Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
13793 | 813 | 19.6 | 51% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
532 | 2 | IEEE TRANSACTIONS ON ELECTRON DEVICES//MOSFET//FINFET | 14860 |
13793 | 1 | DEVICE MODELLING GRP//RANDOM DOPANT FLUCTUATION//RANDOM DOPANT | 813 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | DEVICE MODELLING GRP | address | 1004693 | 7% | 50% | 54 |
2 | RANDOM DOPANT FLUCTUATION | authKW | 701054 | 3% | 67% | 28 |
3 | RANDOM DOPANT | authKW | 699139 | 3% | 85% | 22 |
4 | DEVICE MODELING GRP | address | 451927 | 2% | 63% | 19 |
5 | INTRINSIC PARAMETER FLUCTUATIONS | authKW | 422514 | 2% | 75% | 15 |
6 | LINE EDGE ROUGHNESS LER | authKW | 421190 | 3% | 42% | 27 |
7 | PARALLEL SCI COMP | address | 417287 | 2% | 56% | 20 |
8 | THRESHOLD VOLTAGE FLUCTUATION | authKW | 352090 | 2% | 63% | 15 |
9 | CHARACTERISTIC FLUCTUATION | authKW | 267073 | 1% | 89% | 8 |
10 | STATISTICAL VARIABILITY | authKW | 235068 | 2% | 48% | 13 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 15277 | 78% | 0% | 637 |
2 | Physics, Applied | 6775 | 58% | 0% | 472 |
3 | Computer Science, Hardware & Architecture | 2564 | 10% | 0% | 83 |
4 | Engineering, Manufacturing | 910 | 6% | 0% | 49 |
5 | Nanoscience & Nanotechnology | 810 | 11% | 0% | 93 |
6 | Physics, Condensed Matter | 788 | 18% | 0% | 146 |
7 | Computer Science, Information Systems | 125 | 4% | 0% | 31 |
8 | Computer Science, Interdisciplinary Applications | 66 | 3% | 0% | 25 |
9 | Materials Science, Multidisciplinary | 32 | 8% | 0% | 66 |
10 | Computer Science, Software Engineering | 27 | 2% | 0% | 15 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | DEVICE MODELLING GRP | 1004693 | 7% | 50% | 54 |
2 | DEVICE MODELING GRP | 451927 | 2% | 63% | 19 |
3 | PARALLEL SCI COMP | 417287 | 2% | 56% | 20 |
4 | ROBUST TRANSISTOR PROGRAM | 187787 | 1% | 100% | 5 |
5 | NSI PROJECT | 150230 | 0% | 100% | 4 |
6 | PROGRAM COMP SCI PPGC | 75115 | 0% | 100% | 2 |
7 | RENESAS SEMICOND ENGN | 75115 | 0% | 100% | 2 |
8 | TOSHIBA IBM RD | 75115 | 0% | 100% | 2 |
9 | MICROELECT INFORMAT SYST | 65782 | 2% | 9% | 19 |
10 | COMMUN COMP ENGN | 47132 | 2% | 7% | 18 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 69938 | 21% | 1% | 168 |
2 | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 48603 | 6% | 3% | 45 |
3 | JOURNAL OF COMPUTATIONAL ELECTRONICS | 30198 | 4% | 3% | 29 |
4 | SOLID-STATE ELECTRONICS | 13222 | 7% | 1% | 59 |
5 | IEEE ELECTRON DEVICE LETTERS | 9966 | 6% | 1% | 49 |
6 | IEEE TRANSACTIONS ON NANOTECHNOLOGY | 4712 | 2% | 1% | 15 |
7 | ANALOG INTEGRATED CIRCUITS AND SIGNAL PROCESSING | 4651 | 2% | 1% | 19 |
8 | JAPANESE JOURNAL OF APPLIED PHYSICS | 4542 | 5% | 0% | 44 |
9 | IEEE JOURNAL OF SOLID-STATE CIRCUITS | 4335 | 4% | 0% | 31 |
10 | IEICE TRANSACTIONS ON ELECTRONICS | 3282 | 3% | 0% | 23 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | RANDOM DOPANT FLUCTUATION | 701054 | 3% | 67% | 28 | Search RANDOM+DOPANT+FLUCTUATION | Search RANDOM+DOPANT+FLUCTUATION |
2 | RANDOM DOPANT | 699139 | 3% | 85% | 22 | Search RANDOM+DOPANT | Search RANDOM+DOPANT |
3 | INTRINSIC PARAMETER FLUCTUATIONS | 422514 | 2% | 75% | 15 | Search INTRINSIC+PARAMETER+FLUCTUATIONS | Search INTRINSIC+PARAMETER+FLUCTUATIONS |
4 | LINE EDGE ROUGHNESS LER | 421190 | 3% | 42% | 27 | Search LINE+EDGE+ROUGHNESS+LER | Search LINE+EDGE+ROUGHNESS+LER |
5 | THRESHOLD VOLTAGE FLUCTUATION | 352090 | 2% | 63% | 15 | Search THRESHOLD+VOLTAGE+FLUCTUATION | Search THRESHOLD+VOLTAGE+FLUCTUATION |
