Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
566 | 3300 | 19.2 | 59% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
532 | 2 | IEEE TRANSACTIONS ON ELECTRON DEVICES//MOSFET//FINFET | 14860 |
566 | 1 | FINFET//SHORT CHANNEL EFFECTS//DOUBLE GATE MOSFET | 3300 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | FINFET | authKW | 869589 | 8% | 36% | 262 |
2 | SHORT CHANNEL EFFECTS | authKW | 781032 | 6% | 45% | 189 |
3 | DOUBLE GATE MOSFET | authKW | 740786 | 4% | 65% | 124 |
4 | COMPACT MODEL | authKW | 452174 | 5% | 30% | 164 |
5 | SHORT CHANNEL EFFECTS SCES | authKW | 444496 | 2% | 78% | 62 |
6 | MOSFET | authKW | 375700 | 11% | 11% | 369 |
7 | SOI MOSFET | authKW | 356161 | 2% | 51% | 76 |
8 | IEEE TRANSACTIONS ON ELECTRON DEVICES | journal | 350001 | 23% | 5% | 757 |
9 | JUNCTIONLESS | authKW | 338016 | 2% | 70% | 52 |
10 | DOUBLE GATE | authKW | 316040 | 2% | 42% | 81 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 58488 | 76% | 0% | 2514 |
2 | Physics, Applied | 32952 | 63% | 0% | 2086 |
3 | Physics, Condensed Matter | 5556 | 23% | 0% | 755 |
4 | Nanoscience & Nanotechnology | 4417 | 13% | 0% | 432 |
5 | Computer Science, Hardware & Architecture | 348 | 2% | 0% | 70 |
6 | Materials Science, Multidisciplinary | 168 | 9% | 0% | 287 |
7 | Optics | 72 | 3% | 0% | 115 |
8 | Physics, Multidisciplinary | 36 | 3% | 0% | 112 |
9 | Mathematics, Interdisciplinary Applications | 9 | 1% | 0% | 29 |
10 | Materials Science, Coatings & Films | 0 | 1% | 0% | 17 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | NANO DEVICE SIMULAT | 182261 | 1% | 73% | 27 |
2 | DEEN DAYAL UPADHYAYA | 146751 | 1% | 36% | 44 |
3 | MOTILAL NEHRU | 136744 | 1% | 48% | 31 |
4 | NISRC | 84101 | 0% | 91% | 10 |
5 | ELECT ENGN DISCIPLINE | 83256 | 0% | 75% | 12 |
6 | LOW POWER NANOELECT GRP | 83256 | 0% | 75% | 12 |
7 | SEMICOND DEVICE | 80494 | 2% | 16% | 56 |
8 | ENGN ELECT ELECT AUTOMAT | 74555 | 1% | 18% | 44 |
9 | INTEGRATED MICROSYST | 74056 | 1% | 28% | 29 |
10 | SEMICOND DEVICES | 73500 | 1% | 22% | 36 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 350001 | 23% | 5% | 757 |
2 | SOLID-STATE ELECTRONICS | 197990 | 14% | 5% | 459 |
3 | IEEE ELECTRON DEVICE LETTERS | 103787 | 10% | 4% | 318 |
4 | JOURNAL OF COMPUTATIONAL ELECTRONICS | 39653 | 2% | 6% | 67 |
5 | JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE | 18526 | 1% | 6% | 33 |
6 | IEEE TRANSACTIONS ON NANOTECHNOLOGY | 17352 | 2% | 3% | 58 |
7 | MICROELECTRONICS JOURNAL | 13103 | 2% | 2% | 74 |
8 | JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS | 9941 | 1% | 3% | 33 |
9 | MICROELECTRONICS RELIABILITY | 9750 | 3% | 1% | 86 |
10 | SUPERLATTICES AND MICROSTRUCTURES | 9195 | 2% | 1% | 80 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | FINFET | 869589 | 8% | 36% | 262 | Search FINFET | Search FINFET |
2 | SHORT CHANNEL EFFECTS | 781032 | 6% | 45% | 189 | Search SHORT+CHANNEL+EFFECTS | Search SHORT+CHANNEL+EFFECTS |
3 | DOUBLE GATE MOSFET | 740786 | 4% | 65% | 124 | Search DOUBLE+GATE+MOSFET | Search DOUBLE+GATE+MOSFET |
4 | COMPACT MODEL | 452174 | 5% | 30% | 164 | Search COMPACT+MODEL | Search COMPACT+MODEL |
