Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
13129 | 859 | 23.1 | 61% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
378 | 3 | SURFACE & COATINGS TECHNOLOGY//HIGH ENTROPY ALLOY//MATERIALS SCIENCE, COATINGS & FILMS | 32127 |
527 | 2 | SURFACE & COATINGS TECHNOLOGY//MATERIALS SCIENCE, COATINGS & FILMS//TITANIUM NITRIDE | 14964 |
13129 | 1 | KAPPA AL2O3//AL CR2O 3//ALUMINUM OXIDE | 859 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | KAPPA AL2O3 | authKW | 174172 | 1% | 70% | 7 |
2 | AL CR2O 3 | authKW | 148107 | 1% | 83% | 5 |
3 | ALUMINUM OXIDE | authKW | 145321 | 9% | 5% | 79 |
4 | BRUKER INDIA NANOTECHNOL | address | 142184 | 0% | 100% | 4 |
5 | ALUMINA COATINGS | authKW | 139973 | 2% | 25% | 16 |
6 | CEMENTED CARBIDE CUTTING TOOLS | authKW | 126948 | 1% | 71% | 5 |
7 | INVERTED CYLINDRICAL MAGNETRONS | authKW | 106638 | 0% | 100% | 3 |
8 | LGC UMR CNRS 5503 | address | 106638 | 0% | 100% | 3 |
9 | COMBUSTION CHEMICAL VAPOR DEPOSITION | authKW | 102448 | 1% | 41% | 7 |
10 | AL2O3 THIN FILMS | authKW | 98429 | 1% | 46% | 6 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Materials Science, Coatings & Films | 28059 | 41% | 0% | 353 |
2 | Physics, Applied | 6165 | 54% | 0% | 465 |
3 | Materials Science, Multidisciplinary | 2323 | 37% | 0% | 322 |
4 | Physics, Condensed Matter | 1695 | 25% | 0% | 211 |
5 | Materials Science, Ceramics | 1393 | 8% | 0% | 71 |
6 | Metallurgy & Metallurgical Engineering | 319 | 7% | 0% | 63 |
7 | Electrochemistry | 98 | 3% | 0% | 30 |
8 | Nanoscience & Nanotechnology | 46 | 3% | 0% | 30 |
9 | Physics, Multidisciplinary | 20 | 4% | 0% | 35 |
10 | Physics, Fluids & Plasmas | 16 | 2% | 0% | 14 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | BRUKER INDIA NANOTECHNOL | 142184 | 0% | 100% | 4 |
2 | LGC UMR CNRS 5503 | 106638 | 0% | 100% | 3 |
3 | NARITA PLANT | 71092 | 0% | 100% | 2 |
4 | SILICON SOLAR CELLS | 71092 | 0% | 100% | 2 |
5 | ENSIACET INP TOULOUSE | 63981 | 0% | 60% | 3 |
6 | SBIR STTR | 47393 | 0% | 67% | 2 |
7 | SGMLSMM | 47393 | 0% | 67% | 2 |
8 | RCSE | 45699 | 0% | 43% | 3 |
9 | ABT MIKROSYSTEMTECH | 35546 | 0% | 100% | 1 |
10 | BASIC EDUC INTEGRATED | 35546 | 0% | 100% | 1 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | SURFACE & COATINGS TECHNOLOGY | 44119 | 18% | 1% | 155 |
2 | THIN SOLID FILMS | 12252 | 13% | 0% | 112 |
3 | INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS | 6552 | 2% | 1% | 20 |
4 | JOURNAL OF HARD MATERIALS | 4442 | 0% | 13% | 1 |
5 | CHEMICAL VAPOR DEPOSITION | 4305 | 1% | 1% | 11 |
6 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2369 | 4% | 0% | 31 |
7 | CERAMICS INTERNATIONAL | 1797 | 3% | 0% | 27 |
8 | PLASMA PROCESSES AND POLYMERS | 1069 | 1% | 0% | 7 |
9 | JOURNAL DE PHYSIQUE IV | 970 | 2% | 0% | 17 |
10 | ZEITSCHRIFT FUR WERKSTOFFTECHNIK-MATERIALS TECHNOLOGY AND TESTING | 959 | 0% | 3% | 1 |
