Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
26157 | 262 | 13.9 | 50% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
532 | 2 | IEEE TRANSACTIONS ON ELECTRON DEVICES//MOSFET//FINFET | 14860 |
26157 | 1 | VERTICAL MOSFET//GROOVED GATE MOSFET//FILLET LOCAL OXIDATION FILOX | 262 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | VERTICAL MOSFET | authKW | 713834 | 5% | 44% | 14 |
2 | GROOVED GATE MOSFET | authKW | 582735 | 2% | 100% | 5 |
3 | FILLET LOCAL OXIDATION FILOX | authKW | 349641 | 1% | 100% | 3 |
4 | 05V | authKW | 233094 | 1% | 100% | 2 |
5 | DEVICE TECHNOL MODELING | address | 233094 | 1% | 100% | 2 |
6 | FILOX | authKW | 233094 | 1% | 100% | 2 |
7 | GROOVED GATE PMOSFET | authKW | 233094 | 1% | 100% | 2 |
8 | SIDEWALL SPACER GATE | authKW | 233094 | 1% | 100% | 2 |
9 | VERTICAL MOSFETS | authKW | 207190 | 2% | 44% | 4 |
10 | LATERAL ASYMMETRIC CHANNEL LAC | authKW | 174817 | 1% | 50% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Engineering, Electrical & Electronic | 3361 | 65% | 0% | 171 |
2 | Physics, Applied | 1433 | 48% | 0% | 125 |
3 | Physics, Condensed Matter | 476 | 24% | 0% | 62 |
4 | Nanoscience & Nanotechnology | 190 | 10% | 0% | 26 |
5 | Physics, Multidisciplinary | 104 | 11% | 0% | 28 |
6 | Materials Science, Coatings & Films | 86 | 5% | 0% | 12 |
7 | Materials Science, Multidisciplinary | 21 | 10% | 0% | 26 |
8 | Humanities, Multidisciplinary | 20 | 1% | 0% | 3 |
9 | Computer Science, Hardware & Architecture | 12 | 2% | 0% | 4 |
10 | Materials Science, Characterization, Testing | 6 | 1% | 0% | 2 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | DEVICE TECHNOL MODELING | 233094 | 1% | 100% | 2 |
2 | ADV CMOS DEV | 116547 | 0% | 100% | 1 |
3 | ADV CUSTOM TECHNOL SEMICOND PROD SECTOR | 116547 | 0% | 100% | 1 |
4 | KILBY DEV | 116547 | 0% | 100% | 1 |
5 | MCU TECHNOL | 116547 | 0% | 100% | 1 |
6 | NANOLELECT SYST INFORMAT TECHNOL | 116547 | 0% | 100% | 1 |
7 | SIGE IC TEAM | 116547 | 0% | 100% | 1 |
8 | SILICON SOLUT GRP | 116547 | 0% | 100% | 1 |
9 | CPR ND | 93235 | 1% | 40% | 2 |
10 | PHYS QUANTUM ELECT | 65553 | 1% | 19% | 3 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | IEEE TRANSACTIONS ON ELECTRON DEVICES | 15556 | 17% | 0% | 45 |
2 | IEEE ELECTRON DEVICE LETTERS | 11646 | 11% | 0% | 30 |
3 | SOLID-STATE ELECTRONICS | 5202 | 8% | 0% | 21 |
4 | AMERASIA JOURNAL | 2315 | 1% | 1% | 3 |
5 | MICROELECTRONICS JOURNAL | 1935 | 3% | 0% | 8 |
6 | IEICE TRANSACTIONS ON COMMUNICATIONS ELECTRONICS INFORMATION AND SYSTEMS | 1907 | 1% | 1% | 2 |
7 | JOURNAL OF THE KOREAN PHYSICAL SOCIETY | 1680 | 6% | 0% | 15 |
8 | SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 1451 | 4% | 0% | 10 |
9 | JAPAN QUARTERLY | 1108 | 0% | 1% | 1 |
10 | VLSI DESIGN | 1044 | 1% | 0% | 2 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | VERTICAL MOSFET | 713834 | 5% | 44% | 14 | Search VERTICAL+MOSFET | Search VERTICAL+MOSFET |
2 | GROOVED GATE MOSFET | 582735 | 2% | 100% | 5 | Search GROOVED+GATE+MOSFET | Search GROOVED+GATE+MOSFET |
3 | FILLET LOCAL OXIDATION FILOX | 349641 | 1% | 100% | 3 | Search FILLET+LOCAL+OXIDATION+FILOX | Search FILLET+LOCAL+OXIDATION+FILOX |
4 | 05V | 233094 | 1% | 100% | 2 | Search 05V | Search 05V |
