Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
12923 | 872 | 20.2 | 66% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
277 | 3 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS//JOURNAL OF SYNCHROTRON RADIATION//NUCLEAR SCIENCE & TECHNOLOGY | 43290 |
1283 | 2 | X RAY OPTICS//X RAY MICROSCOPY//ZONE PLATE | 8701 |
12923 | 1 | GAS PUFF TARGET//EUV SOURCE//LASER PRODUCED PLASMA | 872 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | GAS PUFF TARGET | authKW | 493263 | 2% | 78% | 18 |
2 | EUV SOURCE | authKW | 428944 | 2% | 88% | 14 |
3 | LASER PRODUCED PLASMA | authKW | 322627 | 7% | 16% | 58 |
4 | DISCHARGE PRODUCED PLASMA | authKW | 283629 | 1% | 90% | 9 |
5 | ADV INTERDISCIPLINARY SCI | address | 183320 | 3% | 22% | 24 |
6 | EXTREME ULTRAVIOLET | authKW | 175936 | 4% | 15% | 34 |
7 | EUV LITHOGRAPHY | authKW | 165393 | 3% | 16% | 29 |
8 | DEBRIS MITIGATION | authKW | 157564 | 1% | 50% | 9 |
9 | MAT EXTREME ENVIRONM | address | 145647 | 2% | 20% | 21 |
10 | COLLECTOR OPTICS | authKW | 140065 | 0% | 100% | 4 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 6088 | 53% | 0% | 466 |
2 | Optics | 3704 | 28% | 0% | 242 |
3 | Physics, Fluids & Plasmas | 1139 | 9% | 0% | 81 |
4 | Instruments & Instrumentation | 724 | 10% | 0% | 85 |
5 | Nanoscience & Nanotechnology | 515 | 9% | 0% | 79 |
6 | Engineering, Electrical & Electronic | 235 | 12% | 0% | 105 |
7 | Physics, Multidisciplinary | 174 | 8% | 0% | 71 |
8 | Physics, Atomic, Molecular & Chemical | 110 | 6% | 0% | 50 |
9 | Nuclear Science & Technology | 72 | 3% | 0% | 30 |
10 | Physics, Nuclear | 57 | 3% | 0% | 28 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ADV INTERDISCIPLINARY SCI | 183320 | 3% | 22% | 24 |
2 | MAT EXTREME ENVIRONM | 145647 | 2% | 20% | 21 |
3 | OPT TECHNOL INNOVAT OPTIC | 125055 | 1% | 71% | 5 |
4 | PHYS AS | 105048 | 0% | 100% | 3 |
5 | PLASMA MAT INTERACT GRP | 79577 | 1% | 45% | 5 |
6 | LASER ENGN | 76692 | 8% | 3% | 69 |
7 | GRP PLICAT PLASMAS | 70032 | 0% | 100% | 2 |
8 | HIRATSUKA DEV | 70032 | 0% | 100% | 2 |
9 | OPT CORE | 70032 | 0% | 100% | 2 |
10 | EUVA | 63027 | 0% | 60% | 3 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 27366 | 3% | 3% | 27 |
2 | APPLIED PHYSICS B-LASERS AND OPTICS | 5051 | 4% | 0% | 33 |
3 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 3593 | 1% | 2% | 5 |
4 | REVIEW OF SCIENTIFIC INSTRUMENTS | 2839 | 6% | 0% | 50 |
5 | APPLIED PHYSICS LETTERS | 2423 | 10% | 0% | 89 |
6 | MICROELECTRONIC ENGINEERING | 2295 | 3% | 0% | 26 |
7 | JOURNAL OF APPLIED PHYSICS | 2069 | 9% | 0% | 81 |
8 | JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1889 | 4% | 0% | 34 |
9 | JOURNAL OF LASER MICRO NANOENGINEERING | 1479 | 1% | 1% | 5 |
10 | LASER AND PARTICLE BEAMS | 1244 | 1% | 0% | 9 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | GAS PUFF TARGET | 493263 | 2% | 78% | 18 | Search GAS+PUFF+TARGET | Search GAS+PUFF+TARGET |
2 | EUV SOURCE | 428944 | 2% | 88% | 14 | Search EUV+SOURCE | Search EUV+SOURCE |
3 | LASER PRODUCED PLASMA | 322627 | 7% | 16% | 58 | Search LASER+PRODUCED+PLASMA | Search LASER+PRODUCED+PLASMA |
4 | DISCHARGE PRODUCED PLASMA | 283629 | 1% | 90% | 9 | Search DISCHARGE+PRODUCED+PLASMA | Search DISCHARGE+PRODUCED+PLASMA |
