Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
13873 | 808 | 20.6 | 56% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
378 | 3 | SURFACE & COATINGS TECHNOLOGY//HIGH ENTROPY ALLOY//MATERIALS SCIENCE, COATINGS & FILMS | 32127 |
527 | 2 | SURFACE & COATINGS TECHNOLOGY//MATERIALS SCIENCE, COATINGS & FILMS//TITANIUM NITRIDE | 14964 |
13873 | 1 | TDEAT//TITANIUM NITRIDE//CVD TIN | 808 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | TDEAT | authKW | 157456 | 1% | 83% | 5 |
2 | TITANIUM NITRIDE | authKW | 140797 | 8% | 6% | 65 |
3 | CVD TIN | authKW | 120926 | 0% | 80% | 4 |
4 | MAT CHEM COATINGS | address | 120926 | 0% | 80% | 4 |
5 | TDMAT | authKW | 104642 | 1% | 46% | 6 |
6 | TINX FILMS | authKW | 100770 | 0% | 67% | 4 |
7 | PACVD | authKW | 97421 | 3% | 12% | 21 |
8 | ALKOXIDE SOLUTION | authKW | 86373 | 0% | 57% | 4 |
9 | HARD METALLURGICAL COATINGS | authKW | 75580 | 0% | 100% | 2 |
10 | MOALD | authKW | 75580 | 0% | 100% | 2 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 21343 | 37% | 0% | 299 |
2 | Physics, Applied | 4115 | 46% | 0% | 373 |
3 | Materials Science, Multidisciplinary | 1699 | 34% | 0% | 271 |
4 | Physics, Condensed Matter | 697 | 17% | 0% | 138 |
5 | Electrochemistry | 656 | 8% | 0% | 66 |
6 | METALLURGY & MINING | 558 | 1% | 0% | 8 |
7 | Materials Science, Ceramics | 289 | 4% | 0% | 33 |
8 | Nanoscience & Nanotechnology | 205 | 6% | 0% | 51 |
9 | Metallurgy & Metallurgical Engineering | 182 | 6% | 0% | 48 |
10 | Chemistry, Inorganic & Nuclear | 44 | 4% | 0% | 30 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MAT CHEM COATINGS | 120926 | 0% | 80% | 4 |
2 | OBERFLACHENTECH PLASMATECH WERKSTOFFENTWIC | 75568 | 1% | 25% | 8 |
3 | DIGITAL SEMICOND | 50385 | 0% | 67% | 2 |
4 | ANGLAGENTECH | 37790 | 0% | 100% | 1 |
5 | ARTMENT MAT ENGN | 37790 | 0% | 100% | 1 |
6 | BROWN 170 | 37790 | 0% | 100% | 1 |
7 | CNRS UPR8521 | 37790 | 0% | 100% | 1 |
8 | CREA PS | 37790 | 0% | 100% | 1 |
9 | ENSEIGNEMENT RECH ANGERS | 37790 | 0% | 100% | 1 |
10 | ESA5071 | 37790 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MODERN MACHINE SHOP | 18894 | 0% | 50% | 1 |
2 | SURFACE & COATINGS TECHNOLOGY | 18304 | 12% | 1% | 97 |
3 | THIN SOLID FILMS | 6278 | 10% | 0% | 78 |
4 | CHEMICAL VAPOR DEPOSITION | 4578 | 1% | 1% | 11 |
5 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 3807 | 5% | 0% | 38 |
6 | JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 3609 | 7% | 0% | 54 |
7 | JOURNAL DE PHYSIQUE IV | 2637 | 3% | 0% | 27 |
8 | NEUE HUTTE | 1411 | 0% | 1% | 4 |
9 | POWDER METALLURGY INTERNATIONAL | 1254 | 0% | 1% | 4 |
10 | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1129 | 4% | 0% | 31 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | TDEAT | 157456 | 1% | 83% | 5 | Search TDEAT | Search TDEAT |
2 | TITANIUM NITRIDE | 140797 | 8% | 6% | 65 | Search TITANIUM+NITRIDE | Search TITANIUM+NITRIDE |
3 | CVD TIN | 120926 | 0% | 80% | 4 | Search CVD+TIN | Search CVD+TIN |
4 | TDMAT | 104642 | 1% | 46% | 6 | Search TDMAT | Search TDMAT |
