATURE SILICON OXIDATION//DIRECTIONAL OXIDATION//HIGH RATE SILICON OXIDATION
10 18646 A S H ZNS MULTILAYER FILMS//A SIH NC SIH SUPERLATTICE//AMORPHOUS HYDROGENED SILICON NITRIDE

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