5 | EXTREME ULTRAVIOLET | 175936 | 4% | 15% | 34 | Search EXTREME+ULTRAVIOLET | Search EXTREME+ULTRAVIOLET |
6 | EUV LITHOGRAPHY | 165393 | 3% | 16% | 29 | Search EUV+LITHOGRAPHY | Search EUV+LITHOGRAPHY |
7 | DEBRIS MITIGATION | 157564 | 1% | 50% | 9 | Search DEBRIS+MITIGATION | Search DEBRIS+MITIGATION |
8 | COLLECTOR OPTICS | 140065 | 0% | 100% | 4 | Search COLLECTOR+OPTICS | Search COLLECTOR+OPTICS |
9 | PLASMA DEBRIS | 140065 | 0% | 100% | 4 | Search PLASMA+DEBRIS | Search PLASMA+DEBRIS |
10 | EXTREME ULTRAVIOLET SOURCE | 140061 | 1% | 67% | 6 | Search EXTREME+ULTRAVIOLET+SOURCE | Search EXTREME+ULTRAVIOLET+SOURCE |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | O'SULLIVAN, G , LI, BW , D'ARCY, R , DUNNE, P , HAYDEN, P , KILBANE, D , MCCORMACK, T , OHASHI, H , O'REILLY, F , SHERIDAN, P , ET AL (2015) SPECTROSCOPY OF HIGHLY CHARGED IONS AND ITS RELEVANCE TO EUV AND SOFT X-RAY SOURCE DEVELOPMENT.JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS. VOL. 48. ISSUE 14. P. - | 43 | 78% | 5 |
2 | O'SULLIVAN, G , KILBANE, D , D'ARCY, R , (2012) RECENT PROGRESS IN SOURCE DEVELOPMENT FOR EXTREME UV LITHOGRAPHY.JOURNAL OF MODERN OPTICS. VOL. 59. ISSUE 10. P. 855 -872 | 36 | 90% | 5 |
3 | ROY, A , HARILAL, SS , POLEK, MP , HASSAN, SM , ENDO, A , HASSANEIN, A , (2014) INFLUENCE OF LASER PULSE DURATION ON EXTREME ULTRAVIOLET AND ION EMISSION FEATURES FROM TIN PLASMAS.PHYSICS OF PLASMAS. VOL. 21. ISSUE 3. P. - | 28 | 88% | 8 |
4 | COONS, RW , HARILAL, SS , CAMPOS, D , HASSANEIN, A , (2010) ANALYSIS OF ATOMIC AND ION DEBRIS FEATURES OF LASER-PRODUCED SN AND LI PLASMAS.JOURNAL OF APPLIED PHYSICS. VOL. 108. ISSUE 6. P. - | 30 | 81% | 12 |
5 | NISHIHARA, K , SUNAHARA, A , SASAKI, A , NUNAMI, M , TANUMA, H , FUJIOKA, S , SHIMADA, Y , FUJIMA, K , FURUKAWA, H , KATO, T , ET AL (2008) PLASMA PHYSICS AND RADIATION HYDRODYNAMICS IN DEVELOPING AN EXTREME ULTRAVIOLET LIGHT SOURCE FOR LITHOGRAPHY.PHYSICS OF PLASMAS. VOL. 15. ISSUE 5. P. - | 27 | 79% | 49 |
6 | O'SULLIVAN, G , LI, BW , DUNNE, P , HAYDEN, P , KILBANE, D , LOKASANI, R , LONG, E , OHASHI, H , O'REILLY, F , SHEIL, J , ET AL (2015) SOURCES FOR BEYOND EXTREME ULTRAVIOLET LITHOGRAPHY AND WATER WINDOW IMAGING.PHYSICA SCRIPTA. VOL. 90. ISSUE 5. P. - | 22 | 81% | 2 |
7 | ABHARI, RS , ROLLINGER, B , GIOVANNINI, AZ , MORRIS, O , HENDERSON, I , ELLWI, SS , (2012) LASER-PRODUCED PLASMA LIGHT SOURCE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY APPLICATIONS.JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. VOL. 11. ISSUE 2. P. - | 23 | 82% | 11 |
8 | MATSUKUMA, H , HOSODA, T , SUZUKI, Y , YOGO, A , YANAGIDA, T , KODAMA, T , NISHIMURA, H , (2016) FAR-INFRARED-LIGHT SHADOWGRAPHY FOR HIGH EXTRACTION EFFICIENCY OF EXTREME ULTRAVIOLET LIGHT FROM A CO2-LASER-GENERATED TIN PLASMA.APPLIED PHYSICS LETTERS. VOL. 109. ISSUE 5. P. - | 18 | 90% | 1 |
9 | SIZYUK, T , HASSANEIN, A , (2014) OPTIMIZING LASER PRODUCED PLASMAS FOR EFFICIENT EXTREME ULTRAVIOLET AND SOFT X-RAY LIGHT SOURCES.PHYSICS OF PLASMAS. VOL. 21. ISSUE 8. P. - | 19 | 90% | 3 |
10 | HARILAL, SS , MILOSHEVSKY, GV , SIZYUK, T , HASSANEIN, A , (2013) EFFECTS OF EXCITATION LASER WAVELENGTH ON LY-ALPHA AND HE-ALPHA LINE EMISSION FROM NITROGEN PLASMAS.PHYSICS OF PLASMAS. VOL. 20. ISSUE 1. P. - | 27 | 64% | 5 |
Classes with closest relation at Level 1 |