Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
22955 | 363 | 16.2 | 58% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
532 | 2 | IEEE TRANSACTIONS ON ELECTRON DEVICES//MOSFET//FINFET | 14860 |
22955 | 1 | QUANTUM MECHANICAL EFFECTS//WAVE FUNCTION PENETRATION//QUANTUM MECHANICAL EFFECTS QMES | 363 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | QUANTUM MECHANICAL EFFECTS | authKW | 713016 | 7% | 31% | 27 |
2 | WAVE FUNCTION PENETRATION | authKW | 448628 | 2% | 67% | 8 |
3 | QUANTUM MECHANICAL EFFECTS QMES | authKW | 350493 | 1% | 83% | 5 |
4 | QUANTUM MECHANICAL QM EFFECTS | authKW | 300421 | 1% | 71% | 5 |
5 | INVERSION LAYER | authKW | 264028 | 5% | 17% | 19 |
6 | POISSON SCHRODINGER SIMULATION | authKW | 252356 | 1% | 100% | 3 |
7 | SURFACE QUANTIZATION | authKW | 252356 | 1% | 100% | 3 |
8 | ULTRATHIN GATE OXIDE | authKW | 183512 | 3% | 18% | 12 |
9 | ELECTRICAL OXIDE THICKNESS | authKW | 168237 | 1% | 100% | 2 |
10 | INVERSION QUANTIZATION | authKW | 168237 | 1% | 100% | 2 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 5477 | 71% | 0% | 256 |
2 | Physics, Applied | 4272 | 68% | 0% | 248 |
3 | Physics, Condensed Matter | 731 | 25% | 0% | 90 |
4 | Nanoscience & Nanotechnology | 297 | 10% | 0% | 38 |
5 | Engineering, Manufacturing | 45 | 2% | 0% | 8 |
6 | Optics | 9 | 4% | 0% | 13 |
7 | Computer Science, Hardware & Architecture | 3 | 1% | 0% | 3 |
8 | Mathematics, Interdisciplinary Applications | 3 | 1% | 0% | 4 |
9 | Materials Science, Multidisciplinary | 2 | 6% | 0% | 20 |
10 | Education, Scientific Disciplines | 2 | 1% | 0% | 2 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SI NANO DEVICE | 112157 | 1% | 67% | 2 |
2 | ADV ELECT SYST INFORMAT COMMUN TECHNO | 84119 | 0% | 100% | 1 |
3 | ADV SEMICOND DEVICE S | 84119 | 0% | 100% | 1 |
4 | CASCADE SCI LTD | 84119 | 0% | 100% | 1 |
5 | EMERGING DEVICE TECHNOL GRP | 84119 | 0% | 100% | 1 |
6 | FLASH MEMORY DEVICE TECHNOL | 84119 | 0% | 100% | 1 |
7 | MICROTECIMOL NANOSCI | 84119 | 0% | 100% | 1 |
8 | NANDEVICES SYST | 84119 | 0% | 100% | 1 |
9 | UMRENSERGLPCS | 84119 | 0% | 100% | 1 |
10 | INTEGRATED CIRCUITS | 82064 | 3% | 9% | 11 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 43993 | 25% | 1% | 89 |
2 | SOLID-STATE ELECTRONICS | 22222 | 14% | 1% | 51 |
3 | IEEE ELECTRON DEVICE LETTERS | 8959 | 9% | 0% | 31 |
4 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 3431 | 2% | 1% | 8 |
5 | INTERNATIONAL JOURNAL OF NUMERICAL MODELLING-ELECTRONIC NETWORKS DEVICES AND FIELDS | 1413 | 1% | 0% | 4 |
6 | MICROELECTRONIC ENGINEERING | 1383 | 4% | 0% | 13 |
7 | JOURNAL OF COMPUTATIONAL ELECTRONICS | 1281 | 1% | 0% | 4 |
8 | CHINESE JOURNAL OF ELECTRONICS | 1194 | 2% | 0% | 6 |
9 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 958 | 5% | 0% | 19 |
