Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
11311 | 991 | 20.9 | 65% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
279 | 3 | SELF ASSEMBLED MONOLAYER//MOLECULAR ELECTRONICS//NANOSCIENCE & NANOTECHNOLOGY | 42929 |
3017 | 2 | DIAZONIUM SALTS//SU 8//ELECTROGRAFTING | 2527 |
11311 | 1 | SU 8//MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS//JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 991 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | SU 8 | authKW | 1144873 | 13% | 29% | 127 |
2 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | journal | 269663 | 17% | 5% | 171 |
3 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | journal | 192991 | 19% | 3% | 186 |
4 | LIGA | authKW | 180224 | 3% | 21% | 28 |
5 | DEEP X RAY LITHOGRAPHY | authKW | 169067 | 2% | 37% | 15 |
6 | UV LIGA | authKW | 162706 | 1% | 41% | 13 |
7 | MIKROSTRUKTURTECH | address | 130777 | 2% | 19% | 22 |
8 | SU 8 REMOVAL | authKW | 123245 | 0% | 100% | 4 |
9 | DEVICE TECHNOL GRP | address | 123237 | 1% | 50% | 8 |
10 | SU8 | authKW | 116742 | 1% | 32% | 12 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Nanoscience & Nanotechnology | 33730 | 62% | 0% | 611 |
2 | Instruments & Instrumentation | 13267 | 36% | 0% | 360 |
3 | Engineering, Electrical & Electronic | 11673 | 63% | 0% | 621 |
4 | Physics, Applied | 9159 | 61% | 0% | 604 |
5 | Materials Science, Multidisciplinary | 4204 | 46% | 0% | 455 |
6 | Mechanics | 2713 | 19% | 0% | 186 |
7 | Optics | 653 | 12% | 0% | 118 |
8 | Engineering, Mechanical | 149 | 5% | 0% | 48 |
9 | Electrochemistry | 79 | 3% | 0% | 30 |
10 | Engineering, Manufacturing | 78 | 2% | 0% | 18 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MIKROSTRUKTURTECH | 130777 | 2% | 19% | 22 |
2 | DEVICE TECHNOL GRP | 123237 | 1% | 50% | 8 |
3 | DMT IMS | 69324 | 0% | 75% | 3 |
4 | PLICAT MICRO ENGN | 69324 | 0% | 75% | 3 |
5 | MICROSTRUCT GRP | 64184 | 1% | 42% | 5 |
6 | CNR INORGAN METHODOL PLASMAS | 61622 | 0% | 100% | 2 |
7 | MICRO NANO INTEGRATED DEVICES | 61622 | 0% | 100% | 2 |
8 | SING ORE MIT ALLIANCE INNOVAT MFG SYST TECHNOL | 61622 | 0% | 100% | 2 |
9 | IMMR | 54771 | 0% | 44% | 4 |
10 | CHEM MAT PROC MODELING | 41080 | 0% | 67% | 2 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 269663 | 17% | 5% | 171 |
2 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 192991 | 19% | 3% | 186 |
3 | MICROELECTRONIC ENGINEERING | 25110 | 9% | 1% | 91 |
4 | MICROSYSTEM TECHNOLOGIES | 13691 | 0% | 22% | 2 |
5 | SENSORS AND ACTUATORS A-PHYSICAL | 10740 | 6% | 1% | 59 |
6 | MICROMACHINES | 9142 | 1% | 2% | 13 |
7 | JOURNAL OF MICROELECTROMECHANICAL SYSTEMS | 8999 | 3% | 1% | 28 |
8 | VERPACKUNGS RUNDSCHAU | 5134 | 0% | 17% | 1 |
9 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 4553 | 1% | 2% | 6 |
10 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 3290 | 1% | 1% | 10 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | SU 8 | 1144873 | 13% | 29% | 127 | Search SU+8 | Search SU+8 |
2 | LIGA | 180224 | 3% | 21% | 28 | Search LIGA | Search LIGA |
3 | DEEP X RAY LITHOGRAPHY | 169067 | 2% | 37% | 15 | Search DEEP+X+RAY+LITHOGRAPHY | Search DEEP+X+RAY+LITHOGRAPHY |