5 | SHORT CHANNEL EFFECTS SCES | 444496 | 2% | 78% | 62 | Search SHORT+CHANNEL+EFFECTS+SCES | Search SHORT+CHANNEL+EFFECTS+SCES |
6 | MOSFET | 375700 | 11% | 11% | 369 | Search MOSFET | Search MOSFET |
7 | SOI MOSFET | 356161 | 2% | 51% | 76 | Search SOI+MOSFET | Search SOI+MOSFET |
8 | JUNCTIONLESS | 338016 | 2% | 70% | 52 | Search JUNCTIONLESS | Search JUNCTIONLESS |
9 | DOUBLE GATE | 316040 | 2% | 42% | 81 | Search DOUBLE+GATE | Search DOUBLE+GATE |
10 | DIBL | 287492 | 2% | 60% | 52 | Search DIBL | Search DIBL |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | PARIHAR, MS , KRANTI, A , (2014) REVISITING THE DOPING REQUIREMENT FOR LOW POWER JUNCTIONLESS MOSFETS.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 29. ISSUE 7. P. - | 42 | 93% | 13 |
2 | KRANTI, A , HAO, Y , ARMSTRONG, GA , (2008) PERFORMANCE PROJECTIONS AND DESIGN OPTIMIZATION OF PLANAR DOUBLE GATE SOI MOSFETS FOR LOGIC TECHNOLOGY APPLICATIONS.SEMICONDUCTOR SCIENCE AND TECHNOLOGY. VOL. 23. ISSUE 4. P. - | 46 | 85% | 4 |
3 | PARIHAR, MS , GHOSH, D , KRANTI, A , (2013) SINGLE TRANSISTOR LATCH PHENOMENON IN JUNCTIONLESS TRANSISTORS.JOURNAL OF APPLIED PHYSICS. VOL. 113. ISSUE 18. P. - | 33 | 97% | 2 |
4 | BARI, S , DE, D , SARKAR, A , (2015) EFFECT OF GATE ENGINEERING IN JLSRG MOSFET TO SUPPRESS SCES: AN ANALYTICAL STUDY.PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES. VOL. 67. ISSUE . P. 143 -151 | 33 | 92% | 0 |
5 | BARAL, B , DAS, AK , DE, D , SARKAR, A , (2016) AN ANALYTICAL MODEL OF TRIPLE-MATERIAL DOUBLE-GATE METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR TO SUPPRESS SHORT-CHANNEL EFFECTS.INTERNATIONAL JOURNAL OF NUMERICAL MODELLING-ELECTRONIC NETWORKS DEVICES AND FIELDS. VOL. 29. ISSUE 1. P. 47 -62 | 29 | 94% | 1 |
6 | HIBLOT, G , LACORD, J , AKBAL, M , RAFHAY, Q , BOEUF, F , GHIBAUDO, G , (2015) COMPACT MODEL OF SHORT-CHANNEL EFFECTS FOR FDSOI DEVICES INCLUDING THE INFLUENCE OF BACK-BIAS AND FRINGING FIELDS FOR SI AND III-V TECHNOLOGY.SOLID-STATE ELECTRONICS. VOL. 107. ISSUE . P. 1 -7 | 29 | 100% | 1 |
7 | HU, GX , HU, SY , FENG, JH , LIU, R , WANG, LL , ZHENG, LR , (2016) ANALYTICAL MODELS FOR CHANNEL POTENTIAL, THRESHOLD VOLTAGE, AND SUBTHRESHOLD SWING OF JUNCTIONLESS TRIPLE-GATE FINFETS.MICROELECTRONICS JOURNAL. VOL. 50. ISSUE . P. 60 -65 | 25 | 100% | 2 |
8 | VISHVAKARMA, SK , SAXENA, AK , DASGUPTA, S , (2008) TWO DIMENSIONAL ANALYTICAL POTENTIAL MODELING OF NANOSCALE FULLY DEPLETED METAL GATE DOUBLE GATE MOSFET.JOURNAL OF NANOELECTRONICS AND OPTOELECTRONICS. VOL. 3. ISSUE 3. P. 297-306 | 34 | 100% | 1 |
9 | SAHAY, S , KUMAR, MJ , (2017) SYMMETRIC OPERATION IN AN EXTENDED BACK GATE JLFET FOR SCALING TO THE 5-NM REGIME CONSIDERING QUANTUM CONFINEMENT EFFECTS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 64. ISSUE 1. P. 21 -27 | 31 | 89% | 0 |
10 | KILCHYTSKA, V , ARSHAD, MKM , MAKOVEJEV, S , OLSEN, S , ANDRIEU, F , POIROUX, T , FAYNOT, O , RASKIN, JP , FLANDRE, D , (2012) ULTRA-THIN BODY AND THIN-BOX SOI CMOS TECHNOLOGY ANALOG FIGURES OF MERIT.SOLID-STATE ELECTRONICS. VOL. 70. ISSUE . P. 50 -58 | 33 | 89% | 7 |
Classes with closest relation at Level 1 |