Class information for:
Level 1: ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
12287 917 15.3 56%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
19 4 ASTRONOMY & ASTROPHYSICS//ASTROPHYSICAL JOURNAL//ASTRON 523489
158 3       NUCLEAR FUSION//PHYSICS, FLUIDS & PLASMAS//PLASMA PHYSICS AND CONTROLLED FUSION 61209
1077 2             PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 9920
12287 1                   ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE 917

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ECR PLASMA authKW 791668 8% 33% 71
2 UNIFORM PLASMA authKW 148321 1% 64% 7
3 ELECTRON CYCLOTRON RESONANCE DISCHARGE authKW 138739 1% 83% 5
4 ECR POSITION authKW 133191 0% 100% 4
5 UPPER HYBRID RESONANCE authKW 133187 1% 67% 6
6 MAGNETIC MULTIPOLE FIELD authKW 106551 0% 80% 4
7 LOW ELECTRON TEMPERATURE PLASMA authKW 104052 1% 63% 5
8 AR N 2 MIXTURE authKW 99893 0% 100% 3
9 MULTI SLOT ANTENNA authKW 99893 0% 100% 3
10 ELECTRON CYCLOTRON WAVE authKW 99887 1% 50% 6

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Physics, Applied 12198 72% 0% 664
2 Materials Science, Coatings & Films 5842 18% 0% 169
3 Instruments & Instrumentation 3752 21% 0% 188
4 Physics, Fluids & Plasmas 1980 12% 0% 108
5 Nanoscience & Nanotechnology 296 7% 0% 64
6 Engineering, Electrical & Electronic 123 9% 0% 86
7 Physics, Multidisciplinary 96 6% 0% 59
8 Materials Science, Multidisciplinary 54 9% 0% 83
9 Nuclear Science & Technology 50 3% 0% 27
10 Physics, Nuclear 29 3% 0% 23

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 DRY ETCHING ENGN 66595 0% 100% 2
2 COMBUSTIBLE NUCL 33298 0% 100% 1
3 DIRECC INVEST CIENT DESARROLLO TECNOL 33298 0% 100% 1
4 DV EFREMOV SCI ELE OPHYS PARTUS 33298 0% 100% 1
5 ELE OSTAT MATERIAUX DIELECT 33298 0% 100% 1
6 ELE TECHNOL SAKYO KU 33298 0% 100% 1
7 FUS ENEGY PROGRAM 33298 0% 100% 1
8 GRENOBLE INP RECH PLASMAS MAT NANOSTRUCT 33298 0% 100% 1
9 KOKUBU POWER IND PROD 33298 0% 100% 1
10 NANO MFG SYST 33298 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 REVIEW OF SCIENTIFIC INSTRUMENTS 29011 18% 1% 162
2 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 21191 10% 1% 95
3 PLASMA SOURCES SCIENCE & TECHNOLOGY 12395 3% 1% 32
4 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 9257 10% 0% 93
5 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS 7081 1% 4% 6
6 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 5772 6% 0% 54
7 VACUUM 5015 4% 0% 38
8 IEEE TRANSACTIONS ON PLASMA SCIENCE 2652 3% 0% 28
9 SURFACE & COATINGS TECHNOLOGY 1710 3% 0% 32
10 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 1308 2% 0% 22

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 ECR PLASMA 791668 8% 33% 71 Search ECR+PLASMA Search ECR+PLASMA
2 UNIFORM PLASMA 148321 1% 64% 7 Search UNIFORM+PLASMA Search UNIFORM+PLASMA
3 ELECTRON CYCLOTRON RESONANCE DISCHARGE 138739 1% 83% 5 Search ELECTRON+CYCLOTRON+RESONANCE+DISCHARGE Search ELECTRON+CYCLOTRON+RESONANCE+DISCHARGE
4 ECR POSITION 133191 0% 100% 4 Search ECR+POSITION Search ECR+POSITION
5 UPPER HYBRID RESONANCE 133187 1% 67% 6 Search UPPER+HYBRID+RESONANCE Search UPPER+HYBRID+RESONANCE
6 MAGNETIC MULTIPOLE FIELD 106551 0% 80% 4 Search MAGNETIC+MULTIPOLE+FIELD Search MAGNETIC+MULTIPOLE+FIELD
7 LOW ELECTRON TEMPERATURE PLASMA 104052 1% 63% 5 Search LOW+ELECTRON+TEMPERATURE+PLASMA Search LOW+ELECTRON+TEMPERATURE+PLASMA
8 AR N 2 MIXTURE 99893 0% 100% 3 Search AR+N+2+MIXTURE Search AR+N+2+MIXTURE
9 MULTI SLOT ANTENNA 99893 0% 100% 3 Search MULTI+SLOT+ANTENNA Search MULTI+SLOT+ANTENNA
10 ELECTRON CYCLOTRON WAVE 99887 1% 50% 6 Search ELECTRON+CYCLOTRON+WAVE Search ELECTRON+CYCLOTRON+WAVE

