Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
8898 | 1206 | 21.5 | 53% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
715 | 3 | BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION | 5470 |
2014 | 2 | BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION | 5470 |
8898 | 1 | FREEFORM FABRICAT S//NEMISIS TEAM//LCVD | 1206 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | FREEFORM FABRICAT S | address | 180037 | 1% | 89% | 8 |
2 | NEMISIS TEAM | address | 50636 | 0% | 100% | 2 |
3 | LCVD | authKW | 39619 | 0% | 26% | 6 |
4 | DIMETHYLGOLDIII COMPLEXES | authKW | 33756 | 0% | 67% | 2 |
5 | 8 MERCAPTOQUINOLATE | authKW | 25318 | 0% | 100% | 1 |
6 | ADLAYER PHOTOCHEMISTRY | authKW | 25318 | 0% | 100% | 1 |
7 | ADV MAT NANOSYST GRP | address | 25318 | 0% | 100% | 1 |
8 | AKAD LAVRENTIV PROSPEKT 3 | address | 25318 | 0% | 100% | 1 |
9 | BEAM GUIDE | authKW | 25318 | 0% | 100% | 1 |
10 | BORON DOPING OF SILICON | authKW | 25318 | 0% | 100% | 1 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 8323 | 53% | 0% | 641 |
2 | Materials Science, Coatings & Films | 4310 | 14% | 0% | 168 |
3 | Chemistry, Physical | 1044 | 22% | 0% | 263 |
4 | Physics, Condensed Matter | 668 | 14% | 0% | 171 |
5 | Materials Science, Multidisciplinary | 633 | 19% | 0% | 227 |
6 | Physics, Atomic, Molecular & Chemical | 260 | 7% | 0% | 85 |
7 | Engineering, Electrical & Electronic | 215 | 10% | 0% | 125 |
8 | Spectroscopy | 169 | 4% | 0% | 47 |
9 | Optics | 159 | 6% | 0% | 75 |
10 | Electrochemistry | 153 | 4% | 0% | 44 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | FREEFORM FABRICAT S | 180037 | 1% | 89% | 8 |
2 | NEMISIS TEAM | 50636 | 0% | 100% | 2 |
3 | ADV MAT NANOSYST GRP | 25318 | 0% | 100% | 1 |
4 | AKAD LAVRENTIV PROSPEKT 3 | 25318 | 0% | 100% | 1 |
5 | CANADA CHAIR FREEFORM FABRICAT | 25318 | 0% | 100% | 1 |
6 | CHEM SOLID STATE SCI | 25318 | 0% | 100% | 1 |
7 | CHIM CHIM TECH | 25318 | 0% | 100% | 1 |
8 | COMPARTIMENTO ENEL | 25318 | 0% | 100% | 1 |
9 | ELECT ENGN SEMICOND PHOTON POB 6101 | 25318 | 0% | 100% | 1 |
10 | ENGN CHEM MAT 1515 KAMAHAMACHO | 25318 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 11684 | 7% | 1% | 80 |
2 | APPLIED SURFACE SCIENCE | 4187 | 6% | 0% | 77 |
3 | APPLIED PHYSICS LETTERS | 3693 | 11% | 0% | 129 |
4 | PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS | 3647 | 2% | 1% | 28 |
5 | APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY | 3127 | 1% | 1% | 14 |
6 | SOLID STATE TECHNOLOGY | 3050 | 1% | 1% | 15 |
7 | JOURNAL OF APPLIED PHYSICS | 2307 | 8% | 0% | 101 |
8 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1705 | 3% | 0% | 34 |
9 | LASER CHEMISTRY | 1643 | 0% | 1% | 5 |
10 | ELECTRON DEVICE LETTERS | 1338 | 0% | 1% | 4 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | HERMAN, IP , (1989) LASER-ASSISTED DEPOSITION OF THIN-FILMS FROM GAS-PHASE AND SURFACE-ADSORBED MOLECULES.CHEMICAL REVIEWS. VOL. 89. ISSUE 6. P. 1323 -1357 | 170 | 55% | 168 |
2 | HAIGH, J , AYLETT, MR , (1988) PHOTO-INITIATED DEPOSITION AND ETCHING OF MATERIALS RELEVANT TO SEMICONDUCTOR-DEVICES.PROGRESS IN QUANTUM ELECTRONICS. VOL. 12. ISSUE 1. P. 1 -85 | 129 | 50% | 10 |
3 | DUTY, C , JEAN, D , LACKEY, WJ , (2001) LASER CHEMICAL VAPOUR DEPOSITION: MATERIALS, MODELLING, AND PROCESS CONTROL.INTERNATIONAL MATERIALS REVIEWS. VOL. 46. ISSUE 6. P. 271 -287 | 59 | 54% | 30 |
4 | TESLENKO, VV , (1990) LASER-INDUCED CHEMICAL-DEPOSITION FROM GAS-PHASE.USPEKHI KHIMII. VOL. 59. ISSUE 2. P. 177 -196 | 67 | 67% | 0 |
5 | MAXWELL, JL , WEBB, N , BRADSHAW, D , BLACK, MR , MASKALY, K , CHAVEZ, CA , ESPINOZA, M , VESSARD, S , ART, B , JOHNSON, S , ET AL (2014) ON "HOW TO START A FIRE'', OR TRANSVERSE FORCED-CONVECTION, HYPERBARIC LASER CHEMICAL VAPOR DEPOSITION OF FIBERS AND TEXTILES.TEXTILE RESEARCH JOURNAL. VOL. 84. ISSUE 18. P. 1976 -1986 | 22 | 88% | 0 |
6 | RYTZFROIDEVAUX, Y , SALATHE, RP , GILGEN, HH , (1985) LASER GENERATED MICROSTRUCTURES.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. VOL. 37. ISSUE 3. P. 121 -138 | 62 | 71% | 71 |
7 | BAUM, TH , COMITA, PB , (1992) LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF METALS FOR MICROELECTRONICS TECHNOLOGY.THIN SOLID FILMS. VOL. 218. ISSUE 1-2. P. 80 -94 | 55 | 53% | 42 |
8 | MAXWELL, JL , PEGNA, J , MESSIA, DV , (1998) REAL-TIME VOLUMETRIC GROWTH RATE MEASUREMENTS AND FEEDBACK CONTROL OF THREE-DIMENSIONAL LASER CHEMICAL VAPOR DEPOSITION.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. VOL. 67. ISSUE 3. P. 323-329 | 26 | 93% | 9 |
9 | DOWBEN, PA , SPENCER, JT , STAUF, GT , (1989) DEPOSITION OF THIN METAL AND METAL SILICIDE FILMS FROM THE DECOMPOSITION OF ORGANOMETALLIC COMPOUNDS.MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY. VOL. 2. ISSUE 4. P. 297 -323 | 76 | 46% | 14 |
10 | KOUTLAS, GN , VLACHOS, NS , (2003) NUMERICAL MODELING OF PYROLYTIC LASER-INDUCED CHEMICAL VAPOR DEPOSITION.JOURNAL OF APPLIED PHYSICS. VOL. 93. ISSUE 5. P. 3049-3056 | 25 | 71% | 2 |
Classes with closest relation at Level 1 |