Class information for:
Level 1: MEMS POST PROCESSING//AE STZI SENSORTECHNOL ZENTRUM//ALUMINIUM INTERCONNECTS

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
29679 182 18.0 38%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
6 3       PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON 155028
1385 2             POLYCRYSTALLINE SILICON//POLY SI//THIN FILM TRANSISTORS 8137
29679 1                   MEMS POST PROCESSING//AE STZI SENSORTECHNOL ZENTRUM//ALUMINIUM INTERCONNECTS 182

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 MEMS POST PROCESSING authKW 251663 2% 50% 3
2 AE STZI SENSORTECHNOL ZENTRUM address 167777 1% 100% 1
3 ALUMINIUM INTERCONNECTS authKW 167777 1% 100% 1
4 ALUMINUM INTERCONNECTIONS authKW 167777 1% 100% 1
5 ANTI MICROBIAL COATINGS authKW 167777 1% 100% 1
6 DIPARTIMENTO FISSEZ LECCE address 167777 1% 100% 1
7 EMBEDDED MASK authKW 167777 1% 100% 1
8 FAST ELECTROMAGNETIC SIGNALS authKW 167777 1% 100% 1
9 FV FLD CORP MICROSYST address 167777 1% 100% 1
10 LEASINFNSEZ LECCE address 167777 1% 100% 1

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 1291 54% 0% 98
2 Instruments & Instrumentation 376 15% 0% 27
3 Materials Science, Coatings & Films 356 10% 0% 19
4 Physics, Condensed Matter 312 23% 0% 42
5 Materials Science, Multidisciplinary 241 27% 0% 50
6 Engineering, Electrical & Electronic 229 23% 0% 41
7 Microscopy 158 3% 0% 6
8 Nanoscience & Nanotechnology 148 10% 0% 19
9 Nuclear Science & Technology 73 7% 0% 12
10 Physics, Multidisciplinary 68 10% 0% 19

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 AE STZI SENSORTECHNOL ZENTRUM 167777 1% 100% 1
2 DIPARTIMENTO FISSEZ LECCE 167777 1% 100% 1
3 FV FLD CORP MICROSYST 167777 1% 100% 1
4 LEASINFNSEZ LECCE 167777 1% 100% 1
5 MICRO NANO FABRACAT TECHNOL 167777 1% 100% 1
6 MS SSM GRP 167777 1% 100% 1
7 PT IPSI 167777 1% 100% 1
8 INFNSEZ LECCE 167775 1% 50% 2
9 SERV TRAITEMENTS CONSULTAT DENT 83888 1% 50% 1
10 SRI VENKATESWARA PHYS ELE 83888 1% 50% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 JOURNAL DE MICROSCOPIE ET DE SPECTROSCOPIE ELECTRONIQUES 5828 2% 1% 4
2 REVUE DE PHYSIQUE APPLIQUEE 3180 3% 0% 5
3 JOURNAL DE PHYSIQUE 2534 7% 0% 12
4 APPLIED PHYSICS 2256 1% 1% 2
5 JOURNAL OF MICROELECTROMECHANICAL SYSTEMS 2252 3% 0% 6
6 SOVIET PHYSICS SEMICONDUCTORS-USSR 1465 4% 0% 7
7 RADIATION EFFECTS AND DEFECTS IN SOLIDS 1294 3% 0% 6
8 APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING 1206 5% 0% 10
9 SENSORS AND ACTUATORS A-PHYSICAL 1071 4% 0% 8
10 MICROELECTRONIC ENGINEERING 1048 4% 0% 8

