Class information for: |
Basic class information |
Class id | #P | Avg. number of references |
Database coverage of references |
---|---|---|---|
2012 | 2387 | 20.1 | 81% |
Hierarchy of classes |
The table includes all classes above and classes immediately below the current class. |
Cluster id | Level | Cluster label | #P |
---|---|---|---|
2 | 4 | MATERIALS SCIENCE, MULTIDISCIPLINARY//PHYSICS, APPLIED//PHYSICS, CONDENSED MATTER | 2836879 |
279 | 3 | SELF ASSEMBLED MONOLAYER//MOLECULAR ELECTRONICS//NANOSCIENCE & NANOTECHNOLOGY | 42929 |
2054 | 2 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//DIP PEN NANOLITHOGRAPHY | 5330 |
2012 | 1 | NANOIMPRINT//NANOIMPRINT LITHOGRAPHY//IMPRINT LITHOGRAPHY | 2387 |
Terms with highest relevance score |
rank | Term | termType | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|---|
1 | NANOIMPRINT | authKW | 1479034 | 10% | 47% | 245 |
2 | NANOIMPRINT LITHOGRAPHY | authKW | 1380662 | 11% | 42% | 256 |
3 | IMPRINT LITHOGRAPHY | authKW | 420515 | 2% | 60% | 55 |
4 | UV NANOIMPRINT | authKW | 373046 | 1% | 83% | 35 |
5 | HOT EMBOSSING | authKW | 352888 | 4% | 31% | 89 |
6 | UV NIL | authKW | 319754 | 1% | 83% | 30 |
7 | MICROELECTRONIC ENGINEERING | journal | 285137 | 20% | 5% | 475 |
8 | ANTISTICKING LAYER | authKW | 256391 | 1% | 95% | 21 |
9 | UV NANOIMPRINT LITHOGRAPHY | authKW | 193860 | 1% | 63% | 24 |
10 | LASTI | address | 171171 | 2% | 28% | 47 |
Web of Science journal categories |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | Nanoscience & Nanotechnology | 67016 | 56% | 0% | 1339 |
2 | Physics, Applied | 29684 | 70% | 0% | 1674 |
3 | Engineering, Electrical & Electronic | 13953 | 45% | 0% | 1075 |
4 | Optics | 7165 | 24% | 0% | 563 |
5 | Materials Science, Multidisciplinary | 4348 | 32% | 0% | 752 |
6 | Polymer Science | 1090 | 9% | 0% | 218 |
7 | Instruments & Instrumentation | 509 | 5% | 0% | 129 |
8 | Engineering, Manufacturing | 447 | 3% | 0% | 63 |
9 | Physics, Condensed Matter | 417 | 9% | 0% | 216 |
10 | Mechanics | 272 | 5% | 0% | 113 |
Address terms |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | LASTI | 171171 | 2% | 28% | 47 |
2 | GRACE POLYMER PROC | 79689 | 0% | 69% | 9 |
3 | ELECT INFORMAT MEDIA ENGN | 75210 | 1% | 29% | 20 |
4 | MICROSTRUCT ENGN | 73996 | 0% | 64% | 9 |
5 | NANOMECH SYST | 71487 | 2% | 14% | 40 |
6 | TECHNOL DEV OPERAT | 57554 | 0% | 75% | 6 |
7 | NANOTECHNOL PLICAT POLYMERS | 51162 | 0% | 100% | 4 |
8 | PL ELECT | 48569 | 3% | 5% | 75 |
9 | NANO CONVERGENCE MFG SYST | 42930 | 1% | 22% | 15 |
10 | UBIQUITOUS MEMS MICRO ENGN | 42469 | 1% | 24% | 14 |
Journals |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
---|---|---|---|---|---|
1 | MICROELECTRONIC ENGINEERING | 285137 | 20% | 5% | 475 |
2 | JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 99878 | 5% | 6% | 123 |
3 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 79671 | 13% | 2% | 322 |
4 | MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 23168 | 3% | 2% | 78 |
5 | JOURNAL OF MICROMECHANICS AND MICROENGINEERING | 20752 | 4% | 2% | 95 |
6 | JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS | 13143 | 1% | 3% | 31 |
7 | JAPANESE JOURNAL OF APPLIED PHYSICS | 10916 | 5% | 1% | 117 |
8 | NANOTECHNOLOGY | 8444 | 4% | 1% | 88 |
9 | JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS | 6348 | 0% | 5% | 11 |
10 | INTERNATIONAL POLYMER PROCESSING | 2261 | 1% | 1% | 16 |
Author Key Words |
Rank | Term | Chi square | Shr. of publ. in class containing term |
Class's shr. of term's tot. occurrences |
#P with term in class |
LCSH search | Wikipedia search |
