Class information for:
Level 1: DIMETHYLALUMINUM HYDRIDE//DIMETHYLALUMINUMHYDRIDE DMAH//SELECTIVE AL CVD

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
24432 312 18.7 57%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
715 3       BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION 5470
2014 2             BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION 5470
24432 1                   DIMETHYLALUMINUM HYDRIDE//DIMETHYLALUMINUMHYDRIDE DMAH//SELECTIVE AL CVD 312

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 DIMETHYLALUMINUM HYDRIDE authKW 1223360 5% 83% 15
2 DIMETHYLALUMINUMHYDRIDE DMAH authKW 391477 1% 100% 4
3 SELECTIVE AL CVD authKW 293608 1% 100% 3
4 ALUMINUM PLUG authKW 220204 1% 75% 3
5 DMAH authKW 195738 1% 100% 2
6 ELEMENTARY REACTION SIMULATION authKW 195738 1% 100% 2
7 FULLY SELF ALIGNED METALLIZATION authKW 195738 1% 100% 2
8 METHYLPYRROLIDINE ALANE authKW 195738 1% 100% 2
9 PROC SEQUENCE INTEGRAT address 195738 1% 100% 2
10 SELECTIVE ALUMINUM CHEMICAL VAPOR DEPOSITION authKW 195738 1% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 5429 30% 0% 94
2 Physics, Applied 3277 65% 0% 202
3 Physics, Condensed Matter 835 28% 0% 88
4 Materials Science, Multidisciplinary 282 23% 0% 73
5 Chemistry, Physical 131 16% 0% 51
6 Engineering, Electrical & Electronic 127 14% 0% 44
7 Nanoscience & Nanotechnology 127 8% 0% 24
8 Electrochemistry 117 6% 0% 18
9 Crystallography 28 3% 0% 10
10 METALLURGY & MINING 21 0% 0% 1

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PROC SEQUENCE INTEGRAT 195738 1% 100% 2
2 CIRIMAT INPT 130491 1% 67% 2
3 AGCY IND SCI TECHNOL IND PROD 97869 0% 100% 1
4 DRAM DEV PROGRAM 97869 0% 100% 1
5 ELECT ELE ENGN TENPA KU 97869 0% 100% 1
6 ENCIACET 97869 0% 100% 1
7 MET DEPOSIT PROD BUSINESS GRP 97869 0% 100% 1
8 PROC ENGN INTERCONNECT 97869 0% 100% 1
9 SECT MICROELECT 97869 0% 100% 1
10 SEMICOND PLANT REGENSBURG 97869 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 THIN SOLID FILMS 2740 10% 0% 32
2 JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS 2641 9% 0% 29
3 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2476 6% 0% 19
4 APPLIED SURFACE SCIENCE 1582 8% 0% 24
5 OPTOELECTRONICS-DEVICES AND TECHNOLOGIES 1062 0% 1% 1
6 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 976 4% 0% 13
7 KOREAN JOURNAL OF CHEMICAL ENGINEERING 971 2% 0% 7
8 JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS 801 3% 0% 10
9 MICROELECTRONIC ENGINEERING 768 3% 0% 9
10 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 713 5% 0% 15

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 DIMETHYLALUMINUM HYDRIDE 1223360 5% 83% 15 Search DIMETHYLALUMINUM+HYDRIDE Search DIMETHYLALUMINUM+HYDRIDE
2 DIMETHYLALUMINUMHYDRIDE DMAH 391477 1% 100% 4 Search DIMETHYLALUMINUMHYDRIDE+DMAH Search DIMETHYLALUMINUMHYDRIDE+DMAH
3 SELECTIVE AL CVD 293608 1% 100% 3 Search SELECTIVE+AL+CVD Search SELECTIVE+AL+CVD
4 ALUMINUM PLUG 220204 1% 75% 3 Search ALUMINUM+PLUG Search ALUMINUM+PLUG
5 DMAH 195738 1% 100% 2 Search DMAH Search DMAH
6 ELEMENTARY REACTION SIMULATION 195738 1% 100% 2 Search ELEMENTARY+REACTION+SIMULATION Search ELEMENTARY+REACTION+SIMULATION
7 FULLY SELF ALIGNED METALLIZATION 195738 1% 100% 2 Search FULLY+SELF+ALIGNED+METALLIZATION Search FULLY+SELF+ALIGNED+METALLIZATION
8 METHYLPYRROLIDINE ALANE 195738 1% 100% 2 Search METHYLPYRROLIDINE+ALANE Search METHYLPYRROLIDINE+ALANE
9 SELECTIVE ALUMINUM CHEMICAL VAPOR DEPOSITION 195738 1% 100% 2 Search SELECTIVE+ALUMINUM+CHEMICAL+VAPOR+DEPOSITION Search SELECTIVE+ALUMINUM+CHEMICAL+VAPOR+DEPOSITION
10 UHV SPUTTERING 130491 1% 67% 2 Search UHV+SPUTTERING Search UHV+SPUTTERING