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 ASMUSSEN, J , GROTJOHN, TA , MAK, P , PERRIN, MA , (1997) THE DESIGN AND APPLICATION OF ELECTRON CYCLOTRON RESONANCE DISCHARGES.IEEE TRANSACTIONS ON PLASMA SCIENCE. VOL. 25. ISSUE 6. P. 1196 -1221 49 63% 33
2 TUDA, M , ONO, K , TAKI, M , NAMBA, K , (1994) MULTICUSP ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE WORKING WITH MICROWAVES RADIALLY INJECTED THROUGH AN ANNULAR SLIT.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 33. ISSUE 3A. P. 1530-1537 27 79% 12
3 WATANABE, S , FURUSE, M , USUI, T , KAWASAKI, S , (1995) SPATIAL-DISTRIBUTION AND TRANSPORT OF AN ELECTRON-CYCLOTRON-RESONANCE PLASMA GENERATED USING DOMINANT-MODE MICROWAVE.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 34. ISSUE 10. P. 5807 -5817 20 100% 8
4 ZHONG, XX , WU, JD , WU, CZ , LI, FM , (1998) MONTE CARLO SIMULATIONS OF ARGON ION TRANSPORT IN THE DOWNSTREAM REGION OF ELECTRON CYCLOTRON RESONANCE PLASMAS.JOURNAL OF APPLIED PHYSICS. VOL. 83. ISSUE 10. P. 5069-5074 23 77% 9
5 KOGA, M , MUTA, H , YONESU, A , KAWAI, Y , (2006) EXPERIMENTAL AND NUMERICAL INVESTIGATION OF ION TEMPERATURE IN AN ECR PLASMA.VACUUM. VOL. 80. ISSUE 7. P. 771-775 14 93% 2
6 TAREY, RD , GANGULI, A , SAHU, D , NARAYANAN, R , ARORA, N , (2017) STUDIES ON PLASMA PRODUCTION IN A LARGE VOLUME SYSTEM USING MULTIPLE COMPACT ECR PLASMA SOURCES.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 26. ISSUE 1. P. - 15 65% 0
7 LIU, MH , HU, XW , WU, HM , WU, QC , YU, GY , REN, ZX , (2000) SIMULATION OF ION TRANSPORT IN AN EXTENDED ELECTRON CYCLOTRON RESONANCE PLASMA.JOURNAL OF APPLIED PHYSICS. VOL. 87. ISSUE 3. P. 1070 -1075 16 94% 0
8 CHOI, NH , KOH, WH , YOON, NS , PARK, HB , CHOI, DI , (1995) ONE-DIMENSIONAL HYBRID MODELING AND SIMULATION OF ELECTRON-CYCLOTRON-RESONANCE DISCHARGE.IEEE TRANSACTIONS ON PLASMA SCIENCE. VOL. 23. ISSUE 4. P. 617-622 18 95% 6
9 KAWAI, Y , UEDA, Y , (2000) ELECTROMAGNETIC WAVE PROPAGATION IN AN ECR PLASMA.SURFACE & COATINGS TECHNOLOGY. VOL. 131. ISSUE 1-3. P. 12 -19 14 100% 6
10 LIU, MH , HU, XW , YU, GY , WU, QC , PAN, Y , (2002) TWO-DIMENSIONAL SIMULATION OF AN ELECTRON CYCLOTRON RESONANCE PLASMA SOURCE WITH POWER DEPOSITION AND NEUTRAL GAS DEPLETION.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 11. ISSUE 3. P. 260-265 14 93% 4

Classes with closest relation at Level 1


Rank Class id link
1 5904 ECR ION SOURCE//ELECTRON CYCLOTRON RESONANCE ION SOURCE//REVIEW OF SCIENTIFIC INSTRUMENTS
2 7057 SURFACE WAVE PLASMA//MICROWAVE DISCHARGE//GRP PHYS PLASMAS
3 24686 LOW TEMPERATURE SILICON OXIDATION//DIRECTIONAL OXIDATION//HIGH RATE SILICON OXIDATION
4 9098 SPACE PLASMA POWER PROP GRP//SPACE PLASMA POWER PROP//HELICON WAVE
5 868 PLASMA SOURCES SCIENCE & TECHNOLOGY//CAPACITIVELY COUPLED PLASMA//PLASMA ATOM PHYS
6 5594 SOLID STATE TECHNOLOGY//AFTER CORROSION//AL SI CU ETCHING
7 1352 ELECT DEVICES MAT TECHNOL//PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
8 36683 SOLID SOLUTION OF CARBON IN BETA SIC//MCECR PLASMA SPUTTERING//SINTERED IRON ORE CONCENTRATE
9 14239 SILANE PLASMA//SIH2//SIH3
10 27183 NEGATIVE ION IMPLANTATION//DELTA LAYERED NANOPARTICLES//SOL GEL TITANIUM OXIDE FILM

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