Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
13441 | 836 | 20.0 | 52% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
314 | 3 | ULTRAMICROSCOPY//MICROSCOPY//JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 39933 |
2587 | 2 | SCANNING//BACKSCATTERED ELECTRONS//MICROSCOPY | 3648 |
13441 | 1 | LAMACOP//SECONDARY ELECTRON EMISSION//SECONDARY ELECTRON YIELD | 836 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | LAMACOP | address | 568257 | 3% | 68% | 23 |
2 | SECONDARY ELECTRON EMISSION | authKW | 397058 | 8% | 17% | 63 |
3 | SECONDARY ELECTRON YIELD | authKW | 185679 | 2% | 27% | 19 |
4 | DEEP DIELECTRIC CHARGING | authKW | 149134 | 1% | 58% | 7 |
5 | CHARGING | authKW | 147874 | 5% | 10% | 40 |
6 | PROJECTION ELECTRON MICROSCOPE | authKW | 146096 | 0% | 100% | 4 |
7 | X RAY INDUCED SECONDARY ELECTRON EMISSION | authKW | 146096 | 0% | 100% | 4 |
8 | RADIATION INDUCED CONDUCTIVITY RIC | authKW | 131482 | 1% | 60% | 6 |
9 | CURRENT DENSITY EFFECT | authKW | 109572 | 0% | 100% | 3 |
10 | NONCONDUCTIVE SPECIMENS | authKW | 109572 | 0% | 100% | 3 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Microscopy | 9282 | 11% | 0% | 96 |
2 | Physics, Applied | 4117 | 45% | 0% | 380 |
3 | Nanoscience & Nanotechnology | 1342 | 14% | 0% | 119 |
4 | Engineering, Electrical & Electronic | 888 | 21% | 0% | 175 |
5 | Instruments & Instrumentation | 843 | 11% | 0% | 89 |
6 | Materials Science, Coatings & Films | 541 | 6% | 0% | 52 |
7 | Physics, Condensed Matter | 274 | 11% | 0% | 96 |
8 | Nuclear Science & Technology | 189 | 5% | 0% | 43 |
9 | Spectroscopy | 159 | 4% | 0% | 37 |
10 | Materials Science, Multidisciplinary | 125 | 12% | 0% | 100 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | LAMACOP | 568257 | 3% | 68% | 23 |
2 | G PI MAT FONCT | 83480 | 0% | 57% | 4 |
3 | MAU | 82178 | 0% | 75% | 3 |
4 | ELE ON EMISS SOURCE | 77337 | 1% | 35% | 6 |
5 | LPIO EA 3254 | 73048 | 0% | 100% | 2 |
6 | LASSI | 69195 | 1% | 32% | 6 |
7 | DTI UMR 6107 | 48697 | 0% | 67% | 2 |
8 | DTI | 45032 | 2% | 9% | 13 |
9 | UMR 6107 | 43639 | 1% | 17% | 7 |
10 | ASTRIUM SATELLITES | 36524 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SCANNING | 26390 | 4% | 2% | 35 |
2 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 9215 | 8% | 0% | 65 |
3 | PHILIPS JOURNAL OF RESEARCH | 5345 | 1% | 2% | 7 |
4 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 4725 | 1% | 1% | 11 |
5 | IEEE TRANSACTIONS ON ELECTRICAL INSULATION | 3054 | 1% | 1% | 11 |
6 | MICROSCOPY AND MICROANALYSIS | 2484 | 1% | 1% | 11 |
7 | JOURNAL OF APPLIED PHYSICS | 2392 | 10% | 0% | 85 |
8 | IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION | 2367 | 2% | 0% | 17 |
9 | JOURNAL OF ELECTRON MICROSCOPY | 2364 | 1% | 1% | 11 |
10 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2182 | 2% | 0% | 19 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | CAZAUX, J , (2010) SECONDARY ELECTRON EMISSION AND CHARGING MECHANISMS IN AUGER ELECTRON SPECTROSCOPY AND RELATED E-BEAM TECHNIQUES.JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA. VOL. 176. ISSUE 1-3. P. 58 -79 | 39 | 74% | 29 |
2 | FENG, GB , CAO, M , YAN, LP , ZHANG, HB , (2013) COMBINED EFFECTS OF SAMPLE PARAMETERS ON POLYMER CHARGING DUE TO ELECTRON IRRADIATION: A CONTOUR SIMULATION.MICRON. VOL. 52-53. ISSUE . P. 62 -66 | 30 | 86% | 4 |
3 | ZHANG, HB , LI, WQ , CAO, M , (2012) SPACE CHARGE CHARACTERISTICS OF AN INSULATING THIN FILM NEGATIVELY CHARGED BY A LOW-ENERGY ELECTRON BEAM.JOURNAL OF ELECTRON MICROSCOPY. VOL. 61. ISSUE 2. P. 85 -97 | 30 | 81% | 4 |
4 | LI, WQ , ZHANG, HB , (2010) THE POSITIVE CHARGING EFFECT OF DIELECTRIC FILMS IRRADIATED BY A FOCUSED ELECTRON BEAM.APPLIED SURFACE SCIENCE. VOL. 256. ISSUE 11. P. 3482 -3492 | 30 | 81% | 17 |
5 | LI, WQ , ZHANG, HB , LU, J , (2012) CHARGING EFFECTS OF SIO2 THIN FILMS UNDER DEFOCUSED ELECTRON BEAM IRRADIATION.ACTA PHYSICA SINICA. VOL. 61. ISSUE 2. P. - | 28 | 80% | 2 |
6 | FENG, GB , WANG, F , CAO, M , (2015) NUMERICAL SIMULATION OF MULTI-COMBINED EFFECTS OF PARAMETERS ON POLYMER CHARGING CHARACTERISTICS DUE TO ELECTRON IRRADIATION.ACTA PHYSICA SINICA. VOL. 64. ISSUE 22. P. - | 26 | 74% | 0 |
7 | WANG, F , FENG, GB , ZHANG, XS , CAO, M , (2016) MECHANISM OF ELECTRON MULTIPLICATION DUE TO CHARGING FOR A SIO2 SAMPLE WITH A BURIED MICROSTRUCTURE IN SEM: A SIMULATION ANALYSIS.MICRON. VOL. 90. ISSUE . P. 64 -70 | 20 | 87% | 0 |
8 | LI, WQ , ZHANG, HB , (2010) THE SURFACE POTENTIAL OF INSULATING THIN FILMS NEGATIVELY CHARGED BY A LOW-ENERGY FOCUSED ELECTRON BEAM.MICRON. VOL. 41. ISSUE 5. P. 416-422 | 25 | 76% | 13 |
9 | RAU, EI , FAKHFAKH, S , ANDRIANOV, MV , EVSTAFEVA, EN , JBARA, O , RONDOT, S , MOUZE, D , (2008) SECOND CROSSOVER ENERGY OF INSULATING MATERIALS USING STATIONARY ELECTRON BEAM UNDER NORMAL INCIDENCE.NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. VOL. 266. ISSUE 5. P. 719-729 | 22 | 88% | 16 |
10 | WENG, M , HU, TC , ZHANG, N , CAO, M , (2016) DYNAMIC SECONDARY ELECTRON EMISSION CHARACTERISTICS OF POLYMERS IN NEGATIVE CHARGING PROCESS.MODERN PHYSICS LETTERS B. VOL. 30. ISSUE 11. P. - | 17 | 94% | 0 |
Classes with closest relation at Level 1 |