5 | FILOX | 233094 | 1% | 100% | 2 | Search FILOX | Search FILOX |
6 | GROOVED GATE PMOSFET | 233094 | 1% | 100% | 2 | Search GROOVED+GATE+PMOSFET | Search GROOVED+GATE+PMOSFET |
7 | SIDEWALL SPACER GATE | 233094 | 1% | 100% | 2 | Search SIDEWALL+SPACER+GATE | Search SIDEWALL+SPACER+GATE |
8 | VERTICAL MOSFETS | 207190 | 2% | 44% | 4 | Search VERTICAL+MOSFETS | Search VERTICAL+MOSFETS |
9 | LATERAL ASYMMETRIC CHANNEL LAC | 174817 | 1% | 50% | 3 | Search LATERAL+ASYMMETRIC+CHANNEL+LAC | Search LATERAL+ASYMMETRIC+CHANNEL+LAC |
10 | GROOVED GATE PMOSFETS | 155395 | 1% | 67% | 2 | Search GROOVED+GATE+PMOSFETS | Search GROOVED+GATE+PMOSFETS |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | HAKIM, MMA , TAN, L , BUIU, O , REDMAN-WHITE, W , HALL, S , ASHBURN, P , (2009) IMPROVED SUB-THRESHOLD SLOPE IN SHORT-CHANNEL VERTICAL MOSFETS USING FILOX OXIDATION.SOLID-STATE ELECTRONICS. VOL. 53. ISSUE 7. P. 753-759 | 13 | 76% | 3 |
2 | HAKIM, MMA , TAN, L , ABUELGASIM, A , MALLIK, K , CONNOR, S , BOUSQUET, A , DE GROOT, CH , REDMAN-WHITE, W , HALL, S , ASHBURN, P , (2010) SELF-ALIGNED SILICIDATION OF SURROUND GATE VERTICAL MOSFETS FOR LOW COST RF APPLICATIONS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 57. ISSUE 12. P. 3318-3326 | 14 | 58% | 0 |
3 | GILI, E , UCHINO, T , AL HAKIM, MM , DE GROOT, CH , BUIU, O , HALL, S , ASHBURN, P , (2006) SHALLOW JUNCTIONS ON PILLAR SIDEWALLS FOR SUB-100-NM VERTICAL MOSFETS.IEEE ELECTRON DEVICE LETTERS. VOL. 27. ISSUE 8. P. 692 -695 | 10 | 77% | 9 |
4 | RIYADI, MA , SAAD, I , ISMAIL, R , (2010) INVESTIGATION OF PILLAR THICKNESS VARIATION EFFECT ON OBLIQUE ROTATING IMPLANTATION (ORI)-BASED VERTICAL DOUBLE GATE MOSFET.MICROELECTRONICS JOURNAL. VOL. 41. ISSUE 12. P. 827 -833 | 14 | 48% | 0 |
5 | BULUCEA, C , BAHL, SR , FRENCH, WD , YANG, JJ , FRANCIS, P , HARJONO, T , KRISHNAMURTHY, V , TAO, J , PARKER, C , (2010) PHYSICS, TECHNOLOGY, AND MODELING OF COMPLEMENTARY ASYMMETRIC MOSFETS.IEEE TRANSACTIONS ON ELECTRON DEVICES. VOL. 57. ISSUE 10. P. 2363-2380 | 17 | 38% | 6 |
6 | SUSENO, JE , ANWAR, S , RIYADI, MA , ISMAIL, R , (2011) AN ANALYTICAL THRESHOLD VOLTAGE MODEL FOR THE VERTICAL SIDEWALL MOSFET WITH A CURVED-CHANNEL.JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE. VOL. 8. ISSUE 11. P. 2299-2306 | 6 | 100% | 0 |
7 | MOERS, J , (2007) TURNING THE WORLD VERTICAL: MOSFETS WITH CURRENT FLOW PERPENDICULAR TO THE WAFER SURFACE.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. VOL. 87. ISSUE 3. P. 531 -537 | 10 | 59% | 12 |
8 | KOK, OP , IBRAHIM, K , (2009) SIMULATION OF TWO-DIMENSIONAL 50 NM VERTICAL METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTOR INCORPORATING A DIELECTRIC POCKET.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 48. ISSUE 11. P. - | 7 | 78% | 1 |
9 | SUSENO, JE , ANWAR, S , RIYADI, MA , ISMAIL, R , (2012) MODELING OF DRAIN CURRENT FOR GROOVED-GATE MOSFET.JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE. VOL. 9. ISSUE 10. P. 1596-1602 | 5 | 100% | 1 |
10 | TAN, L , BUIU, O , HALL, S , GILL, E , UCHINO, T , ASHBURN, P , (2008) THE INFLUENCE OF JUNCTION DEPTH ON SHORT CHANNEL EFFECTS IN VERTICAL SIDEWALL MOSFETS.SOLID-STATE ELECTRONICS. VOL. 52. ISSUE 7. P. 1002-1007 | 7 | 64% | 4 |
Classes with closest relation at Level 1 |