Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
12287 | 917 | 15.3 | 56% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
19 | 4 | ASTRONOMY & ASTROPHYSICS//ASTROPHYSICAL JOURNAL//ASTRON | 523489 |
158 | 3 | NUCLEAR FUSION//PHYSICS, FLUIDS & PLASMAS//PLASMA PHYSICS AND CONTROLLED FUSION | 61209 |
1077 | 2 | PLASMA ETCHING//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 9920 |
12287 | 1 | ECR PLASMA//UNIFORM PLASMA//ELECTRON CYCLOTRON RESONANCE DISCHARGE | 917 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | ECR PLASMA | authKW | 791668 | 8% | 33% | 71 |
2 | UNIFORM PLASMA | authKW | 148321 | 1% | 64% | 7 |
3 | ELECTRON CYCLOTRON RESONANCE DISCHARGE | authKW | 138739 | 1% | 83% | 5 |
4 | ECR POSITION | authKW | 133191 | 0% | 100% | 4 |
5 | UPPER HYBRID RESONANCE | authKW | 133187 | 1% | 67% | 6 |
6 | MAGNETIC MULTIPOLE FIELD | authKW | 106551 | 0% | 80% | 4 |
7 | LOW ELECTRON TEMPERATURE PLASMA | authKW | 104052 | 1% | 63% | 5 |
8 | AR N 2 MIXTURE | authKW | 99893 | 0% | 100% | 3 |
9 | MULTI SLOT ANTENNA | authKW | 99893 | 0% | 100% | 3 |
10 | ELECTRON CYCLOTRON WAVE | authKW | 99887 | 1% | 50% | 6 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 12198 | 72% | 0% | 664 |
2 | Materials Science, Coatings & Films | 5842 | 18% | 0% | 169 |
3 | Instruments & Instrumentation | 3752 | 21% | 0% | 188 |
4 | Physics, Fluids & Plasmas | 1980 | 12% | 0% | 108 |
5 | Nanoscience & Nanotechnology | 296 | 7% | 0% | 64 |
6 | Engineering, Electrical & Electronic | 123 | 9% | 0% | 86 |
7 | Physics, Multidisciplinary | 96 | 6% | 0% | 59 |
8 | Materials Science, Multidisciplinary | 54 | 9% | 0% | 83 |
9 | Nuclear Science & Technology | 50 | 3% | 0% | 27 |
10 | Physics, Nuclear | 29 | 3% | 0% | 23 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | DRY ETCHING ENGN | 66595 | 0% | 100% | 2 |
2 | COMBUSTIBLE NUCL | 33298 | 0% | 100% | 1 |
3 | DIRECC INVEST CIENT DESARROLLO TECNOL | 33298 | 0% | 100% | 1 |
4 | DV EFREMOV SCI ELE OPHYS PARTUS | 33298 | 0% | 100% | 1 |
5 | ELE OSTAT MATERIAUX DIELECT | 33298 | 0% | 100% | 1 |
6 | ELE TECHNOL SAKYO KU | 33298 | 0% | 100% | 1 |
7 | FUS ENEGY PROGRAM | 33298 | 0% | 100% | 1 |
8 | GRENOBLE INP RECH PLASMAS MAT NANOSTRUCT | 33298 | 0% | 100% | 1 |
9 | KOKUBU POWER IND PROD | 33298 | 0% | 100% | 1 |
10 | NANO MFG SYST | 33298 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | REVIEW OF SCIENTIFIC INSTRUMENTS | 29011 | 18% | 1% | 162 |
2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 21191 | 10% | 1% | 95 |
3 | PLASMA SOURCES SCIENCE & TECHNOLOGY | 12395 | 3% | 1% | 32 |
4 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 9257 | 10% | 0% | 93 |
5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 7081 | 1% | 4% | 6 |
6 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 5772 | 6% | 0% | 54 |
7 | VACUUM | 5015 | 4% | 0% | 38 |
8 | IEEE TRANSACTIONS ON PLASMA SCIENCE | 2652 | 3% | 0% | 28 |
9 | SURFACE & COATINGS TECHNOLOGY | 1710 | 3% | 0% | 32 |
10 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1308 | 2% | 0% | 22 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | ECR PLASMA | 791668 | 8% | 33% | 71 | Search ECR+PLASMA | Search ECR+PLASMA |
2 | UNIFORM PLASMA | 148321 | 1% | 64% | 7 | Search UNIFORM+PLASMA | Search UNIFORM+PLASMA |