5 | TINX FILMS | 100770 | 0% | 67% | 4 | Search TINX+FILMS | Search TINX+FILMS |
6 | PACVD | 97421 | 3% | 12% | 21 | Search PACVD | Search PACVD |
7 | ALKOXIDE SOLUTION | 86373 | 0% | 57% | 4 | Search ALKOXIDE+SOLUTION | Search ALKOXIDE+SOLUTION |
8 | HARD METALLURGICAL COATINGS | 75580 | 0% | 100% | 2 | Search HARD+METALLURGICAL+COATINGS | Search HARD+METALLURGICAL+COATINGS |
9 | MOALD | 75580 | 0% | 100% | 2 | Search MOALD | Search MOALD |
10 | MOCVD TIN | 75580 | 0% | 100% | 2 | Search MOCVD+TIN | Search MOCVD+TIN |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | SPEE, CIMA , DRIESSEN, JPAM , KUYPERS, AD , (1995) LOW-TEMPERATURE DEPOSITION OF TIN CERAMIC MATERIAL BY METAL-ORGANIC AND/OR PLASMA-ENHANCED CVD.JOURNAL DE PHYSIQUE IV. VOL. 5. ISSUE C5. P. 719-734 | 59 | 87% | 14 |
2 | RODRIGUEZ-REYES, JCF , TEPLYAKOV, AV , (2007) CHEMISTRY OF DIFFUSION BARRIER FILM FORMATION: ADSORPTION AND DISSOCIATION OF TETRAKIS(DIMETHYLAMINO)TITANIUM ON SI(100)-2 X 1.JOURNAL OF PHYSICAL CHEMISTRY C. VOL. 111. ISSUE 12. P. 4800-4808 | 44 | 63% | 15 |
3 | SEN, K , BANU, T , DEBNATH, T , GHOSH, D , DAS, AK , (2014) TOWARDS A COMPREHENSIVE UNDERSTANDING OF THE CHEMICAL VAPOR DEPOSITION OF TITANIUM NITRIDE USING TI(NME2)(4): A DENSITY FUNCTIONAL THEORY APPROACH.DALTON TRANSACTIONS. VOL. 43. ISSUE 23. P. 8877 -8887 | 32 | 53% | 2 |
4 | PANDA, S , KIM, J , WEILLER, BH , ECONOMOU, DJ , HOFFMAN, DM , (1999) LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION OF TITANIUM NITRIDE FILMS FROM TETRAKIS(ETHYLMETHYLAMIDO)TITANIUM AND AMMONIA.THIN SOLID FILMS. VOL. 357. ISSUE 2. P. 125 -131 | 29 | 88% | 19 |
5 | KAFIZAS, A , CARMALT, CJ , PARKIN, IP , (2013) CVD AND PRECURSOR CHEMISTRY OF TRANSITION METAL NITRIDES.COORDINATION CHEMISTRY REVIEWS. VOL. 257. ISSUE 13-14. P. 2073 -2119 | 49 | 30% | 29 |
6 | GONG, YS , TU, R , GOTO, T , (2010) LASER CHEMICAL VAPOR DEPOSITION OF TITANIUM NITRIDE FILMS WITH TETRAKIS (DIETHYLAMIDO) TITANIUM AND AMMONIA SYSTEM.SURFACE & COATINGS TECHNOLOGY. VOL. 204. ISSUE 14. P. 2111-2117 | 24 | 71% | 1 |
7 | WANG, ST , ZHANG, Z , (2003) PREPARATION OF TITANIUM NITRIDE BY CHEMICAL VAPOR DEPOSITION.PROGRESS IN CHEMISTRY. VOL. 15. ISSUE 5. P. 374-378 | 37 | 53% | 0 |
8 | AMATO-WIERDA, C , NORTON, ET , WIERDA, DA , (1999) LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION OF TITANIUM NITRIDE THIN FILMS WITH HYDRAZINE AND TETRAKIS(DIMETHYLAMIDO)TITANIUM.ELECTROCHEMICAL AND SOLID STATE LETTERS. VOL. 2. ISSUE 12. P. 613 -615 | 23 | 88% | 3 |
9 | DRIESSEN, JPAM , KUYPERS, AD , SCHOONMAN, J , (2000) GAS-PHASE CHEMISTRY IN UP-SCALED PLASMA ENHANCED METAL-ORGANIC CHEMICAL-VAPOR DEPOSITION OF TIN AND TI(C,N) ON TOOL STEEL.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. VOL. 18. ISSUE 4. P. 1971-1976 | 19 | 100% | 3 |
10 | ASSAUD, L , PITZSCHEL, K , HANBUCKEN, M , SANTINACCI, L , (2014) HIGHLY-CONFORMAL TIN THIN FILMS GROWN BY THERMAL AND PLASMA-ENHANCED ATOMIC LAYER DEPOSITION.ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY. VOL. 3. ISSUE 7. P. P253 -P258 | 19 | 66% | 4 |
Classes with closest relation at Level 1 |