Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
23066 | 359 | 17.3 | 66% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
6 | 3 | PHYSICS, APPLIED//IEEE TRANSACTIONS ON ELECTRON DEVICES//SILICON | 155028 |
899 | 2 | SURFACE SCIENCE//SILICON//SCANNING TUNNELING MICROSCOPY | 11316 |
23066 | 1 | SYNCHROTRON RADIATION STIMULATED ETCHING//ADV SCI TECHNOL IND//VACUUM UV PHOTOSCI | 359 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | SYNCHROTRON RADIATION STIMULATED ETCHING | authKW | 255168 | 1% | 100% | 3 |
2 | ADV SCI TECHNOL IND | address | 213919 | 9% | 8% | 31 |
3 | VACUUM UV PHOTOSCI | address | 177427 | 3% | 19% | 11 |
4 | FLUID FILTER | authKW | 170112 | 1% | 100% | 2 |
5 | MICROFLUID FILTER | authKW | 170112 | 1% | 100% | 2 |
6 | SYNCHROTRON RADIATION EXCITED GROWTH | authKW | 170112 | 1% | 100% | 2 |
7 | SUBSTRATE TEMPERATURE DEPENDENCE | authKW | 153098 | 1% | 60% | 3 |
8 | ETCHED PATTERN | authKW | 113407 | 1% | 67% | 2 |
9 | SYNCHROTRON RADIATION ABLATION | authKW | 113407 | 1% | 67% | 2 |
10 | SYNCHROTRON RADIATION ETCHING | authKW | 113407 | 1% | 67% | 2 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Physics, Applied | 3196 | 60% | 0% | 215 |
2 | Materials Science, Coatings & Films | 1870 | 17% | 0% | 60 |
3 | Instruments & Instrumentation | 764 | 15% | 0% | 54 |
4 | Nuclear Science & Technology | 463 | 11% | 0% | 40 |
5 | Nanoscience & Nanotechnology | 319 | 11% | 0% | 39 |
6 | Physics, Nuclear | 292 | 9% | 0% | 33 |
7 | Spectroscopy | 212 | 7% | 0% | 26 |
8 | Physics, Condensed Matter | 209 | 14% | 0% | 52 |
9 | Engineering, Electrical & Electronic | 180 | 15% | 0% | 55 |
10 | Physics, Atomic, Molecular & Chemical | 138 | 9% | 0% | 32 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | ADV SCI TECHNOL IND | 213919 | 9% | 8% | 31 |
2 | VACUUM UV PHOTOSCI | 177427 | 3% | 19% | 11 |
3 | BEHLEN PHYS 225 | 85056 | 0% | 100% | 1 |
4 | CHEM KAMITOMIOKA | 85056 | 0% | 100% | 1 |
5 | DOCTORAL PROGRAM MECH ENGN | 85056 | 0% | 100% | 1 |
6 | ENERGY DENS | 85056 | 0% | 100% | 1 |
7 | KAZUSA ARC | 85056 | 0% | 100% | 1 |
8 | KONINKLIJKE SHELL AMSTERDAM | 85056 | 0% | 100% | 1 |
9 | REACT DYNAM UNIT | 85056 | 0% | 100% | 1 |
10 | SCI TECH S SETAGAYA KU | 85056 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | OPTOELECTRONICS-DEVICES AND TECHNOLOGIES | 45289 | 2% | 8% | 7 |
2 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 6493 | 4% | 0% | 16 |
3 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 5070 | 12% | 0% | 43 |
4 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2885 | 6% | 0% | 22 |
5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1821 | 5% | 0% | 19 |
6 | JOURNAL OF SYNCHROTRON RADIATION | 1769 | 2% | 0% | 8 |
7 | JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1711 | 3% | 0% | 11 |
8 | APPLIED SURFACE SCIENCE | 1255 | 6% | 0% | 23 |
9 | ELECTRONICS AND COMMUNICATIONS IN JAPAN | 1121 | 1% | 0% | 3 |