Author Key Words |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | SASEK, M , MUSIL, J , BLAZEK, J , ZEMAN, P , PROKSOVA, S , CERSTVY, R , (2010) THERMAL STABILITY OF ALUMINA THIN FILMS CONTAINING GAMMA-AL2O3 PHASE PREPARED BY REACTIVE MAGNETRON SPUTTERING.APPLIED SURFACE SCIENCE. VOL. 257. ISSUE 3. P. 1058 -1062 | 30 | 81% | 48 |
2 | BOIDIN, R , HALENKOVIC, T , NAZABAL, V , BENES, L , NEMEC, P , (2016) PULSED LASER DEPOSITED ALUMINA THIN FILMS.CERAMICS INTERNATIONAL. VOL. 42. ISSUE 1. P. 1177 -1182 | 24 | 80% | 1 |
3 | CANOVIC, S , LJUNGBERG, B , BJORMANDER, C , HALVARSSON, M , (2010) CVD TIC/ALUMINA AND TIN/ALUMINA MULTILAYER COATINGS GROWN ON SAPPHIRE SINGLE CRYSTALS.INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS. VOL. 28. ISSUE 2. P. 163-173 | 24 | 96% | 5 |
4 | PAULITSCH, J , RACHBAUER, R , RAMM, J , POLCIK, P , MAYRHOFER, PH , (2014) INFLUENCE OF SI ON THE TARGET OXIDE POISONING DURING REACTIVE ARC EVAPORATION OF (AL,CR)(2)O-3 COATINGS.VACUUM. VOL. 100. ISSUE . P. 29-32 | 23 | 85% | 5 |
5 | BOLVARDI, H , BABEN, MT , NAHIF, F , MUSIC, D , SCHNABEL, V , SHAHA, KP , MRAZ, S , BEDNARCIK, J , MICHALIKOVA, J , SCHNEIDER, JM , (2015) EFFECT OF SI ADDITIONS ON THERMAL STABILITY AND THE PHASE TRANSITION SEQUENCE OF SPUTTERED AMORPHOUS ALUMINA THIN FILMS.JOURNAL OF APPLIED PHYSICS. VOL. 117. ISSUE 2. P. - | 31 | 61% | 3 |
6 | OLARINOYE, O , OGUNDARE, F , (2015) IMPROVING THE STOICHIOMETRY OF RF-SPUTTERED AMORPHOUS ALUMINA THIN FILMS BY THERMAL ANNEALING.INTERNATIONAL JOURNAL OF MATERIALS RESEARCH. VOL. 106. ISSUE 5. P. 514 -520 | 30 | 63% | 1 |
7 | REDDY, IN , REDDY, VR , SRIDHARA, N , RAO, VS , BHATTACHARYA, M , BANDYOPADHYAY, P , BASAVARAJA, S , MUKHOPADHYAY, AK , SHARMA, AK , DEY, A , (2014) PULSED RF MAGNETRON SPUTTERED ALUMINA THIN FILMS.CERAMICS INTERNATIONAL. VOL. 40. ISSUE 7. P. 9571 -9582 | 26 | 70% | 6 |
8 | BALAKRISHNAN, G , SUNDARI, ST , RAMASESHAN, R , THIRUMURUGESAN, R , MOHANDAS, E , SASTIKUMAR, D , KUPPUSAMI, P , KIM, TG , SONG, JI , (2013) EFFECT OF SUBSTRATE TEMPERATURE ON MICROSTRUCTURE AND OPTICAL PROPERTIES OF NANOCRYSTALLINE ALUMINA THIN FILMS.CERAMICS INTERNATIONAL. VOL. 39. ISSUE 8. P. 9017-9023 | 28 | 67% | 8 |
9 | KHATIBI, A , GENVAD, A , GOTHELID, E , JENSEN, J , EKLUND, P , HULTMAN, L , (2013) STRUCTURAL AND MECHANICAL PROPERTIES OF CORUNDUM AND CUBIC (ALXCR1-X)(2+Y)O3-Y COATINGS GROWN BY REACTIVE CATHODIC ARC EVAPORATION IN AS-DEPOSITED AND ANNEALED STATES.ACTA MATERIALIA. VOL. 61. ISSUE 13. P. 4811 -4822 | 28 | 67% | 8 |
10 | MULLER, MGJ , NAHIF, F , MAYER, J , SCHNEIDER, JM , (2014) TRANSMISSION ELECTRON MICROSCOPY INVESTIGATION OF THE EFFECT OF SI ALLOYING ON THE THERMAL STABILITY OF AMORPHOUS ALUMINA THIN FILMS DEPOSITED BY FILTERED CATHODIC ARC DEPOSITION.SURFACE & COATINGS TECHNOLOGY. VOL. 257. ISSUE . P. 338 -347 | 22 | 81% | 1 |
Classes with closest relation at Level 1 |