3 | ELECTRON CYCLOTRON RESONANCE DISCHARGE | 138739 | 1% | 83% | 5 | Search ELECTRON+CYCLOTRON+RESONANCE+DISCHARGE | Search ELECTRON+CYCLOTRON+RESONANCE+DISCHARGE |
4 | ECR POSITION | 133191 | 0% | 100% | 4 | Search ECR+POSITION | Search ECR+POSITION |
5 | UPPER HYBRID RESONANCE | 133187 | 1% | 67% | 6 | Search UPPER+HYBRID+RESONANCE | Search UPPER+HYBRID+RESONANCE |
6 | MAGNETIC MULTIPOLE FIELD | 106551 | 0% | 80% | 4 | Search MAGNETIC+MULTIPOLE+FIELD | Search MAGNETIC+MULTIPOLE+FIELD |
7 | LOW ELECTRON TEMPERATURE PLASMA | 104052 | 1% | 63% | 5 | Search LOW+ELECTRON+TEMPERATURE+PLASMA | Search LOW+ELECTRON+TEMPERATURE+PLASMA |
8 | AR N 2 MIXTURE | 99893 | 0% | 100% | 3 | Search AR+N+2+MIXTURE | Search AR+N+2+MIXTURE |
9 | MULTI SLOT ANTENNA | 99893 | 0% | 100% | 3 | Search MULTI+SLOT+ANTENNA | Search MULTI+SLOT+ANTENNA |
10 | ELECTRON CYCLOTRON WAVE | 99887 | 1% | 50% | 6 | Search ELECTRON+CYCLOTRON+WAVE | Search ELECTRON+CYCLOTRON+WAVE |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | ASMUSSEN, J , GROTJOHN, TA , MAK, P , PERRIN, MA , (1997) THE DESIGN AND APPLICATION OF ELECTRON CYCLOTRON RESONANCE DISCHARGES.IEEE TRANSACTIONS ON PLASMA SCIENCE. VOL. 25. ISSUE 6. P. 1196 -1221 | 49 | 63% | 33 |
2 | TUDA, M , ONO, K , TAKI, M , NAMBA, K , (1994) MULTICUSP ELECTRON-CYCLOTRON-RESONANCE PLASMA SOURCE WORKING WITH MICROWAVES RADIALLY INJECTED THROUGH AN ANNULAR SLIT.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 33. ISSUE 3A. P. 1530-1537 | 27 | 79% | 12 |
3 | WATANABE, S , FURUSE, M , USUI, T , KAWASAKI, S , (1995) SPATIAL-DISTRIBUTION AND TRANSPORT OF AN ELECTRON-CYCLOTRON-RESONANCE PLASMA GENERATED USING DOMINANT-MODE MICROWAVE.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 34. ISSUE 10. P. 5807 -5817 | 20 | 100% | 8 |
4 | ZHONG, XX , WU, JD , WU, CZ , LI, FM , (1998) MONTE CARLO SIMULATIONS OF ARGON ION TRANSPORT IN THE DOWNSTREAM REGION OF ELECTRON CYCLOTRON RESONANCE PLASMAS.JOURNAL OF APPLIED PHYSICS. VOL. 83. ISSUE 10. P. 5069-5074 | 23 | 77% | 9 |
5 | KOGA, M , MUTA, H , YONESU, A , KAWAI, Y , (2006) EXPERIMENTAL AND NUMERICAL INVESTIGATION OF ION TEMPERATURE IN AN ECR PLASMA.VACUUM. VOL. 80. ISSUE 7. P. 771-775 | 14 | 93% | 2 |
6 | TAREY, RD , GANGULI, A , SAHU, D , NARAYANAN, R , ARORA, N , (2017) STUDIES ON PLASMA PRODUCTION IN A LARGE VOLUME SYSTEM USING MULTIPLE COMPACT ECR PLASMA SOURCES.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 26. ISSUE 1. P. - | 15 | 65% | 0 |
7 | LIU, MH , HU, XW , WU, HM , WU, QC , YU, GY , REN, ZX , (2000) SIMULATION OF ION TRANSPORT IN AN EXTENDED ELECTRON CYCLOTRON RESONANCE PLASMA.JOURNAL OF APPLIED PHYSICS. VOL. 87. ISSUE 3. P. 1070 -1075 | 16 | 94% | 0 |
8 | CHOI, NH , KOH, WH , YOON, NS , PARK, HB , CHOI, DI , (1995) ONE-DIMENSIONAL HYBRID MODELING AND SIMULATION OF ELECTRON-CYCLOTRON-RESONANCE DISCHARGE.IEEE TRANSACTIONS ON PLASMA SCIENCE. VOL. 23. ISSUE 4. P. 617-622 | 18 | 95% | 6 |
9 | KAWAI, Y , UEDA, Y , (2000) ELECTROMAGNETIC WAVE PROPAGATION IN AN ECR PLASMA.SURFACE & COATINGS TECHNOLOGY. VOL. 131. ISSUE 1-3. P. 12 -19 | 14 | 100% | 6 |
10 | LIU, MH , HU, XW , YU, GY , WU, QC , PAN, Y , (2002) TWO-DIMENSIONAL SIMULATION OF AN ELECTRON CYCLOTRON RESONANCE PLASMA SOURCE WITH POWER DEPOSITION AND NEUTRAL GAS DEPLETION.PLASMA SOURCES SCIENCE & TECHNOLOGY. VOL. 11. ISSUE 3. P. 260-265 | 14 | 93% | 4 |
Classes with closest relation at Level 1 |