Class information for:
Level 1: PERFLUORINATED CARBOXYLATES//ZENTRUM MIKROTECHNOL//COPPER FILMS

Basic class information
Class id #P Avg. number of
references		 Database coverage
of references
11277 994 27.2 65%


Bar chart of Publication_year

Last years might be incomplete

Hierarchy of classes
The table includes all classes above and classes immediately below the current class.


Cluster id Level Cluster label #P
2 4 MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER 2836879
715 3       BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION 5470
2014 2             BETA DIKETONATE//DIMETHYLALUMINUM HYDRIDE//CHEMICAL VAPOR DEPOSITION 5470
11277 1                   PERFLUORINATED CARBOXYLATES//ZENTRUM MIKROTECHNOL//COPPER FILMS 994

Terms with highest relevance score


rank Term termType Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 PERFLUORINATED CARBOXYLATES authKW 247198 1% 62% 13
2 ZENTRUM MIKROTECHNOL address 137650 1% 41% 11
3 COPPER FILMS authKW 130085 1% 35% 12
4 CU CVD authKW 127991 1% 83% 5
5 COPPER CVD authKW 109705 1% 71% 5
6 IR AND NMR authKW 109705 1% 71% 5
7 LOW INDEX SINGLE CRYSTAL SI SURFACES authKW 92154 0% 100% 3
8 SILA BETA DIKETONE authKW 92154 0% 100% 3
9 COPPER CVD FILMS authKW 61436 0% 100% 2
10 COPPERICHLORIDE authKW 61436 0% 100% 2

Web of Science journal categories


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 Materials Science, Coatings & Films 11108 24% 0% 241
2 Physics, Applied 3275 38% 0% 376
3 Chemistry, Inorganic & Nuclear 1485 14% 0% 144
4 Materials Science, Multidisciplinary 1456 29% 0% 285
5 Electrochemistry 1379 10% 0% 104
6 Physics, Condensed Matter 1073 19% 0% 187
7 Nanoscience & Nanotechnology 617 9% 0% 92
8 Chemistry, Physical 442 17% 0% 166
9 Engineering, Electrical & Electronic 208 11% 0% 109
10 Crystallography 197 4% 0% 44

Address terms


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 ZENTRUM MIKROTECHNOL 137650 1% 41% 11
2 PHYS 1SC25 61436 0% 100% 2
3 CNRS 7071 55290 0% 60% 3
4 LEHRSTUHL MIKROTECHNOL 40956 0% 67% 2
5 SCI MAT ENGN 31346 1% 15% 7
6 863 PROGRAM NEW MAT MO PRECURSORS RD 30718 0% 100% 1
7 ARTS SCI KAHEAMANMARAS 30718 0% 100% 1
8 BLANKET DIELECT 30718 0% 100% 1
9 CIRIMAT 4 30718 0% 100% 1
10 CORPORATE SCI TECHNOL 30718 0% 100% 1

Journals


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class
1 CHEMICAL VAPOR DEPOSITION 51870 4% 4% 41
2 CHEMISTRY OF MATERIALS 4842 5% 0% 53
3 MICROELECTRONIC ENGINEERING 4792 4% 0% 40
4 ELECTROCHEMICAL AND SOLID STATE LETTERS 4104 2% 1% 24
5 JOURNAL OF THE ELECTROCHEMICAL SOCIETY 3986 6% 0% 63
6 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 2174 3% 0% 32
7 THIN SOLID FILMS 2135 5% 0% 51
8 JOURNAL DE PHYSIQUE IV 1825 3% 0% 25
9 POLYHEDRON 1232 3% 0% 26
10 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 1113 3% 0% 25

Author Key Words


Rank Term Chi square Shr. of publ. in
class containing
term		 Class's shr. of
term's tot. occurrences		 #P with
term in
class		 LCSH search Wikipedia search
1 PERFLUORINATED CARBOXYLATES 247198 1% 62% 13 Search PERFLUORINATED+CARBOXYLATES Search PERFLUORINATED+CARBOXYLATES
2 COPPER FILMS 130085 1% 35% 12 Search COPPER+FILMS Search COPPER+FILMS
3 CU CVD 127991 1% 83% 5 Search CU+CVD Search CU+CVD
4 COPPER CVD 109705 1% 71% 5 Search COPPER+CVD Search COPPER+CVD
5 IR AND NMR 109705 1% 71% 5 Search IR+AND+NMR Search IR+AND+NMR
6 LOW INDEX SINGLE CRYSTAL SI SURFACES 92154 0% 100% 3 Search LOW+INDEX+SINGLE+CRYSTAL+SI+SURFACES Search LOW+INDEX+SINGLE+CRYSTAL+SI+SURFACES
7 SILA BETA DIKETONE 92154 0% 100% 3 Search SILA+BETA+DIKETONE Search SILA+BETA+DIKETONE
8 COPPER CVD FILMS 61436 0% 100% 2 Search COPPER+CVD+FILMS Search COPPER+CVD+FILMS
9 COPPERICHLORIDE 61436 0% 100% 2 Search COPPERICHLORIDE Search COPPERICHLORIDE
10 CUHFACVTMOS 61436 0% 100% 2 Search CUHFACVTMOS Search CUHFACVTMOS

Core articles
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c:
(1) Number of references referring to publications in the class.
(2) Share of total number of active references referring to publications in the class.
(3) Age of the article. New articles get higher score than old articles.
(4) Citation rate, normalized to year.