6 | CHARACTERISTIC FLUCTUATION | 267073 | 1% | 89% | 8 | Search CHARACTERISTIC+FLUCTUATION | Search CHARACTERISTIC+FLUCTUATION |
7 | STATISTICAL VARIABILITY | 235068 | 2% | 48% | 13 | Search STATISTICAL+VARIABILITY | Search STATISTICAL+VARIABILITY |
8 | RANDOM DOPANT FLUCTUATION RDF | 204462 | 2% | 39% | 14 | Search RANDOM+DOPANT+FLUCTUATION+RDF | Search RANDOM+DOPANT+FLUCTUATION+RDF |
9 | MISMATCH MODELING | 187787 | 1% | 100% | 5 | Search MISMATCH+MODELING | Search MISMATCH+MODELING |
10 | MOSFET | 169529 | 15% | 4% | 123 | Search MOSFET | Search MOSFET |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | BAJOLET, A , DI FRENZA, R , GHIBAUDO, G , MEZZOMO, CM , CATHIGNOL, A , (2011) CHARACTERIZATION AND MODELING OF TRANSISTOR VARIABILITY IN ADVANCED CMOS TECHNOLOGIES.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 58. ISSUE 8. P. 2235 -2248 | 27 | 90% | 10 |
2 | HAN, MH , LI, YM , HWANG, CH , (2010) DISCRETE-DOPANT-INDUCED POWER-DELAY CHARACTERISTIC FLUCTUATION IN 16 NM COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR WITH HIGH DIELECTRIC CONSTANT MATERIAL.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 49. ISSUE 4. P. - | 24 | 89% | 0 |
3 | MIZUTANI, T , YAMAMOTO, Y , MAKIYAMA, H , YAMASHITA, T , ODA, H , KAMOHARA, S , SUGII, N , HIRAMOTO, T , (2015) DETAILED ANALYSIS OF MINIMUM OPERATION VOLTAGE OF EXTRAORDINARILY UNSTABLE CELLS IN FULLY DEPLETED SILICON-ON-BURIED-OXIDE SIX-TRANSISTOR STATIC RANDOM ACCESS MEMORY.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 54. ISSUE 4. P. - | 19 | 95% | 2 |
4 | KOVAC, U , ALEXANDER, C , ROY, G , RIDDET, C , CHENG, BJ , ASENOV, A , (2010) HIERARCHICAL SIMULATION OF STATISTICAL VARIABILITY: FROM 3-D MC WITH "AB INITIO" IONIZED IMPURITY SCATTERING TO STATISTICAL COMPACT MODELS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 57. ISSUE 10. P. 2418-2426 | 25 | 83% | 1 |
5 | MIZUTANI, T , SARAYA, T , TAKEUCHI, K , KOBAYASHI, M , HIRAMOTO, T , (2016) TRANSISTOR-LEVEL CHARACTERIZATION OF STATIC RANDOM ACCESS MEMORY BIT FAILURES INDUCED BY RANDOM TELEGRAPH NOISE.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 55. ISSUE 4. P. - | 19 | 95% | 0 |
6 | LI, YM , HWANG, CH , LI, TY , (2009) RANDOM-DOPANT-INDUCED VARIABILITY IN NANO-CMOS DEVICES AND DIGITAL CIRCUITS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 56. ISSUE 8. P. 1588 -1597 | 30 | 68% | 12 |
7 | MIZUTANI, T , YAMAMOTO, Y , MAKIYAMA, H , SHINOHARA, H , IWAMATSU, T , ODA, H , SUGII, N , HIRAMOTO, T , (2014) COMPARISON AND DISTRIBUTION OF MINIMUM OPERATION VOLTAGE IN FULLY DEPLETED SILICON-ON-THIN-BURIED-OXIDE AND BULK STATIC RANDOM ACCESS MEMORY CELLS.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 53. ISSUE 4. P. - | 19 | 95% | 1 |
8 | LI, YM , HWANG, CH , LI, TY , HAN, MH , (2010) PROCESS-VARIATION EFFECT, METAL-GATE WORK-FUNCTION FLUCTUATION, AND RANDOM-DOPANT FLUCTUATION IN EMERGING CMOS TECHNOLOGIES.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 57. ISSUE 2. P. 437 -447 | 29 | 64% | 21 |
9 | LI, YM , HWANG, CH , HAN, MH , (2010) SIMULATION OF CHARACTERISTIC VARIATION IN 16 NM GATE FINFET DEVICES DUE TO INTRINSIC PARAMETER FLUCTUATIONS.NANOTECHNOLOGY. VOL. 21. ISSUE 9. P. - | 20 | 91% | 2 |
10 | LI, YM , LEE, KF , YIU, CY , CHIU, YY , CHANG, RW , (2011) DUAL-MATERIAL GATE APPROACH TO SUPPRESSION OF RANDOM-DOPANT-INDUCED CHARACTERISTIC FLUCTUATION IN 16 NM METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT-TRANSISTOR DEVICES.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 50. ISSUE 4. P. - | 21 | 78% | 4 |
Classes with closest relation at Level 1 |