10 | MICROELECTRONICS RELIABILITY | 765 | 2% | 0% | 8 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | SRIKANTAIAH, JG , DASGUPTA, A , (2012) QUANTUM MECHANICAL EFFECTS IN BULK MOSFETS FROM A COMPACT MODELING PERSPECTIVE: A REVIEW.IETE TECHNICAL REVIEW. VOL. 29. ISSUE 1. P. 3 -28 | 42 | 59% | 3 |
2 | VOGEL, EM , RICHTER, CA , RENNEX, BG , (2003) A CAPACITANCE-VOLTAGE MODEL FOR POLYSILICON-GATED MOS DEVICES INCLUDING SUBSTRATE QUANTIZATION EFFECTS BASED ON MODIFICATION OF THE TOTAL SEMICONDUCTOR CHARGE.SOLID-STATE ELECTRONICS. VOL. 47. ISSUE 9. P. 1589 -1596 | 20 | 74% | 14 |
3 | LEE, W , SU, P , SU, KW , CHIANG, CS , LIU, S , (2008) INVESTIGATION OF ANOMALOUS INVERSION C-V CHARACTERISTICS FOR LONG-CHANNEL MOSFETS WITH LEAKY DIELECTRICS: MECHANISMS AND RECONSTRUCTION.IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING. VOL. 21. ISSUE 1. P. 104 -109 | 13 | 93% | 2 |
4 | YADAV, BPK , DUTTA, AK , (2010) AN ANALYTICAL MODEL OF THE FIRST EIGEN ENERGY LEVEL FOR MOSFETS HAVING ULTRATHIN GATE OXIDES.JOURNAL OF SEMICONDUCTOR TECHNOLOGY AND SCIENCE. VOL. 10. ISSUE 3. P. 203 -212 | 10 | 91% | 0 |
5 | WANG, Y , CHEUNG, KP , CHOI, R , LEE, BH , (2008) AN ACCURATE CAPACITANCE-VOLTAGE MEASUREMENT METHOD FOR HIGHLY LEAKY DEVICES - PART I.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 55. ISSUE 9. P. 2429 -2436 | 11 | 85% | 8 |
6 | HOU, YT , LI, MF , (2001) HOLE QUANTIZATION EFFECTS AND THRESHOLD VOLTAGE SHIFT IN PMOSFET - ASSESSED BY IMPROVED ONE-BAND EFFECTIVE MASS APPROXIMATION.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 48. ISSUE 6. P. 1188-1193 | 14 | 82% | 5 |
7 | HAQUE, A , KAUSER, MZ , (2002) A COMPARISON OF WAVE-FUNCTION PENETRATION EFFECTS ON GATE CAPACITANCE IN DEEP SUBMICRON N- AND P-MOSFETS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 49. ISSUE 9. P. 1580-1587 | 15 | 71% | 19 |
8 | LARCHER, L , PAVAN, P , PELLIZZER, F , GHIDINI, G , (2001) A NEW MODEL OF GATE CAPACITANCE AS A SIMPLE TOOL TO EXTRACT MOS PARAMETERS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 48. ISSUE 5. P. 935 -945 | 14 | 78% | 20 |
9 | PALESTRI, P , BARIN, N , BRUNEL, D , BUSSERET, C , CAMPERA, A , CHILDS, PA , DRIUSSI, F , FIEGNA, C , FIORI, G , GUSMEROLI, R , ET AL (2007) COMPARISON OF MODELING APPROACHES FOR THE CAPACITANCE-VOLTAGE AND CURRENT-VOLTAGE CHARACTERISTICS OF ADVANCED GATE STACKS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 54. ISSUE 1. P. 106-114 | 16 | 55% | 12 |
10 | SAN ANDRES, E , PANTISANO, L , RAMOS, J , ROUSSEL, PJ , O'SULLIVAN, BJ , TOLEDANO-LUQUE, M , DEGENDT, S , GROESENEKEN, G , (2007) ACCURATE GATE IMPEDANCE DETERMINATION ON ULTRALEAKY MOSFETS BY FITTING TO A THREE-LUMPED-PARAMETER MODEL AT FREQUENCIES FROM DC TO RF.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 54. ISSUE 7. P. 1705 -1712 | 12 | 75% | 3 |
Classes with closest relation at Level 1 |