Rank Reference # ref. in
cl.		 Shr. of ref. in
cl.		 Citations
1 VERTOPRAKHOV, VN , KRUPODER, SA , (2000) PREPARATION OF THIN COPPER FILMS FROM THE VAPOUR PHASE OF VOLATILE COPPER(I) AND COPPER(II) DERIVATIVES BY THE CVD METHOD.USPEKHI KHIMII. VOL. 69. ISSUE 12. P. 1149 -1177 176 62% 6
2 GORDON, PG , KUREK, A , BARRY, ST , (2015) TRENDS IN COPPER PRECURSOR DEVELOPMENT FOR CVD AND ALD APPLICATIONS.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 4. ISSUE 1. P. N3188 -N3197 42 88% 7
3 RICKERBY, J , STEINKE, JHG , (2002) CURRENT TRENDS IN PATTERNING WITH COPPER.CHEMICAL REVIEWS. VOL. 102. ISSUE 5. P. 1525 -1549 81 59% 95
4 MA, Q , ZAERA, F , (2013) CHEMISTRY OF CU(ACAC)(2) ON NI(110) AND CU(110) SURFACES: IMPLICATIONS FOR ATOMIC LAYER DEPOSITION PROCESSES.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 31. ISSUE 1. P. - 42 71% 8
5 LAY, E , SONG, YH , CHIU, YC , LIN, YM , CHI, Y , CARTY, AJ , PENG, SM , LEE, GH , (2005) NEW CVD PRECURSORS CAPABLE OF DEPOSITING COPPER METAL UNDER MIXED O-2/AR ATMOSPHERE.INORGANIC CHEMISTRY. VOL. 44. ISSUE 20. P. 7226-7233 42 78% 23
6 KALUTARAGE, LC , CLENDENNING, SB , WINTER, CH , (2014) LOW-TEMPERATURE ATOMIC LAYER DEPOSITION OF COPPER FILMS USING BORANE DIMETHYLAMINE AS THE REDUCING CO-REAGENT.CHEMISTRY OF MATERIALS. VOL. 26. ISSUE 12. P. 3731 -3738 29 66% 15
7 DOPPELT, P , BAUM, TH , (1994) CHEMICAL-VAPOR-DEPOSITION OF COPPER FOR IC METALLIZATION - PRECURSOR CHEMISTRY AND MOLECULAR-STRUCTURE.MRS BULLETIN. VOL. 19. ISSUE 8. P. 41 -48 47 76% 57
8 DEY, G , WRENCH, JS , HAGEN, DJ , KEENEY, L , ELLIOTT, SD , (2015) QUANTUM CHEMICAL AND SOLUTION PHASE EVALUATION OF METALLOCENES AS REDUCING AGENTS FOR THE PROSPECTIVE ATOMIC LAYER DEPOSITION OF COPPER.DALTON TRANSACTIONS. VOL. 44. ISSUE 22. P. 10188 -10199 35 57% 2
9 WILLCOCKS, AM , PUGH, T , HAMILTON, JA , JOHNSON, AL , RICHARDS, SP , KINGSLEY, AJ , (2013) CVD OF PURE COPPER FILMS FROM NOVEL ISO-UREATE COMPLEXES.DALTON TRANSACTIONS. VOL. 42. ISSUE 15. P. 5554-5565 38 53% 2
10 GRODZICKI, A , LAKOMSKA, I , PISZCZEK, P , SZYMANSKA, I , SZLYK, E , (2005) COPPER(I), SILVER(I) AND GOLD(I) CARBOXYLATE COMPLEXES AS PRECURSORS IN CHEMICAL VAPOUR DEPOSITION OF THIN METALLIC FILMS.COORDINATION CHEMISTRY REVIEWS. VOL. 249. ISSUE 21-22. P. 2232-2258 41 52% 92

Classes with closest relation at Level 1


Rank Class id link
1 27272 CHROMIUM BASED COATINGS//TG BASED TRANSPIRATION//ATMOSPHERIC DEPOSITION PROCESS
2 3427 DIFFUSION BARRIER//CU METALLIZATION//TANTALUM NITRIDE
3 24432 DIMETHYLALUMINUM HYDRIDE//DIMETHYLALUMINUMHYDRIDE DMAH//SELECTIVE AL CVD
4 24465 STATE ADV TECHNOL PLATINUM MET//IRIDIUM ACETYLACETONATE COMPLEXES//AV NIKOLAEV INORGAN CHEM
5 26085 INDUCTIVELY COUPLED PLASMA REACTIVE ION ETCHING//TI HARD MASK//MAGNETIC TUNNEL JUNCTION MATERIALS
6 14620 SUPERCRITICAL FLUID DEPOSITION//SUPERCRITICAL DEPOSITION//TBP HNO3 COMPLEX
7 26984 AGGLOMERATION SUPPRESSION//NSF LOW POWER ELECT//SILVER METALLIZATION
8 8977 SRDPM2//BETA DIKETONATE//TIT BUO2DPM2
9 16292 CVD W//TUNGSTEN THIN FILMS//CVD IRON
10 2435 ATOMIC LAYER DEPOSITION//ALD//MOLECULAR LAYER DEPOSITION

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