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 MEMS POST PROCESSING 251663 2% 50% 3 Search MEMS+POST+PROCESSING Search MEMS+POST+PROCESSING
2 ALUMINIUM INTERCONNECTS 167777 1% 100% 1 Search ALUMINIUM+INTERCONNECTS Search ALUMINIUM+INTERCONNECTS
3 ALUMINUM INTERCONNECTIONS 167777 1% 100% 1 Search ALUMINUM+INTERCONNECTIONS Search ALUMINUM+INTERCONNECTIONS
4 ANTI MICROBIAL COATINGS 167777 1% 100% 1 Search ANTI+MICROBIAL+COATINGS Search ANTI+MICROBIAL+COATINGS
5 EMBEDDED MASK 167777 1% 100% 1 Search EMBEDDED+MASK Search EMBEDDED+MASK
6 FAST ELECTROMAGNETIC SIGNALS 167777 1% 100% 1 Search FAST+ELECTROMAGNETIC+SIGNALS Search FAST+ELECTROMAGNETIC+SIGNALS
7 LOW STRESS THICK LAYER 167777 1% 100% 1 Search LOW+STRESS+THICK+LAYER Search LOW+STRESS+THICK+LAYER
8 MICROCRYSTALLINE POLY SIGE 167777 1% 100% 1 Search MICROCRYSTALLINE+POLY+SIGE Search MICROCRYSTALLINE+POLY+SIGE
9 POST CMOS INTEGRATION 167777 1% 100% 1 Search POST+CMOS+INTEGRATION Search POST+CMOS+INTEGRATION
10 SILICON BASED MEMS 167777 1% 100% 1 Search SILICON+BASED+MEMS Search SILICON+BASED+MEMS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 EL-RIFAI, J , SEDKY, S , VAN HOOF, R , SEVERI, S , LIN, D , SANGAMESWARAN, S , PUERS, R , VAN HOOF, C , WITVROUW, A , (2012) SIGE MEMS AT PROCESSING TEMPERATURES BELOW 250 DEGREES C.SENSORS AND ACTUATORS A-PHYSICAL. VOL. 188. ISSUE . P. 230-239 8 73% 2
2 BELLONI, F , DORIA, D , LORUSSO, A , NASSISI, V , (2006) NOVEL PULSE AMPLIFYING CIRCUITS BASED ON TRANSMISSION LINES OF DIFFERENT CHARACTERISTIC IMPEDANCE.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT. VOL. 556. ISSUE 1. P. 296-301 7 88% 0
3 WITVROUW, A , (2008) CMOS-MEMS INTEGRATION TODAY AND TOMORROW.SCRIPTA MATERIALIA. VOL. 59. ISSUE 9. P. 945-949 7 64% 25
4 SEDKY, S , (2007) SIGE: AN ATTRACTIVE MATERIAL FOR POST-CMOS PROCESSING OF MEMS.MICROELECTRONIC ENGINEERING. VOL. 84. ISSUE 11. P. 2491 -2500 10 38% 7
5 DANNA, E , LEGIERI, G , LUCHES, A , (1989) THIN-FILM PROCESSING WITH PULSED ELECTRON-BEAMS.THIN SOLID FILMS. VOL. 182. ISSUE . P. 215-228 10 71% 5
6 LOW, CW , LIU, TJK , HOWE, RT , (2007) CHARACTERIZATION OF POLYCRYSTALLINE SILICON-GERMANIUM FILM DEPOSITION FOR MODULARLY INTEGRATED MEMS APPLICATIONS.JOURNAL OF MICROELECTROMECHANICAL SYSTEMS. VOL. 16. ISSUE 1. P. 68-77 6 60% 5
7 NASSISI, V , BELLONI, F , DORIA, D , LORUSSO, A , (2003) NOVEL VOLTAGE COMPRESSOR CIRCUIT BY TRANSMISSION LINES.REVIEW OF SCIENTIFIC INSTRUMENTS. VOL. 74. ISSUE 12. P. 5201-5203 4 80% 1
8 HARTITI, B , SLAOUI, A , MULLER, JC , SIFFERT, P , (1990) ANNEALING KINETICS DURING RAPID THERMAL-PROCESSING OF EXCIMER LASER-INDUCED DEFECTS IN VIRGIN SILICON.APPLIED SURFACE SCIENCE. VOL. 46. ISSUE 1-4. P. 371-374 6 86% 1
9 HARTITI, B , SLAOUI, A , MULLER, JC , SIFFERT, P , (1989) THERMAL ANNEALING OF EXCIMER-LASER-INDUCED DEFECTS IN VIRGIN SILICON.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY. VOL. 4. ISSUE 1-4. P. 257-260 8 62% 1
10 KONG, GL , ZHANG, DL , YUE, GZ , LIAO, XB , (1998) COMMENT ON "PHOTODILATATION EFFECT OF UNDOPED ALPHA-SI : H FILMS" - KONG ET AL REPLY.PHYSICAL REVIEW LETTERS. VOL. 80. ISSUE 25. P. 5705-5705 3 100% 0

Classes with closest relation at Level 1


Rank Class id link
1 29857 AMORPHOUS ALLOY LAYER//DATA SYST POUGHKEEPSIE//ELECTRON BEAM SOLIDIFICATION TREATMENT
2 16870 LASER INDUCED SURFACE PROCESS//LAMP2009//WIDE BANDGAP OXIDES
3 13380 ARCHITECTURE TECH//3 DIMENSIONAL INTEGRATION//ELECTRON DEVICE LETTERS
4 6094 EXCIMER LASER CRYSTALLIZATION//LASER CRYSTALLIZATION//EXCIMER LASER ANNEALING
5 29312 CROSS KELVIN RESISTOR CKR//CROSS BRIDGE KELVIN RESISTOR CBKR//POLYMETAL
6 11494 HIGH INTENSITY PULSED ION BEAM//HIGH CURRENT PULSED ELECTRON BEAM//INTENSE PULSED ION BEAM
7 13086 MICROBOLOMETER//OPTICAL READOUT//THERMOPILE
8 31429 METHODOLOGY OF MEASUREMENT//MATH PHYS SEMICOND//MICROWAVE SOLID STATE GRP
9 25979 NANOELECTROMECHANICAL SYSTEMS NEMS//NANOELECTROMECHANICAL NEM MEMORY//NANOELECTROMECHANICAL SWITCH
10 26940 SOURCE GATED TRANSISTOR SGT//SOURCE GATED TRANSISTOR//ELE OMAGNET ELECT DEVICES

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