---|---|---|---|---|---|---|---|
1 | NANOIMPRINT | 1479034 | 10% | 47% | 245 | Search NANOIMPRINT | Search NANOIMPRINT |
2 | NANOIMPRINT LITHOGRAPHY | 1380662 | 11% | 42% | 256 | Search NANOIMPRINT+LITHOGRAPHY | Search NANOIMPRINT+LITHOGRAPHY |
3 | IMPRINT LITHOGRAPHY | 420515 | 2% | 60% | 55 | Search IMPRINT+LITHOGRAPHY | Search IMPRINT+LITHOGRAPHY |
4 | UV NANOIMPRINT | 373046 | 1% | 83% | 35 | Search UV+NANOIMPRINT | Search UV+NANOIMPRINT |
5 | HOT EMBOSSING | 352888 | 4% | 31% | 89 | Search HOT+EMBOSSING | Search HOT+EMBOSSING |
6 | UV NIL | 319754 | 1% | 83% | 30 | Search UV+NIL | Search UV+NIL |
7 | ANTISTICKING LAYER | 256391 | 1% | 95% | 21 | Search ANTISTICKING+LAYER | Search ANTISTICKING+LAYER |
8 | UV NANOIMPRINT LITHOGRAPHY | 193860 | 1% | 63% | 24 | Search UV+NANOIMPRINT+LITHOGRAPHY | Search UV+NANOIMPRINT+LITHOGRAPHY |
9 | NANOIMPRINT LITHOGRAPHY NIL | 166251 | 1% | 50% | 26 | Search NANOIMPRINT+LITHOGRAPHY+NIL | Search NANOIMPRINT+LITHOGRAPHY+NIL |
10 | THERMAL NANOIMPRINT | 154010 | 1% | 71% | 17 | Search THERMAL+NANOIMPRINT | Search THERMAL+NANOIMPRINT |
Core articles |
The table includes core articles in the class. The following variables is taken into account for the relevance score of an article in a cluster c: (1) Number of references referring to publications in the class. (2) Share of total number of active references referring to publications in the class. (3) Age of the article. New articles get higher score than old articles. (4) Citation rate, normalized to year. |
Rank | Reference | # ref. in cl. |
Shr. of ref. in cl. |
Citations |
---|---|---|---|---|
1 | SCHIFT, H , (2008) NANOIMPRINT LITHOGRAPHY: AN OLD STORY IN MODERN TIMES? A REVIEW.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 26. ISSUE 2. P. 458 -480 | 130 | 84% | 305 |
2 | GUO, LJ , (2007) NANOIMPRINT LITHOGRAPHY: METHODS AND MATERIAL REQUIREMENTS.ADVANCED MATERIALS. VOL. 19. ISSUE 4. P. 495 -513 | 71 | 76% | 738 |
3 | MATSUI, S , HIROSHIMA, H , HIRAI, Y , NAKAGAWA, M , (2015) INNOVATIVE UV NANOIMPRINT LITHOGRAPHY USING A CONDENSABLE ALTERNATIVE CHLOROFLUOROCARBON ATMOSPHERE.MICROELECTRONIC ENGINEERING. VOL. 133. ISSUE . P. 134 -155 | 82 | 84% | 4 |
4 | SCHIFT, H , (2015) NANOIMPRINT LITHOGRAPHY: 2D OR NOT 2D? A REVIEW.APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING. VOL. 121. ISSUE 2. P. 415 -435 | 85 | 69% | 6 |
5 | YI, PY , WU, H , ZHANG, CP , PENG, LF , LAI, XM , (2015) ROLL-TO-ROLL UV IMPRINTING LITHOGRAPHY FOR MICRO/NANOSTRUCTURES.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 33. ISSUE 6. P. - | 98 | 58% | 1 |
6 | LAN, HB , LIU, HZ , (2013) UV-NANOIMPRINT LITHOGRAPHY: STRUCTURE, MATERIALS AND FABRICATION OF FLEXIBLE MOLDS.JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY. VOL. 13. ISSUE 5. P. 3145 -3172 | 59 | 86% | 26 |
7 | DUMOND, JJ , LOW, HY , (2012) RECENT DEVELOPMENTS AND DESIGN CHALLENGES IN CONTINUOUS ROLLER MICRO- AND NANOIMPRINTING.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B. VOL. 30. ISSUE 1. P. - | 62 | 79% | 40 |
8 | KOOY, N , MOHAMED, K , PIN, LT , GUAN, OS , (2014) A REVIEW OF ROLL-TO-ROLL NANOIMPRINT LITHOGRAPHY.NANOSCALE RESEARCH LETTERS. VOL. 9. ISSUE . P. - | 45 | 88% | 31 |
9 | YOON, H , LEE, H , LEE, WB , (2014) TOWARD RESIDUAL-LAYER-FREE NANOIMPRINT LITHOGRAPHY IN LARGE-AREA FABRICATION.KOREA-AUSTRALIA RHEOLOGY JOURNAL. VOL. 26. ISSUE 1. P. 39 -48 | 59 | 78% | 5 |
10 | PENG, LF , DENG, YJ , YI, PY , LAI, XM , (2014) MICRO HOT EMBOSSING OF THERMOPLASTIC POLYMERS: A REVIEW.JOURNAL OF MICROMECHANICS AND MICROENGINEERING. VOL. 24. ISSUE 1. P. - | 74 | 48% | 34 |
Classes with closest relation at Level 1 |