10 | NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 945 | 5% | 0% | 19 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | TSAI, WC , WANG, SK , HE, TM , CHOU, LC , HSIEH, YC , LIAO, KY , CHEN, HC , WEN, CR , (2011) CONTINUOUS-TIME PHOTON-STIMULATED DESORPTION SPECTROSCOPY STUDIES ON SOFT X-RAY-INDUCED REACTIONS OF CF3BR ADSORBED ON SI(111)-7X7.JOURNAL OF CHEMICAL PHYSICS. VOL. 135. ISSUE 16. P. - | 29 | 67% | 0 |
2 | TSAI, WC , WANG, SK , CHOU, LC , CHEN, J , WU, YH , CHEN, HC , WEN, CR , (2010) PHOTOLYSIS OF SF6 ADSORBED ON SI(111)-7 X 7 BY MONOCHROMATIC SOFT X-RAY.SURFACE SCIENCE. VOL. 604. ISSUE 17-18. P. 1494 -1501 | 26 | 67% | 2 |
3 | WEN, CR , JANG, CY , CHOU, LC , CHEN, J , WU, YH , CHANG, SC , TSAI, WC , LIU, CC , WANG, SK , SHAI, Y , (2007) SOFT X-RAY PHOTOREACTIONS OF CF3CL ADSORBED ON SI(111)-7X7 STUDIED BY CONTINUOUS-TIME PHOTON-STIMULATED DESORPTION SPECTROSCOPY NEAR F(1S) EDGE.JOURNAL OF CHEMICAL PHYSICS. VOL. 127. ISSUE 11. P. - | 23 | 77% | 3 |
4 | CHOU, LC , WEN, CR , (2006) CONTINUOUS-TIME CORE-LEVEL PHOTON-STIMULATED DESORPTION SPECTROSCOPY FOR MONITORING SOFT X-RAY-INDUCED REACTIONS OF MOLECULES ADSORBED ON A SINGLE-CRYSTAL SURFACE.PHYSICAL REVIEW B. VOL. 73. ISSUE 19. P. - | 26 | 67% | 4 |
5 | CHOU, LC , JANG, CY , WU, YH , TSAI, WC , WANG, SK , CHEN, J , CHANG, SC , LIU, CC , SHAI, Y , WEN, CR , (2008) PHOTON-EXPOSURE-DEPENDENT PHOTON-STIMULATED DESORPTION FOR OBTAINING PHOTOLYSIS CROSS SECTION OF MOLECULES ADSORBED ON SURFACE BY MONOCHROMATIC SOFT X-RAY PHOTONS.JOURNAL OF CHEMICAL PHYSICS. VOL. 129. ISSUE 21. P. - | 26 | 57% | 1 |
6 | ROSENBERG, RA , FRIGO, SP , SIMONS, JK , (1994) SYNCHROTRON-RADIATION-INDUCED REACTIONS ON SURFACES - MECHANISMS AND APPLICATIONS.APPLIED SURFACE SCIENCE. VOL. 79-80. ISSUE . P. 47 -56 | 38 | 56% | 28 |
7 | URISU, T , YOSHIGOE, A , IMAIZUMI, Y , (1996) SYNCHROTRON RADIATION-STIMULATED SEMICONDUCTOR PROCESS AND NEW PROSPECTS OF CORE ELECTRON EXCITATION PHOTOCHEMISTRY.OPTOELECTRONICS-DEVICES AND TECHNOLOGIES. VOL. 11. ISSUE 1. P. 57 -70 | 28 | 65% | 8 |
8 | NAKANISHI, K , SUZUKI, H , KATOH, T , IMAI, S , NAKAYAMA, Y , MIKI, H , (1999) DEPOSITION OF POLYETHYLENE THIN FILMS USING SYNCHROTRON RADIATION ABLATION.JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS. VOL. 38. ISSUE 2A. P. 863 -867 | 21 | 78% | 3 |
9 | YAMAGUCHI, A , KIDO, H , UKITA, Y , KISHIHARA, M , UTSUMI, Y , (2016) ANISOTROPIC PYROCHEMICAL MICROETCHING OF POLY(TETRAFLUOROETHYLENE) INITIATED BY SYNCHROTRON RADIATION-INDUCED SCISSION OF MOLECULE BONDS.APPLIED PHYSICS LETTERS. VOL. 108. ISSUE 5. P. - | 13 | 72% | 0 |
10 | UKITA, Y , KISHIHARA, M , KANDA, K , MATSUI, S , MOCHIJI, K , UTSUMI, Y , (2008) FABRICATION OF POLY(TETRAFLUOROETHYLENE) MICROPARTS BY HIGH-ENERGY X-RAY-INDUCED ETCHING.JAPANESE JOURNAL OF APPLIED PHYSICS. VOL. 47. ISSUE 1. P. 337 -341 | 11 | 100% | 1 |
Classes with closest relation at Level 1 |