4 | UV LIGA | 162706 | 1% | 41% | 13 | Search UV+LIGA | Search UV+LIGA |
5 | SU 8 REMOVAL | 123245 | 0% | 100% | 4 | Search SU+8+REMOVAL | Search SU+8+REMOVAL |
6 | SU8 | 116742 | 1% | 32% | 12 | Search SU8 | Search SU8 |
7 | 3 D MICROMESH STRUCTURES | 92433 | 0% | 100% | 3 | Search 3+D+MICROMESH+STRUCTURES | Search 3+D+MICROMESH+STRUCTURES |
8 | CONFORMAL MASK | 92433 | 0% | 100% | 3 | Search CONFORMAL+MASK | Search CONFORMAL+MASK |
9 | KMPR | 85582 | 1% | 56% | 5 | Search KMPR | Search KMPR |
10 | SU 8 RESIST | 79222 | 1% | 43% | 6 | Search SU+8+RESIST | Search SU+8+RESIST |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | KIM, BJ , MENG, E , (2016) REVIEW OF POLYMER MEMS MICROMACHINING.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 26. ISSUE 1. P. - | 77 | 30% | 5 |
2 | HIRAI, Y , SUGANO, K , TSUCHIYA, T , TABATA, O , (2010) EMBEDDED MICROSTRUCTURE FABRICATION USING DEVELOPER-PERMEABILITY OF SEMI-CROSS-LINKED NEGATIVE RESIST.JOURNAL OF MICROELECTROMECHANICAL SYSTEMS. VOL. 19. ISSUE 5. P. 1058-1069 | 38 | 81% | 5 |
3 | ABGRALL, P , CONEDERA, V , CAMON, H , GUE, AM , NGUYEN, NT , (2007) SU-8 AS A STRUCTURAL MATERIAL FOR LABS-ON-CHIPS AND MICROELECTROMECHANICAL SYSTEMS.ELECTROPHORESIS. VOL. 28. ISSUE 24. P. 4539 -4551 | 48 | 54% | 116 |
4 | DEL CAMPO, A , GREINER, C , (2007) SU-8: A PHOTORESIST FOR HIGH-ASPECT-RATIO AND 3D SUBMICRON LITHOGRAPHY.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 17. ISSUE 6. P. R81-R95 | 54 | 40% | 233 |
5 | HIRAI, Y , SUGANO, K , TSUCHIYA, T , TABATA, O , (2010) A THREE-DIMENSIONAL MICROSTRUCTURING TECHNIQUE EXPLOITING THE POSITIVE PHOTORESIST PROPERTY.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 20. ISSUE 6. P. - | 29 | 71% | 4 |
6 | WANGLER, N , GUTZWEILER, L , KALKANDJIEV, K , MULLER, C , MAYENFELS, F , REINECKE, H , ZENGERLE, R , PAUST, N , (2011) HIGH-RESOLUTION PERMANENT PHOTORESIST LAMINATE TMMF FOR SEALED MICROFLUIDIC STRUCTURES IN BIOLOGICAL APPLICATIONS.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 21. ISSUE 9. P. - | 25 | 69% | 18 |
7 | MAKAROVA, OV , YANG, GH , AMSTUTZ, PT , TANG, CM , (2008) FABRICATION OF ANTISCATTER GRIDS AND COLLIMATORS FOR X-RAY AND GAMMA-RAY IMAGING BY LITHOGRAPHY AND ELECTROFORMING.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS. VOL. 14. ISSUE 9-11. P. 1613 -1619 | 19 | 100% | 7 |
8 | GRIFFITHS, SK , LOSEY, MW , HACHMAN, JT , SKALA, DM , HUNTER, LL , YANG, NYC , BOEHME, DR , KORELLIS, JS , AIGELDINGER, G , LU, WY , ET AL (2005) RESIST SUBSTRATE STUDIES FOR LIGA MICROFABRICATION WITH APPLICATION TO A NEW ANODIZED ALUMINUM SUBSTRATE.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 15. ISSUE 9. P. 1700-1712 | 22 | 88% | 9 |
9 | CHUANG, T , FANG, T , JIANG, M , LEI, W , SHEW, B , FU, C , (2012) MOTION-PATH-BASED THREE-DIMENSIONAL X-RAY FREE-FORM MICROMACHINING SYSTEM.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 22. ISSUE 8. P. - | 19 | 76% | 1 |
10 | XUE, P , BAO, JN , CHUAH, YJ , MENON, NV , ZHANG, YL , KANG, YJ , (2014) PROTEIN COVALENTLY CONJUGATED SU-8 SURFACE FOR THE ENHANCEMENT OF MESENCHYMAL STEM CELL ADHESION AND PROLIFERATION.LANGMUIR. VOL. 30. ISSUE 11. P. 3110-3117 | 24 | 55% | 6 |
Classes with closest relation at Level 1 |