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref.
in cl.		 Shr. of ref. in
cl.		 Citations
1 WILLIS, BG , JENSEN, KF , (2001) DISPROPORTIONATION OF DIMETHYLALANE ON ALUMINUM SURFACES. PART 1. EXPERIMENTAL STUDIES.SURFACE SCIENCE. VOL. 488. ISSUE 3. P. 286 -302 30 75% 4
2 KIM, DH , KIM, BY , (2001) MORPHOLOGY AND HOLE FILLING PROPERTIES OF CHEMICALLY VAPOR DEPOSITED ALUMINUM FILMS PREPARED FROM DIMETHYLETHYLAMINE ALANE.JOURNAL OF THE ELECTROCHEMICAL SOCIETY. VOL. 148. ISSUE 1. P. C10 -C15 18 90% 4
3 AHN, SD , LEE, HB , KANG, SW , (2000) SURFACE MORPHOLOGY IMPROVEMENT OF METALORGANIC CHEMICAL VAPOR DEPOSITION AL FILMS BY LAYERED DEPOSITION OF AL AND ULTRATHIN TIN.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 39. ISSUE 6A. P. 3349-3354 18 86% 3
4 KIM, DH , KIM, BY , (2000) CHARACTERISTICS OF ALUMINUM FILMS PREPARED BY METALORGANIC CHEMICAL VAPOR DEPOSITION USING DIMETHYLETHYLAMINE ALANE ON THE PLASMA-PRETREATED TIN SURFACES.KOREAN JOURNAL OF CHEMICAL ENGINEERING. VOL. 17. ISSUE 4. P. 449 -454 15 100% 1
5 BULANIN, KM , KONG, MJ , PIROLLI, L , MATHAUSER, AT , TEPLYAKOV, AV , (2003) ADSORPTION AND THERMAL DECOMPOSITION OF DIETHYLALUMINUM HYDRIDE ON SI(100)-2 X 1.SURFACE SCIENCE. VOL. 542. ISSUE 3. P. 167-176 24 49% 4
6 WADAYAMA, T , TAKEUCHI, K , MUKAI, K , TANABE, T , HATTA, A , (2002) INFRARED SPECTROSCOPIC STUDY OF DIMETHYLALUMINUM-HYDRIDE ADSORPTION ON OXIDIZED, HYDROGEN-TERMINATED, AND RECONSTRUCTED SI SURFACES.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 20. ISSUE 2. P. 299 -304 17 68% 2
7 LIU, Y , OVERZET, LJ , GOECKNER, MJ , (2006) CHEMICAL VAPOR DEPOSITION OF ALUMINUM FROM METHYLPYRROLIDINE ALANE COMPLEX.THIN SOLID FILMS. VOL. 510. ISSUE 1-2. P. 48-54 10 100% 13
8 UESUGI, F , NISHIYAMA, I , (1994) PHOTON ENERGY-DEPENDENCE OF SYNCHROTRON-RADIATION-INDUCED GROWTH SUPPRESSION AND INITIATION IN AL CHEMICAL-VAPOR-DEPOSITION.APPLIED SURFACE SCIENCE. VOL. 79-80. ISSUE . P. 203 -207 15 100% 9
9 HANABUSA, M , KOMATSU, A , (1994) PHOTOINDUCED MODIFICATION OF THE CATALYTIC REACTION OF TITANIUM-OXIDE AND PALLADIUM IN CHEMICAL-VAPOR-DEPOSITION OF AL FILMS.APPLIED PHYSICS LETTERS. VOL. 65. ISSUE 14. P. 1826-1828 15 100% 6
10 JEGIER, JA , GLADFELTER, WL , (2000) THE USE OF ALUMINUM AND GALLIUM HYDRIDES IN MATERIALS SCIENCE.COORDINATION CHEMISTRY REVIEWS. VOL. 206. ISSUE . P. 631 -650 31 36% 38

Classes with closest relation at Level 1


Rank Class id link
1 8898 FREEFORM FABRICAT S//NEMISIS TEAM//LCVD
2 16292 CVD W//TUNGSTEN THIN FILMS//CVD IRON
3 11277 PERFLUORINATED CARBOXYLATES//ZENTRUM MIKROTECHNOL//COPPER FILMS
4 23066 SYNCHROTRON RADIATION STIMULATED ETCHING//ADV SCI TECHNOL IND//VACUUM UV PHOTOSCI
5 34788 CERIUM MAGNETOPLUMBITE//EDS SPECTRA//ENAMEL INSERT RESTORATION
6 1618 JOURNAL OF CRYSTAL GROWTH//TRIMETHYLINDIUM//MOMBE
7 24227 TRIODE ION PLATING//ENERGY RESOLVED MASS SPECTROSCOPY//AL PT
8 11111 TEOS PECVD//TEOS//FEATURE SCALE
9 25730 ERBIUM ARSENIDE//ERSB//RARE EARTH GROUP V COMPOUND
10 8050 ION BEAM ENGN EXPT//GAS CLUSTER ION BEAM//CLUSTER ION BEAM

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